• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2008.05a
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• pp.535-538
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• 2008

Insert-injection molding can inject two different materials or two colors in the same mold and process. If this injection process use, product has ability because the base part maintain strength and specified part can inject soft-material. It makes the cost down by single operation automatically for saving wages. In this paper, we designed double-injection mold for automobile remote control to inject secondary using this part as insert after inject external appearance of product. CAE analysis was progressed gate location and runner size as variable and analysis result is reflected in mold design process. As a result, it could solved badness that is generated at the conventional mold. Additionally, cost is downed by reducing loss of runner as well as could omit painting process because surface of finished product is improved through new mold.

• JSTS:Journal of Semiconductor Technology and Science
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• v.14 no.5
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• pp.666-672
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• 2014

We have investigated the gate insulator effects on the electrical performance of p-type tin monoxide (SnO) thin-film transistors (TFTs). Various SnO TFTs are fabricated with different gate insulators of a thermal $SiO_2$, a plasma-enhanced chemical vapor deposition (PECVD) $SiO_x$, a $150^{\circ}C$-deposited PEVCD $SiO_x$, and a $300^{\circ}C$-deposited PECVD $SiO_x$. Among the devices, the one with the $150^{\circ}C$-deposited PEVCD $SiO_x$ exhibits the best electrical performance including a high field-effect mobility ($=4.86cm^2/Vs$), a small subthreshold swing (=0.7 V/decade), and a turn-on voltage around 0 (V). Based on the X-ray diffraction data and the localized-trap-states model, the reduced carrier concentration and the increased carrier mobility due to the small grain size of the SnO thin-film are considered as possible mechanisms, resulting in its high electrical performance.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.307.2-307.2
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• 2016

In this study, we synthesized Au nanoparticles (AuNPs) in polyacrylonitrile (PAN) thin films using a simple annealing process in the solid phase. The synthetic conditions were systematically controlled and optimized by varying the concentration of the Au salt solution and the annealing temperature. X-ray photoelectron spectroscopy (XPS) confirmed their chemical state, and transmission electron microscopy (TEM) verified the successful synthesis, size, and density of AuNPs. Au nanoparticles were generated from the thermal decomposition of the Au salt and stabilized during the cyclization of the PAN matrix. For actual device applications, previous synthetic techniques have required the synthesis of AuNPs in a liquid phase and an additional process to form the thin film layer, such as spin-coating, dip-coating, Langmuir-Blodgett, or high vacuum deposition. In contrast, our one-step synthesis could produce gold nanoparticles from the Au salt contained in a solid matrix with an easy heat treatment. The PAN:AuNPs composite was used as the charge trap layer of an organic nano-floating gate memory (ONFGM). The memory devices exhibited a high on/off ratio (over $10^6$), large hysteresis windows (76.7 V), and a stable endurance performance (>3000 cycles), indicating that our stabilized PAN:AuNPs composite film is a potential charge trap medium for next generation organic nano-floating gate memory transistors.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.3 no.2
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• pp.471-475
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• 1999

The metal plasma-etch damage immunity of nMOSFET with $N{_2}O$ gate oxide is found to be improved comparing to that with regular pure oxide of similar thickness. With increasing the antenna ratio (AR), the characteristics of nMOSFETs with $N{_2}O$ oxide shows tighter initial distribution and smaller degradation under constant field stress, which is explained by the effect of the nitrogen at the substrate $Si/SiO_2$ interface. Also, if $N{_2}O$ gate oxide is used, the maximum allowable size of metal AAR and PAR may be increased to the much larger values. These improvements of nMOSFETs with $N{_2}O$ gate oxide are attributed to the effect of the interface hardness improved by the nitrogen included at the substrate-Si/$N{_2}O$-oxide interface.

• Journal of Sensor Science and Technology
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• v.23 no.5
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• pp.332-336
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• 2014

In this paper, we propose a complementary metal oxide semiconductor (CMOS) binary image sensor with a gate/body-tied (GBT) PMOSFET-type photodetector for high-speed operation. The GBT photodetector of an active pixel sensor (APS) consists of a floating gate ($n^+$-polysilicon) tied to the body (n-well) of the PMOSFET. The p-n junction photodiode that is used in a conventional APS has a good dynamic range but low photosensitivity. On the other hand, a high-gain GBT photodetector has a high level of photosensitivity but a narrow dynamic range. In addition, the pixel size of the GBT photodetector APS is less than that of the conventional photodiode APS because of its use of a PMOSFET-type photodetector, enabling increased image resolution. A CMOS binary image sensor can be designed with simple circuits, as a complex analog to digital converter (ADC) is not required for binary processing. Because of this feature, the binary image sensor has low power consumption and high speed, with the ability to switch back and forth between a binary mode and an analog mode. The proposed CMOS binary image sensor was simulated and designed using a standard CMOS $0.18{\mu}m$ process.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.43 no.1 s.343
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• pp.143-148
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• 2006

