• Electrical & Electronic Materials
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• v.8 no.2
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• pp.217-223
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• 1995

In this paper, we investigated physical properties and electrical characteristics of the fluorocarbon that used as coolants for large power gas-insulated transformer. Volume resistivity of the fluorocarbon was .rho.=1.87*10$^{15}$ [.ohm.cm] at 1 atm, 27.deg. C. Dielectric constant was 1.86 and decreases as temperature increase. The breakdown voltage at 1 atm was higher than that of transformer oil. The breakdown voltage of fluorocarbon vapor was about 18kV when pressure in a test chamber increases over lkg/cm$^{2}$. When fluorocarbon was mixed with SF$_{6}$ gas, breakdown voltage of the mixed was higher than that of fluorocarbon. Then fluorocarbon leads to increase over 4kg/cm$^{2}$ in pressure as temperature increase. Therefore, when a gas-insulated transformer is manufactured, the design must be taken into consideration a high-pressure.

• Journal of the Korean Ceramic Society
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• v.49 no.4
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• pp.328-332
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• 2012

Etch rates of Si and high purity SiC have been compared for various fluorocarbon plasmas. The relative plasma resistance of SiC, which is defined as the etch rate ratio of Si to SiC, varied between 1.4 and 4.1, showing generally higher plasma resistance of SiC. High resolution X-ray photoelectron analysis revealed that etched SiC has a surface carbon content higher than that of etched Si, resulting in a thicker fluorocarbon polymer layer on the SiC surface. The plasma resistance of SiC was correlated with this thick fluorocarbon polymer layer, which reduced the reaction probability of fluorine-containing species in the plasma with silicon from the SiC substrate. The remnant carbon after the removal of Si as volatile etch products augments the surface carbon, and seems to be the origin of the higher plasma resistance of SiC.

• Korean Chemical Engineering Research
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• v.59 no.2
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• pp.254-259
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• 2021

Optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma under various source powers and pressures were investigated. The F/C ratio of the fluorocarbon film deposited in a high-density C4F8 plasma increased with increasing source power and decreasing pressure due to two-step deposition mechanism. The change in the F/C ratio of the film directly affected the optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma. The refractive index of the fluorocarbon film increased with decreasing source power and increasing pressure contrary to the dependence of the film's F/C ratio on the source power and pressure. This was because the increase in the F/C ratio suppressed electronic polarization and weakened the network structures of the film. The resistivity of the fluorocarbon film showed the same behavior as its F/C ratio. In other words, the resistivity increased with increasing source power and decreasing pressure, resulting from stronger repellence of electrons at higher F/C ratios. This work offers the feasibility of the use of the fluorocarbon films deposited in a high-density C4F8 plasma as an alternative to low dielectric constant materials because the optical and electrical properties of the fluorocarbon film can be directly controlled by its F/C ratio.

• Textile Coloration and Finishing
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• v.24 no.3
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• pp.173-179
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• 2012

Silk fabric treated with fluorocarbon resins (Asahi Guard AG-7005 and AG-E061) were washed and subsequently heat treated varying the washing cycles and the temperature. After the processing, the water and oil repellencies, and contact angle to water were evaluated. The water and oil repellencies decreased by the washing and recovered by following heat treatment. Also ESCA measurement was carried out to investigate the surface chemical composition of the treated fiber. The $F_1s$ intensity of the treated fabric decreased by the washing and recovered by the subsequent heat treatment. On the other hand, the $O_1s$ intensity increased by the washing and decreased by following heat treatment. From the results, it is clear that change of the water and oil repellencies of the silk fabric treated with fluorocarbon resin occurred by the washing and subsequent heat treatment. Considering a change of the water repellency of the silk fabric treated with fluorocarbon resin, it seems likely that the fluoroalkyl group of the fluorocarbon resin rotates from surface to inside of the fiber by the washing to adapt to the hydrophilic circumstance, and the orientation of the fluoroalkyl groups of the resin disturbed by the washing recovers the orientation to the fiber surface after the subsequent heat treatment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.6
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• pp.472-476
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• 1998

