• 제목/요약/키워드: Ferroelectric property

검색결과 81건 처리시간 0.021초

RF 마그네트론 스퍼터링 법을 이용한 PZT 박막의 강유전 특성 (Ferroelectric Properties of PZT Thin Films by RF-Magnetron sputtering)

  • 박영;주필연;이준신;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.341-344
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    • 1999
  • The effects of post annealing treatments of ferroelectrlclty in PZT(P $b_{1.05}$(Z $r_{0.52}$, $Ti_{0.48}$) $O_3$ thin film deposited on Pt/ $SiO_2$/Si substrate by RF-Magnetron sputtering methode was Investigated. Analyses by RTA(Rapid Thermal Annealing) treatments reveled that the crystallization process strongly depend on the healing temperature. The Perovskite structure with strong PZT (101) plan was obtained by RTA treatments at 75$0^{\circ}C$ With increasing RTA temperature of PZI thin films, the coercive field and remanent Polarization decreased, while saturation polarization( $P_{r}$) was decreased. P-E curves of Pt/PZT/Pt capacitor structures demonstrate typical hysteresiss loops. The measure values of $P_{r}$,. $E_{c}$ and dielectric constants by post annealed at 75$0^{\circ}C$ were 38 $\mu$C/$\textrm{cm}^2$ 35KV/cm and 974, respectively. Switching polarization versus fatigue characteristic showed 12% degradation up to 10$^{7}$ cycles.s.s.s.s.s.s.

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Role of NH4 and H2O in Tutton Salt (NH4)2M(SO4)2·6H2O (M=Fe and Zn) Single Crystals Studied by 1H and 14N NMR at High Temperatures

  • Park, Sung Soo;Lim, Ae Ran
    • 한국자기공명학회논문지
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    • 제21권2호
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    • pp.67-71
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    • 2017
  • At high temperature, the roles of $NH_4$ and $H_2O$ in $(NH_4)_2Fe(SO_4)_2{\cdot}6H_2O$ and $(NH_4)_2Zn(SO_4)_2{\cdot}6H_2O$ single crystals were investigated using a pulse NMR spectrometer. Temperature was shown to have a significant influence, causing changes in the deformation of $NH_4$ and $H_2O$. From the $^1H$ NMR and $^{14}N$ NMR spectrum, the forms of environment surrounding $^{14}N$ in $NH_4$ groups is more important than the loss of $H_2O$ groups. NMR studies indicate that $NH_4{^+}$ ions in Tutton salts play an important role in the changes of the crystal structure at high temperatures.

광화학증착법에 의한 직접패턴 PZT 박막의 제조 및 특성 (Fabrication and Characterization of Direct-Patternable PZT Film Prepared by Photochemical Metal-Organic Deposition)

  • 박형호;박형호;김태송
    • 한국재료학회지
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    • 제18권2호
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    • pp.98-102
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    • 2008
  • The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated PZT films after annealing at $650^{\circ}C$ were 29 and $23\;{\mu}C/cm^2$, respectively. The UV irradiation was found to be effective for the enhancement of the <111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.

잉크젯 프린팅 공정을 통해 제작된 BaTiO3 Capacitor의 유전특성 분석 (Dielectric Property Analysis of BaTiO3 Capacitor Manufactured by Inkjet Printing Process)

  • 김유진;이경영;이인곤;홍익표;김지훈
    • 한국전기전자재료학회논문지
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    • 제35권6호
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    • pp.610-615
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    • 2022
  • BaTiO3 is one of the ferroelectric materials with excellent dielectric properties such as high dielectric constant, low dielectric loss, and is widely used for the manufacturing of capacitors, piezoelectric converters, microsensors, and ferroelectric memories. Inkjet printing is a technology which uses digital and contactless methods which significantly improves flexibility associated with material and structural design, reducing manufacturing costs. Therefore, the top and bottom electrodes, BaTiO3 ink, and photocurable resin were all printed by an inkjet to produce a BaTiO3 capacitor. The properties of the printed thin film were analyzed. It was confirmed that the photocurable resin ink was well-infiltrated between the BaTiO3 powder particles printed by inkjet. The dielectric properties of the capacitor such as dielectric constant which varies in accordance with frequency, polarization and tunability that changes with voltage, were measured.

