• E2M - 전기 전자와 첨단 소재
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• 제8권2호
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• pp.217-223
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• 1995

In this paper, we investigated physical properties and electrical characteristics of the fluorocarbon that used as coolants for large power gas-insulated transformer. Volume resistivity of the fluorocarbon was .rho.=1.87*10$^{15}$ [.ohm.cm] at 1 atm, 27.deg. C. Dielectric constant was 1.86 and decreases as temperature increase. The breakdown voltage at 1 atm was higher than that of transformer oil. The breakdown voltage of fluorocarbon vapor was about 18kV when pressure in a test chamber increases over lkg/cm$^{2}$. When fluorocarbon was mixed with SF$_{6}$ gas, breakdown voltage of the mixed was higher than that of fluorocarbon. Then fluorocarbon leads to increase over 4kg/cm$^{2}$ in pressure as temperature increase. Therefore, when a gas-insulated transformer is manufactured, the design must be taken into consideration a high-pressure.

• 한국세라믹학회지
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• 제49권4호
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• pp.328-332
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• 2012

Etch rates of Si and high purity SiC have been compared for various fluorocarbon plasmas. The relative plasma resistance of SiC, which is defined as the etch rate ratio of Si to SiC, varied between 1.4 and 4.1, showing generally higher plasma resistance of SiC. High resolution X-ray photoelectron analysis revealed that etched SiC has a surface carbon content higher than that of etched Si, resulting in a thicker fluorocarbon polymer layer on the SiC surface. The plasma resistance of SiC was correlated with this thick fluorocarbon polymer layer, which reduced the reaction probability of fluorine-containing species in the plasma with silicon from the SiC substrate. The remnant carbon after the removal of Si as volatile etch products augments the surface carbon, and seems to be the origin of the higher plasma resistance of SiC.

• Korean Chemical Engineering Research
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• 제59권2호
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• pp.254-259
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• 2021

고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성을 소스파워와 압력을 변화하며 분석하였다. 고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 F/C 비율은 2단계 증착 메커니즘의 작용으로 소스파워가 증가할수록 증가하였고 압력이 증가할수록 감소하였다. 고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 F/C 비율 변화는 불화탄소막의 광학적 및 전기적 특성 변화에 직접적으로 영향을 끼쳤다. 즉, 불화탄소막의 굴절률은 F/C 비율 변화 양상과는 달리 소스파워가 증가할수록 감소하였고 압력이 증가할수록 증가하였는데 이는 F/C 비율이 증가할수록 전자분극작용이 억제되고 불화탄소막의 망상조직이 약화되어 굴절률이 감소하기 때문이었다. 불화탄소막의 비저항은 F/C 비율 변화와 같이 소스파워가 증가할수록 증가하였고 압력이 증가할수록 감소하였는데 이는 F/C 비율이 증가할수록 주변 전자들을 반발하려는 경향이 강해져서 비저항이 증가하기 때문이었다. 고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 F/C 비율 조절로 불화탄소막의 광학적 및 전기적 특성을 직접적으로 변화할 수 있으므로 불화탄소막이 반도체소자제조공정에서 저 유전상수 물질 대체용으로 가능할 수 있음이 예상된다.

• 한국염색가공학회지
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• 제24권3호
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• pp.173-179
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• 2012

Silk fabric treated with fluorocarbon resins (Asahi Guard AG-7005 and AG-E061) were washed and subsequently heat treated varying the washing cycles and the temperature. After the processing, the water and oil repellencies, and contact angle to water were evaluated. The water and oil repellencies decreased by the washing and recovered by following heat treatment. Also ESCA measurement was carried out to investigate the surface chemical composition of the treated fiber. The $F_1s$ intensity of the treated fabric decreased by the washing and recovered by the subsequent heat treatment. On the other hand, the $O_1s$ intensity increased by the washing and decreased by following heat treatment. From the results, it is clear that change of the water and oil repellencies of the silk fabric treated with fluorocarbon resin occurred by the washing and subsequent heat treatment. Considering a change of the water repellency of the silk fabric treated with fluorocarbon resin, it seems likely that the fluoroalkyl group of the fluorocarbon resin rotates from surface to inside of the fiber by the washing to adapt to the hydrophilic circumstance, and the orientation of the fluoroalkyl groups of the resin disturbed by the washing recovers the orientation to the fiber surface after the subsequent heat treatment.

