• 한국전기전자재료학회논문지
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• 제24권12호
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• pp.982-987
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• 2011

In this study, $Ge_8Se_{(2+x)}Te_{(6-x)}$ thin film amorphous-to-crystalline phase-change rate was evaluated in using a nano-pulse scanner. The focused laser beam with a diameter <10 ${\mu}m$ was illuminated in the power (P) and pulse duration (t) ranges of 1-31 mW and 10-460 ns, respectively, with subsequent detection of the responsive signals reflected from the film surface. We also evaluated the material characteristics, such as optical absorption and energy gap, crystalline phases, and sheet resistance of as-deposited and annealed films. The result of experiments showed that the thermal stability of the Ge-Se-Te film is largely improved by adding Se.

• Applied Microscopy
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• 제41권2호
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• pp.81-88
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• 2011

최근 나노 영역에서의 구조분석과 조성분석의 중요성이 증대되고 있으나, 기존의 분석장비들은 한계에 부딪히고 있다. 최근 개발된 APT는 nm 이하의 공간분해능과 수십 ppm수준의 detection limit으로 원소의 3차원분포와 조성정보를 제공해 주는 분석장비로서, 이러한 기존 분석의 한계를 극복할 수 있는 새로운 분석장비이다. 그러나 국내에는 아직 잘 알려지지 않아 활용이 미비한 실정이다. 따라서, 본 논문에서는 APT에 대한 이해를 돕기 위해 APT분석의 원리와 시편준비에 대해 소개하였다.

• 한국정밀공학회지
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• 제25권1호
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• pp.138-144
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• 2008

Micro-machining of a brittle material such as glass, silicon, etc., is important in micro fabrication. Particularly, micro-abrasive jet machining (${\mu}-AJM$) has become a useful technique for micro-machining of such materials. The ${\mu}-AJM$ process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particle. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the ${\mu}-AJM$ process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the ${\mu}-AJM$. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Two kinds of mask patterns were fabricated using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer were conducted successfully.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.617-620
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• 1999

In this study, the polarization e(fecal and the birefringence effect of amorphous germanium (a-Ge) thin films were investigated by using linearly polarized He-Ne laser beam. The a-7e thin films were deposited on the quarts substrate by plasma enhanced chemical vapor deposition (PECVD) and thermal vacuum evaporation In order to obtain the optimum grating arrays, inorganci resists such as Si$_3$N$_4$ and a-Se$_{75}$ Ge$_{25}$ , were prepared with the optimized thickness by Monte Carlo (MC) simulation. As the results of MC simulation, the thickness ofa-Se$_{75}$ Ge$_{25}$ resist was determined with Z$_{min}$ of 360$\AA$ . The resists were exposed to Ga$^{+}$-FIB with accelerating energies of 50 keV, developed by wet etching, and a-Ge thin film was etched by reactive ion-etching (RIE). Finally, we were obtained grating arrays which grating width and linewidth are 0.8${\mu}{\textrm}{m}$, respectively and we studied the polarization and birefringence effect in transmission grating array made of high refractive amorphous material, and the applicability as waveplates and polarizers in optical device.e.e.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1155-1158
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• 2005

Micro-stereolithography is a newly proposed technology as a means that can fabricate a 3D micro structure of free form. It makes a 3D micro-structure by dividing the shape into many slices of relevant thickness along horizontal surfaces, hardening each layer of slice with a focused laser beam, and stacking them up to a desired shape. However, we do not anticipate the electric conductivity of the final product at the existing micro-stereolithography. The reason is that this technology uses polymer to make the product. Thus the new suspension which was mixed conventional photopolymer with metal powder was developed in this study. The developed suspensions were based on SL5180 which is commercialized resin and IMS03 that is made in our laboratory. And Triton X-100 was added at the suspension for getting the scattering effect and stabilizing effect. The layer recoating device was developed to be flat the mixed high viscosity suspension. A 3D micro structure was manufactured by using recoating system and micro-stereolithography system. The fabricated product was sintered to get the electric conductivity. After sintering, a pure copper product was made. In this study, new process was developed by making metal micro structure having an electric conductivity. This technology broadened the realm of the micro-stereolithography technology. And it will be applied to make the 3D micro structure of free form which has a high hardness and an electric conductivity in the near future.

• 한국정밀공학회지
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• 제26권7호
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• pp.44-50
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• 2009

High-pressured jetting is now widely used in the advanced cutting processes of polymers, metals, glass, ceramics and composite materials because of some advantages such as heatless and non-contacting cutting. Similarly to the focused laser beam machining, it is well known as a type of high-density energy processes. High-pressured jetting is going to be developed not only to minimize the cutting line width but also to achieve the short cutting time as soon as possible. However, the interaction behavior between a work piece and high-velocity abrasive particles during the high-pressured jet cutting makes the impact mechanism even more complicated. Conventional high-pressured jetting is still difficult to apply to precision cutting of micro-scaled thin work piece such as thin metal sheets, thin ceramic substrates, thin glass plates and TMM (Thin multi-layered materials). In this paper, we proposed the advanced high-pressured jetting technology by introducing a new abrasives supplying method and investigated the optimal process conditions of the cutting pressure, the cutting velocity and SOD (Standoff distance).