• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 춘계종합학술대회
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• pp.88-92
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• 2003

본 논문에서는 Al 하부전극 상에서 RF magnetron sputtering 기술을 이용한 ZnO 박막 증착 및 공정온도가 ZnO 결정성장에 미치는 영향을 고려하여 제작한 FBAR 소자에 대한 연구를 발표한다. 결과적으로, 20$0^{\circ}C$의 공정온도에서 주상형 결정립(columnar grain)을 가지고 c축 우선 배향된 ZnO 박막을 얻을 수 있었다. 이렇게 얻은 ZnO 박막을 FBAR 소자에 적용하여 제작한 결과, 2.05GHz의 공진 주파수에서 ~19.5dB의 반사손실을 보였다.

• 전기학회논문지
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• 제56권5호
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• pp.905-909
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• 2007

Crystalline and micro-structural characteristics of ZnO thin films which were deposited on p-Si(100) with cooling naturally down of pre-heated substrate during RF magnetron sputter deposition, were investigated by XRD and SEM in this paper. The film which was prepared on the substrate which was pre-heated to $400^{\circ}C$ before deposition and then cooled naturally down during deposition, showed the most outstanding c-axis preferred orientation. The ZnO thin film having the best crystalline result were applied to SMR type FBAR device and resonance properties of the device were investigated by network analyzer. It showed that resonance frequency was 2.05 GHz, return loss was -30.64 dB, quality factor was 3169 and electromechanical coupling factor was 0.4 %. This deposition method would be very useful for application of surface acoustic wave filter or film bulk acoustic wave resonator.

• 한국세라믹학회지
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• 제38권11호
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• pp.980-986
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• 2001

5.2GHz 중심 주파수를 갖는 Bragg reflector형 FBAR를 제작하여 주파수 응답 특성을 측정하고, 공진기 구조에서 각 층의 탄성 손실(acoustic loss)을 고려한 주파수 응답의 수치적 계산을 통해서 그 특성을 분석하였다. W과 $SiO_2$쌍을 선택하여 RF sputtering법으로 총 9층의 Bragg reflector를 제작하였고, 공진기의 압전층으로 pulsed dc 전원에 의한 sputtering법으로 AlN과 Al 전극을 증착하여 제작하였다. 제작된 공진기의 반사손실( $S_{11}$)은 중심주파수 5.38GHz에서 12dB이었고 직렬 공진 주파수( $f_{s}$)는 5.376GHz, 병렬 공진 주파수 ( $f_{p}$)는 5.3865GHz로 관찰되었다. 공진기의 성능지수인 유효 전기기계결합계수( $K_{ef{f^2}}$)값이 약 0.48%, 품질계수 ( $Q_{s}$) 값이 411이었다. 수치적으로 계산된 주파수 응답 특성으로부터 AlN 박막의 acoustic 상수들과 Bragg reflector의 반사계수를 도출한 결과 AlN 박막의 material acoustic impedance와 wave velocity는 AlN 고유의 값보다 감소되었으며, AlN 박막의 전기기계 결합계수( $K^2$)값은 c축 배향성 저하에 의해 매우 작은 값(0.49%)을 가졌다. 주파수 대역에서 Bragg reflector의 반사계수는 약 0.99966으로 계산되었으며 약 2.5 GHz에서 9.5 GHz까지의 넓은 반사대역을 나타내었다.다.었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1414-1415
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• 2006

Air-gap type film bulk acoustic wave resonator device using ZnO for piezoelectric layer and sacrifice layer, deposited by RF magnetron sputter with various conditions, fabricated in this study. Also, membrane$(SiO_2)$ and top and bottom electrode(both Al) of piezoelectric layer deposited by RF magnetron sputter. Using micro electro mechanical systems(MEMS) technique, sacrifice layer removed and then air-gap formed. The results of each process checked by XRD, AFM, SEM to obtain good quality device.

• 한국전기전자재료학회논문지
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• 제20권11호
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• pp.965-968
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• 2007

In this study we investigated the variation of the substrate temperatures using RF sputtering to identify the effect on the structure and electrical properties by c-axis orientation of ZnO thin film. ZnO thin films were prepared on Al/Si substrate. In our experimental results, ZnO thin film at $300^{\circ}C$ was well grown with (002) peak of ZnO thin film, the thin film showed the high resistivity with the value of $5.9{\times}10^7\;{\Omega}cm$ and the roughness with 27.06 nm. As increased the substrate temperatures, the grain size of ZnO thin films was increased. From these results, we could confirm the suitable substrate temperature of ZnO thin films for FBAR(film bulk acoustic resonator).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.151-154
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• 2003

AlN/Al/SiO$_2$/Si thin films for application to FBAR(Film Bulk Acoustic Resonator) devices were prepared by FTS(Facing Targets sputtering system) apparatus which provides a stable discharge at low gas pressures and can deposit high quality thin films because of the substrate located apart from the plasma. The AlN thin films were deposited on a $SiO_2(1{\mu}m)/Si(100)$ substrate using an Al bottom electrode. The process parameters were fixed such as sputering power of 200W, working pressures of 1mTorr and AlN thin film thickness of 800nm, respectively and crytallographic characteristics of AlN thin films were investigated as a function of $N_2$ gas flow rate$[N_2/(N_2+Ar)]$. Thickness of AlN thin films were measured by $\alpha$-step, the crystallographic characteristics and c-axis preferred orientation were evaluated by XRD.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1523-1525
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• 2003

