• Title/Summary/Keyword: Focused-ion-beam

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'AMADEUS' Software for ion Beam Nano Patterning and Characteristics of Nano Fabrication ('아마데우스' 이온빔 나노 패터닝 소프트웨어와 나노 가공 특성)

  • Kim H.B.;Hobler G.;Lugstein A.;Bertagonolli E.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.322-325
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    • 2005
  • The shrinking critical dimensions of modern technology place a heavy requirement on optimizing feature shapes at the micro- and nano scale. In addition, the use of ion beams in the nano-scale world is greatly increased by technology development. Especially, Focused ion Beam (FIB) has a great potential to fabricate the device in nano-scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the re-deposition effect due to the sputtered atoms. In recent years, many approaches and research results show that the re-deposition effect is the most outstanding effect to overcome or reduce in fabrication of micro and nano devices. A 2D string based simulation software AMADEUS-2D $(\underline{A}dvanced\;\underline{M}odeling\;and\;\underline{D}esign\;\underline{E}nvironment\;for\;\underline{S}putter\;Processes)$ for ion milling and FIB direct fabrication has been developed. It is capable of simulating ion beam sputtering and re-deposition. In this paper, the 2D FIB simulation is demonstrated and the characteristics of ion beam induced direct fabrication is analyzed according to various parameters. Several examples, single pixel, multi scan box region, and re-deposited sidewall formation, are given.

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The Influence of Parameters Controlling Beam Position On-Sample During Deposition Patterning Process with Focused Ion Beam (빔 위치 관련 제어인자가 집속이온빔 패턴 증착공정에 미치는 영향)

  • Kim, Joon-Hyun;Song, Chun-Sam;Kim, Youn-Jea
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.32 no.3
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    • pp.209-216
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    • 2008
  • The application of focused ion beam (FIB) depends on the optimal interaction of the operation parameters between operating parameters which control beam and samples on the stage during the FIB deposition process. This deposition process was investigated systematically in C precursor gas. Under the fine beam conditions (30kV, 40nm beam size, etc), the effect of considered process parameters - dwell time, beam overlap, incident beam angle to tilted surface, minimum frame time and pattern size were investigated from deposition results by the design of experiment. For the process analysis, influence of the parameters on FIB-CVD process was examined with respect to dimensions and constructed shapes of single and multi- patterns. Throughout the single patterning process, optimal conditions were selected. Multi-patterning deposition were presented to show the effect of on-stage parameters. The analysis have provided the sequent beam scan method and the aspect-ratio had the most significant influence for the multi-patterning deposition in the FIB processing. The bitmapped scan method was more efficient than the one-by-one scan type method for obtaining high aspect-ratio (Width/Height > 1) patterns.

Research on ultra-precision fine-pattern machining through single crystal diamond tool fabrication technology (단결정 다이아몬드공구 제작 기술을 통한 초정밀 미세패턴 가공 연구)

  • Jung, Sung-Taek;Song, Ki-Hyeong;Choi, Young-Jae;Baek, Seung-Yub
    • Design & Manufacturing
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    • v.14 no.3
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    • pp.63-70
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    • 2020
  • As the consumer market in the VR(virtual reality) and the head-up display industry grows, the demand for 5-axis machines and grooving machines using on a ultra-precision machining increasing. In this paper, ultra-precision diamond tools satisfying the cutting edge width of 500 nm were developed through the process research of a focused ion beam. The material used in the experiment was a single-crystal diamond tool (SCD), and the equipment for machining the SCD used a focused ion beam. In order to reduce the influence of the Gaussian beam emitted from the focused ion beam, the lift-off process technology used in the semiconductor process was used. 2.9 ㎛ of Pt was coated on the surface of the diamond tool. The sub-micron tool with a cutting edge of 492.19 nm was manufactured through focused ion beam machining technology. Toshiba ULG-100C(H3) equipment was used to process fine-pattern using the manufactured ultra-precision diamond tool. The ultra-precision machining experiment was conducted according to the machining direction, and fine burrs were generated in the pattern in the forward direction. However, no burr occurred during reverse machining. The width of the processed pattern was 480 nm and the price of the pitch was confirmed to be 1 ㎛ As a result of machining.

Beam Focusing Performance of Electrostatic Lens using SIMION Simulator (SIMION 시뮬레이터를 이용한 정전렌즈의 빔 집속 성능)

  • Oh, Maeng-Ho;Jeong, In-Sung;Lee, Jong-Hang
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.4
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    • pp.128-133
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    • 2009
  • Focused-ion-beam (FIB) system is capable of both machining and measuring in nano-scale; hence nano-scale focusing quality is important. This paper investigates design parameters of two electrostatic lenses in order to achieve the best ion beam focusing performance. Commercial SIMION simulator is used to optimize the dimensions of the condenser and objective lenses and investigate the influence of assembly error on focusing quality The simulation results show that the beam focusing quality is not influenced by angle deviation within ${\pm}0.02\;deg$ and geometrical eccentricity within ${\pm}50$ micrometers.

Control the length of beam trajectory with a quadruple triplet for heavy ion accelerator

  • Wei, Shaoqing;Zhang, Zhan;Lee, Sangjin;Kim, Do Gyun;Kim, Jang Youl
    • Progress in Superconductivity and Cryogenics
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    • v.18 no.4
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    • pp.40-43
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    • 2016
  • Beam trajectory is needed to be controlled in heavy ion accelerator system. Quadruple magnets are widely used in heavy ion accelerator for focusing the transporting particles. A quadruple triplet system which consists of three consecutive quadrupoles, Q1, Q2 and Q3, is used to control beam trajectory at a focused position. Q1 and Q3 have symmetry with respect to Q2. The beam trajectory in magnet system is affected by higher order fields existed in real fields. For quadrupoles, the representation simulation of beam trajectory was carried out to study the beam trajectory and to estimate an effect of higher order field in triplet system. SCALA program was used to simulate the beam trajectory in $Opera^{TM}$. SCALA can analyze a large number of beam trajectories at the same time by adjusting the size of finite element of the emitter. With $Opera^{TM}$ and $Matlab^{TM}$ programs, the position of focused beam spot in quadruple triplet system can be increased or decreased using evolution strategy (ES) method, therefore the length of triplet system can be controlled. Finally, the quadruple triplet system with the appropriate length and expected beam spot range was suggested in this paper.