• 반도체디스플레이기술학회지
• /
• 제12권1호
• /
• pp.47-51
• /
• 2013

The screen printing is a process that is widely used in manufacturing process of various fields such as flexible devices, portable multimedia devices, OLED, and the solar cell. The screen printing method has been studied as a method for forming the high precision micro-pattern, making the low-cost manufacturing process and reducing cost through improvement of productivity. It is applicable to deposit and forming the pillars which are one of the core element for comprising vacuum glazing. In this paper, by using the paste of the glass frit base, the screen printing was performed. We analyzed the effect for the printing process to deposit pillar paste on the screen printing parameters by the factorial experimental design. The polynomial predicting the volume of the printed supporting pillars was drawn by using screen printing.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
• /
• pp.892-896
• /
• 2005

In this paper, key issues of stainless steel foil substrates for display applications have been described. We studied and analyzed technical issues on substrate passivation/planarization to control surface roughness and capacitive coupling from conductive substrates. A thick (either multiple or single) passivation/planarization layer needs to be applied on the nonelectronic-grade stainless steel substrate to provide a smooth surface and electrical insulation from the conductive substrate. Especially for large size, high-resolution display applications, low k and thick passivation/planarization layers should be used for appropriate capacitive coupling. Based on our initial study, a unit area capacitance of less than $2nF/cm^2$ of passivation/planarization layers is needed for 32" HD TV OLED displays.

• 진공이야기
• /
• 제1권2호
• /
• pp.19-23
• /
• 2014

Transparent and top emission organic light-emitting device (OLEDs) are the important issues in realizing new display applications such as see-through electronic displays, and flexible displays. The cathode of the transparent and top emission OLEDs should be transparent in the visible light and should not give any damage to the underlying organic layers, in addition to its intrinsic role of injecting electrons into the organic layers. Several authors have investigated the transparent conducting oxide films prepared by sputtering methods. They have introduced the sophisticated sputtering process for reducing the damages. Other groups have developed thermally evaporated transparent cathodes which are believed to be damage free without causing any permanent defect to the organic layers. This review focuses on the vacuum evaporated damage free transparent cathodes.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.222.1-222.1
• /
• 2014

Flexible device 및 OLED 디스플레이 제조를 위한 산화물 반도체 보호막 증착 및 encapsulation 공정을 위해 균일한 대면적 플라즈마를 만들기 위한 다양한 연구가 진행되고 있다. 초고주파 플라즈마는 고밀도, 고효율의 플라즈마를 저진공에서 쉽게 생성시킬 수 있고 다양한 전력결합방법을 통해 대면적 확장성이 우수한 장점이 있다. 본 연구에서는 TEM 웨이브가이드로 파워가 전달되는 선형 초고주파 플라즈마 소스에 대한 2차원축대칭 유체 시뮬레이션을 수행하였다. Ar 가스 압력과 초고주파 입력전력이 증가함에 따라 전자밀도가 증가하였고 도파관 방향으로 플라즈마의 길이가 증가함이 관측되었다. Quartz Tube 표면 가까이에서 전자밀도가 가장 높게 나타났다. 전자의 에너지 손실 채널중 가장 많은 부분을 차지하는 것은 여기종 생성에 따른 에너지 손실이었으며 탄성 충돌에 의한 에너지 손실이 두 번째로 큰 부분을 차지하였다.

• 한국재료학회지
• /
• 제17권7호
• /
• pp.352-357
• /
• 2007

Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2018년도 춘계학술대회 논문집
• /
• pp.50.1-50.1
• /
• 2018

산화물 반도체 기반 박막 트랜지스터가 국내에서 본격적으로 연구 개발 된 지 10년 만에 대면적 OLED TV에 적용되었다. 전기적인 신뢰성뿐만 아니라, 광학적 신뢰성도 검증되어, 앞으로 산업계에서 그 적용 확대가 기대되고 있는 상황이다. 그렇지만, 향후 큰 성장이 예상되는 고해상도 플렉시블 디스플레이에 적용 가능한 높은 수준의 전기적 특성뿐만 아니라, 저온공정도 만족시킬 수 있는 박막 트랜지스터 개발이 필요한 실정이다. 이러한 측면에서 LTPS, 유기물 박막 트랜지스터에 비해, 산화물 박막 트랜지스터는 250도 이하의 저온공정에서도 고이동도 및 고신뢰성을 확보할 수 있는 좋은 대안이 될 수 있을 것이다. 본 강연에서는 플렉시블 기판에 적용 가능한 산화물 박막 트랜지스터 기술 및 개발 동향에 대해 발표할 예정이다.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
• /
• pp.692-696
• /
• 2005

In an attempt to fabricate all inclusive display systems we are presenting a study on several elements that would be used as building blocks for all-on-board integrated applications on stainless steel foils. These systems would include in the same substrate all or many of the components needed to drive a flat panel OLED display. We are reporting results on both digital and analog circuits on stainless steel foils. Shift registers running at speeds greater than 1.0MHz are shown as well as oscillators operating at over 40MHz. Pixel circuits for driving organic light emitting diodes are presented. The device technology of choice is that based on poly-silicon TFT technology as it has the potential of producing circuits with good performance and considerable cost savings over the established processes on quartz or glass substrates (amorphous Silicon a-Si:H or silicon on Insulator SOI).

• 한국전기전자재료학회논문지
• /
• 제20권2호
• /
• pp.162-166
• /
• 2007

The ITO thin films were prepared by facing targets sputtering (FTS) system on polycarbonate (PC) substrate. The ITO thin films were deposited with a film thickness of 100 nm at room temperature. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measure. The electrical and optical characteristics of the ITO thin films were evaluted by Hall Effect Measurement (EGK) and UV/VIS spectrometer (HP), respectively. From the results, the ITO thin films was deposited with a resistivity $8{\times}10^{4}\;{\Omega}-cm$ and transmittance over 80 %.

• 반도체디스플레이기술학회지
• /
• 제4권4호
• /
• pp.5-8
• /
• 2005

In this study, we prepared the ITO thin film for TOLED(Top-emitting OLED) or flexible display at room temperature using the FTS(Facing Targets Sputtering Apparatus). We observed characteristics of deposited thin films as a function of sputtering conditions. XRD patterns were independence trom oxygen gas flow and input current. But electrical and optical properties were strongly dependence. In the results, we could prepare good properties of ITO thin films resistivity of $4.27X10^{-4}[\Omega-cm]$, transmittance of over 80% at working gas pressure 1[mTorr], input current 0.6[A], oxygen gas ratio 0.3[sccm], at room temperature.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
• /
• pp.106-107
• /
• 2011

Organic Light Emitting Diode(OLED), Optical Photovotaic Device(OPV)와 같은 유기소자에서 전극으로 적용되어지고 있는 Indium Tin Oxide (ITO) 박막의 유연성을 향상시키기 위하여 중간층으로 투명도(~80%)와 전도도(~1000 S/cm)가 우수한 PEDOT:PSS(PH1000)을 적용하였다. PEDOT:PSS(PH1000)의 적용으로 인하여 ITO 박막의 유연성이 현저히 개선됨과 동시에 PEDOT:PSS(PH1000)의 우수한 전도도로 인하여 보다 얇은 ITO의 두께에서도 우수한 면 저항(25 ${\Omega}/{\square}$ ~ 220 ${\Omega}/{\square}$) 및 비저항(3.75E-4 ${\Omega}{\cdot}cm$ ~ 4.40E-4 ${\Omega}{\cdot}cm$)의 값을 측정하였다.