• Title/Summary/Keyword: Gas flow uniformity

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Relationship between ICAC EP-7 and %RMS, Standards for Gas Flow Uniformity inside Electrostatic Precipitators (전기집진기 내부 유동 균일도 평가 기준인 ICAC EP-7과 %RMS 간 상관관계)

  • Shin, Wan-Ho;Hong, Won-Seok;Song, Dong-Keun
    • Journal of Korean Society for Atmospheric Environment
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    • v.26 no.2
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    • pp.234-240
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    • 2010
  • Gas flow uniformity is an important factor to guarantee particle removal performance of electrostatic precipitators (EP), and the gas flow uniformity is evaluated by a fraction of standard deviation to the mean of gas flow distribution (%RMS) or a technical standard, ICAC EP-7, provided by The Institute of Clean Air Companies. In this study, relationship between the ICAC EP-7 and %RMS in evaluation of gas flow uniformity was investigated in terms of flow velocity. The maximum values of %RMS for gas velocity distribution of normal distribution has been obtained, and the maximum values of %RMS with gas velocity distribution satisfying ICAC EP-7 standards were also evaluated. With gas flow distribution obtained from CFD analysis and physical model test of real EP, %RMS values were calculated and it was tested if those gas flow distribution satisfy the criteria specified in ICAC EP-7. The %RMS values satisfying criteria of ICAC have been appeared to have similar values with %RMS values calculated with normal distribution of gas velocities.

COMPUTATIONAL ANALYSIS FOR IMPROVING UNIFORMITY OF $SNO_2$ THIN FILM DEPOSITION IN AN APCVD SYSTEM ($SnO_2$ 박막증착을 위한 APCVD Reactor 내 유량 균일도 향상에 대한 수치 해석적 연구)

  • Park, J.W.;Yoon, I.R.;Chung, H.S.;Shin, S.W.;Park, S.H.;Kim, H.J.
    • 한국전산유체공학회:학술대회논문집
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    • 2010.05a
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    • pp.567-570
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    • 2010
  • With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity

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CFD Analysis on Effect of Pressure Drop and Flow Uniformity with Geometry in 13" Asymmetric DPF (13" 비대칭 DPF 내 형상에 따른 배압 및 유동균일도 영향에 관한 전산해석연구)

  • HAN, DANBEE;BYUN, HYUNSEUNG;BAEK, YOUNGSOON
    • Transactions of the Korean hydrogen and new energy society
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    • v.31 no.6
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    • pp.614-621
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    • 2020
  • Recently, as the fine dust is increased and the emission regulations of diesel engines are strengthened, interest in diesel soot filtration devices is rapidly increased. In particular, there is a demand for technology development for higher efficiency of diesel exhaust gas after-treatment devices. As part of this, many studies conducted to increase the exhaust gas treatment efficiency by improving the flow uniformity of the exhaust gas in the DPF and reducing the pressure drop between the inlet and outlet of disel particle filter (DPF). In this study, computational fluid dynamics (CFD) simulation was performed when exhaust gas flows into the canning reduction device equipped with a 13" asymmetric DPF in order to maintain the flow uniformity in the diesel exhaust system and reduce the pressure. In particular, a study was conducted to find the geometry with the smallest pressure drop and the highest flow uniformity by simulating the DPF I/O ratio, exhaust gas temperature, inlet-outlet pressure and flow uniformity according to the geometry and hole size of distributor.

Mixer design for improving the injection uniformity of the reduction agent in SCR system