Ellipsometric study of Mn-doped $Bi_4Ti_3O_{12}$ thin films

  • Yoon, Jae-Jin;Ghong, Tae-Ho;Jung, Yong-Woo;Kim, Young-Dong;Seong, Tae-Geun;Kang, Lee-Seung;Nahm, Sahn
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.173-173
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    • 2010
  • $Bi_4Ti_3O_{12}$ ($B_4T_3$) is a unique ferroelectric material that has a relatively high dielectric constant, high Curie temperature, high breakdown strength, and large spontaneous polarization. As a result this material has been widely studied for many applications, including nonvolatile ferroelectric random memories, microelectronic mechanical systems, and nonlinear-optical devices. Several reports have appeared on the use of Mn dopants to improve the electrical properties of $B_4T_3$ thin films. Mn ions have frequently been used for this purpose in thin films and multilayer capacitors in situations where intrinsic oxygen vacancies are the major defects. However, no systematic study of the optical properties of $B_4T_3$ films has appeared to date. Here, we report optical data for these films, determined by spectroscopic ellipsometry (SE). We also report the effects of thermal annealing and Mn doping on the optical properties. The SE data were analyzed using a multilayer model that is consistent with the original sample structure, specifically surface roughness/$B_4T_3$ film/Pt/Ti/$SiO_2$/c-Si). The data are well described by the Tauc-Lorentz dispersion function, which can therefore be used to model the optical properties of these materials. Parameters for reconstructing the dielectric functions of these films are also reported. The SE data show that thermal annealing crystallizes $B_4T_3$ films, as confirmed by the appearance of $B_4T_3$ peaks in X-ray diffraction patterns. The bandgap of $B_4T_3$ red-shifts with increasing Mn concentration. We interpret this as evidence of the existence deep levels generated by the Mn transition-metal d states. These results will be useful in a number of contexts, including more detailed studies of the optical properties of these materials for engineering high-speed devices.

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TiO2 Buffer Layer의 후열처리 온도 증가에 따른 PLZT 박막의 유전특성에 대한 연구 (The Dielectric Properties of PLZT Thin Films as Post Annealing Temperatures of TiO2 Buffer Layer)

  • 윤지언;이인석;김상지;손영국
    • 한국진공학회지
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    • 제17권6호
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    • pp.560-565
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    • 2008
  • 본 연구에서는 PLZT 박막이 $(Pb_{0.92}La_{0.08})(Zr_{0.65}Ti_{0.35})O_3$ 조성의 타겟을 이용한 R.F. 마그네트론 스퍼터링공정에 의해 실리콘 웨이퍼 위에 증착되었다. PLZT 박막의 강유전특성을 향상시키기 위해 buffer layer인 $TiO_2$ 층이 사용되었으며, buffer layer의 후열처리온도 변화에 따른 PLZT 박막의 결정성과 유전특성이 연구되었다. buffer layer이 삽입되지 않은 PLZT 박막의 잔류분극값은 $19.13{\mu}C/cm^2$ 이었으며, 반면 $TiO_2$ buffer layer을 삽인한 후 후열처리 온도를 $600^{\circ}C$로 증가시킨 PLZT 박막의 잔류분극값은 $146.62{\mu}C/cm^2$까지 크게 증가하였다. 하부전극 백금(Pt)과 PLZT 박막층 사이에 삽입된 $TiO_2$ buffer layer의 특성과 PLZT 박막의 유전특성에 미치는 영향을 살펴보기 위해 글로우 방전 분광법 (glow discharge spectroscopy, GDS)이 PLZT 박막(PLZT/($TiO_2$)/Pt/Ti/$SiO_2$/Si wafer)에 대해 수행 되었다.

