• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.1039-1040
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• 2002

For the I-V modeling of sharp tip arrays and nanostructured planar emitters, we propose a new and much practical I-V relation including tip height and radius by considering a statistical distribution of tip radius. Frequently observed nonlinearity of Fowler-Nordheim plot for sharp tip and tip arrays was successfully simulated and then, an application example was provided to extract relevant emission-governing parameters of sharp tip.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.131-132
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• 2000

We prepared Si emitters coated with a MOCVD $CoSi_2$ layer to improve the emission properties. The $CoSi_2$ layer was grown on Si field emitters in situ by reactive chemical-vapor deposition of cyclopentadienyl dicarbonyl cobalt at 600 ${\sim}$ $650^{\circ}C$. The $CoSi_2$ coated field emitters showed enhanced emission properties of current-voltage characteristics, which were due to the increase of emitting area from Fowler-Nordheim plot. And the emission current fluctuation decreased due to the chemically stable surface properties of $CoSi_2$.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.53-54
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• 2000

Measurements of the direct current resistivity, on multiwalled carbon nanotubes(MWNT) for field electron emitter source that had been screen printed in a thick film form were made as a function of temperature T in the range of 1.7K-390K. In this measuring temperature range, the electrical resistivity for the MWNT show that the main contribution to the conductivity comes form carries that hop directly between localized states executing variable range hopping processes. This thick-film form system for large area display showed a high bright light emission as well as very low turn-on field as like an individual MWNT system at room temperature. Furthermore, the electron emission characteristics followed well typical Fowler-Nordheim conduction under the vacuum.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.4
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• pp.296-299
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• 2008

The effects of radio frequency (RF) source power for decoupled plasma nitridation (DPN) process on the electrical properties and Fowler-Nordheim (FN) stress immunity of the oxynitride gate dielectrics for deep nano-technology devices has been investigated. With increase of RF source power, the threshold voltage (Vth) of a NMOS transistor(TR) decreased and that of a PMOS transistor increased, indicating that the increase of nitrogen incorporation in the oxynitride layer due to higher RF source power induced more positive fixed charges. The improved off-current characteristics and wafer uniformity of PMOS Vth were observed with higher RF source power. FN stress immunity, however, has been degenerated with increasing RF source power, which was attributed to the increased trap sites in the oxynitride layer. With the experimental results, we could optimize the DPN process minimizing the power consumption of a device and satisfying the gate oxide reliability.

• KEPCO Journal on Electric Power and Energy
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• v.2 no.2
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• pp.223-225
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• 2016

The newly proposed analysis method using a direct-current current-voltage (DCIV) simulation is introduced for investigating leakage current composing MOS transistor. From comparing the density and location of traps using DCIV method and investigating the leakage current of gate channel transistor, we proposed the graphical analysis method to correlate the DCIV current and leakage mechanism by the traps. And, our graphical method intuitively explains that leakage current in MOS transistor is well correlated with the DCIV current of the MOS transistor arrays due to two kinds of traps created by Fowler-Nordheim (F-N) stress and Hot carrier stress, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.691-692
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• 2009

Screen printable CNT pastes were formulated including conductive nano particles (CNPs) and their properties were investigated with an expectation of stable cold cathodes for advanced lamp application. CNT cathodes showed a turn-on field of 1~1.5V/um, a life time of ~100 hours at an emission current density of 10uA/$cm^2$ for DC-bias. Detailed analysis of measured I-V was carried out by applying Fowler-Nordheim model to trace down the origin of emission property degradation.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2002.05a
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• pp.158-164
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• 2002

본 연구에서는 탄소나노튜브를 직류 바이어스가 인가된 유도결합형 플라즈마 열선 화학기상증착 장치를 이용하여 58$0^{\circ}C$ 이하의 저온에서 유리기판의 변형 없이 수직 배향 시켰다. 탄소나노튜브의 성장을 위해 강화유리기판 위에 전도층으로 Cr을 증착하였고, 그 위에 촉매 층으로 Ni을 순차적으로 RF magnetron cputtering 장치를 이용하여 증착 시켰다. 성장 시 탄소나노튜브의 저온에서의 좋은 특성을 위해 높은 온도에서의 열분해를 목적으로 텅스텐 필라멘트를 이용하였으며, 수직 배향 시키기 위해서 직류 바이어스를 이용하였다. 성장된 탄소나노튜브는 수직적으로 잘 배향 되었으며, 저온에서 좋은 특성을 보였다. 탄소나노튜브의 특성화에는 SEM, TEM을 관찰하였으며, Raman spectroscopy를 이용하여 흑연화도를 측정하였고, 전계방츨 특성은 전류 전압 특성곡선과 Fowler-Nordheim plots를 이용하였다.

• Electrical & Electronic Materials
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• v.6 no.3
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• pp.269-275
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• 1993

미래의 ULSI 소자의 게이트 산화막으로 이용하기 위하여 $N_{2}$O 가스 분위기에서 기존의 전기로를 이용한 실리콘의 열산화에 의해 $N_{2}$O 산화막을 형성하였고 MOS 소자를 제작하여 전기적 특성을 고찰하였다. 900.deg.C에서 90분간 산화한 $N_{2}$O 산화막의 경우, 플랫밴드 전압( $V_{FB}$ ), 고정전하밀도 ( $N_{f}$)와 플랫밴드 전압의 변화량(.DELTA. $V_{FB}$ )은 각각 0.81[V], 6.7x$10^{10}$[$cm^{-2}$]와 80~95[mV]를 나타내었다. $N_{2}$O 산화막의 전기전도기구는 저전계 영역에서는 Fowler-Nordheim 터널링, 고전계영역에서는 Poole-Frenkel 방출이 지배적으로 나타났고 절연파괴전계는 16[MV/cm]로 높게 나타났다. 따라서 $N_{2}$O 산화로 형성된 게이트 산화막이 ULSI소자의 게이트 유전체로 응용이 가능하리라 생각된다..

• Journal of the Korean Ceramic Society
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• v.37 no.1
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• pp.6-11
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• 2000

Electron emission from the Pb(ZrxTi1-x)O3 ferroelectrics by pulsed electric field has been investigated as a function of Zr/Ti ratios such as 35/65, 50/50 and 65/35 below 250kV/cm. Electrons were emitted regardless of the applied field polarity to the rear electrode. When the negative field was applied to the rear electrode, the electron emission charge was more stable. It was proved that the electrons were emitted at the edge of the upper electrode. The emission charge increased in order of 65/35>50/50>35/65. The electron emission characteristics were dependent on the ferroelectric properties such as polarization and coercive field. The emission charge and emission threshold field were affected by the polarization change and the coercive field, respectively. This result explains that the electron emission is a field emission with polarization induced surface potential by a modified Fowler-Nordheim plot of emission charge.

• Proceedings of the KIEE Conference
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• 1996.11a
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• pp.203-205
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• 1996

DLC(Diamond-Like Carbon) films were prepared by Inductively Coupled Plasma(ICP) CVD system. It was confirmed that the field emission characteristics are closely related to the richness of C-H bonding incorporated in the DLC. According to Fowler-Nordheim equation, it is thought that the ability of DLC to emit electron at relatively low voltage is due to the field enhancement caused by the nodules of ${\sim}100nm$ size on the surface of DLC. The electric field to start field emission was about $1.4{\times}10^9V/m$ in case of DLC film deposited at input power of 400W and substrate bias of -100V.