Study on Improving Surface Structure with Changing RF Power Conditions in RIE (reactive ion etching) (반응성 이온 건식식각에서 RF Power 변화에 따른 표면 조직화 개선 연구)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.29 no.8
- /
- pp.455-460
- /
- 2016