• Title/Summary/Keyword: High Power semiconductor

검색결과 969건 처리시간 0.028초

2-Hexylthieno[3,2-b]thiophene-substituted Anthracene Derivatives for Organic Field Effect Transistors and Photovoltaic Cells

  • Jo, So-Young;Hur, Jung-A;Kim, Kyung-Hwan;Lee, Tae-Wan;Shin, Ji-Cheol;Hwang, Kyung-Seok;Chin, Byung-Doo;Choi, Dong-Hoon
    • Bulletin of the Korean Chemical Society
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    • 제33권9호
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    • pp.3061-3070
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    • 2012
  • Novel 2-hexylthieno[3,2-b]thiophene-containing conjugated molecules have been synthesized via a reduction reaction using tin chloride in an acidic medium. They exhibited good solubility in common organic solvents and good self-film and crystal-forming properties. The single-crystalline objects were fabricated by a solvent slow diffusion process and then were employed for fabricating field-effect transistors (FETs) along with thinfilm transistors (TFTs). TFTs made of 5 and 6 exhibited carrier mobility as high as 0.10-0.15 $cm^2V^{-1}s^{-1}$. The single-crystal-based FET made of 6 showed 0.70 $cm^2V^{-1}s^{-1}$ which was relatively higher than that of the 5-based FET (${\mu}=0.23cm^2V^{-1}s^{-1}$). In addition, we fabricated organic photovoltaic (OPV) cells with new 2-hexylthieno [3,2-b]thiophene-containing conjugated molecules and methanofullerene [6,6]-phenyl C61-butyric acid methyl ester ($PC_{61}BM$) without thermal annealing. The ternary system for a bulk heterojunction (BHJ) OPV cell was elaborated using $PC_{61}BM$ and two p-type conjugated molecules such as 5 and 7 for modulating the molecular energy levels. As a result, the OPV cell containing 5, 7, and $PC_{61}BM$ had improved results with an open-circuit voltage of 0.90 V, a short-circuit current density of 2.83 $mA/cm^2$, and a fill factor of 0.31, offering an overall power conversion efficiency (PCE) of 0.78%, which was larger than those of the devices made of only molecule 5 (${\eta}$~0.67%) or 7 (${\eta}$~0.46%) with $PC_{61}BM$ under identical weight compositions.

2.4GHz RFID 태그용 고조파 억제를 위한 저역통과필터의 설계 (A Low-pass filter design for suppressing the harmonics of 2.4GHz RFID tag)

  • 조영빈;김병수;김장권
    • 대한전자공학회논문지TE
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    • 제39권3호
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    • pp.59-64
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    • 2002
  • ISM 대역을 사용하는 RFID 시스템에서 대상물에 장착되는 태그는 내장된 컨트롤러와 메모리를 동작시키기 위해서 소형 안테나로부터 들어온 전파 신호를 쇼트키 다이오드로 정류하여 전원으로 사용하게 된다. 반도체 소자의 비선형성에 의한 고조파 성분과 안테나의 고차 모드의 공진으로 여기되는 불요파는 태그의 성능 저하를 가져온다. 본 논문에서는 2차 고조파 성분을 제거함으로써 시스템 효율을 개선하기 위하여 "스터브 I 형 DGS 슬롯 구조"를 이용한 새로운 형태의 저역통과 필터를 구현하였다. 스터브 폭과 I 형 슬롯의 연결 폭을 조정하여 최적의 통과대역 및 저지대역 주파수 특성을 갖도록 설계하고 제작하였다. 제작된 저역통과 필터의 측정결과는 차단 주파수는 3.25 GHz 이고 2.4 GHz~2.5 GHz 의 대역에서 삽입손실은 -0.29~-0.3 dB 이고 반사손실은 -27.688~-33.665 dB 로 비교적 양호한 특성을 보여주고 있으며, 2배 고조파의 대역인 4.9 GHz 에서의 저지특성은 약 -19.367 dB를 보여준다. 이 구조의 필터를 이용하여 RFID, WLAN 등의 응용에 적용되어 고조파와 불요파를 제거함으로서 시스템 효율의 개선에 사용할 수 있을 것이다.

