• Title/Summary/Keyword: He plasma

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The Effects of Laser Irradiation on Human Plasma $\beta-endorphin$ Levels (Laser가 정상인의 혈장내 $\beta-endorphin$ 농도에 미치는 영향)

  • Seo Yeon-Soon;Park Rae-Joon;Park Young-Han
    • The Journal of Korean Physical Therapy
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    • v.9 no.1
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    • pp.157-166
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    • 1997
  • The purpose of this study was to determine the effects of laser Irradiation on Human plasma $\beta-endorphin$ levels, by treating with low level helium-neon (He-Ne) and Infrared(lR) laser. The Laser was fixed frequency of 2400Hz by continuous scanning and irradiating time was 8 minutes each point. Blood samples were taken at before, after, after 15min's treatment and Plasma $\beta-endorphin$ was measured by radioimmunoassay. The samples for this study were 6 normal subjects(3male, 3female). The data were analyzed by paired t-test, one-way ANOVA and simple regression. The results of this study were as follows : 1. The human plasma $\beta-endorphin$ levels were noted as significant increase in after-treatment $(22.84{\pm}10.63pg/ml)$ as compared with before-treatment $(16.96{\pm}9.23pg/ml)$ and significant increase in after 15min's $(27.27{\pm}8.81pg/ml)$ as compared with after-treatment (p<0.05). 2. There were no significant changes in plasma g-endorphin levels between male and female. 3. The human plasma $\beta-endorphin$ levels were high associated in between session reliability (p<0.05).

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Generation and Application of Atmospheric Pressure Glow Plasma in Micro Channel Reactor (마이크로 채널 반응기 내 상압 글로우 플라즈마 생성 및 응용)

  • Lee, Dae-Hoon;Park, Hyoun-Hyang;Lee, Jae-Ok;Lee, Seung-S.;Song, Young-Hoon
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1869-1873
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    • 2008
  • In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

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Discharge and Luminous Characteristics of Coplanar Type Xe Plasma Flat Lamp (면방전형 Xe 플라즈마 평판 램프의 방전 및 발광 특성)

  • Kim, Hyuk-Hwan;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.21 no.10
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    • pp.532-541
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    • 2011
  • The Xe plasma flat lamp, considered to be a new eco-friendly LCD backlight, requires a further improvement of its luminance and luminous efficiency. To improve the performance of this type of lamp, it is necessary to understand the effects of the discharge variables on the luminous characteristics of the lamp. In this study, the luminous characteristics of a coplanartype Xe plasma flat lamp with a teeth-type electrode pattern were analyzed while varying the gas composition, gas pressure and input voltage. The effects of the phosphor layer on the discharge and the luminous characteristics of the lamp were also studied. The luminous efficiency of the coplanar-type Xe plasma flat lamp improved as the Xe input ratio and gas pressure increased. Higher luminous efficiency was also obtained when helium (He) was used as a buffer gas and when a phosphor layer was fabricated on the electrode region. In contrast, the luminous efficiency was reduced with increasing the input voltage. It was found that the infrared emissions from the lamp were affected by the Xe excitation rate in the plasma, the Xe gas density, the collisional quenching of excited Xe species by gas molecules, and the recombination rate between the Xe ions and electrons.

Fabrication and Characteristics of Mather Type Plasma Focus System (마더형 플라즈마 집속장치의 제작과 특성)

  • 김동환;이상수;조성국;김규욱;이민희
    • Korean Journal of Optics and Photonics
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    • v.1 no.1
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    • pp.65-72
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    • 1990
  • Mather type plasma focus system is designed and fabricated, and its electrical behaviors and the ,~haracteristics of the plasma are investigated. The discharge CUlTent is measured with a Rogowski coil, and the external resistance and inductance of the system are found to be $20m\Omega, 0.2{\mu}H respectively from the measured voltage signals and current signals, and discharge inductance, magnetic, and mechanical energy are calculated. 'i'he speed of the plasma current sheath in the acceleration phase is found to vary as $P^{-0.25}\timesV^{0.38}$ and its value is about is 106 cm/sec. The electron temperature in the plasma is determined from the measurement of the X-ray transmittance with the number of X-ray filters and its value is found to be about I keY. The size of plasma, measured using X-ray pin-hole camera, is about 17 (dia.) x 30 (length)mm2. h)mm2.

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Surface Reactions on the Bi4-xLaxTiO3O12 Thin Films Etched in Inductively Coupled CF4/Ar Plasma (유도결합 CF4/Ar 플라즈마에 의한 Bi4-xLaxTiO3O12 박막의 식각 표면 반응)

  • 김동표;김경태;김창일
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.5
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    • pp.378-384
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    • 2003
  • Etching species in CF$_4$/Ar plasma and the behavior of etching rate of Bi$_4$-$_{x}$L$_{x}$rTi$_3$O$_2$ (BLT) films were investigated in inductively coupled plasma (ICP) reactor in terms of etch parameters. The etching rate as functions of CF$_4$ contents showed the maximum 803 $\AA$/min at 20% CF$_4$ addition in CF$_4$/Ar plasma. The increase of RF power and DC bias voltage caused to an increase of etch rate. The variation of relative volume densities for F and he atoms were measured with the optical emission spectroscopy (OES). The chemical states of BLT were investigated with using X-ray photoelectron spectroscopy (XPS). XPS narrow scan analysis shows that La-fluorides remained on the etched surface. The presence of maximum etch rate at CF$_4$(20%)/Ar(80%) may be explained by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction. The roles of he ion bombardment include destruction of metal (Bi, La, Ti)-O bonds as well as assistant for chemical reaction of metals with fluorine atoms.oms.

