• 제목/요약/키워드: H2 Plasma

검색결과 2,260건 처리시간 0.027초

열플라즈마에 의한 폐타이어의 열분해 공정에서 가연성 가스 생성 (Combustible gas production from waste tire pyrolysis process by thermal plasma)

  • 최경수;박동화
    • 청정기술
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    • 제5권1호
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    • pp.42-48
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    • 1999
  • 폐타이어는 환경 문제와 관련하여 오염과 재활용의 양면성을 지니고 있다. 이와 같은 폐타이어를 재활용의 측면에서 고온의 열플라즈마를 이용하여 열분해하여 가연성 가스로의 전환을 시도하였다. 폐타이어를 산소가 배제된 상태에서 열분해하여 $CH_4$, $C_2H_2$, $C_4H_{10}$등과 같은 저분자량의 탄화수소가 주성분인 가연성 가스가 다량 발생함을 GC를 이용하여 확인할 수 있었다. 타이어의 공급량이 증가할수록 가연성 가스의 구성에서 $CH_4$의 비율이 증가하였으며, 플라즈마 전력이 증가할수록 $C_2H_2$가 증가함을 확인하였다. 발생가스는 $C_4H_{10}$ 또는 $C_2H_2$등의 탄화수소가 주를 이루었으며 그 비율은 70%이상이었다. 한편 char의 온도에 따른 질량 감소 경향을 TG로 분석하여 열플라즈마 내에서 타이어의 열분해 경향을 간접적으로 유추할 수 있었다.

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Measurement of Energy bands of the MgO Layer in AC-PDPs

  • Jeoung, S.J.;Lee, H.J.;Son, C.G.;Kim, J.H.;Park, E.Y.;Hong, Y.J.;You, N.L.;Lee, S.B.;Han, Y.G.;Jeoung, S.H.;Song, K.B.;Moon, M.W.;Oh, P.Y.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.906-909
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    • 2006
  • The secondary electron emission coefficient $({\gamma})$ of the cathode is an important factor for improving the discharge characteristics of AC-PDPs because of its close relationship to discharge voltage. In AC-PDPs, MgO is most widely used as a surface protective layer. In this experimental, we have investigated the electronic structure of the energy band structure of the MgO layer responsible for the high ${\gamma}$. The MgO layers have been deposited by electron beam evaporation method, where the $O_2$ partial pressures have been varied as 0, $5.2{\times}10^{-5}$ torr, $1.0{\times}10^{-4}$ torr, and $4.1{\times}10^{-4}$ torr, in this experiment. It is noted that work function that is energy gap between surface and first defect level of MgO layer has the lowest value for the highest O2 partial pressure of $4.1^{\ast}10^{-4}$ Torr.

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소금, 인산염, pH가 돼지 혈장단백질과 근원섬유단백질 혼합물의 기능적 특성에 미치는 영향 (Effect of NaCl, Phosphate and pH on the Functional Properties of a Mixed System of Pork Myofibrillar and Plasma Proteins)

  • 김천제;한의수
    • 한국식품과학회지
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    • 제23권4호
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    • pp.428-432
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    • 1991
  • 본 연구는 식품산업 특히 육가공산업에 돈혈액의 이용을 위하여 NaCl, pH, phosphate가 혈장단백질과 근원섬유단백질 혼합물의 기능성에 어떠한 영향을 미치는지를 규명하고자 실시하였다. 각 단백질의 용해성은 NaCl 농도($1{\sim}4%$)와 $pH(4{\sim}8)$가 증가함에 따라 증가하였다. 혼합물(plasma+myofibrillar)의 용해성, 유화활성, 유화력은 혈장단백질 보다는 낮았으나 근원섬유단백질 보다는 높았다. 혼합물과 근원섬유단백질은 NaCl 농도가 2%에서 3%로 증가할 때 gel 강도가 현저히 증가하였다. 0.3%, polyphosphate를 첨가시 근원섬유단백질의 gel 강도는 약 4배 증가하였으며, 근원섬유단백질과 혼합물의 수분손실량이 크게 감소하였다. $3{\sim}5%$ 단백질농도에서 각 단백질의 gel 강도는 서서히 증가하였으나 $5{\sim}9%$에서는 단백질농도가 증가함에 따라 gel 강도가 크게 증가하였다.