다용도 실시간 경사각과 방위각 연속 측정 시스템 개발연구 (A Study on the Development of Multifuntional Real-Time Inclination and Azimuth Measurement System)

  • 김규현;조성호;정현기;이효선;손정술
    • 한국지구과학회지
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    • 제34권6호
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    • pp.588-601
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    • 2013
  • 최근 지구물리 물리탐사 분야에서 경사각과 방위각 정보는 시추공 물리검층 및 물리탐사 자료보정을 위한 시추공 편차검층, 이동형 실시간 자료획득 시스템, 기타 지구물리 모니터링 시스템 등 다양하게 활용되면서 그 중요성이 높아지고 있다. 특히 최근 셰일가스의 개발이 가능하게 한 방향시추 기술에서도 경사각과 방위각 정보는 필수일 정도로 그 응용범위가 매우 넓다. 따라서 여러 분야에 응용될 수 있는 경사각과 방위각 측정 시스템의 초소형 옥외 저전력 운용이 절실해졌다. 본 논문에서는 최신 CMOS 저전력, 고성능 MCU 및 멤스(MEMS) 자세방위기준장치(AHRS)를 도입하여 초소형, 저전력으로 제작된 다용도 야외시험용 실시간 경사각과 방위각 연속 측정 시스템 개발 연구의 결과를 제시하고자 한다. 시스템은 최소 지름 42 mm의 존데 내에 설치될 수 있도록 초슬림 형태로 제작되었으며 실시간 데이터 획득이 가능할 뿐만 아니라 엔코더, DGPS 연동으로 운용 확장이 가능하여 다양한 응용이 기대된다.

Strained SGOI n-MOSFET에서의 phonon-limited전자이동도의 Si두께 의존성 (Dependency of Phonon-limited Electron Mobility on Si Thickness in Strained SGOI (Silicon Germanium on Insulator) n-MOSFET)

  • 심태헌;박재근
    • 대한전자공학회논문지SD
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    • 제42권9호
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    • pp.9-18
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    • 2005
  • 60 nm C-MOSFET 기술 분기점 이상의 고성능, 저전력 트랜지스터를 구현 시키기 위해 SiGe/SiO2/Si위에 성장된 strained Si의 두께가 전자 이동도에 미치는 영향을 두 가지 관점에서 조사 연구하였다. 첫째, inter-valley phonon 산란 모델의 매개변수들을 최적화하였고 둘째, strained Si 반전층의 2-fold와 4-fold의 전자상태, 에너지 밴드 다이어그램, 전자 점유도, 전자농도, phonon 산란율과 phonon-limited 전자이동도를 이론적으로 계산하였다. SGOI n-MOSFET의 전자이동도는 고찰된 SOI 구조의 Si 두께 모든 영역에서 일반적인 SOI n-MOSFET보다 $1.5\~1.7$배가 높음이 관찰 되었다. 이러한 경향은 실험 결과와 상당히 일치한다. 특히 strained Si의 두께가 10 nm 이하일 때 Si 채널 두께가 6 nm 보다 작은 SGOI n-MOSFET에서의 phonon-limited 전자 이동도는 일반 SOI n-MOSFET과 크게 달랐다. 우리는 이러한 차이가 전자들이 suained SGOI n-MOSFET의 반전층에서 SiGe층으로 터널링 했기 때문이고, 반면에 일반 SOI n-MOSFET에서는 캐리어 confinement 현상이 발생했기 때문인 것으로 해석하였다. 또한 우리는 10 nm와 3 nm 사이의 Si 두께에서는 SGOI n-MOSFET의 phonon-limited 전자 이동도가 inter-valley phonon 산란율에 영향을 받는 다는 것을 확인하였으며, 이러한 결과는 더욱 높은 드레인 전류를 얻기 위해서 15 nm 미만의 채널길이를 가진 완전공핍 C-MOSFET는 stained Si SGOI 구조로 제작하여야 함을 확인 했다

라이밀의 에탄올 생산 후 발효 부산물을 이용한 머핀의 품질 특성 (Quality Characteristics of Muffins using Ethanol Fermentation By-product of Triticale)

