• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.74.2-74.2
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• 2010

유리를 기판으로 하는 실리콘 박막태양전지의 경우 PIN 비정질 태양전지 뒤에 후면반사막으로 주로 Ga 또는 Al이 Doping된 후면반사막을 사용한다. 이 후면반사막의 경우 PIN층을 통과한 빛을 반사함으로써 빛의 효용성을 높이는 데 그 목적이 있다. 본 논문에서는 후면박사막으로 ZnO:Al을 사용하고 산소 부여량에 따른 투과도, 비저항 변화를 살펴보고 실제로 a-Si:H 박막태양전지를 제작하여 그 효과를 파악하였다. 이 때 산소 부여량이 많아질 경우 투과도는 높아지지만 비저항이 급격히 높아지는 문제가 있었으나 이 조건으로 a-Si:H 박막태양전지를 제작시에도 효율이 상승하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.6
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• pp.372-375
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• 2017

ZnO thin films were deposited by RF magnetron sputtering and then diffused by using an As source in the ampouletube. Also, the ZnO p-n homojunction was made by using As-doped ZnO thin films, and its properties were analyzed. After the As doping, the surface roughness increased, the crystal quality deteriorated, and the full width at half maximum was increased. The As-doped ZnO thin films showed typical p-type properties, and their resistivity was as low as $2.19{\times}10^{-3}{\Omega}cm$, probably because of the in-diffusion from an external As source and out-diffusion from the GaAs substrate. Also, the ZnO p-n junction displayed the typical rectification properties of a p-n junction. Therefore, the As diffusion method is effective for obtaining ZnO films with p-type properties.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.183-183
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• 2009

본 연구에선 ITO에 사용되는 Indium의 양을 줄이기 위해 ITO와 유사한 성질을 보이는 조성인 Indium - Zinc - Tin Turnary compound를 연구하였다. 각 조성은 Indium - Zinc - Tin Turnary compound를 기본으로 하여 Zinc site에 이종원소인 Al2O3와 Ga2O3를 doping함에 따라 변화되는 전기적 특성을 살며보았다. 분석에 사용한 Ceramic pellet은 일반적인 Ceramic process를 거쳐 제작되었다. 각 조성의 전기적 특성은 TCR meter와 Hall effect analyser를 이용하여 측정하였고, X-ray diffraction measurements(XRD), Scanning Electron microscope(SEM)를 이용하여 결정학적 특성을 분석하였다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.59-59
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• 2003

ZnO는 상온에서 3.37 eV의 넓은 밴드갭을 가지는 직접천이형 반도체이다. 상온에서 60 meV의 큰 엑시톤 결합에너지를 가짐으로 인해 엑시톤 재결합에 의한 강한 UV 레이저 발진효과를 기대할 수 있다. 이러한 장점을 갖는 ZnO 박막을 이용하여 광소자 등에 응용하기 위하여 양질의 ZnO 박막성장이 필수적이며, 이를 위해 MBE, MOCVD, PLD, rf magnetron sputtering 등 다양한 증착방법을 통한 연구결과가 보고되고 있다. 또한 p형 불순물인 As과 N 도핑 및 Ga과 N의 co-doping 방법 등을 통하여 p형 ZnO 박막을 제조하였음이 보고되고 있으나 재현성 문제 등으로 인해 계속적인 연구가 진행되고 있다. 본 연구에서는 MOCVD를 이용하여 A1$_2$O$_3$(0001) 기판 위에 ZnO 박막을 성장시켰다. Zn 전구체로 DEZn을 사용하였으며, 산소 source로 $O_2$를 사용하였다. 증착온도, Ⅵ/II 비율, 반응기 압력 등 MOCVD의 중요한 공정변수들의 체계적인 변화에 따른 박막성장 양상을 조사하였다. 증착 조건에 따라 ZnO 입자의 모양이 주상(column), nano-rod, nano-needle, nano-wire 등으로 급격하게 변화됨을 확인하였으며, 이러한 입자의 모양과 결정성장 방향 및 광학적 특성과의 상관관계의 해석을 시도하였다.

