• Title/Summary/Keyword: High density plasma

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QMF Ion Beam System Development for Oxide Etching Mechanism Study (산화막 식각 기구 연구를 위한 QMF Ion Beam 장치의 제작)

  • 주정훈
    • Journal of the Korean institute of surface engineering
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    • v.37 no.4
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    • pp.220-225
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    • 2004
  • A new ion beam extraction system is designed using a simple ion mass filter and a micro mass balance and a QMS based detecting system. A quadrupole Mass Filter is used for selective ion beam formation from inductively coupled high density plasma sources with appropriate electrostatic lens and final analyzing QMS. Also a quartz crystal microbalance is set between a QMF and a QMS to measure the etching and polymerization rate of the mass selected ion beam. An inductively coupled plasma was used as a ion/radical source which had an electron temperature of 4-8 eV and electron density of $4${\times}$10^{11}$#/㎤. A computer interfaced system through 12bit AD-DA board can control the pass ion mass of the qmf by setting RF/DC voltage ratio applied to the quadrupoles so that time modulation of pass ion's mass is possible. So the direct measurements of ion - surface chemistry can be possible in a resolution of $1\AA$/sec based on the qcm's sensitivity. A full set of driving software and hardware setting is successfully carried out to get fundamental plasma information of the ICP source and analysed $Ar^{+}$ beam was detected at the $2^{nd}$ QMS.

Characterization of Linear Microwave Plasma using the Fluid Simulation (유체 시뮬레이션을 이용한 선형 마이크로웨이브 플라즈마의 특성 분석)

  • Seo, Kwon-Sang;Han, Moon-Ki;Kim, Dong-Hyun;Lee, Ho-Jun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.64 no.4
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    • pp.567-572
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    • 2015
  • Discharge characteristics of linear microwave plasma were investigated by using fluid simulation of 2D axis-symmetry based on finite elements method. The microwave power was 2.45 GHz TEM mode and transmitted through linear antenna. Resistive power and pressure were considered simulation variables and argon was used for working gas. A decrease of electron density along the quartz tube was observed in low power condition but relatively uniform plasmas were generated in chamber by increasing the resistive power. The electron temperature was highly detected near the surface of quartz tube because the electron was heated only dielectric surface. The power transmission efficiency decreased and characteristics of surface plasma were observed in high electron density condition.

Twin Target Sputtering System with Ladder Type Magnet Array for Direct Al Cathode Sputtering on Organic Light Emitting Diodes

  • Moon, Jong-Min;Kim, Han-Ki
    • Journal of Information Display
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    • v.8 no.3
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    • pp.5-10
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    • 2007
  • Twin target sputtering (TTS) system with a configuration of vertically parallel facing Al targets and a substrate holder perpendicular to the Al target plane has been designed to realize a direct Al cathode sputtering on organic light emitting diodes (OLEDs). The TTS system has a linear twin target gun with ladder type magnet array for effective and uniform confinement of high density plasma. It is shown that OLEDs with Al cathode deposited by the TTS show a relatvely lower leakage current density $({\sim}1{\times}10^{-5}mA/cm^2)$ at reverse bias of -6V, compared to that ($1{\times}10^{-2}{\sim}10^{-3}$ $mA/cm^2$ at -6V) of OLEDs with Al cathodes grown by conventional DC magnetron sputtering. In addition, it was found that Al cathode films prepared by TTS were amorphous structure with nanocrystallines due to low substrate temperature. This demonstrates that there is no plasma damage caused by the bombardment of energetic particles. This indicates that the TTS system with ladder type magnet array could be useful plasma damage free deposition technique for direct Al cathode sputtering on OLEDs or flexible OLEDs.

Characteristics of organic light-emitting diodes with AI cathode prepared by ITS system (TTS로 성막한 Al 캐소드를 가진 유기발광소자의 특성 분석)

  • Moon, Jong-Min;Lee, Sang-Hyun;Kim, Han-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.74-75
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    • 2007
  • We report on the characteristics of organic light-emitting diodes with Al cathode deposited by specially designed twin target sputter(TTS) system. It was found that the Al cathode films grown by TTS system were amorphous structure with nanocrystallines due to low substrate temperature during sputtering process. Effective confinement of high-density plasma between two Al targets lead to low temperature sputtering process on organic layer. Moreover, organic light-emitting diodes with Al cathode deposited by TTS system exhibited low leakage current density of $4{\times}10^{-6}\;mA/cm2$ at -6 V indicating plasma damage due to bombardment of energetic particles such as ions and $\gamma$-electrons was effectively restricted in the ITS system. Sputtering method using ITS system is expected to be applied in organic electronics and flexible displays due to its low temperature and plasma damage free deposition process.