  • 서은옥;고승혜;이내택;김광오;최기욱;오경철
    • 동아시아식생활학회지
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    • 제20권3호
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    • pp.382-388
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    • 2010
  • This study was aimed to examine the quality characteristics of the bread with the muffin added with the by-product of fermented ethanol from wheat rye that has high $\beta$-glucan contents. In the muffin added with TEFB (Triticale Ethanol Fermentation By-product), the height of the muffin decreased as the additive contents increased. There was no significant difference among the volumes of the muffins added with TEFB 0%, 5%, 10% and 15%. In the muffin added with TEFB, the height of the muffin decreased as the additive contents increased. In the moisture measurement of TEFB muffin, the moisture contents increased as the TEFB additive contents increased. Using SEM, showed that as TEFB additive contents increased, gluten contents was relatively lowered, which led to the reduced gas retention power and generation of rough tissues. In chromaticity, as the TEFB additive contents increased, the brightness decreased and the redness and yellowness decreased as well. The result of texture measurement showed that as the TEFB additive contents increased, hardness increased. springiness decreased gradually as the TEFB additive contents increased. There was no significant difference in cohesiveness (p<0.005). Although there as signigicant difference between the control group and the additive group in gumminess (p<0.005), there was no significant difference for a certain amount of additive contents (p<0.05). While there was significant difference in chewiness between the control group and the additive group (p<0.05). there was no significant difference for a certain amount of additive contents (p<0.05). The result of taste test of TEFB added muffin showed that the preference for the muffins added with 5% or more TEFB decreased. This study found that more than 5% of TEFB additives to muffin decreases the preference level.

졸-겔법으로 성장시킨 Mg0.3Zn0.7O 박막의 Mg 전구체의 종류에 따른 광학적·구조적 특성에 관한 연구 (The Effect of Mg Precursors on Optical and Structural Characteristics of Sol-Gel Processed Mg0.3Zn0.7O Thin Films)

  • 염아람;김홍승;장낙원;윤영;안형수
    • 한국전기전자재료학회논문지
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    • 제33권3호
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    • pp.214-218
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    • 2020
  • In this study, MgxZn1-xO thin films, which can be applied not only to active layers of light-emitting devices (LEDs), such as UV-LEDs, but also to solar cells, high mobility field-effect transistors, and power semiconductor devices, are fabricated using the sol-gel method. ZnO and Mg0.3Zn0.7O solution synthesized by the sol-gel method and the thin film were grown by spin coating on a Si (100) substrate and sapphire substrate. The solutions are synthesized by dissolving precursor materials in 2-methoxyethanol (2-ME) solvent, and then monoethanolamine (MEA) was added to the mixed solution as a sol stabilizer. Zinc acetate dihydrate is used as a ZnO precursor, while Mg nitrate hexahydrate and Mg acetate tetrahydrate are used as an MgO precursor. Then, the optical and structural characteristics of the fabricated thin films are compared. The molar concentration of the Zn precursor in the solvent is fixed at 0.3 M, and the amount of the Mg precursor is 30% of Mg2+/Zn2+. The optical characteristics are measured using an UV-vis spectrophotometer, and the transmittance of each wavelength is measured. Structural characteristics are measured using X-ray diffraction (XRD) and transmission electron microscopy (TEM). Composition analyses are performed using energy dispersive X-ray spectroscopy (EDS). The Mg0.3Zn0.7O thin film was well formed at the ratio of the Mg precursor added regardless of the type of Mg precursor, and the c-axis of the thin film was decreased, while the band gap was increased to 3.56 eV.

Efficient Red-Color Emission of InGaN/GaN Double Hetero-Structure Formed on Nano-Pyramid Structure

