• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.74-74
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• 2009

The ArF PR mask was. developed to overcome the limit. of sub 40nm patterning technology with KrF PR. But ArF PR difficult to meet the required PR selectivity by thin PR thickness. So need to the multi-stack mask such as amorphous carbon layer (ACL). Generally capacitively coupled plasma (CCP) etcher difficult to make the high density plasma and inductively coupled plasma (ICP) type etcher is more suitable for multi stack mask etching. Hybrid Coupled Plasma source (HCPs) etcher using the 13.56MHz RF power for ICP source and 2MHz and 27.12MHz for bias power was adopted to improve the process capability and controllability of ion density and energy independently. In the study, the oxide trench which has the multi stack layer process was investigated with the HCPs etcher (iGeminus-600 model DMS Corporation). The results were analyzed by scanning electron microscope (SEM) and it was found that etching characteristic of oxide trench profile depend on the multi-stack mask.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.7-15
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• 2000

An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

• Korean Journal of Optics and Photonics
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• v.12 no.2
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• pp.115-120
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• 2001

In the present study, we described in detail a precise correction method of the copper emission spectra obtained from a highpressure and high-temperature pulsed plasma-jet. The pulsed plasma-jet is initiated from an electro-thermal capillary discharge through a small orifice, and expanded rapidly into an atmosphere. In order to characterize the plasma, fundamental measurements such as the plasma excitation temperature or electron number density are essential. However those spectral lines which are directly related to the excitation temperature or electron number density may be distorted by the spectral response of the optical instruments used. Therefore, in this paper, we discuss some efforts to derive precise correction methods of the copper emission spectra obtained from the pulsed plasma-jet. a-jet.

• Transactions on Electrical and Electronic Materials
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• v.1 no.1
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• pp.32-39
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• 2000

Langmuir probe measurements of electron density, electron temperature and potential are mad in the early stage (<5${\mu}$s) of a laser ablated plasma plume, in which a positive current form positive ions and a electron current are overlapped. The plasma wes produced by focusing the second harmonic, 532 nm, of Q-switched Nd:YAG laser on a high purity carbon target. Then the laser intensity on the target of ~1.6${\times}$10$\^$15/ W/$\textrm{cm}^2$. The measured electron desities and temperatures are ~2${\times}$10/sip 11/ cm$\^$-3/ and -3 eV. In particluar , the phenomenon that the electron temperature decreased and then increased was observed,. It could be well explained that this phenomenon occurred in the process of inverse Bremsstrahlung of free electrons in plasma. Additionally, the plasma potential(>11V) was higher than the published values.

• Journal of Advanced Marine Engineering and Technology
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• v.36 no.8
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• pp.1076-1082
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• 2012

Today the welding for LNG carrier is known to be possible using arc and plasma arc welding process. But because of the lower energy density, arc welding is inevitable to multi-pass welding for thick plate and has a limit of welding speed compared to laser which is high energy density heat source. When thick plate is welded, weld defect by multi-pass welding and heat-affected zone by high heat-input were formed. Therefore one-pass welding by key-hole has been considered to work out the problems. It is possible for Laser, electron beam, plasma process to do key-hole welding. Nowadays, plasma process has been used for welding membrane of cargo tank for LNG carrier instead of arc process. Recently, many studies have examined to apply laser process to welding of membrane. In this paper, weldability, microstructure and mechanical properties of stainless steel for LNG carrier welded by fiber laser were compared to those by plasma. As a result, although the laser welding has several times faster speed, similar properties and smaller weld and heat affected zone were obtained. Consequently, this study proves the superiority of fiber laser welding for LNG carrier.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.253.2-253.2
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• 2014

Micro hollow cathode discharges (MHCDs) are high-pressure, non-equilibrium discharges. Those MHCDs are useful to produce an excimer radiation. A major advantage of excimer sources is their high internal efficiency which may reach values up to 40% when operated under optimum conditions. To produce strong excimer radiation, the optimisation of the discharge conditions however needs a detailed knowledge of the properties of the discharge plasma itself. The electron density and temperature influence the excitation as well as plasma chemistry reactions and the gas temperature plays a major role as a significant energy loss process limiting efficiency of excimer radiation. Most of the recent spectroscopic investigations are focusing on the ultraviolet or vacuum ultraviolet range for direct detection of the excimer. In our experiments we have concentrated on investigating the micro hollow cathodes from the near UV to the near infrared (300~850 nm) to measure the basic plasma parameters using standard plasma diagnostic techniques such as stark broadening for electron density and the relative line intensity method for electron temperature. Finally, the neutral gas temperature was measured by means of the vibrational rotational structures of the second positive system of nitrogen.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.74-74
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• 2010