Optimal Condition of Hydroxyapatite Powder Plasma Spray on Ti6Al4V Alloy for Implant Applications

  • Ahn, Hyo-Sok;Lee, Yong-Keun
    • Korean Journal of Materials Research
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    • v.22 no.4
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    • pp.211-214
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    • 2012
  • Optimal conditions for HA plasma spray-coating on Ti6Al4V alloy were investigated in order to obtain enhanced bone-bonding ability with Ti6Al4V alloy. The properties of plasma spray coated film were analyzed by SEM, XRD, surface roughness measurement, and adhesion strength test because the film's transformed phase and crystallinity were known to be influential to bone-bonding ability withTi6Al4V alloy. The films were formed by a plasma spray coating technique with various combinations of plasma power, spray distance, and auxiliary He gas pressure. The film properties were analyzed in order to determine the optimal spray coating parameters with which we will able to achieve enhanced bone-bonding ability with Ti6Al4V alloy. The most influential coating parameter was found to be the plasma spray distance to the specimen from the spray gun nozzle. Additionally, it was observed that a relatively higher film crystallinity can be obtained with lower auxiliary gas pressure. Moderate adhesion strength can be achievable at minimal plasma power. That is, adhesion strength is minimally dependent on the plasma power. The combination of shorter spray distance, lower auxiliary gas pressure, and moderate spray power can be recommended as the optimal spray conditions. In this study, optimal plasma spray coated films were formed with spray distance of 70 mm, plasma current of 800 A, and auxiliary gas pressure of 60 psi.

Hypolipidemic Effect of Exo-Polymer Produced in Submerged Mycelial Culture of Five Different Mushrooms

  • Yang, Byung-Keun;Park, Jun-Bo;Song, Chi-Hyun
    • Journal of Microbiology and Biotechnology
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    • v.12 no.6
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    • pp.957-961
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    • 2002
  • The hypolipidemic effect of exe-polymer produced in submerged mycelial culture of Hericium erinaceus (HE), Auricularia auricula-judue (AA), Flammulina veluripes (FV), Phellinus pini (PP), and Grifola frondosa (GF) was investigated in dietary-induced hyperlipidemic rats. The animals were administered with exe-polymers at the level of 100 mg/kg body weight daily for four weeks. Hypolipidemic effect was achieved in all the experimental groups, however, HE exo-polymer proved to be the most potent one, which significantly reduced the plasma triglyceride ($28.9\%$), total cholesterol ($29.7\%$), low-density lipoprotein (LDL) cholesterol ($39.6\%$), phospholipid ($16.0\%$), and liver total cholesterol ($28.9\%$) level, when compared to the saline administered (control) group. The results of the present investigation strongly demonstrate the potential of HE exe-polymer in combating hyperlipidemia in the experimental animals.

Two Versions of He-Ne Laser 3.39 μm with Radio Frequency Excitation

  • Kopica, Miroslaw;Choi, Jong-Woon
    • Journal of the Optical Society of Korea
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    • v.12 no.1
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    • pp.31-37
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    • 2008
  • To increase output power of a He-Ne laser we propose to use the capacitive rf discharge and implement four channel structure. Most of experiments were carried out with a single laser tube from this structure to optimize the output mirror transmission, pressure and composition of the mixture. A laser tube of 2.8 mm inner diameter and 50 cm discharge length can give an output power of above 5.5 mW at 3.39 ${\mu}m$. Four such tubes in "matrix" structure let us obtain 20 mW of output. Simplified models which can be used to evaluate the behavior of an equivalent electrical circuit with laser plasma and qualitative characteristics of output power of He-Ne laser were also described.

Influence of gas mixing ration on secondary electron emission coefficient of MgO single crystal with different orientations and MgO protective layer

  • 임재용
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.234-234
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    • 1999
  • AC-PDP(Plasma Display Panel)에 사용하는 MgO 보호막의 이차전자 방출계수(${\gamma}$)는 AC-PDP의 방전특성을 결정짓는 중요한 요소이다. MgO 보호막의 이차전자 방출계수는 AC-PDP에 주입하는 기체의 종류에 영향을 받는다. 현재 AC-PDP에는 방전특성의 향상과 VUV 발생을 위하여 He, Ne, Ar, Xe 등의 비활성기체를 두가지 혹은 세가지로 혼합한 혼합기체가 사용되고 있다. 기체를 혼합할 경우 Penning 효과에 의해 더 좋은 방전특성을 얻을 수 있는 것으로 알려져 왔으며, 이때의 적절한 혼합비율을 찾는 것은 AC-PDP의 효율 개선에 매우 중요하다. 이번 실험에서는 (111), (100), (110) 각각의 방향으로 배향된 MgO Bulk Crystal과 MgO 보호막의 이차전자방출계수를 He+Ne+Xe 삼원기체를 사용하였다. MgO 보호막은 실제 21inch 규격의 Panel을 사용하였으며, 혼합기체의 혼합비율의 Ne:Xe을 99:1, 98:2, 96:4, 93:7과 He+Ne+Xe의 삼원기체로 다양하게 변화시켜 가며 실험하였다.

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A Comparison Study of the Effect of Adding Ar or Kr Gas into the Conventional Gas Mixtures in a Matrix Type PDP

  • Khorami, Alireza;Ghanbari, Shirin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.748-751
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    • 2009
  • This paper provides a novel scheme to enhance luminous efficiency within Plasma Display Panels (PDPs). The He-Xe or Ne-Xe mixtures are mainly used in conventional PDP cells, where their discharge characteristics exemplify different behavior. Significantly, the excitation efficiency in He-Xe is lower than that of the Ne-Xe mixture. This paper demonstrates that by adding a small quantity of Ar or Kr gas in Ne-Xe mixture increases cell efficiency, while for the He-Xe mixtures their cell efficiency is reduced.

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