This paper presents a high isolation and power-handling single-pole double-throw(SPDT) switch for dual band wireless LAN applications. The switch circuit has asymmetric topology which uses stacked-gate to have high power-handling and isolation for the Tx path. The proposed SPDT switch has been designed with optimum gate-width, bias, and number of stacked-gate FET. This SPDT switch has been implemented with $0.25{\mu}m$ GaAs pHEMT process which has Gmmax of 500mS/mm and fmax of 150GHz. The designed SPDT switch has the measured insertion loss of better than 0.9dB and isolation of better than 40dB for the Tx path and 25dB for the Rx path and the high power handling capability with PldB of about 23dBm for control voltage of -3/0V. The fabricated SPDT switch chip size is $1.8mm{\times}1.8mm$.

• Journal of The Korean Society of Agricultural Engineers
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• v.56 no.5
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• pp.67-75
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• 2014

In this study, the large-scale hydraulic model test was performed to investigate the hydraulic characteristics for development of the non-power soil cleaning and keeping system at the dike gate. The outlet height, outflow number, outflow discharge, and outflow cycle were compared and analyzed. The non-power soil cleaning and keeping system was most effective at 11.2 mm in the outlet height. And then the mean outflow cycle was 1.09 sec, and the mean outflow discharge was $0.00164m^3/s$. The total outflow number increased gradually as the water level of a water tank increased, and the outlet height decreased. As a level of water tank decreased, the mean outflow cycle was lengthened, and the unit outflow discharge increased. This result showed this system was most effective. To remove the silty clay deposited in facilities, the methods of excavation, dredging, high pressure washing, etc have been applied to the tidal facilities such as land reclamation, a small size fishing port, and a harbor for maintenance. However, this is extremely cost-ineffective, whereas the non-power soil cleaning and keeping system will bring about an enormously positive economic effect. In addition, when the non-power soil cleaning and keeping system is applied to the dike gate of land reclamation, a thorough examination of the local tidal data and the careful system planning are required to prevent the disaster damage caused by flooding.

• JSTS:Journal of Semiconductor Technology and Science
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• v.5 no.3
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• pp.159-167
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• 2005

Quantization effects (QEs), which manifests when the device dimensions are comparable to the de Brogile wavelength, are becoming common physical phenomena in the present micro-/nanometer technology era. While most novel devices take advantage of QEs to achieve fast switching speed, miniature size and extremely small power consumption, the mainstream CMOS devices (with the exception of EEPROMs) are generally suffering in performance from these effects. In this paper, an analytical model accounting for the QEs and poly-depletion effects (PDEs) at the silicon (Si)/dielectric interface describing the capacitance-voltage (C-V) and current-voltage (I-V) characteristics of MOS devices with thin oxides is developed. It is also applicable to multi-layer gate-stack structures, since a general procedure is used for calculating the quantum inversion charge density. Using this inversion charge density, device characteristics are obtained. Also solutions for C-V can be quickly obtained without computational burden of solving over a physical grid. We conclude with comparison of the results obtained with our model and those obtained by self-consistent solution of the $Schr{\ddot{o}}dinger$ and Poisson equations and simulations reported previously in the literature. A good agreement was observed between them.

• The Journal of the Korea institute of electronic communication sciences
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• v.12 no.2
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• pp.273-280
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• 2017

As massive integration technology of transistors has been developing, multi-core circuit is fabricated on a silicon chip and a clock frequency is getting faster to meet the system requirement. But increasing the clock frequency can induce some problems to violate the operation of system such as clock synchronization, so it is very import to avoid metastability events to design digital chips. In this paper, metastability windows are measured by bisection method in H-spice depending on temperature, supply voltage, and the size of transmission gate with D-FF designed with 180nm CMOS process. The simulation results show that the metastability window(: MW) is slightly increasing to temperature and supply voltage, but is quadratic to the area of a transmission gate, and the best area ration of P and Ntransitor in transmission gate is P/N=4/2 to get the least MW.

• Journal of Korea Game Society
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• v.7 no.4
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• pp.13-21
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• 2007

Recently, medical advances have been increasing the size of the aged population. With rapidly developing technology, computers are now essential parts in our daily life, and the number of the aged people using computers is also increasing continuously. But user interfaces and contents for the aged people have not yet been developed actively. In this paper, we present a 3D sensory gate-ball game which can be played by the aged people easily. This study is based on 3D graphics and uses a realistic gate-ball stick and balls as interfaces, so it can improve both physical and metal health of the aged people. Because our game is a sensory game, it is easy to play in house without an outdoor playground. In addition, the game provides many interesting situation so that it can raise the participation and interest of the aged people.