• Title/Summary/Keyword: Grain Orientation

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Microstructure and Hardness Changes of the CVD-ZrC Film with Different Deposition Temperature (증착온도 변화에 따른 화학증착 ZrC의 미세구조와 경도 변화)

  • Park, Jong-Hoon;Jung, Choong-Hwan;Kim, Weon-Ju;Kim, Do-Jin;Park, Ji-Yeon
    • Journal of the Korean Ceramic Society
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    • v.45 no.9
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    • pp.567-571
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    • 2008
  • The properties of a grown film by the chemical vapor deposition process depend on the deposition temperature because the deposition mechanism of the CVD film is controlled by the deposition temperature. The preferred orientation of the zrC film changed from (111) to (220) or (200) with an increase of the deposition temperature. The grain size of the ZrC film changes from $0.8{\mu}m$ to $2.5{\mu}m$ in the range of 1350 to $1500^{\circ}C$. The hardness of the deposited ZrC film depended on the preferred orientation and the grain size. The hardness of the ZrC film deposited at $1400^{\circ}C$ was 31 GPa.

Thickness dependence of grain growth orientation in MgB2 films fabricated by hybrid physical-chemical vapor deposition

  • Ranot, Mahipal;Kang, W.N.
    • Progress in Superconductivity and Cryogenics
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    • v.15 no.2
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    • pp.9-11
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    • 2013
  • We have investigated the effect of thickness of the MgB2 film on the grain growth direction as well as on their superconducting properties. $MgB_2$ films of various thicknesses were fabricated on c-cut $Al_2O_3$ substrates at a temperature of $540^{\circ}C$ by using hybrid physical-chemical vapor deposition (HPCVD) technique. The superconducting transition temperature ($T_c$) was found to increase with increase in the thickness of the $MgB_2$ film. X-ray diffraction analysis revealed that the orientation of grains changed from c-axis to a-axis upon increasing the thickness of the $MgB_2$ film from 0.6 to 2.0 ${\mu}m$. $MgB_2$ grains of various orientations were observed in the microstructures of the films examined by scanning electron microscopy. It is observed that at high magnetic fields the 2.0-${\mu}m$-thick film exhibit considerably larger critical current density ($J_c$) as compared to 0.6-${\mu}m$-thick film. The results are discussed in terms of an intrinsic-pinning in $MgB_2$ similarly as intrinsic-pinning occurring in high-Tc cuprate superconductors with layered structure.

Low temperature sintering and dielectric properties of $Sr_2(Ta_{1-x}Nb_x)_2O_7$ ceramics by the flux method (용융염합성법에 의한 $Sr_2(Ta_{1-x}Nb_x)_2O_7$ 세라믹스의 저온소성과 유전특성)

  • 남효덕
    • Electrical & Electronic Materials
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    • v.8 no.2
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    • pp.158-164
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    • 1995
  • Solid solutions Sr$_{2}$(Ta$_{1-x}$ Nb$_{x}$)$_{2}$O$_{7}$, (x=0.0-1.0), composed of strontium tantalate(Tc=-107.deg. C) and strontium-niobate(Tc=1342.deg. C) were prepared by the conventional mixed oxide method and the flux method(molten salt synthesis method). Phase relation, sintering temperature, grain-orientation and dielectric properties for sintered ceramic samples were investigated with different compositions. Both Curie temperature and dielectric constant at Curie temperature were increased, and sintering behavior and the degree of grain-orientation were improved with the increase of Nb content. The single phase Sr$_{2}$(Ta/sib 1-x/Nb$_{x}$)$_{2}$O$_{7}$ powder was synthesized by using the flux method at lower temperatures, and sintering temperature was also reduced by using the flux method-derived powder than using the mixed oxide-derived powder. Sintering characteristics and dielectric properties of the specimens prepared by the flux method were better than those derived through the conventional mixed oxide method.thod.hod.