• Proceedings of the Korean Society of Marine Engineers Conference
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• 2002.05a
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• pp.167-171
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• 2002

We have investigated the optical properties of Te-doped ZnSSe:Te epitaxial layers grown on (100) GaAs substrates by molecular beam epitaxy. The Te-doped ternary specimen shows strong blue or green emission (at 300k) which is assigned to Te$_{1}$ or Te$_{n}$( n$\geq$2) cluster bound exciton. Bright green and blue light-emitting diodes (LEDs) have been developed using ZnSSe:Te system as an active layer. The green LEDs exhibit a fairly long device lifetime (>2000 h) when operated at 3 A/cm$^{2}$ under CW condition at room temperature. It is confirmed that the Te-doping induced "crystal-hardening effect" plays a significant role in both efficient and strong suppression of the optical device degradation.gradation.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.02a
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• pp.45-46
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• 1997

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.05a
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• pp.113-115
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• 1994

We considered the ion and photo-induced properties as a function of wavelength by exposing the light over the band gap of a-Ag/a-$Se_{75}$$Ge_{25}$ and the low-energy defocused $Ga^{+}$ ion beam on Ag/a-$Se_{75}$$Ge_{25}$ thin film. This film acts as a negative resist for photo or ion beam lithography. We observed that the absorbance coefficient decreased with increasing the photo-exposing time and exposing the ion beam. The bandgap shifts toward longer wavelength called a "darkening effect" are observed in the films exposed to both photons and ions. We suggest that a primary step in the Ag layer and a secondary step is in a-$Se_{75}$$Ge_{25}$ film layer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.535-538
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• 2004

Zinc Oxide (ZnO) films have attracted considerable attention for transparent conducting films, because of their high conductivity, good optical transmittance from UV to near IR as well as a low-cost fabrication. To increase the conductivity of ZnO, doping of group III elements (Al, Ga, In and B) has been carried out. Transparent conducting films have been applied for optoelectric devices, the development of the transparent conducting thin films on flexible light-weight substrates are required. In this research, the transparent conducting ZnO thin films doped with Aluminum (Al) on polymer substrates were deposited by the RF magnetron suputtering method, and the structural, optical and electrical properties were investigated.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.220-221
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• 2003

We optimized the structure of a fully depleted optical thyristor (DOT) to achieve the faster switching speed and the lower power consumption by the depletion of charge at the lower negative voltage. The fabricated optical thyristor shows sufficient nonlinear s-shape I-V characteristics with the switching voltage of 2.85 V and the complete depletion voltage of -8.73 V. In this paper, using a finite difference method (FDM), we calculate the effects of parameters such as doping concentration and thickness of each layer to determine the optimized structure in the view of the fast and low-power-consuming operation.

• Korean Journal of Materials Research
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• v.28 no.11
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• pp.659-662
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• 2018

We report the properties of infrared photodetectors based on two kinds of quantum dots(QDs): i) 2.0 ML InAs QDs by the Stranski-Krastanov growth mode(SK QDs) and ii) sub-monolayer QDs by $4{\times}[0.3ML/1nm\;In_{0.15}Ga_{0.85}As]$ deposition(SML QDs). The QD infrared photodetector(QDIP) structure of $n^+-n^-(QDs)-n^+$ is epitaxially grown on GaAs (100) wafers using molecular-beam epitaxy. Both the bottom and top contact GaAs layers are Si doped at $2{\times}10^{18}/cm^3$. The QD layers are grown with Si doping of $2{\times}10^{17}/cm^3$ and capped by an $In_{0.15}Ga_{0.85}As$ layer at $495^{\circ}C$. The photoluminescence peak(1.24 eV) of the SML QDIP is blue-shifted with respect to that (1.04 eV) of SK QDIPs, suggesting that the electron ground state of SML QDIP is higher than that of the SK QDIP. As a result, the photoresponse regime(${\sim}9-14{\mu}m$) of the SML QDIP is longer than that (${\sim}6-12{\mu}m$) of the SK QDIP. The dark current of the SML QDIP is two orders of magnitude smaller value than that of the SK QDIP because of the inserted $Al_{0.08}Ga_{0.92}As$ layer.