• Korean Journal of Materials Research
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• v.29 no.11
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• pp.715-719
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• 2019

Molybdenum is a low-resistivity transition metal that can be applied to silicon devices using Si-metal electrode structures and thin film solar cell electrodes. We investigate the deposition of metal Mo thin film by plasma-enhanced atomic layer deposition (PE-ALD). $Mo(CO)_6$ and $H_2$ plasma are used as precursor. $H_2$ plasma is induced between ALD cycles for reduction of $Mo(CO)_6$ and Mo film is deposited on Si substrate at $300^{\circ}C$. Through variation of PE-ALD conditions such as precursor pulse time, plasma pulse time and plasma power, we find that these conditions result in low resistivity. The resistivity is affected by Mo pulse time. We can find the reason through analyzing XPS data according to Mo pulse time. The thickness uniformity is affected by plasma power. The lowest resistivity is $176{\mu}{\Omega}{\cdot}cm$ at $Mo(CO)_6$ pulse time 3s. The thickness uniformity of metal Mo thin film deposited by PE-ALD shows a value of less than 3% below the plasma power of 200 W.

• Transactions on Electrical and Electronic Materials
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• v.1 no.1
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• pp.32-39
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• 2000

Langmuir probe measurements of electron density, electron temperature and potential are mad in the early stage (<5${\mu}$s) of a laser ablated plasma plume, in which a positive current form positive ions and a electron current are overlapped. The plasma wes produced by focusing the second harmonic, 532 nm, of Q-switched Nd:YAG laser on a high purity carbon target. Then the laser intensity on the target of ~1.6${\times}$10$\^$15/ W/$\textrm{cm}^2$. The measured electron desities and temperatures are ~2${\times}$10/sip 11/ cm$\^$-3/ and -3 eV. In particluar , the phenomenon that the electron temperature decreased and then increased was observed,. It could be well explained that this phenomenon occurred in the process of inverse Bremsstrahlung of free electrons in plasma. Additionally, the plasma potential(>11V) was higher than the published values.

• Resources Recycling
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• v.25 no.3
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• pp.49-54
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• 2016

In this study, zircon sand is separated into zirconia and silica by using the Ar-$H_2$ arc plasma refining. And then silica is removed from it by the microwave leaching method to produce a high pure zirconia. Plasma melting consist of two sequential processes; reduction process with Ar gas only followed by refining process with Ar-$H_2$ gas. After cooling in chamber. The solid phase obtained at $240^{\circ}C$ were found to be composed of 20% sulfuric acid solution. The solution was used as a leaching solution with microwave irradiation to obtain a high purity zirconia.

• Elastomers and Composites
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• v.34 no.2
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• pp.128-134
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• 1999

Steel tire cords were coated via RF plasma polymerization of acetylene and butadiene gas in order to enhance adhesion to rubber compounds. Adhesion of tire cords was measured by TCAT and T-test as a function of type of gas, plasma powder, treatment time, gas pressure and Ar gas etching. Some samples were subjected to aging study in distilled water at $80^{\circ}C$ for a period of 7 days. After testing, tire cords were analysed by SEM to elucidate the adhesion mechanism. The highest adhesion values were obtained at 20W, 2min and 25mtorr for acetylene plasma polymerization, and l0W, 4min, 25mtorr for butadiene plasma polymerization. However, Ar plasma etching did not affect adhesion, while the adhesion of tire cords increased rather than decreased, contrary to expectations. It was not possible to elucidate failure mode by SEM, owing to the rough surface of the tire and the thin plasma polymer coating layer.

• Proceedings of the KIEE Conference
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• 1993.07b
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• pp.1147-1149
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• 1993

ZnO/$SnO_2$:F bilayer films have been prepared by pyrosol deposition method to develop optimum transparent electrode for use in amorphous silicon solar cells. The solution for $SnO_2:F$ film was composed of $SnCl_4{\cdot}5H_2O,\;NH_4F,\;CH_3OH$ and HCl, and ZnO films have been deposited on the $SnO_2:F$ films by using the solution of $ZnO(CH_3COO){_2}{\cdot}2H_2O,\;H_2O\;and\;CH_3OH$. These films have been investigated the variation of electrical and optical properties under the hydrogen plasma exposure. The sheet resistance of the $SnO_2:F$ film was sharply increased and its transmittance was decreased with the blackish effect after plasma treatment. However, the ZnO/$SnO_2:F$ bilayer film was shown hydrogen plasma durability because the electrical and optical properties was almost unchanged more then 60 seconds exposure time.