Infrared Detector Using Pyroelectrics

  • Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • 제4권4호
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    • pp.147-150
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    • 2006
  • The thin film of PbTiO3 is fabricated at substrate temperature of 100-150$^{\circ}C$. The infrared spectrum of the ferroelectric thin film is measured as temperature of thermal treatment, 400 - 550$^{\circ}C$. According to infrared spectrum analysis, there are absorption bands at a nearby wave number of 1000 $\sim$ 400 cm-l and the thin film treated by temperature of 550$^{\circ}C$ has absorption bands of wave number 500 cm-l similar to infrared response property of PbTiO3 powder. The pyroelectric infrared detector is fabricated after deposition of Pt and PbTiO3 thin film on Si wafer by sputtering machine. The measured remnant polarization are 11.5-12.5$\muC/cm2$, breakdown electric field Ec is 100-120KV/cm, and voltage responsivity and detectivity is -280V/W, -108cm Hz/W.

FRAM 응용을 위한 PZT 다층 박막의 유전 특성 (The Dielectric Properties of the PZT Multilayered Thin Films for FRAM)

  • 남성필;이상철;이상헌;배선기;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.1618-1620
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    • 2004
  • The $Pb(Zr_{0.4}Ti_{0.6})O_3/Pb(Zr_{0.6}Ti_{0.4})O_3$ [PZT(4060)/(6040)] multilayered thin films were deposited by RF Sputtering method on the Pt/Ti/$SiO_2$/Si substrate. This procedure was repeated several times to form PZT(4060)/(6040) heterolayerd thin films. The effects on the structural and dielectric properties of PZT multilayered thin films were investigated. The MFM(Metal Ferroelectric Metal) type capacitors were made using the PZT(4060)/(6040) multilayered thin films deposited with optimum deposition condition. An enhanced dielectric property was observed in the PZT(4060)/(6040) multilayered thin films. The relative dielectric constant and dielectric loss at 100Hz of the PZT(4060)/(6040)-5 multilayered thin films were about 1106 and 0.016, respectively.

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Measurement of Barium Ion Displacement Near Surface in a Barium Titanate Nanoparticle by Scanning Transmission Electron Microscopy

  • Aoki, Mai;Sato, Yukio;Teranishi, Ryo;Kaneko, Kenji
    • Applied Microscopy
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    • 제48권1호
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    • pp.27-32
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    • 2018
  • Barium titanate ($BaTiO_3$) nanoparticle is one of the most promising materials for future multi-layer ceramic capacitor and ferroelectric random access memory. It is well known that electrical property of nanoparticles depends on the atomistic structure. Although surface may possibly have an impact on the atomistic structure, reconstructed structure at the surface has not been widely investigated. In the present study, Ba-ion position near surface in a $BaTiO_3$ nanoparticle has been quantitatively characterized by scanning transmission electron microscopy. It was found that some Ba ions at the surface were greatly displaced in non-uniform directions.

RF 스퍼터링법으로 제조한 PZT 이종층 박막의 유전 특성 (The Dielectric Properties of the PZT Heterolayered Thin Films Prepared by RF Sputtering Method)

  • 남성필;이상철;배선기;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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    • pp.153-156
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    • 2004
  • The $Pb(Zr_{0.4}Ti_{0.6})O_3/Pb(Zr_{0.6}Ti_{0.4})O_3$ [PZT(4060)/(6040)] heterolayered thin films were deposited by RF sputtering method on the $Pt/TiO_2/SiO_2/Si$ substrate. The effects of the structural and dielectric properties of PZT heterolayered thin films were investigated. The MFM(Metal Ferroelectric Metal) type capacitors were made using the PZT(6040)/(4060) heterolayered thin films deposited with optimum deposition condition. An enhanced dielectric property was observed in the PZT(4060)/(6040) thin films. Investigating the dielectric constant and dielectric loss characteristics. the application for the next-generation dielectric thin films and memory devices were studied.

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