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Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering

  • Chun, Sung-Yong;Kim, Seong-Jong
    • Corrosion Science and Technology
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    • v.20 no.3
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    • pp.112-117
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    • 2021
  • Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramatically improve coating properties by increasing the plasma ionization rate and the ion bombardment effect during deposition. Thus, this paper presents the comparative results of CrN films deposited by direct current magnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical and corrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electron microscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films by ICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films deposited by ICPMS had a very compact microstructure with high hardness. The nanoindentation hardness reached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMS was about 9.8 × 10-6 mA/cm2, which was 1/470 of 4.6 × 10-3 mA/cm2, the corrosion current density of CrN film prepared by dcMS.

Where is the coronal loop plasma located, within a flux rope or between flux ropes?

  • Lim, Daye;Choe, G.S.;Yi, Sibaek
    • The Bulletin of The Korean Astronomical Society
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    • v.40 no.1
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    • pp.66.3-67
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    • 2015
  • Without scrutinizing reflection, the plasma comprising a coronal loop is usually regarded to reside within a flux rope. This picture seems to have been adopted from laboratory plasma pinches, in which a plasma of high density and pressure is confined in the vicinity of the flux rope axis by magnetic tension and magnetic pressure of the concave inward magnetic field. Such a configuration, in which the plasma pressure gradient and the field line curvature vector are almost parallel, however, is known to be vulnerable to ballooning instabilities (to which belong interchange instabilities as a subset). In coronal loops, however, ideal MHD (magnetohydrodynamic) ballooning instabilities are impeded by a very small field line curvature and the line-tying condition. We, therefore, focus on non-ideal (resistive) effects in this study. The footpoints of coronal loops are constantly under random motions of convective scales, which twist individual loop strands quite randomly. The loop strands with the axial current of the same direction tend to coalesce by magnetic reconnection. In this reconnection process, the plasma in the loop system is redistributed in such a way that a smaller potential energy of the system is attained. We have performed numerical MHD simulations to investigate the plasma redistribution in coalescence of many small flux ropes. Our results clearly show that the redistributed plasma is more accumulated between flux ropes rather than near the magnetic axes of flux ropes. The Joule heating, however, creates a different temperature distribution than the density distribution. Our study may give a hint of which part of magnetic field we are looking to in an observation.

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Comparative evaluation of obesity-related parameters in junior sumo wrestlers and children with obesity

  • Ogawa, Miori;Sagayama, Hiroyuki;Tamai, Shinsuke;Momma, Reiko;Hoshi, Daisuke;Uchizawa, Akiko;Ichikawa, Go;Arisaka, Osamu;Watanabe, Koichi
    • Korean Journal of Exercise Nutrition
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    • v.25 no.3
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    • pp.36-43
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    • 2021
  • [Purpose] Exercise is a key factor in preventing obesity and metabolic syndrome. Sumo wrestlers increase their body size from childhood for athletic advantage; however, the risk of metabolic syndrome in junior sumo wrestlers is undetermined. Preventive measures against pediatric obesity should be initiated during childhood to prevent obesity in adulthood, considering its high global incidence. We comparatively evaluated the risk factors for metabolic syndrome in junior sumo wrestlers and children with obesity. [Methods] We enrolled 70 male children (age 9-17 years [sumo group, n = 14] and 9-14 years [other sports and non-exercise groups, n = 28 each]) and evaluated their anthropometric parameters (height, weight, body mass index z-score, obesity rate, waist circumference, waist to height ratio) and hematological parameters (total, low-density, high-density, and non-high-density lipoprotein-cholesterol; triglycerides; plasma glucose, and glycated hemoglobin levels). [Results] The BMI z-score, obesity rate, waist circumference (p < 0.05, along with the non-exercise group), and systolic blood pressure were significantly higher and the high-density cholesterol level was lower in the sumo group than in the other sports group (p < 0.05). The waist to height ratio was significantly higher in the non-exercise group than in the other sports group (p < 0.05). No significant difference was found in other blood lipid, plasma glucose (significantly lower level than the reference range in the sumo group, p < 0.05), and glycated hemoglobin (within the reference range in all groups) levels among the three groups. [Conclusion] Junior sumo wrestlers had a larger body size and higher blood pressure than children with obesity who exercised regularly. This provides direction for future research into targeted preventive interventions against metabolic syndrome for junior sumo wrestlers with large body size.