  • 고영호;김제형;공수현;김주성;김택;조용훈
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.174-175
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    • 2012
  • (In, Ga) N-based III-nitride semiconductor materials have been viewed as the most promising materials for the applications of blue and green light emitting devices such as light-emitting diodes (LEDs) and laser diodes. Although the InGaN alloy can have wide range of visible wavelength by changing the In composition, it is very hard to grow high quality epilayers of In-rich InGaN because of the thermal instability as well as the large lattice and thermal mismatches. In order to avoid phase separation of InGaN, various kinds of structures of InGaN have been studied. If high-quality In-rich InGaN/GaN multiple quantum well (MQW) structures are available, it is expected to achieve highly efficient phosphor-free white LEDs. In this study, we proposed a novel InGaN double hetero-structure grown on GaN nano-pyramids to generate broad-band red-color emission with high quantum efficiency. In this work, we systematically studied the optical properties of the InGaN pyramid structures. The nano-sized hexagonal pyramid structures were grown on the n-type GaN template by metalorganic chemical vapor deposition. SiNx mask was formed on the n-type GaN template with uniformly patterned circle pattern by laser holography. GaN pyramid structures were selectively grown on the opening area of mask by lateral over-growth followed by growth of InGaN/GaN double hetero-structure. The bird's eye-view scanning electron microscope (SEM) image shows that uniform hexagonal pyramid structures are well arranged. We showed that the pyramid structures have high crystal quality and the thickness of InGaN is varied along the height of pyramids via transmission electron microscope. Because the InGaN/GaN double hetero-structure was grown on the nano-pyramid GaN and on the planar GaN, simultaneously, we investigated the comparative study of the optical properties. Photoluminescence (PL) spectra of nano-pyramid sample and planar sample measured at 10 K. Although the growth condition were exactly the same for two samples, the nano-pyramid sample have much lower energy emission centered at 615 nm, compared to 438 nm for planar sample. Moreover, nano-pyramid sample shows broad-band spectrum, which is originate from structural properties of nano-pyramid structure. To study thermal activation energy and potential fluctuation, we measured PL with changing temperature from 10 K to 300 K. We also measured PL with changing the excitation power from 48 ${\mu}W$ to 48 mW. We can discriminate the origin of the broad-band spectra from the defect-related yellow luminescence of GaN by carrying out PL excitation experiments. The nano-pyramid structure provided highly efficient broad-band red-color emission for the future applications of phosphor-free white LEDs.

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스퍼터링 증확 CdTe 박막의 두께 불균일 현상 개선을 위한 화학적기계적연마 공정 적용 및 광특성 향상 (Application of CMP Process to Improving Thickness-Uniformity of Sputtering-deposited CdTe Thin Film for Improvement of Optical Properties)

  • 박주선;임채현;류승한;명국도;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.375-375
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    • 2010
  • CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

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EFG 법으로 성장시킨 β-Ga2O3 단결정의 다양한 결정면, off-angle에 따른 epitaxial layer의 특성 분석 (Characterization of epitaxial layers on beta-gallium oxide single crystals grown by EFG method as a function of different crystal faces and off-angle)

  • 채민지;서선영;장희연;신소민;김대욱;김윤진;박미선;정광희;강진기;이해용;이원재
    • 한국결정성장학회지
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    • 제34권4호
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    • pp.109-116
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    • 2024
  • β-Ga2O3는 4.9 eV의 넓은 밴드갭과 8 MV/cm의 높은 항복전압으로 전력 소자 응용 분야에서 많은 관심을 받고 있는 대표적인 UWBG(Ultra-wide Band-gap) 반도체이다. 또한 용액 성장이 가능하기 때문에 SiC, GaN에 비해 성장 속도가 빠르고 생산 비용이 저렴하다는 장점이 있다[1,2]. 본 연구에서는 EFG(Edge-defined Film-fed Growth) 법을 통해 Si 도핑 된 β-Ga2O3 단결정을 성장시키는 데에 성공하였다. 성장 방향과 성장 주 면은 각각 [010] / (001)로 설정하였으며 성장속도는 7~20 mm/h이다. 성장시킨 β-Ga2O3 단결정은 다양한 결정 면 방향(001, 100, ${\bar{2}}01$)과 off-angle(1o, 3o, 4o)에 따라 절단하여 표면 가공을 진행하였고, 가공 후 HVPE(Halide vapor phase epitaxy) 법을 이용해 epi-ready 기판 위에 homoepitaxial 층을 성장시켰다. 가공 후의 샘플과 epi-layer를 성장시킨 샘플을 XRD, AFM, OM, Etching 등의 분석을 통해 결정면과 off-angle에 따른 표면 특성을 비교하였다.