Investigation of PEG(polyethyleneglycol) Removal Mechanism during UV/O2 Gas Phase Cleaning for Silicon Technology (UV/O2 가스상 세정을 이용한 실리콘 웨이퍼상의 PEG 반응기구의 관찰)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.19 no.11
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- pp.985-993
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- 2006