The aqua-plasma is the non-thermal plasma in electrical conductive electrolyte by generates the vapor film layer on the immersed metal electrode surface. This plasma can generate the hydroxyl radical by dissociate the water molecule with the plasma electron. To develop the plasma discharge device for high efficiency in the hydroxyl radical generation, proper model for estimation of plasma power is necessary. In this work, the 1-D spherical model was developed, considering temperature dependence material constants. The relation between the plasma power and hydroxyl generation was also studied by the comparison between the optical emission intensity from the hydroxyl radical using monochromator and estimated plasma power. First, the thickness of vapor layer thickness was estimated using the Navier-Stokes fluid equation in order to calculate the discharge E-field inside vapor layer. Using the E-field magnitude and power balance on the plasma generation, it was possible to estimate the plasma power. The plasma power was assumed to uniformly fill the vapor layer and the temperature of vapor layer was fixed in the boiling temperature of electrolyte, 375K. In the experiment, the aqua-plasma was discharged in the saline by applied the voltage on the bipolar electrode. The range of applied voltage was 234 to 280V-rms in the frequency of 380 kHz. Two type electrodes were produced with two ${\Phi}0.2$ tungsten. The plasma power was estimated from the V-I signal from the two high voltage probes and current probe. The estimated plasma power agreed with the profile of emission intensity when the plasma discharged between the metal electrode and vapor layer surface. However, when the plasma discharged between the metal electrodes, the increasing rate of emission intensity was lower than the increase of plasma power. It implies that the surface reaction is more sufficient rather than the volume reaction in the radical generation, due to the high density of water molecule in the liquid.

• Asian-Australasian Journal of Animal Sciences
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• v.16 no.4
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• pp.511-514
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• 2003

Previously, we reported that a diet including sesame meal (SM) increased plasma total and high-density lipoprotein (HDL)-cholesterol concentrations in goats. In the present study, the components in the sesame meal that can increase plasma total and HDL-cholesterol concentrations have been examined. In experiment 1, we gave goats defatted sesame meal diet (DSM) to investigate the influence of ether extract fraction remained in sesame meal. Corn gluten meal diet (CGM) was also fed to goats as a high-protein diet to examine the influence of high dietary protein level caused by usage of sesame meal. Plasma total and HDL-cholesterol concentrations of goats fed DSM and CGM did not change during experimental periods though they were elevated by feeding SM. In experiment 2, the influence of sesame oil and corn oil added in diets on plasma total and HDL-cholesterol concentrations in goats was investigated. Plasma total and HDL-cholesterol concentrations were increased by feeding both corn oil diet and sesame oil diet. In conclusion, the increase in plasma HDL-cholesterol concentration by feeding sesame meal was resulted by the effect of ether extract fraction including sesame oil or some lipid-soluble components remained in sesame meal.

• Journal of the Korean institute of surface engineering
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• v.53 no.2
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• pp.67-71
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• 2020

For deposition technology using plasma, it plays an important role in improving film deposited with high ionization rate through high density plasma. Various deposition methods such as high-power impulse magnetron sputtering and ion-beam sputtering have been developed for physical vapor deposition technology and are still being studied. In this study, it is intended to control plasma using inductive coupled plasma (ICP) antennas and use properties to improve the properties of Hafnium nitride (HfN) films using ICP assisted magnetron sputtering (ICPMS). HfN film deposited using ICPMS showed a finer grain sizes, denser microstructure and better mechanical properties as ICP power increases. The best mechanical properties such as nanoindentation hardness of 47 GPa and Young's modulus of 401 GPa was obtained from HfN film deposited using ICPMS at ICP power of 200 W.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.184-184
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• 2012

We proposed a new measurement method of cutoff probe using the reactance spectrum of the plasma in cutoff probe system instead of transmission spectrum. The high accurate reactance spectrum of the plasma which is expected in previous circuit simulation of cutoff probe [1] was measured by using the automatic port extension method of the network analyzer. The measured reactance spectrum is good agreement with E/M wave simulation result (CST Microwave Studio). From the analysis of the measured reactance spectrum based on the circuit modeling, not only the electron density but also electron-neutral collision frequency can be simply obtained. The obtained results of electron density and e-n collision frequency were presented and discussed in wide range of experimental conditions, together with comparison result with previous methods (a previous cutoff probe using transmission spectrum and a single langmuir probe).