• Applied Chemistry for Engineering
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• v.18 no.2
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• pp.136-141
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• 2007

The decomposition of chlorinated methanes including $CCl_4$, $CCl_3H$, and $CCl_2H_2$ was carried out using a thermal plasma process and the characteristics of the process were investigated. The thermal equilibrium composition was analyzed with temperature by Fcatsage program. The decomposition rates at various process parameters including the concentration of reactants, flow rate of carrier gas, and quenching rate, were evaluated, where sufficiently high conversion over 92% was achieved. The generation of main products was strongly influenced by the reaction atmosphere; carbon, chlorine, and hydrogen chloride at neutral condition; carbon dioxide, chlorine, and hydrogen chloride at oxidative condition. The decomposition mechanism was speculated considering the results from Factsage and the identification of generated radicals and ionic species. The main decomposition pathways were found to be dissociative electron attachment and oxidative by radicals formed in a plasma state.

• Korean Journal of Materials Research
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• v.9 no.5
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• pp.496-502
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• 1999

In this study, n-GaN samples were etched using planar inductively coupled $Cl_2$/$H_2$plasmas and the effects of plasma conditions on the etch properties, surface composition, and ohmic contact formation were investigated as a function of gas combination. As the addition of hydrogen to the $Cl_2$plasma increased to 100%, GaN etch rates decreased due to the reduction of chlorine radical density. Even though the variation of the surface composition is limited under $50\AA$, the surface composition was also changed from Ga-rich to N-rich with the increased addition of hydrogen to $Cl_2$. Etch products by the reaction between Ga in GaN and Cl in $Cl_2$ plasma were investigated using OES analysis during the GaN etching. The value of specific resistivity of the contact formed on the n-GaN etched using 100% $Cl_2$plasma was 3.1$\times$10\ulcorner$\Omega$$\textrm{cm}^2$, and which was lower than that formed on the non-etched n-GaN. However, the resistively was increased with the increased hydrogen percent in $Cl_2$/$H_2$.

• Vacuum Magazine
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• v.2 no.4
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• pp.9-15
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• 2015

Nonthermal bio-compatible plasma (bioplasma) sources and their characteristics operating at atmospheric pressure could be used for biological cell interactions, especially for plasma bioscience and medicines. The electron temperatures and plasma densities of this bioplasma are measured to be 0.7 ~ 1.8 eV and $(3-5){\times}10^{14-15}cm^{-3}$, respectively. Herein, we introduced general schematic view of the plasma-initiated ultraviolet photolysis of water inside the biological solutions or living tissue for the essential generation mechanism of the reactive hydroxyl radical [OH] and hydrogen peroxide [$H_2O_2$], which may result in apoptotic cell death in plasma bioscience and medicines. Further, we surveyed the various nonthermal bioplasma sources including plasma jet, micro-DBD (dielectric barrier discharge) and nanosecond discharged plasma. The diseased biological protein, cancer, and mutated cells could be treated by these bioplasma sources or bioplasma activated water to result in their apoptosis for new paradigm of plasma bioscience and medicines.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.393-393
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• 2010

The biocompatibility of materials used for biomedical applications depends on chemical composition, mechanical stiffness, surface energy, and roughness. The plasma treatment and etching process is a very important technology in the biomedical fields due to possibility of controlling the surface chemistry and properties of materials. In this work, $N_2/H_2$ plasma were treated on single-walled carbon nanotubes (SWCNTs) paper and characterization of treated SWCNTs paper was carried out. Also we investigated neurite outgrowth from SH-SY5Y on treated SWCNTs paper. The results indicated that $N_2/H_2$ plasma-modified SWCNTs paper enhanced neuronal cell adhesion, viability, neurite outgrowth and branching in vitro and exerted a positive role on the health of neural cells.

• Journal of Food Hygiene and Safety
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• v.32 no.1
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• pp.64-69
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• 2017

This study was conducted to investigate the effect of cold plasma combined with UV-C irradiation against Escherichia coli O157:H7, Salmonella enterica serovar Typhimurium, and Listeria monocytogenes on lettuce. E. coli O157:H7, S. Typhimurium, and L. monocytogenes, corresponding to approximately 5.82, 5.09, 5.65 log CFU/g, were inoculated on lettuce, respectively. Then, the lettuce was treated with cold plasma, UV-C and combination (cold plasma + UV-C), respectively. The treated lettuce was stored for 9 days at $4^{\circ}C$ for microbiological analysis and sensory evaluation. Cold plasma reduced the populations of E. coli O157:H7, S. Typhimurium, and L. monocytogenes by 0.26, 0.65, and 0.93 log CFU/g, respectively. Each microorganism were reduced by 0.87, 0.88, and 1.14 log CFU/g after UV-C treatment. And, the combined treatment that was treated by cold plasma after UV-C treatment reduced the populations of inoculated microorganisms by 1.44, 2.70, 1.62 log CFU/g, respectively. The all treatment significantly (p < 0.05) reduced the populations of all inoculated bacteria compared to untreated lettuce. UV-C combined with cold plasma was the most effective for reducing the pathogenic bacteria on lettuce, by showing log-reductions of ${\geq}2.0\;log\;CFU/g$. All treatment was not significantly different until 6 day storage compared to control group in terms of appearance, texture and overall acceptability. Therefore, the combined treatment will be an effective intervention method to control the bacteria on lettuce.