• Title/Summary/Keyword: Glow plasma

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Fabrication and Characterization of Gas-liquid Hybrid Reactor Equipped with Atmospheric Pressure Plasma (기-액 하이브리드 대기압 플라즈마 반응기 제작 및 특성 분석)

  • Kwon, Heoung Su;Lee, Won Gyu
    • Korean Chemical Engineering Research
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    • v.60 no.3
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    • pp.452-458
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    • 2022
  • Three types of gas-liquid hybrid horizontal, vertical and needle-to-cylinder plasma reactors were fabricated. Through these reactors, a high-efficiency, eco-friendly cleaning concept that generates reactive active species generated in atmospheric plasma discharge and gas-liquid activation reaction of cleaning components through the potential difference within the electrode was presented. As a result of comparing the efficiency for cleaning performance, the needle-to-cylinder type reactor had the best characteristics. Through this study, it was confirmed that the gas-liquid hybrid atmospheric pressure plasma reactor has the potential to be applied to ultra-precision cleaning processes such as semiconductor processes.

Effects of plasma ion nitriding temperature using DC glow discharge on improvement of corrosion resistance of 304 stainless steel in seawater (천연 해수에서 304 스테인리스강의 내식성에 미치는 DC glow 방전 플라즈마 이온질화처리 온도의 영향)

  • Chong, Sang-Ok;Park, Il-Cho;Kim, Seong-Jong
    • Journal of Advanced Marine Engineering and Technology
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    • v.41 no.3
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    • pp.238-244
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    • 2017
  • Plasma ion nitriding has been widely used in various industries to improve the mechanical properties of materials, especially stainless steels by increasing the surface hardness. It has the particular advantages of less distortion compared to that in the case of hardening of steel, gas nitriding, and carburizing; in addition, it allows treatment at low-temperatures, and results in a high surface hardness and improved corrosion resistance. Many researchers have demonstrated that the plasma ion nitriding process should be carried out at temperatures of below $450^{\circ}C$ to improve corrosion resistance via the formation of the expanded austenite phase(S-phase). Most experimentals studied to date have been carried out in chloride solutions like HCl or NaCl. However, the electrochemical characteristics for the chloride solutions and natural seawater differ. Hence, in this work, plasma ion nitriding of 304 stainless steels was performed at various temperatures, and the electrochemical characteristics corresponding to the different process temperatures were analyzed for the samples in natural seawater. Finally the optimum plasma ion nitriding temperature that resulted in the highest corrosion resistance was determined.

A Study on Wear and Corrosion Properties of Plasma Carburized Austenitic Stainless Steel (플라즈마 침탄된 오스테나이트계 스데인리스강의 마모 및 부식 특성에 관한 연구)

  • Shin, Dong-Myung;Lee, Chang-Youl;Lee. Kyung-Sub
    • Korean Journal of Materials Research
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    • v.12 no.10
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    • pp.776-783
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    • 2002
  • Austenitic stainless steel (STS304) has been carburized using glow discharge plasma and its microstructure, wear resistance and corrosion property have been investigated. A repeat boost-diffuse carburizing was used as an effective plasma carburizing method. The effective case depth of the plasma carburized specimens was increased with the carbon concentration at the surface area. The specimens prepared by 3 hours plasma carburizing under $600^{\circ}C$ did not have the standard hardness for the effective case depth, but the specimen prepared by 11 hours plasma carburizing at $500^{\circ}C$ had nearly the same hardness with the specimen plasma carburized for 3 hours at $800^{\circ}C$. The wear resistance increased with temperature but the corrosion properties of the specimens prepared over $600^{\circ}C$ decreased rapidly due to the grain boundary sensitization. However, the specimen plasma carburized for 11 hours at $500^{\circ}C$ had nearly the same wear resistance with the specimen plasma carburized for 3 hours at $800^{\circ}C$ without deterioration of corrosion property. This could be resulted from the fact that the microstructure of the specimen plasma carburized for 11 hours at $500^{\circ}C$ was composed of martensite and austenite, because a partial martensite transformation was occurred only in the specimen plasma carburized for 11 hours at 50$0^{\circ}C$.

Development and characteristics investigation of new soft plasma ionization(SPI) source (새로운 소프트 플라스마 이온화(SPI) 장치의 개발 및 특성관찰)

  • Lee, Hiwwon;Park, Hyunkook;Lee, Sang Chun
    • Analytical Science and Technology
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    • v.22 no.2
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    • pp.152-158
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    • 2009
  • In this study, we made a new discharge source improving previous SPI source to ionize softly organic compounds. The new SPI source consists of two electrodes as a hollow mesh cathode of half cylindrical shape and a hollow anode. We optimized the geometrical parameter of the SPI source by investigating the I-V curves at the various distance between the cathode and the anode. As the results, we found stable conditions of the soft plasma on broad range of the current and the voltage. The new SPI source attached to quadrupole mass spectrometer (QMS), and we obtained the mass spectra of dichloromethane (DCM). The fragment patterns of DCM appeared similarly with the pattern of electron ionization (EI).

