• 제목/요약/키워드: GaN films

검색결과 276건 처리시간 0.026초

상온 강자성 (Ga,Mn)N 박막을 이용한 질화물계 스핀 발광소자의 스핀편극된 빛의 발광 (Emission of Spin-polarized Light in Nitride-based Spin LEDs with Room-temperature Ferromagnetic (Ga,Mn)N Layer)

  • 함문호;명재민
    • 한국전기전자재료학회논문지
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    • 제18권11호
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    • pp.1056-1060
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    • 2005
  • We investigated the fabrication and characteristics of the nitride-based spin-polarized LEDs with room-temperature ferromagnetic (Ga,Mn)N layer as a spin injection source. The (Ga,Mn)N thin films having room-temperature ferromagnetic ordering were found to exhibit the negative MR and anomalous Hall resistance up to room temperature, revealing the existence of spin-polarized electrons in (Ga,Mn)N films at room temperature. The electrical characteristics in the spin LEDs did not degraded in spite of the insertion of the (Ga,Mn)N layer into the LED structure. In EL spectra of the spin LEDs, it is confirmed that the devices produce intense EL emission at 7 K as well as room temperature. These results are expected to open up new opportunities to realize room-temperature operating semiconductor spintronic devices.

펄스 레이저 어블레이션을 이용한 비정질 GaN박막의 성장 및 특성분석 (Growth and characterization of amorphous GaN film using a pulsed-laser ablation)

  • 심승환;윤종원;;심광보
    • 한국결정성장학회지
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    • 제14권1호
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    • pp.33-36
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    • 2004
  • 고밀도 GaN 타겟의 레이저 어블레이션으로 상온에서 비정질 GaN 박막을 제조하였다. 다양한 Ar 압력 및 레이저 에너지로 증착된 박막의 표면미세구조 및 조성분석 결과, 10Pa의 압력하에 증착된 박막은 smooth한 표면을 갖는 비정질 GaN로 구성되었음을 확인하였으며, 특히 200mJ/pu1se로 증착된 박막은 저 에너지에서 증착된 박막과 비교하여 결정성의 증가 및 화학양론에 가까운 조성을 나타냈다. 상온 photoluminescence spectra로부터 비정질 GaN 박막은 약 2.8eV에서 강한 band gap발광특성이 관측되었으며, 200mJ/pu1se의 10 Pa에서 가장 높은 발광효율을 나타냈다.

HVPE법에 의한 Zn-Doped GaN 박막 제조 (Preparation of Zn-Doped GaN Film by HVPE Method)

  • 김향숙;황진수;정필조
    • 대한화학회지
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    • 제40권3호
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    • pp.167-172
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    • 1996
  • GaN 단결정 박막은 halide vapor phase epitaxy(HVPE)방법을 사용하여 사파이어 기판위에 헤케로에피탁시하게 성장시켰다. 이렇게 제조된 박막은 n형 전동성을 갖는다. 아연(Zn)을 받개 불순물로 도핑시켜 절연형 GaN 박막을 만들었는데 2.64과 2.43eV의 청색영역에서 발광 피크를 가졌다. 본 연구에의해 GaN 박막은 MIS(metal-insulator-semiconductor) 접합구조로 제작이 가능함을 시사하였고, 이종접합형 발광소자 개발에 기초자료가 될 것으로 전망된다.

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GaN계 스핀 발광소자의 스핀편극된 빛의 발광 (Emission of spin-polarized light in GaN-based spin LEDs)

  • 함문호;윤석호;박용조;명재민
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.150-152
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    • 2005
  • We investigated the fabrication and characteristics of spin-polarized LEDs based on GaN using (Ga,Mn)N as spin injection source. (Ga,Mn)N thin films were found to exhibit the ferromagnetic ordering above room temperature and the negative MR up to room temperature. The electrical characteristics in spin LEDs did not degraded in spite of the insertion of (Ga,Mn)N films. In EL spectra of spin LEDs, it is confirmed that spin LEDs emit the strong light at 7 K as well as room temperature. These results suggest that it is possible to emit spin-polarized light in our spin LEDs.

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ZnO Intermediate Layer가 GaN 박막의 PL 특성에 미치는 영향 연구 (Study of the Effects of ZnO Intermediate Layer on Photoluminescence Properties of Magnetron Sputtering Grown GaN Thin Films)

  • 성웅제;이용일;박천일;최우범;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.574-577
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    • 2001
  • GaN thin films on sapphire were grown by rf magnetron sputtering with ZnO buffer layer. The dependence of GaN film quality on ZnO buffer layer was investigated by X-ray diffraction(XRD). The improved film quality has been obtained by using thin ZnO buffer layer. Using Auger electron spectroscopy(AES), it was observed that the annealing process improved the GaN film quality. The surface roughness according to the annealing temperatures(700, 900, 1100$^{\circ}C$) were investigated by AFM(atomic force microscopy) and it was confirmed that the crystallization was improved by increasing the annealing temperature. Photoluminescence at 8K shows a near-band-edge peak at 3.2eV with no deep level emission.

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질화갈륨 박막의 유전 상수 (Dielectric constant of GaN thin films)

  • 김혜림;추장희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.267-270
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    • 1999
  • We measured the dielectr~c constant of undoped GaN thin films grown on (0001) sapphire substrates In 0.8 - 4.5 eV energy (276 - 1550 nm wavelength) range by spectroscopic ellipsometry. For more accurate data analysis we also performed X-ray diffraction, photolurninescence and Rutherford backscattering spectroscopy on samples. Data were analyzed with a four-phase model. The dielectric constant of GaN thin films was obtained not only in the transparent region but also around the absorption edge. Absorption edge energy, $3.3992{\pm}0.002$eV was determined from the obtained dielectric function.

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Mg도핑된 GaN 반도체 박막의 전자스핀공명 (Electron Spin Resonance from Mg-doped GaN Semiconductor Thin Films)

  • 박효열
    • 반도체디스플레이기술학회지
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    • 제4권2호
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    • pp.1-5
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    • 2005
  • Electon spin resonance measurements have been performed on the Mg-doped wurtzite GaN thin films grown on sapphire substrates by low-pressure metal-organic chemical vapor deposition. The sample set included films as-grown with the regular Mg doped and Mg delta doped samples and the corresponding annealed ones. The resonance signal has been observed from the annealed Mg delta-doped sample with the Lande g value of 2.029. This indicates that the singlet resonance signal originates from the neutral Mg acceptor located at 0.24 eV above the valence band edge and 0.13 eV above the Fermi level because of the nuclear hyperfine spin 1=0 of Mg and the larger value than the free electron g=2.0023.

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