  • Hwang, Woohyeon;Lee, Kyungok
    • Journal of the Korea Society of Computer and Information
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    • v.22 no.1
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    • pp.63-69
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    • 2017
  • In this paper, we propose a method to optimize the geometry and installation position of the mixer in the selective catalytic reduction (SCR) system by computational fluid dynamic(CFD). Using the commercial CFD software of CFD-ACE+, the flow dynamics of the flue gas was numerically analyzed for improving the injection uniformity of the reduction agent. Numerical analysis of the mixed gas heat flow into the upstream side of the primary SCR catalyst layer was performed when the denitrification facility was operated. The characteristics such as the flow rate, temperature, pressure loss and ammonia concentration of the mixed gas consisting of the flue gas and the ammonia reducing gas were examined at the upstream of the catalyst layer of SCR. The temperature difference on the surface of the catalyst layer is very small compared to the flow rate of the exhaust gas, and the temperature difference caused by the reducing gas hardly occurs because the flow rate of the reducing gas is very small. When the mixed gas is introduced into the SCR reactor, there is a slight tendency toward one wall. When the gas passes through the catalyst layer having a large pressure loss, the flow angle of the exhaust gas changes because the direction of the exhaust gas changes toward a smaller flow. Based on the uniformity of the flow rate of the mixed gas calculated at the SCR, it is judged that the position of the test port reflected in the design is proper.

Numerical Analysis of Flow Uniformity in Selective Catalytic Reduction (SCR) Process Using Computational Fluid Dynamics (CFD)

  • Shon, Byung-Hyun
    • International Journal of Advanced Culture Technology
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    • v.10 no.3
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    • pp.295-306
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    • 2022
  • The NOx removal performance of the SCR process depends on various factors such as catalytic factors (catalyst composition, shape, space velocity, etc.), temperature and flow rate distribution of the exhaust gas. Among them, the uniformity of the flow flowing into the catalyst bed plays the most important role. In this study, the flow characteristics in the SCR reactor in the design stage were simulated using a three-dimensional numerical analysis technique to confirm the uniformity of the airflow. Due to the limitation of the installation space, the shape of the inlet duct was compared with the two types of inlet duct shape because there were many curved sections of the inlet duct and the duct size margin was not large. The effect of inlet duct shape, guide vane or mixer installation, and venturi shape change on SCR reactor internal flow, airflow uniformity, and space utilization rate of ammonia concentration were studied. It was found that the uniformity of the airflow reaching the catalyst layer was greatly improved when an inlet duct with a shape that could suppress drift was applied and guide vanes were installed in the curved part of the inlet duct to properly distribute the process gas. In addition, the space utilization rate was greatly improved when the duct at the rear of the nozzle was applied as a venturi type rather than a mixer for uniform distribution of ammonia gas.

Simulation of Inductively Coupled $Ar/O_2$ Plasma; Effects of Operating Conditions on Plasma Properties and Uniformity of Atomic Oxygen

  • Park, Seung-Kyu;Kim, Jin-Bae;Kim, Heon-Chang
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.59-63
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    • 2009
  • This paper presents two dimensional simulation results of an inductively coupled $Ar/O_2$ plasma reactor. The effects of operating conditions on the plasma properties and the uniformity of atomic oxygen near the wafer were systematically investigated. The plasma density had the linear dependence on the chamber pressure, the flow rate of the feed gas and the power deposited into the plasma. On the other hand, the electron temperature decreased almost linearly with the chamber pressure and the flow rate of the feed gas. The power deposited into the plasma nearly unaffected the electron temperature. The simulation results showed that the uniformity of atomic oxygen near the wafer could be improved by lowering the chamber pressure and/or the flow rate of the feed gas. However, the power deposited into the plasma had an adverse effect on the uniformity.

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Numerical Analysis of the Gas Flow Distribution Characteristics in the Anode Flow Channel of Molten Carbonate Fuel Cell (MCFC) (용융탄산염 연료전지 Anode 유로 채널에서의 가스 유동 분포에 관한 수치해석적 연구)

  • Cho, Jun-Hyun;Ha, Tae-Hun;Kim, Han-Sang;Min, Kyoung-Doug;Park, Jong-Hoon;Chang, In-Gab;Lee, Tae-Won
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.33 no.11
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    • pp.834-839
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    • 2009
  • A three-dimensional computational fluid dynamics (CFD) analysis is performed to investigate flow characteristics in the anode channels and manifold of the internal reforming type molten carbonate fuel cell (MCFC). Considering the computational difficulties associated with the size and geometric complexity of the MCFC system, the polyhedral meshes that can reduce mesh connectivity problems at the intersection of the channel and the manifold are adopted and chemical reactions inside the MCFC system are not included. Through this study, the gas flow rate uniformity of the anode channels is mainly analyzed to provide basic insights into improved design parameters for anode flow channel design. Results indicate that the uniformity in flow-rate is in the range of ${\pm}$1% between the anode channels. Also, the mal-distributed inlet flow-rate conditions and the change in the size of the manifold depth have no significant effect on the flow-rate uniformity of the anode channels.

