• Title/Summary/Keyword: Ga doped

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Fabrication and Characteristization of AlGaAs/InGaAs/GaAs Heterostructure Quantum-Wire FET (AlGaAs/InGaAs/GaAs 이종접합 양자선-FET의 제작 및 특성)

  • 손영진;이봉훈;정문영;정윤하
    • Proceedings of the IEEK Conference
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    • 2000.11b
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    • pp.13-16
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    • 2000
  • A quantum-wire field effect transistor(QW-FET) using asymmetric double InGaAs channel and Si-delta doped barrier has been fabricated. It exhibited good modulation and saturation characteristic in the range of ${\mu}\textrm{A}$ current level. For estimated channel width of 150nm QW-FET, maximum transconductance was about 400 mS/mm which is higher than a conventional heterostructure FET(HFET) with the same epi-structure.

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Band alignments in Al-doped GaInAsSb/GaSb heterojunctions (Al이 도핑된 GaInAsSb/GaSb의 경계면에서의 밴드정렬)

  • Shim, Kyurhee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.6
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    • pp.225-231
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    • 2016
  • The valence band maximum (VBM) and conduction band minimum (CBM) of Al-doped GaInAsSb alloys substrated on GaSb are calculated by using an analytic approximation based on the tight binding method. The relative positions of the VBM and CBM between Al-GaInASSb and GaSb determine band alignement type, valence band offset (VBO) and conductin band offset (CBO) for the heterojunctions. In this study, aluminium doping is assumed to be substituted in the cation site and limited up to 20 % because it can easily oxidize and degrade materials. It is found that the Al-doped alloys exhibit type-II band alignments over the entire composition range and make the band gaps increase, whereas the VBO and CBO decrease. The decreasing rate of VBO is higher than that of CBO, which implies the Al components play a decisive role in controlling electrons at the interface. The Al-dopled GaInAsSb alloy has a direct band gap induced by $E({\Gamma})$ with a considerable distance from the E(L) and E(X), however, $E({\Gamma})$ approaches to E(L) and E(X) in the high Sb concentration (Sb > 0.7-0.8) which might affect the electron mobility and degrade the optical quality.

Effect of Si Doping in Self-Assembled InAs Quantum Dots on Infrared Photodetector Properties (Si 도핑이 InAs 자기조립 양자점 적외선 소자 특성에 미치는 효과)

  • Seo, Dong-Bum;Hwang, Je-hwan;Oh, Boram;Kim, Jun Oh;Lee, Sang Jun;Kim, Eui-Tae
    • Korean Journal of Materials Research
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    • v.29 no.9
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    • pp.542-546
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    • 2019
  • We investigate the characteristics of self-assembled quantum dot infrared photodetectors(QDIPs) based on doping level. Two kinds of QDIP samples are prepared using molecular beam epitaxy : $n^+-i(QD)-n^+$ QDIP with undoped quantum dot(QD) active region and $n^+-n^-(QD)-n^+$ QDIP containing Si direct doped QDs. InAs QDIPs were grown on semi-insulating GaAs (100) wafers by molecular-beam epitaxy. Both top and bottom contact GaAs layer are Si doped at $2{\times}10^{18}/cm^3$. The QD layers are grown by two-monolayer of InAs deposition and capped by InGaAs layer. For the $n^+-n^-(QD)-n^+$ structure, Si dopant is directly doped in InAs QD at $2{\times}10^{17}/cm^3$. Undoped and doped QDIPs show a photoresponse peak at about $8.3{\mu}m$, ranging from $6{\sim}10{\mu}m$ at 10 K. The intensity of the doped QDIP photoresponse is higher than that of the undoped QDIP on same temperature. Undoped QDIP yields a photoresponse of up to 50 K, whereas doped QDIP has a response of up to 30 K only. This result suggests that the doping level of QDs should be appropriately determined by compromising between photoresponsivity and operating temperature.