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Structural Evolution and Electrical Properties of Highly Active Plasma Process on 4H-SiC

  • Kim, Dae-Kyoung;Cho, Mann-Ho
    • Applied Science and Convergence Technology
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    • 제26권5호
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    • pp.133-138
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    • 2017
  • We investigated the interface defect engineering and reaction mechanism of reduced transition layer and nitride layer in the active plasma process on 4H-SiC by the plasma reaction with the rapid processing time at the room temperature. Through the combination of experiment and theoretical studies, we clearly observed that advanced active plasma process on 4H-SiC of oxidation and nitridation have improved electrical properties by the stable bond structure and decrease of the interfacial defects. In the plasma oxidation system, we showed that plasma oxide on SiC has enhanced electrical characteristics than the thermally oxidation and suppressed generation of the interface trap density. The decrease of the defect states in transition layer and stress induced leakage current (SILC) clearly showed that plasma process enhances quality of $SiO_2$ by the reduction of transition layer due to the controlled interstitial C atoms. And in another processes, the Plasma Nitridation (PN) system, we investigated the modification in bond structure in the nitride SiC surface by the rapid PN process. We observed that converted N reacted through spontaneous incorporation the SiC sub-surface, resulting in N atoms converted to C-site by the low bond energy. In particular, electrical properties exhibited that the generated trap states was suppressed with the nitrided layer. The results of active plasma oxidation and nitridation system suggest plasma processes on SiC of rapid and low temperature process, compare with the traditional gas annealing process with high temperature and long process time.

Inactivation of Mycobacteria by Radicals from Non-Thermal Plasma Jet

  • Lee, Chaebok;Subhadra, Bindu;Choi, Hei-Gwon;Suh, Hyun-Woo;Uhm, Han. S;Kim, Hwa-Jung
    • Journal of Microbiology and Biotechnology
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    • 제29권9호
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    • pp.1401-1411
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    • 2019
  • Mycobacterial cell walls comprise thick and diverse lipids and glycolipids that act as a permeability barrier to antibiotics or other chemical agents. The use of OH radicals from a non-thermal plasma jet (NTPJ) for the inactivation of mycobacteria in aqueous solution was adopted as a novel approach. Addition of water vapor in a nitrogen plasma jet generated OH radicals, which converted to hydrogen peroxide ($H_2O_2$) that inactivated non-pathogenic Mycobacterium smegmatis and pathogenic Mycobacterium tuberculosis H37Rv. A stable plasma plume was obtained from a nitrogen plasma jet with 1.91 W of power, killing Escherichia coli and mycobacteria effectively, whereas addition of catalase decreased the effects of the former. Mycobacteria were more resistant than E. coli to NTPJ treatment. Plasma treatment enhanced intracellular ROS production and upregulation of genes related to ROS stress responses (thiolrelated oxidoreductases, such as SseA and DoxX, and ferric uptake regulator furA). Morphological changes of M. smegmatis and M. tuberculosis H37Rv were observed after 5 min treatment with $N_2+H_2O$ plasma, but not of pre-incubated sample with catalase. This finding indicates that the bactericidal efficacy of NTPJ is related to the toxicity of OH and $H_2O_2$ radicals in cells. Therefore, our study suggests that NTPJ treatment may effectively control pulmonary infections caused by M. tuberculosis and nontuberculous mycobacteria (NTM) such as M. avium or M. abscessus in water.

Improvement of Plasma Reactor Performance for Hydrogen Generation

  • Pavel, Kostyuk;Park, J.Y.;Kim, J.S.;Park, S.H.;Kim, Y.C.;Jeong, M.G.;Lee, H.W.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.519-520
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    • 2006
  • Research was performed to increase the efficiency of a plasma reactor for $H_2$ yield. In the preceding studies $H_2$ was increased by adding Ni as a transitional metal catalyst and $TiO_2$ as a photocatalyst. In these experiments, it was found that distilled water, discharge frequency, and electrode configuration had a significant impact on $H_2$ generation. A substantial amount of hydrogen yield was observed at 2 kHz of discharge frequency and 12 kV of applied voltage. Within this favorable discharge conditions, the weight rate of $TiO_2$ and Ni powders was investigated. Plasma phenomenon was measured by electrical, optical and acoustical devices. It was found that emitted light, electric current and acoustical signals acquired from the discharge demonstrated systematical correlation. Changing the electrode's configuration allowed discharge distribution along the perimeter of the electrode's tip, which increased the density of streamers and plasma energy loadings, as the value of inception voltage for the discharge propagation decreased.