Numerical analysis of the gas flow distribution characteristics in the anode flow channel of the molten carbonate fuel cell (MCFC) (용융탄산염 연료전지 anode 유로 채널에서의 가스 유동 분포에 관한 수치해석적 연구)

  • Cho, Jun-Hyun;Ha, Tae-Hun;Kim, Han-Sang;Min, Kyoung-Doug;Park, Jong-Hoon;Chang, In-Gab;Lee, Tae-Won
    • Proceedings of the KSME Conference
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    • 2008.11b
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    • pp.3120-3124
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    • 2008
  • A three-dimensional computational fluid dynamics (CFD) analysis is performed to investigate flow characteristics in the anode channels and manifold of the internal reforming type molten carbonate fuel cell (MCFC). Considering the computational difficulties associated with the size and geometric complexity of the MCFC system, the polyhedral meshes that can reduce mesh connectivity problems at the intersection of the channel and the manifold are adopted and chemical reactions inside the MCFC system are not included. Through this study, the gas flow rate uniformity of the anode channels is mainly analyzed to provide basic insights into improved design parameters for anode flow channel design. Results indicate that the uniformity in flow-rate is in the range of ${\pm}1%$ between the anode channels. Also, the mal-distributed inlet flow-rate conditions and the change in the size of the manifold depth have no significant effect on the flow-rate uniformity of the anode channels.

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Enhancing Flow Uniformity of Gas Separator for Solid Oxide Fuel Cells by Optimizing Dimple Patterns (딤플 패턴 최적화를 통한 고체산화물 연료전지 분리판의 흐름 균일도 향상)

  • QUACH, THAI-QUYEN;LEE, DONG KEUN;AHN, KOOK YOUNG;KIM, YOUNG SANG
    • Transactions of the Korean hydrogen and new energy society
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    • v.32 no.5
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    • pp.331-339
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    • 2021
  • This study presents a novel way to enhance uniformity of the gas flow inside the solid oxide fuel cell (SOFC), which is critically important to fuel cell performance, by using dimples. A pattern of dimple, which works as a flow distributor/collector, is designed at the inlet and outlet section of a straight channel gas separator. Size of the dimples and the gap between them were changed to optimize the flow uniformity, and any change in size or gap is considered as one design. The results show that some dimple patterns significantly enhance the uniformity compared to baseline, about 4%, while the others slightly reduce it, about 1%. Besides, the dimple pattern also affects to the pressure drop in the flow channel, however the pressure drop in all cases are negligible (less than 26.4 Pa).

Properties of AlSi etching using the MERIE type reactor (MERIE형 반응로를 이용한 AlSi의 식각 특성)

  • 김창일;김태형;장의구
    • Electrical & Electronic Materials
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    • v.9 no.2
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    • pp.188-195
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    • 1996
  • The AlSi etching process using the MERIE type reactor carried out with different process parameters such as C1$_{2}$ and N$_{2}$ gas flow rate, RF power and chamber pressure. The etching characteristics were evaluated in terms of etch rate, selectivity, uniformity and etched profile. As the N2 gas flow rate is increased, the AlSi etch rate is decreased and uniformity has remained constant within .+-.5%. The etch rate is increased and uniformity is decreased, according to increment of the C1$_{2}$ gas flow rate, RF power and chamber pressure. Selective etching of TEOS with respect to AlSi is decreased as the RF power is increased while it is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, on the other hand, selective etching of photoresist with respect to AlSi is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, it is decreased as the N$_{2}$ gas flow rate is increased.

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