Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2001.06a
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- Pages.72-72
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- 2001
Deposition of Plasma Polymerized Films on Silicon Substrates Using Plasma Assisted CVD Method For Low Dielectric Application
- Kim, M.C. (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- S.H. Cho (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- J.H. Boo (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, S.B. (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- J.G. Han (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- B.Y. Hong (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- S.H. Yang (Plasma Technology Application Division, Korea Institute of Industrial Technology)
- Published : 2001.06.01
Abstract
Plasma polymerized thin films have been deposited on Si(lOO) substrates at
Keywords