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Deposition of Plasma Polymerized Films on Silicon Substrates Using Plasma Assisted CVD Method For Low Dielectric Application

  • Kim, M.C.;S.H. Cho;J.H. Boo;Lee, S.B.;J.G. Han;B.Y. Hong;S.H. Yang
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2001년도 춘계학술발표회 초록집
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    • pp.72-72
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    • 2001
  • Plasma polymerized thin films have been deposited on Si(lOO) substrates at $25-400^{\circ}C$ using thiophene ($C_4H_4S$) precursor by plasma assisted chemical vapor deposition (PACVD) method for low-dielectric device application. In order to compare physical properties of the as-grown thin films, the effects of the plasma power, gas flow ratio and deposition temperature on the dielectric constant and thermal stability were mainly studied. XRD and TED studies revealed that the as-grown thin films have highly oriented amorphous polymer structure. XPS data showed that the polymerized thin films that grown under different RF power and deposition temperature as well as different gas ratio of $Ar:H_2$ have different stoichiometric ratio of C and S compared with that of monomer, indicating a formation of mixture polymers. Moreover, we also realized that oxygen free and thermally stable polymer thin films could be grown at even $400^{\circ}C$. The results of SEM, AFM and TEM showed that the polymer films with smooth surface and sharp interface could be grown under various deposition conditions. From the electrical property measurements such as I-V and C-V characteristics, the minimum dielectric constant and the best leakage current were obtained to be about 3.22 and $10-11{\;}A/\textrm{cm}^2$, respectively.

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플라즈마/촉매 복합 다단 반응기를 이용한 NOx 저감 (A Study on the NOx Removal in Multiple Plasma/Catalyst Combined Reactor)

  • 문승현;전상구
    • 한국자동차공학회논문집
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    • 제12권3호
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    • pp.83-90
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    • 2004
  • Plasma/catalyst combined reactor was designed to overcome the limits of plasma and catalyst technologies. Optimum reductant and catalyst was selected from screening test. Experiments about the concentrations of reactant and $H_2O$ and the effect of temperature were carried out. Hydrocarbons with double bond such as propylene and so on were more reactive than any other reductants in plasma/catalyst condition. Photocatalyst, especially hombikat >$TiO_2$ with the largest surface area among the catalysts tested, showed the highest DeNOx efficiency in plasma/catalyst reaction. As the concentration of $H_2O$ increased, the removal of NO was enhanced. The increased concentration of >$O_2$ promoted the reaction of NO which was oxidized to$NO_2$.

Preferential Killing of Human Lung Cancer Cell Lines with Mitochondrial Dysfunction by Non-Thermal Dbd Plasma

  • Panngom, Kamonporn;Baik, Ku Youn;Nam, Min-Kyung;Rhim, Hyang-Shuk;Choi, Eun Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.199-199
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    • 2013
  • The distinctive cellular and mitochondrial dysfunctions of a human epithelial lung cancer cell line (H460) from a human lung fibroblastic normal cell line (MRC5) have been studied by dielectric barrier discharge (DBD) plasma treatment. The DBD plasma device have generated large amount of H2O2 and NOx in culture media which is dependent on plasma exposure time. It is found that the cell number of lung cancer cell H460 has been reduced more than the lung normal cell MRC5 as being increased exposure and incubation time. Also these both cell lines have showed mitochondria fragmentation under 5 minutes' plasma exposure, which is a clue of apoptosis. It is noted in this study that AnnexinV staining has showed not only early apoptosis, but also late apoptosis in lung cancer cell H460. Mitochondria enzyme activity and ATP generation have been also much reduced in lung cancer cell H460. Their mitochondrial membrane potential (${\Delta}{\psi}m$) has been found to be reduced in magnitude and shifted to the induced-potential level of cccp, while MRC5 mitochondrial membrane potential has been shifted slightly to that. These distinctively selective responses of lung cancer cell H460 from lung normal cell MRC5 gives us possibility of applying plasma to cancer therapy.

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