Study of Surface Reaction and Gas Phase Chemistries in High Density C4F8/O2/Ar and C4F8/O2/Ar/CH2F2 Plasma for Contact Hole Etching

  • Kim, Gwan-Ha
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.2
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    • pp.90-94
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    • 2015
  • In this study, the characterizations of oxide contact hole etching are investigated with C4F8/O2/Ar and CH2F2/C4F8/O2/ Ar plasma. As the percent composition of C4F8 in a C4F8/O2/Ar mixture increases, the amount of polymer deposited on the etched surface also increases because the CxFy polymer layer retards the reaction of oxygen atoms with PR. Adding CH2F2 into the C4F8/O2/Ar plasma increases the etch rate of the oxide and the selectivity of oxide to PR. The profile of contact holes was close to 90°, and no visible residue was seen in the SEM image at a C4F8/(C4F8+O2) ratio of 58%. The changes of chemical composition in the chamber were analyzed using optical emission spectroscopy, and the chemical reaction on the etched surface was investigated using X-ray photoelectron spectroscopy.

Dependence of the Formation of $TiO_{2\pm}{\delta}$ Films on Plasma Process Variables (플라즈마 공정 변수가 $TiO_{2\pm}{\delta}$ 박막 형성에 미치는 영향)

  • Park, Sang-Gi;Gang, Bong-Ju;Lee, Won-Hui;Lee, Jae-Gap
    • Korean Journal of Materials Research
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    • v.10 no.11
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    • pp.732-737
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    • 2000
  • Plasma enhanced chemical vapor deposition of $TiO_{2$\pm}{\delta}$ has been carried out using TEMAT [tetrakis(ethylmethylamido) titanium] and $H_2$. Increasing the power from 300 W to 500 W produced the high density plasma, leading to the formation of TiO$_2$films with an increased ratio of Ti to O and a negligible amount of C and N. Applying the bias of 30W to the substrate in creased the growth rate of the film with a slightly increased content of Ti in the film. In addition, $H_2O$ was from either the residual gas in the gase pressure or $H_2(/He)$ gas and actively participated in the formation of $TiO_2$ films. Consequently, Ti ions created in the plasma could be a main contributor to $TiO_2$ formation with a slight amount of $H_2O(~10^{-4}Toor)$ in the ambient, which provided the dissociation of TEMAT.

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Fruiting Body Extracts of Paecilomyces tenuipes Ameliorate Lipid and Antioxidant Metabolism in Rats Fed a High Fat-Cholesterol Diet

  • Park, Eun-Ju;Park, Nam-Sook;Park, Hae-Ryong;Jin, Byung-Rae;Lee, Sang-Mong
    • Food Science and Biotechnology
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    • v.15 no.5
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    • pp.710-714
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    • 2006
  • The present study examined the lipid lowering and antioxidant activity of Paecilomyces tenuipes. Eight week-old male Sprague-Dawley rats were fed one of the three diets, a reference diet without cholesterol addition (NC), a high fat (17 g/ 100 g)-high cholesterol (1 g/100 g) diet (HC) and a HC diet supplemented with 3% P. tenuipes (PT) for 30 days. Total lipid and total cholesterol were reduced significantly by 33 and 37%, respectively, in the PT diet group compared with controls. A similar reduction was found for low density lipoprotein (LDL) cholesterol levels, while plasma high density lipoprotein (HDL) cholesterol and triglyceride (TG) concentrations were not significantly different among groups. Hepatic total lipid and total cholesterol levels, but not hepatic TG levels, were significantly decreased in the PT group compared to the HC group. The administration of P. tenuipes increased the plasma total antioxidant potential and decreased the levels of lipid peroxidation. These results suggest that P. tenuipes exerts significant health benefits through the modulation of physiological functions including a variety of atherogenic lipid profiles and antioxidants in hypercholesterolemia.