• 한국전기전자재료학회논문지
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• 제11권6호
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• pp.472-476
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• 1998

The surface reactions of silica film($SiO_2-P_2O_5-B_2O_3-GeO_2$) with fluorocarbon plasma has been studied by using angle -resolved x-ray photoelectron spectroscopy(XPS). It has been confirmed that residual carbon consists of C-C and C-CFx bonds and fluorine mainly binds silicon in the case of etched silica by using $CF_4$ gas plasma. The surface reaction of silica with various fluorocarbon gases, such as $CF_4,C_2F_6 and CHF_3$ were investigated. XPS results showed that though the etching gases were changed, the elements and binding states of the residual layers on the etched silica by using various fluorocarbon gas plasma were nearly the same . This seems to be due to the high volatility of byproducts, that is, $SiF_4 and CO_2$ etc..

• 대한전기학회:학술대회논문집
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• 대한전기학회 1993년도 하계학술대회 논문집 B
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• pp.1165-1167
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• 1993

• 마이크로전자및패키징학회지
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• 제7권1호
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• pp.35-40
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• 2000

Teflon-like fluorocarbon thin film was deposited on various substrates by vapor deposition using PFDA (perfluorodecanoic acid). The fluorocarbon films were characterized by static/dynamic contact angle analysis, VASE (Variable-angle Spectroscopic Ellipsometry) and AFM/LFM (Atomic/Lateral Force Microscopy). Based on Lewis Acid/Base theory, the surface energy ($S_{E}$) of the films was calculated by the static contact angle measurement. The work of adhesion (WA) between de-ionized water and substrates was calculated by using the static contact data. The fluorocarbon films showed very similar values of the surface energy and work of adhesion to Teflon. All films showed larger hysteresis than that of Teflon. The roughness and relative friction force of films were measured by AFM and LFM. Even though the small reduction of surface roughness was found on film on $SiO_2$surface, the large reduction of relative friction farce was observed on all films. Especially the relative friction force on TEOS was decreased a quarter after film deposition. LFM images showed the formation of "strand-like"spheres on films that might be the reason far the large contact angle hysteresis.

• Journal of Industrial and Engineering Chemistry
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• 제67권
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• pp.72-79
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• 2018

Hybrid F2HX surfactants bearing a sulfate moiety and both hydrocarbon and fluorocarbon chains were prepared by the reaction of alkyl glycidyl ethers with fluoro-alcohol, and subsequent sulfation. The fluorocarbon number in F2HX was fixed at the shortest number possible (i.e., 2), while the hydrocarbon number (X) in the second chain was varied between 2, 4, 6, and 8. Their surface-active properties and emulsion stabilities were systematically estimated as a function of the X. Among them, F2H8 exhibited the optimal surfactant performance, which was comparable to previously reported surfactants and it was successfully applied in the emulsion polymerization of vinylidene fluoride.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 D
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• pp.1535-1537
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• 1999

Photochemical defluorination and substitution of fluorocarbon-resin surfaces using a pulsed Nd:YAG laser(266 nm) and copper-sulfate$(CuSO_4)$ aqueous solution were discussed. Interface of copper nuclei and fluorocabon-resin was chemically bonded through oxygen which was photodissociated from water in copper-sulfate aqueous solution under the laser irradiation. The reaction mechanism for chemical surface modification is discussed on the basis of x-ray photoelectron spectroscopy and atomic force microscope analyses.

• E2M - 전기 전자와 첨단 소재
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• 제9권5호
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• pp.483-489
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• 1996

Power transformer have many unsymmetrical structure and electric field is enhanced in that area. Those unsymmetrical area are not covered oftenly by solid insulating material which is used as a framework specially in gas transformer. By that result there is a possibility to decrease the total insulation class of the transformer. So in this study the electrical characteristic of $FC+SF_6$ mixture gas which is used as coolants for large power gas insulated transformer and its effects on electrical characteristics of structural material are investigated. Also breakdown characteristic with the tension of taping and curvature of the coil are studied which could be used as a design factor of large power transformer.