• Title/Summary/Keyword: Ga doped

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Intersubband absorption in strained Si(110)/SiGe multiple quantum wells (Si(110)/SiGe 다중 양자 우물에서 수직 입사광에 의한 적외선 흡수)

    • Korean Journal of Optics and Photonics
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    • v.10 no.4
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    • pp.306-310
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    • 1999
  • Electron intersubband absorption in Sb $\delta$-doped Si(110)/SiGe multiple quantum well structures is observed. Normally incident light can excite electrons in Si(110) quantum wells, which is not possible for Si(001) or GaAs quantum wells. The influence of Ge composition in SiGe barries is investigated. As the Ge composition in SiGe barriers increases, the absorption strength is decreased and the transition energy is increased. It is verifired by comparing the calculated and experimental results obtained at various incident and polarization angles that normally incident light and parallel incident light are absorbed in different processes.

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Effects of barrier height on electron scattering mechanisms in $\delta-doped$ InAlAs/InGaAs/InAlAs Heterostructures

  • Park, H.S.;Vang, S.J.;Kim, J.I.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.955-959
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    • 2004
  • The effects of conduction band offset on 2 dimensional electron gas (2DEG) in N-InAlAs(AlAsSb)/InGaAs/InAlAs (AlAsSb) metamorphic heterostructures (MMHS) are studied. A combination of the Shubnikov-deHaas oscillations and the Hall measurements is used to investigate the electron transport properties of these structures. The mobility in the second subband is higher than that in the first subband in all heterostructures. This is attributed to the fact that electrons in the first subband we, on average, closer to the interface and are therefore scattered more strongly by ionized impurities. The results suggest that intersubband scattering rate is more dominant in structures with higher conduction band offset whereas alloy scattering is found to be more dominant in the higher band offset system.

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Photoluminescence of the Mn-doped ZnGa₂O₄ Phosphors Prepared by Coprecipitation of Metal Salts

  • 고중곤;박희동;김동표
    • Bulletin of the Korean Chemical Society
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    • v.20 no.9
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    • pp.1035-1039
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    • 1999
  • Manganese-activated zincgallate (Zn1-xMnxGa2O4) phosphor as a green phosphor was readily prepared by coprecipitation in aqueous basic solution of metal salts. The obtained product converted to amorphous zincgallate even at 300℃, followed by crystallization at 1000 ℃. The pyrolyzed phosphor showed fine particle, then reduction treatment at 900 ℃ changed into homogeneous shape with slight grain growth(particle size less than 0.5 mm). The photoluminescence characteristics of the zincgallates have been investigated as a function of dopant concentrations, reducing atmospheres and temperatures. Under UV excitation the phosphors displayed the highest green emission efficiency at 504 nm when the specimen oxidized at 1000 ℃ was reduced at 900 ℃ in a mild hydrogen atmosphere (97% N2, 3% H2) with a flow rate of 100 ml/min.

Direct Imaging of Polarization-induced Charge Distribution and Domain Switching using TEM

  • O, Sang-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.99-99
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    • 2013
  • In this talk, I will present two research works in progress, which are: i) mapping of piezoelectric polarization and associated charge density distribution in the heteroepitaxial InGaN/GaN multi-quantum well (MQW) structure of a light emitting diode (LED) by using inline electron holography and ii) in-situ observation of the polarization switching process of an ferroelectric Pb(Zr1-x,Tix)O3 (PZT) thin film capacitor under an applied electric field in transmission electron microscope (TEM). In the first part, I will show that strain as well as total charge density distributions can be mapped quantitatively across all the functional layers constituting a LED, including n-type GaN, InGaN/GaN MQWs, and p-type GaN with sub-nm spatial resolution (~0.8 nm) by using inline electron holography. The experimentally obtained strain maps were verified by comparison with finite element method simulations and confirmed that not only InGaN QWs (2.5 nm in thickness) but also GaN QBs (10 nm in thickness) in the MQW structure are strained complementary to accommodate the lattice misfit strain. Because of this complementary strain of GaN QBs, the strain gradient and also (piezoelectric) polarization gradient across the MQW changes more steeply than expected, resulting in more polarization charge density at the MQW interfaces than the typically expected value from the spontaneous polarization mismatch alone. By quantitative and comparative analysis of the total charge density map with the polarization charge map, we can clarify what extent of the polarization charges are compensated by the electrons supplied from the n-doped GaN QBs. Comparison with the simulated energy band diagrams with various screening parameters show that only 60% of the net polarization charges are compensated by the electrons from the GaN QBs, which results in the internal field of ~2.0 MV cm-1 across each pair of GaN/InGaN of the MQW structure. In the second part of my talk, I will present in-situ observations of the polarization switching process of a planar Ni/PZT/SrRuO3 capacitor using TEM. We observed the preferential, but asymmetric, nucleation and forward growth of switched c-domains at the PZT/electrode interfaces arising from the built-in electric field beneath each interface. The subsequent sideways growth was inhibited by the depolarization field due to the imperfect charge compensation at the counter electrode and preexisting a-domain walls, leading to asymmetric switching. It was found that the preexisting a-domains split into fine a- and c-domains constituting a $90^{\circ}$ stripe domain pattern during the $180^{\circ}$ polarization switching process, revealing that these domains also actively participated in the out-of-plane polarization switching. The real-time observations uncovered the origin of the switching asymmetry and further clarified the importance of charged domain walls and the interfaces with electrodes in the ferroelectric switching processes.

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3C-SiC/Si 에피층 성장과 Ga 불순물 효과

  • 박국상;김광철;김선중;서영훈;남기석;이형재;나훈균;김정윤;이기암
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1997.10a
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    • pp.141-144
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    • 1997
  • High quality 3C-SiC epilayer was grown on Si(111) at 125$0^{\circ}C$ using chemical vapor deposition(CVD) technique by pyrolyzing tetramethylsilane(TMS). 3C-SiC epilayer was doped by tetramethylgallium(TMGa) during the CVD growth. The crystallinity of 3C-SiC was significantly enhanced by doping the gallium impurity.

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DC Magnetron Sputtering 공정변수에 따른 GxZO박막의 성장 거동

  • Park, Mun-Gi;Seo, Gyeong-Han;Kim, Cheol-U;Yu, Yong-U;Im, Gyeong-Nam;Yu, Sang-Jeon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.92-92
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    • 2009
  • In the present study, impurities doped GxZO thin films were prepared by dc-magnetron sputtering on glass substrate and effect of processing variables on the growth behavior was investigated.

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