• 제목/요약/키워드: Ge2Sb2Te5

검색결과 101건 처리시간 0.053초

Influence of Sn/Bi doping on the phase change characteristics of $Ge_2Sb_2Te_5$

  • Park T.J.;Kang M.J.;Choi S.Y.
    • 정보저장시스템학회논문집
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    • 제1권1호
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    • pp.93-98
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    • 2005
  • Rewritable optical disk is one of the essential data storage media in these days, which takes advantage of the different optical properties in the amorphous and crystalline states of phase change materials. As well known, data transfer rate is one of the most important parameter of the phase change optical disks, which is mostly limited by the crystallization speed of recording media. Therefore, we doped Sn/Bi to $Ge_2Sb_2Te_5$ alloy in order to improve the crystallization speed and investigated the dependence of phase change characteristics on Sn/Bi doping concentration. The Sn/Bi doped $Ge_2Sb_2Te_5$ thin film was deposited by RF magnetron co-sputtering system and phase change characteristics were investigated by X-ray diffraction (XRD), static tester, UV-visible spectrophotometer, electron probe microanalysis (EPMA), inductively coupled plasma mass spectrometer (ICP-MS) and atomic force microscopy (AFM). Optimum doping concentration of Bi and Sn were 5${\~}$6 at.$\%$ and the minimum time for crystallization was below than 20 ns. This improvement is correlated with the simple crystalline structure of Sn/Bi doped $Ge_2Sb_2Te_5$ and the reduced activation barrier arising from Sn/Bi doping. The results indicate that Sn/Bi might play an important role in the transformation kinetics of phase change materials..

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$Ge_2Sb_2Te_5$ 박막의 Se 증가에 따른 상변화 특성 연구 (The study for phase change properties of Se added $Ge_2Sb_2Te_5$ thin films)

  • 임우식;김성원;이현용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.166-166
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    • 2007
  • PRAM (phase-change random access memory)은 전류 펄스 인가에 따른 기록매질의 비정질-결정질 간 상변화와 그에 동반되는 저항변화를 이용하는 차세대 비휘발성 메모리 소자로서 연구되어지고 있다. 본 논문에서는 $(Ge_2Sb_2Te_5)_{1-x}Se_x$ (x=0,0.05,0.1,0.15) 조성에 대한 벌크 및 박막시료를 제작하고 각 조성에 대한 상변화 특성을 분석하였다. XRD를 통해 열처리 온도에 따른 구조적 분석을 실시하였고 UV-Vis-IR spectrophotometer를 사용하여 박막의 광학적 특성을 분석하였다. 또한 각 조성의 결정화 속도를 비교하기 위해 static tester를 사용하여 레이저 펄스 시간에 대한 반사도 변화를 측정하였고 DSC를 통해 결정화 온도를 측정하였다.

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Thermal Stability of SiO2 Doped Ge2Sb2Te5 for Application in Phase Change Random Access Memory

  • Ryu, Seung-Wook;Ahn, Young-Bae;Lee, Jong-Ho;Kim, Hyeong-Joon
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제11권3호
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    • pp.146-152
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    • 2011
  • Thermal stability of $Ge_2Sb_2Te_5$ (GST) and $SiO_2$ doped GST (SGST) films for phase change random access memory applications was investigated by observing the change of surface roughness, layer density and composition of both films after isothermal annealing. After both GST and SGST films were annealed at $325^{\circ}C$ for 20 min, root mean square (RMS) surface roughness of GST was increased from 1.9 to 35.9 nm but that of SGST was almost unchanged. Layer density of GST also steeply decreased from 72.48 to 68.98 $g/cm^2$ and composition was largely varied from Ge : Sb : Te = 22.3 : 22.1 : 55.6 to 24.2 : 22.7 : 53.1, while those of SGST were almost unchanged. It was confirmed that the addition of a small amount of $SiO_2$ into GST film restricted the deterioration of physical and chemical properties of GST film, resulting in the better thermal stability after isothermal annealing.

광기록매체용 Ge-Sb-Te 다층 박막의 광학적 특성 및 열전달 특성 (Optcal and thermal diffusion properties of Ge-Sb-Te multi-layered thin films for optical recording media)

  • 김도형;김상준;김상열;안성혁
    • 한국광학회지
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    • 제12권5호
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    • pp.394-400
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    • 2001
  • 다층 박막에서의 빛의 반사와 흡수 및 열전달 방정식을 수치해석적으로 풀어 광기록매체용 다층 박막의 광학적 특성과 열전달 특성을 알아보고 이 두 특성들을 모두 고려하여 광기록에 적합한 레이저의 출력 및 지속시간, 다층 박막 구조 상수를 제시하였다. 그 결과 레이저는 650 nm 파장을 기준으로 출력 18mW, 지속 시간 60 nm가 적당하였으며 박막 구조 상수는 ZnS-SiO$_2$140nm, Ge-Sb-Te 20 nm, ZnS-SiO$_2$20~30nm, Al-alloy 100~150 nm가 적당하였다.

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박막 열전 발전 소자를 위한 In3Sb1Te2와 Ge2Sb2Te5 박막의 열전 특성에 관한 연구 (Characterization of n-type In3Sb1Te2 and p-type Ge2Sb2Te5 Thin Films for Thermoelectric Generators)

  • 강소현;서혜지;윤순길
    • 한국재료학회지
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    • 제27권2호
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    • pp.89-93
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    • 2017
  • A thin film thermoelectric generator that consisted of 5 p/n pairs was fabricated with $1{\mu}m$-thick n-type $In_3Sb_1Te_2$ and p-type $Ge_2Sb_2Te_5$ deposited via radio frequency magnetron sputtering. First, $1{\mu}m$-thick GST and IST thin films were deposited at $250^{\circ}C$ and room temperature, respectively, via radio-frequency sputtering; these films were annealed from 250 to $450^{\circ}C$ via rapid thermal annealing. The optimal power factor was found at an annealing temperature of $400^{\circ}C$ for 10 min. To demonstrate thermoelectric generation, we measured the output voltage and estimated the maximum power of the n-IST/p-GST generator by imposing a temperature difference between the hot and cold junctions. The maximum output voltage and the estimated maximum power of the $1{\mu}m$-thick n-IST/p-GST TE generators are approximately 17.1 mV and 5.1 nW at ${\Delta}T=12K$, respectively.

Electromigration in Molten-phase Ge2Sb2Te5 and Effects of Doping on Atomic Migration Rate

  • Joo, Young-Chang;Yang, Tae-Youl;Cho, Ju-Young;Park, Yong-Jin
    • 한국세라믹학회지
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    • 제49권1호
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    • pp.43-47
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    • 2012
  • Electromigration in molten $Ge_2Sb_2Te_5$ (GST) was characterized using pulsed DC stress to an isolated line structure. When an electrical pulse was applied to the GST, GST lines were melted by Joule heating, and Ge and Sb atoms migrate to the cathode, whereas Te atoms migrate to the anode. This elemental separation in the molten GST was caused by an electrostatic force-induced electromigration. The effects of O-, N-, and Bi-doping on the electromigration were also investigated, and atomic mobility changes by the doping were investigated by quantifying $DZ^*$ values. The Bi -doping did not affect the $DZ^*$ values of the constituent atoms in the molten GST, but the D$DZ^*$ values decreased by O-doping and N-doping.