Structure and optical properties of vapor grown In2O3: Ga nano-/microcrystals

  • Sanchez, Diego Leon;Ramon, Jesus Alberto Ramos;Zaldivar, Manuel Herrera;Pal, Umapada;Rosas, Efrain Rubio
    • Advances in nano research
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    • v.3 no.2
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    • pp.81-96
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    • 2015
  • Octahedral shaped single crystalline undoped and Ga-doped indium oxide nano-and microcrystals were fabricated using vapor-solid growth process. Effects of Ga doping on the crystallinity, defect structure, and optical properties of the nano-/microstructures have been studied using scanning electron microscopy, microRaman spectroscopy, transmission electron microscopy and cathodoluminescence spectroscopy. It has been observed that incorporation of Ga does not affect the morphology of $In_2O_3$ structures due to its smaller ionic radius, and similar oxidation state as that of In. However, incorporation of Ga in high concentration (~3.31 atom %) causes lattice compression, reduces optical band gap and defect induced CL emissions of $In_2O_3$ nano-/microcrystals. The single crystalline Ga-doped, $In_2O_3$ nano-/microcrystals with low defect contents are promising for optoelectronic applications.

Phonon bottleneck effects of InAs quantum dots

  • Lee, Joo-In;Sungkyu Yu;Lee, Jae-Young m;Lee, Hyung-Gyoo
    • Journal of Korean Vacuum Science & Technology
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    • v.4 no.1
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    • pp.27-32
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    • 2000
  • We have studied the carrier relaxation of InAs/GaAs modulation-doped quantum dots depending on the excitation wavelength and modulation-doping concentration by using the time-ressolved spectroscopy. At the excitation below GaAs barrier band gap, the relaxation processes become very slow, implying to observe the phonon bottleneck effects. On the other hand, at the excitation far above GaAs band gap, phonon bottleneck effects are broken down due to Auger processes. Increasing modulation-doping concentration, the relaxation times, by virtue of Coulomb scattering between electrons in GaAs doped layer and carriers in InAs quantum dots, are observed to become fast.

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Monte Carlo Study of Hot-Electron Transport in AlInAs/GaInAs Modulation-Doped Structure (Monte Carlo 모의실험에 의한 AlInAs/GaInAs 변조 도핑 구조에서의 Hot-Electron Transport에 관한 연구)

  • Kim, Choong-Won;Park, Seong-Ho;Kim, Koung-Suk;Han, Baik-Hyung
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.3
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    • pp.79-85
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    • 1990
  • Monte Carlo simulation of hot-electron transport in $Al_{0.48}In_{0.52}As/Ga_{0.47}In_{0.53}$ As modulation-doped structure has been performed in which the nonparabolicity in $\Gamma$ valley is taken into account. The calculated results show that the inclusion of the nonparabolicty effect results in a huge decrease in drift velocity.

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Effect of Si-doping on the luminescence properties of InGaN/GaN green LED with graded short-period superlattice

  • Cho, Il-Wook;Lee, Dong Hyun;Ryu, Mee-Yi;Kim, Jin Soo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.280.1-280.1
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    • 2016
  • Generally InGaN/GaN green light emitting diode (LED) exhibits the low quantum efficiency (QE) due to the large lattice mismatch between InGaN and GaN. The QE of InGaN-based multiple quantum wells (MQWs) is drastically decreased when an emission wavelength shifts from blue to green wavelength, so called "green gap". The "green gap" has been explained by quantum confined Stark effect (QCSE) caused by a large lattice mismatch. In order to improve the QE of green LED, undoped graded short-period InGaN/GaN superlattice (GSL) and Si-doped GSL (SiGSL) structures below the 5-period InGaN/GaN MQWs were grown on the patterned sapphire substrates. The luminescence properties of InGaN/GaN green LEDs have been investigated by using photoluminescence (PL) and time-resolved PL (TRPL) measurements. The PL intensity of SiGSL sample measured at 10 K shows stronger about 1.3 times compared to that of undoped GSL sample, and the PL peak wavelength at 10 K appears at 532 and 525 nm for SiGSL and undoped GSL, respectively. Furthermore, the PL decay of SiGSL measured at 10 K becomes faster than that of undoped GSL. The faster decay for SiGSL is attributed to the increased wavefunction overlap between electron and hole due to the screening of piezoelectric field by doped carriers. These PL and TRPL results indicate that the QE of InGaN/GaN green LED with GSL structure can be improved by Si-doping.

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