The surface reactions of silica film($SiO_2-P_2O_5-B_2O_3-GeO_2$) with fluorocarbon plasma has been studied by using angle -resolved x-ray photoelectron spectroscopy(XPS). It has been confirmed that residual carbon consists of C-C and C-CFx bonds and fluorine mainly binds silicon in the case of etched silica by using $CF_4$ gas plasma. The surface reaction of silica with various fluorocarbon gases, such as $CF_4,C_2F_6 and CHF_3$ were investigated. XPS results showed that though the etching gases were changed, the elements and binding states of the residual layers on the etched silica by using various fluorocarbon gas plasma were nearly the same . This seems to be due to the high volatility of byproducts, that is, $SiF_4 and CO_2$ etc..

• Proceedings of the KIEE Conference
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• 1993.07b
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• pp.1165-1167
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• 1993

• Journal of the Microelectronics and Packaging Society
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• v.7 no.1
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• pp.35-40
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• 2000

Teflon-like fluorocarbon thin film was deposited on various substrates by vapor deposition using PFDA (perfluorodecanoic acid). The fluorocarbon films were characterized by static/dynamic contact angle analysis, VASE (Variable-angle Spectroscopic Ellipsometry) and AFM/LFM (Atomic/Lateral Force Microscopy). Based on Lewis Acid/Base theory, the surface energy ($S_{E}$) of the films was calculated by the static contact angle measurement. The work of adhesion (WA) between de-ionized water and substrates was calculated by using the static contact data. The fluorocarbon films showed very similar values of the surface energy and work of adhesion to Teflon. All films showed larger hysteresis than that of Teflon. The roughness and relative friction force of films were measured by AFM and LFM. Even though the small reduction of surface roughness was found on film on $SiO_2$surface, the large reduction of relative friction farce was observed on all films. Especially the relative friction force on TEOS was decreased a quarter after film deposition. LFM images showed the formation of "strand-like"spheres on films that might be the reason far the large contact angle hysteresis.

• Journal of Industrial and Engineering Chemistry
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• v.67
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• pp.72-79
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• 2018

Hybrid F2HX surfactants bearing a sulfate moiety and both hydrocarbon and fluorocarbon chains were prepared by the reaction of alkyl glycidyl ethers with fluoro-alcohol, and subsequent sulfation. The fluorocarbon number in F2HX was fixed at the shortest number possible (i.e., 2), while the hydrocarbon number (X) in the second chain was varied between 2, 4, 6, and 8. Their surface-active properties and emulsion stabilities were systematically estimated as a function of the X. Among them, F2H8 exhibited the optimal surfactant performance, which was comparable to previously reported surfactants and it was successfully applied in the emulsion polymerization of vinylidene fluoride.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1535-1537
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• 1999

Photochemical defluorination and substitution of fluorocarbon-resin surfaces using a pulsed Nd:YAG laser(266 nm) and copper-sulfate$(CuSO_4)$ aqueous solution were discussed. Interface of copper nuclei and fluorocabon-resin was chemically bonded through oxygen which was photodissociated from water in copper-sulfate aqueous solution under the laser irradiation. The reaction mechanism for chemical surface modification is discussed on the basis of x-ray photoelectron spectroscopy and atomic force microscope analyses.

• Electrical & Electronic Materials
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• v.9 no.5
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• pp.483-489
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• 1996

Power transformer have many unsymmetrical structure and electric field is enhanced in that area. Those unsymmetrical area are not covered oftenly by solid insulating material which is used as a framework specially in gas transformer. By that result there is a possibility to decrease the total insulation class of the transformer. So in this study the electrical characteristic of $FC+SF_6$ mixture gas which is used as coolants for large power gas insulated transformer and its effects on electrical characteristics of structural material are investigated. Also breakdown characteristic with the tension of taping and curvature of the coil are studied which could be used as a design factor of large power transformer.