• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2007년도 춘계학술대회 논문집
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• pp.615-616
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 1996년도 제10회 학술발표회 논문개요집
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• pp.75-76
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• 1996

• 진공이야기
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• 제4권1호
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• pp.4-11
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• 2017

The Rare Isotope Science Project (RISP) has been launched for developing a superconducting heavy-ion linear accelerator, which produces various rare isotopes for low energy nuclear science and applied sciences. This superconducting linac is designed to achieve a very high beam current (200Mev/u with 400 kW beam power) of heavy ions including Uranium. For the high current accelerator, the requirement of ultra high-vacuum level is considered as one of the of important factors. Vacuum calculations have been carried out to verify the vacuum system design satisfied the requirements. In this paper, an overview of RISP and vacuum calculation methods for several interesting sections of the superconducting linear accelerator.

• Transactions on Electrical and Electronic Materials
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• 제14권6호
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• pp.334-338
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• 2013

In this study, the outgassing effects of selected vacuum materials on the vacuum characteristics were simulated by the $VacSim^{Multi}$ simulation tool. This investigation examined the feasibility of reliably simulating the outgassing characteristics of common vacuum chamber materials (aluminum, copper, stainless steel, nickel plated steel, Viton A). The optimum design factors for these vacuum systems were suggested based on the simulation results. The baking-out effects of the modeled systems and materials on the performance of the vacuum system were also analyzed. The simulation predicted that the overall outgassing effect was more significant in the turbomolecular pump system than in the diffusion pump system and that the utilization of a booster pump has a greater effect on the evacuation time than on the ultimate pressure.

• 진공이야기
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• 제1권3호
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• pp.14-20
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• 2014

Lithography is widely recognized as one of the key steps in the manufacture of ICs and other devices and/or structures. However, as the dimensions of features made using lithography become smaller, lithography is becoming a more critical factor for enabling miniature IC or other devices and/or structures to be manufactured. As explained above, to make it happen, many other important technologies will have to be addressed. The vacuum technology is one of them and the engineers and experts are paying attention on vacuum technology including vacuum pumps. Especially high Vacuum(HV) and Ultra high vacuum(UHV) are not easy and not simple one. So the manpower who can understand vacuum technology with long experience in vacuum industry is important with basic study.

• Tribology and Lubricants
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• 제16권6호
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• pp.409-414
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• 2000

The friction and wear behaviors of MoS$_2$ coatings were investigated by using a pin and disk type tester. The experiment was conducted by using silicon nitride as pin material and MoS$_2$-on-bearing steel as disk material under different operating conditions that include linear sliding velocities in the range of 22-66 ㎜/sec, normal loads varying from 9.8 N to 29.4 N, corresponding to maximum contact pressures of 1.18-2.83 GPa and atmospheric conditions of high vacuum, medium vacuum, ambient air. The results showed that low friction coefficient of the coating has been identified in high vacuum and that friction coefficient and wear volume increased with increasing normal load. Also at high load conditions, the friction coefficient and wear volume increased with increasing sliding velocity.

• KSTLE International Journal
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• 제1권2호
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• pp.91-94
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• 2000

The friction and wear behavior of MoS$_2$coatings was investigated using a pin and disk type tester. The experiment was conducted with silicon nitride as the pin material and MoS$_2$-on-bearing steel as the disk material under different operating conditions that included linear sliding velocities within a range of 2266 mm/sec, normal loads varying from 9.829.4 N, corresponding to maximum contact pressures of 1.782.83 Gpa, and high vacuum, medium vacuum, and ambient air atmospheric conditions. The results showed a low friction coefficient far the coating in a high vacuum, plus the friction coefficient and wear volume increased with an increased normal load. Furthermore, under high load conditions, the friction coefficient and wear volume also increased with an increased sliding velocity.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 1999년도 제30회 추계학술대회
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• pp.94-100
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• 1999

The friction and wear behavior of MoS$_2$Coatings were investigated using a pin and disk type tester. The experiment was conducted using silicon nitride as pin material and MoS$_2$-on-bearing steel as disk material under different operating conditions that include linear sliding speeds in the range of 22~66mm/sec, normal loads varying from 9.8~29.4N, corresponding to maximum contact pressure of 1.78~2.830GPa and atmospheric conditions of high vacuum, medium vacuum, ambient air. The results showed that low friction coefficient of the coating has been identified when running in high vacuum and that friction coefficient and wear volume increased with increasing normal load. Also at high load conditions, the friction coefficient and wear volume increased with increasing sliding velocity.

• 한국진공학회지
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• 제14권4호
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• pp.186-194
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• 2005

정적법 고진공 표준기를 이용하여 스피닝 로터 게이지를 $4.04\times10^{-3}$ $Pa\~1.11\times10^{-2}$Pa에서 교정하였으며, 그 결과를 국제표준화기구에서 권고한 측정불확도 표현지침에 따라 불확도를 계산 및 평가하였다. 평가 결과 기준압력 $7.5488\times10^{-3}$ Pa에서 교정된 SRG의 합성표준불확도는 $95\%$ 신뢰수준, 포함인자 k = 1에서 $3.0035\times10^{-5}$ Pa로 나타났다.

• Applied Science and Convergence Technology
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• 제27권5호
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• pp.100-104
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• 2018

Herein, we present the behavior of plasma-doped graphene upon high-temperature vacuum annealing. An ammonia plasma-treated graphene sample underwent vacuum annealing for 1 h at temperatures ranging from 100 to $500^{\circ}C$. According to Raman analysis, the structural healing of the plasma-treated sample is more pronounced at elevated annealing temperatures. The crystallite size of the plasma-treated sample increases from 13.87 to 29.15 nm after vacuum annealing. In addition, the doping level by plasma treatment reaches $2.2{\times}10^{12}cm^{-2}$ and maintains a value of $1.6{\times}10^{12}cm^{-2}$, even after annealing at $500^{\circ}C$, indicating high doping stability. A relatively large decrease in the pyrrolic bonding components is observed by X-ray photoelectron spectroscopy as compared to other configurations, such as pyridinic and amino bindings, after the annealing. This study indicates that high-vacuum annealing at elevated temperatures provides a method for the structural reorganization of plasma-treated graphene without a subsequent decrease in doping level.