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PROPERTIES OF PIB-CU FILMS ACCELERATION VOLTAGE AND IONIZATION POTENTIAL

  • Kim, K.H.;Jang, H.G.;Han, S.;Choi, S.C.;Choi, D.J.;Jung, H.J.;Koh, S.K.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.570-576
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    • 1996
  • Cu films for future ULSI metallization were prepared by partially ionized beam (PIB) deposition and characterized in terms of preferred orientation, grain size, roughness and resistivity. PIB-Cu films were prepared on Si (100) at pressure of $8 \times 10^{-7}$~$1 \times 10^{-6}$ Torr. Effects of acceleration voltage and ionization potential on the properties of PIB-Cu films have been investigated. As the acceleration voltage increased at constant ionization potential of 400 V, the degree of preferred orientation and surface smoothness of the Cu film increased. At the ionization potential of 450 V, the degree of preferred orientation at the acceleration voltage higher than 2 kV decreased and surface roughness increased with acceleration voltage. Grain size of Cu films increased to 1100 $\AA$ initially up to applied acceleration voltage of 1 kV, above which a little increase occurred with the acceleration voltage. There was no indication of impurities such as C, O in all sample. Resistivity of Cu film had the same trends as the surface roughness with acceleration voltage and ionization potential. The increase of electrical resistivity of PIB-Cu films was explained in terms of grain size and surface roughness

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Nucleation and growth mechanism of nitride films deposited on glass by unbalanced magnetron sputtering (마그네트론 스퍼터링에 의하여 다양한 기판 위에 증착된 CrN 박막의 핵생성과 성장거동)

  • 정민재;남경훈;한전건
    • Journal of the Korean institute of surface engineering
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    • v.35 no.1
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    • pp.33-38
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    • 2002
  • For the evaluation of nucleation and growth behaviors influenced by substrate properties, such as surface energy, structure and electrical properties, chromium nitride films (CrN) were deposited on various substrates (glass, AISI 1040 steel and Si (110) by unbalanced magnetron sputtering. X-ray diffraction and Atomic Force Microscopy (AFM) were used to study the microstructure and grain growth as a function of deposition time. The diffraction patterns of CrN thin films deposited on Si (110) exhibited crystalline structure with highly preferred orientation of (200) plane parallel to the substrate, whereas the films deposited on glass and AISI 1040 exhibited preferred orientations (200) and minor orientation (111), (311) or (220) plane. The orientation of films deposited both on glass and Si substrates did not depend on the bias voltage (Vs). The grain growth and structure of film deposited on AISI 1040 steel substrate are strongly influenced by the substrate bias in comparison with that deposited onto glass and Si substrates. The differences in the structure and grain growth of CrN films deposited onto different substrates are predominantly related to the properties of the substrate (structure and electrical conductivity).

Crystal growth of BT-based ferroelectric films for nonvolatile memories

  • Yang, B.;Park, N.J.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.4
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    • pp.151-154
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    • 2004
  • Issues of ferroelectric high-density memories (>64 Mb) indispensable for upcoming ubiquitous era have been on the cell integration less than $0.1\;\mu\textrm{m}^2$ and reliabilities. Thus nanoscale control of microstructures of ferroelectric films with large switching polarization has been one of the issues to obtain the uniform electrical properties for realization of high-density memories. In this study the grain orientations and distributions of BT-based films by spin-on coatings were examined by FEG-SEM/EBSD. Ferroelectric domain characteristics by PFM were also performed to study the dependence of reliabilities on the grain orientations and distributions. It is believed that understandings of the nucleation and growth mechanisms of the a- or b-axis oriented films during the thermal processes such as RTA and furnace annealing affecting on grain orientation and uniformity could be possible based on our experimental results.

Dark-field Transmission Electron Microscopy Imaging Technique to Visualize the Local Structure of Two-dimensional Material; Graphene

  • Na, Min Young;Lee, Seung-Mo;Kim, Do Hyang;Chang, Hye Jung
    • Applied Microscopy
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    • v.45 no.1
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    • pp.23-31
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    • 2015
  • Dark field (DF) transmission electron microscopy image has become a popular characterization method for two-dimensional material, graphene, since it can visualize grain structure and multilayer islands, and further provide structural information such as crystal orientation relations, defects, etc. unlike other imaging tools. Here we present microstructure of graphene, particularly, using DF imaging. High-angle grain boundary formation wass observed in heat-treated chemical vapor deposition-grown graphene on the Si substrate using patch-quilted DF imaging processing, which is supposed to occur by strain around multilayer islands. Upon the crystal orientation between layers the multilayer islands were categorized into the oriented one and the twisted one, and their local structure were compared. In addition information from each diffraction spot in selected area diffraction pattern was summarized.