Observation of Plasma Shape by Continuous dc and Pulsed dc (직류 방전과 펄스 직류 방전에 의한 플라즈마 형상 관찰)

  • Yang, Won-Kyun;Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.42 no.3
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    • pp.133-138
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    • 2009
  • Effects of bipolar pulse driving frequency between 50 kHz and 250 kHz on the discharge shapes were analyzed by measuring plasma characteristics by OES (Optical Emission Spectroscopy) and Langmuir probe. Plasma characteristics were modeled by a simple electric field analysis and fluid plasma modeling. Discharge shapes by a continuous dc and bipolar pulsed dc were different as a dome-type and a vertical column-type at the cathode. From OES, the intensity of 811.5 nm wavelength, the one of the main peaks of Ar, decreased to about 43% from a continuous dc to 100 kHz. For increasing from 100 kHz to 250 kHz, the intensity of 811.5 nm wavelength also decreased by 46%. The electron density decreased by 74% and the electron temperature increased by 36% at the specific position due to the smaller and denser discharge shape for increasing pulse frequency. Through the numerical analysis, the negative glow shape of a continuous dc were similar to the electric potential distribution by FEM (Finite Element Method). For the bipolar pulsed dc, we found that the electron temperature increased to maximum 10 eV due to the voltage spikes by the fast electron acceleration generated in pre-sheath. This may induce the electrons and ions from plasma to increase the energetic substrate bombardment for the dense thin film growth.

Heat or radiofrequency plasma glow discharge treatment of a titanium alloy stimulates osteoblast gene expression in the MC3T3 osteoprogenitor cell line

  • Rapuano, Bruce E.;Hackshaw, Kyle;Macdonald, Daniel E.
    • Journal of Periodontal and Implant Science
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    • v.42 no.3
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    • pp.95-104
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    • 2012
  • Purpose: The purpose of this study was to determine whether increasing the Ti6Al4V surface oxide negative charge through heat ($600^{\circ}C$) or radiofrequency plasma glow discharge (RFGD) pretreatment, with or without a subsequent coating with fibronectin, stimulated osteoblast gene marker expression in the MC3T3 osteoprogenitor cell line. Methods: Quantitative real-time polymerase chain reaction was used to measure changes over time in the mRNA levels for osteoblast gene markers, including alkaline phosphatase, bone sialoprotein, collagen type I (${\alpha}1$), osteocalcin, osteopontin and parathyroid hormone-related peptide (PTH-rP), and the osteoblast precursor genes Runx2 and osterix. Results: Osteoprogenitors began to differentiate earlier on disks that were pretreated with heat or RFGD. The pretreatments increased gene marker expression in the absence of a fibronectin coating. However, pretreatments increased osteoblast gene expression for fibronectin-coated disks more than uncoated disks, suggesting a surface oxide-mediated specific enhancement of fibronectin's bioactivity. Heat pretreatment had greater effects on the mRNA expression of genes for PTH-rP, alkaline phosphatase and osteocalcin while RFGD pretreatment had greater effects on osteopontin and bone sialoprotein gene expression. Conclusions: The results suggest that heat and RFGD pretreatments of the Ti6Al4V surface oxide stimulated osteoblast differentiation through an enhancement of (a) coated fibronectin's bioactivity and (b) the bioactivities of other serum or matrix proteins. The quantitative differences in the effects of the two pretreatments on osteoblast gene marker expression may have arisen from the unique physico-chemical characteristics of each resultant oxide surface. Therefore, engineering the Ti6Al4V surface oxide to become more negatively charged can be used to accelerate osteoblast differentiation through fibronectin-dependent and independent mechanisms.

The Fundamental Studies of the New Glow Discharge/Inductively Coupled Plasma Interface: Part Ⅰ. Preliminary Studies (새로운 글로우 방전/유도결합 플라스마 장치(GD/ICP Interface)에 대한 기초 연구: Part Ⅰ. 기초 연구)

  • Lee, Gae Ho;Kil, Hyo Shik;Kim, Hyung Seung;Gary M. Hieftje
    • Journal of the Korean Chemical Society
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    • v.43 no.2
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    • pp.182-192
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    • 1999
  • The new GD/ICP-AES quick change over system has been developed and characterized. Within less than 15 minutes, ICP-AES could be switched to GD-AES and vise a versa. As a result, both solid and liquid samples could be analyzed in a very short period of time by the ICP/GD-AES quick change over system developed in our laboratory. The influences of the experimental variables, such as flow rate of coolant gas, flow rate of auxiliary gas, flow rate of sample carrier gas, sampling depth, orifice size of sampling cone, and rf (radio frequency) power on emission intensity have been presented. The detection limits of Cd(I) 228.8 nm, Mn (II) 257.61 nm, and Fe(II) 259.95 nm were found to be 3.86, 1.49, and 5.79 ppb, respectively. And linealities of the calibration curves were measured to be unity.

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Development of High Voltage TFT by Discharge Plasma Chemical Vapor Depoisition (방전 플라즈마 CVD에 의한 전력용 고합 TFT의 개발)

  • Lee, Woo-Sun;Kang, Yong-Chul;Kim, Byung-In;Yang, Tae-Whan;Chung, Hae-In;Chung, Yong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1993.05a
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    • pp.137-141
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    • 1993
  • We studied the fabrication and electrical characteristics of high voltage hydrogenerated amorphous silicon thin film transistor using glow discharge plasma enchanced chemical vapor deposition (GDPECVD) with $2500{\AA}\;SiO_2$, $400-1500{\AA}$ a-Si thickness, 350V output voltage, 100V input voltaege, and $9.55{\times}10^4$ average on/off ratio. We found that leakage current of high voltage TFT occured 0-70V drain voltage.

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