Due to the rapid development of wireless networking system, researches on the communication devices are mainly focus on microwave frequency devices such as filters, resonators, and phase shifters. Among them, Film bulk acoustic resonator (FBAR) has been paid extensive attentions for their high performance. In this research, ZnO thin films were deposited by RF-magnetron sputtering on Al/$SiO_2$/Si wafer and then crystalline properties and surface morphology were examined. To measure crystalline structure and surface morphology X-ray diffraction (XRD) and Scanning Electron Microscope (SEM) were employed. It was showed that crystalline properties of ZnO thin films were strongly dependant on the deposition conditions. As increasing the deposition temperature and the deposition pressures, the peak intensities of ZnO(002) plane were increased until $300^{\circ}C$, then decreased rapidly. At the sputtering conditions of RF power of 213 W and working pressure of 15 m Torr, ZnO film had excellent c-axis orientation, surface morphology, and adhesion to the substrate. In conclusion we optimized smooth surface with very small grains as well as highly c-axis oriented ZnO film for FBAR applications.

• ETRI Journal
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• 제36권2호
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• pp.317-320
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• 2014

A balanced RF duplexer with low interference in an extremely narrow bandgap is proposed. The Long-Term Evolution band-7 duplexer should be designed to prevent the co-existence problem with the WiFi band, whose fractional bandgap corresponds to only 0.7%. By implementing a hybrid bulk acoustic wave (BAW) structure, the temperature coefficient of frequency (TCF) value of the duplexer is successfully reduced and the suppressed interference for the narrow bandgap is performed. To achieve an RF duplexer with balanced Rx output topology, we also propose a novel balanced BAW Rx topology and RF circuit block. The novel balanced Rx filter is designed with both lattice- and ladder-type configurations to ensure excellent attenuation. The RF circuit block, which is located between the antenna and the Rx filter, is developed to simultaneously function as a balance-tounbalance transformer and a phase shift network. The size of the fabricated duplexer is as small as $2.0mm{\times}1.6mm$. The maximum insertion loss of the duplexer is as low as 2.4 dB in the Tx band, and the minimum attenuation in the WiFi band is as high as 36.8 dB. The TCF value is considerably lowered to $-16.9ppm/^{\circ}C$.

• 대한전자공학회논문지SD
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• 제39권4호
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• pp.41-54
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• 2002

본 논문에서는 등가회로를 이용하여 브래그 반사층형 FBAR (Film Bulk Acoustic Wave Resonator) 와 membrane 형 FBAR 그리고 상 하부 전극이 공기와 접하는 이상적인 FBAR 의 특성을 서로 비교함으로서 브래그 반사층과 membrane 이 공진 특성에 미치는 영향을 분석하였다. 압전층으로는 ZnO, membrane 층과 낮은 음향적인 임피던스 반사층은 SiO₂, 높은 음향적인 임피던스 반사층으로는 W, 전극층으로는 Al를 가정하였고 각 층은 탄성파 전달 손실을 가정하였다. 1-port 의 등가회로를 ABCD 파라미터를 추출할 수 있는 단순화된 등가회로로 변환하여 ABCD 파라미터를 추출하여 입력임피던스를 계산하였다. 필터 설계에서는 구하여진 파라미터를 산란행렬로 변환하여 필터의 대역폭 및 삽입손실을 구하였다. 전극층, 반사층, membrane 층의 두께 변화에 의한 공진주파수의 변화는 membrane 층과 전극 바로 아래의 반사층의 두께 변화가 가장 큰 영향을 미친다는 결과를 확인하였다. 반사층 구조에서 반사층수에 따른 공진특성과 K/sub eff/와 electrical Q 의 변화에서는 반사층수가 K/sub eff/ 에는 거의 영향을 미치지 않지만 electrical Q 는 층수가 증가할수록 증가하다가 7층 이상에서 포화되었다. 또한 FBAR의 electrical Q 는 membrane 층과 반사층의 mechanical Q 에 의존함을 알 수 있었다. Ladder 필터와 SCF(Stacked Crystal Filters) 모두 공진기의 수가 증가할수록 삽입손실과 out-of-band rejection 이 증가하였고 층수가 증가할수록 삽입손실은 감소하지만 대역폭에는 거의 변화가 없었다. membrane형의 ladder 필터와 SCF 는 불효 공진 특성으로 인한 불효응답특성이 나타났다. 또한 ladder 필터는 보다 우수한 대역폭의 skirt-selectivity 특성을 나타내었으며 SCF 는 대역폭의 삽입손실 측면에서 더 우수하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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• pp.24-25
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• 2006

In this paper, ZnO thin films were prepared on p-Si(100) by RF magnetron sputtering. Before the depostion, the substrates were pre-heated to 500, 400, 300, $200^{\circ}C$ or not. During the deposition, the substrates were cooled down naturally or kept and then the films were investigated by XRD(X-ray diffraction) and SEM (scanning micro scope). It is showed the most outstanding result that the film was prepared on the substrate were cooled from $400^{\circ}C$. When the substrate was cooled from a certain temperature during deposition, it could be improve the c-axis orientation and useful for application of SAW(surface acoustic wave) filter and FBAR(film bulk acoustic wave resonator) device.