The effect of impact directions and angels on erosion behavior of undirectionally oriented sillicon nitride (충돌 방향과 각도가 일방적으로 배향된 질화규소의 Erosion 거동에 미치는 영향)

  • Cho, Chang-Hee;Choi, Hyun-Joo;Lim, Dae-Soon;Jung, Jung-Sik;Park, Dong-Soo
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.11a
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    • pp.88-95
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    • 2001
  • Silicon nitride based ceramics reinforced with 3wt% Si$_{3}$N$_{4}$ whisker was prepared by tape casting to investigate the effect of microstructure on erosion behaviors. Hardness and fracture toughness were measured with prepared specimens. A gas blast type erosion tester was used to examine the erosion behavior of the specimens with different impact directions and angles. The erosion rate increases with increasing impact angle. Erosion rate of the silicon nitride ceramics also depends on the grain orientations, The erosion rate was lowered when impaction direction was parallel to the grain orientation This result was explained by the crack deflection and bridging due to the grain orientation.

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Magnetic and Electrical Properties of Mn-Zn Ferrite Thin Films Deposited by Ion Beam Sputtering (이온빔 스퍼터링에 의해 증착된 Mn-Zn 페라이트 박막의 자기 및 전기적 특성)

  • 조해석;하상기;이대형;주한용;김형준;김경용;제해준;유병두
    • Journal of the Korean Ceramic Society
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    • v.32 no.3
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    • pp.313-320
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    • 1995
  • We investigated the preferred orientation, electrical and magnetic properties of the Mn-Zn ferrite thin films deposited on SiO2/Si(100) by ion beam sputtering. The Cu-added Mn-Zn ferrite thin films had a preferred orientation of (111) with a weak orientation, (311). While the Zn-added one had a strong (111) preferred orientation. The saturation magnetization of the Cu- or Zn-doped Mn-Zn ferrite films increased with increasing substrate temperature (Ts) due to the increase of grain size and the enhancement of crystallinity. For the same reason the coercivity of Cu- or Zn-doped Mn-Zn ferrite films deposited at low Ts increased with increasing Ts, but those of the films deposited at high Ts slightly decreased not only because the defect density of the films decreases but because more grains have multi-domains with increasing Ts. The resistivity of Cu- or Zn-added Mn-Zn ferrite thin fims measured by complex impedance method decreased with increasing Ts due to the ehhancement of crystallinity as well as due to the increase of grain size.

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Characteristics of Grain Orientation and Grain Boundaries of the $ZrB_2$-ZrC Composites Densified by Spark Plasma Sintering (방전플라즈마소결법으로 제조된 $ZrB_2$-ZrC 복합체의 결정립 방위분포 및 결정입계의 특성)

  • Shim, Seung-Hwan;Kim, Kyoung-Hun;Shim, Kwang-Bo
    • Journal of the Korean Ceramic Society
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    • v.38 no.10
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    • pp.914-920
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    • 2001
  • The grain orientation distribution and grain boundary characterization of $ZrB_2$-ZrC composites sintered by a SPS(Spark Plasma Sintering) method, a new sintering technique were analyzed by the EBSP technique and then their crystallographic results have been compared with those of a sintered specimen using a PLS(Pressureless Sintering) method. In the $ZrB_2$-ZrC composite manufactured by SPS, (0001) planes of $ZrB_2$ were oriented in the direction normal to the specimen surface. In the case of PLS, those of $ZrB_2$ were oriented normal to the electron beam. In both cases of PLS and SPS, ZrC grains had the randomly oriented grain structure. The grain boundary characterization showed that low angle grain boundaries in the PLS and SPS processed materials constituted about 10% and 8% of the total number of boundaries, respectively, represented the only slight difference between the proportion of low angle grain boundary. However, in the distribution of CSL(Coincident Site Lattice) boundaries, it was shown the higher proportion of CSL boundaries with $\Sigma$ 3,5,7,9, 11 in the SPS processed material.

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