• Title/Summary/Keyword: Ferroelectric capacitor

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Growth and Characteristics of IrO2 Thin Films for Application as Bottom Electrodes of Ferroelectric Capacitors (Ferroelectric 캐패시터의 하부전극에의 응용을 위한 IrO2 박막 증착 및 특성분석)

  • Hur, Jae-Sung;Choi, Hoon-Sang;Kim, Do-Young;Jang, Yu-Min;Lee, Jang-Hyeok;Choi, In-Hoon
    • Korean Journal of Materials Research
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    • v.13 no.2
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    • pp.69-73
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    • 2003
  • In this work, $IrO_2$thin films as bottom electrode of ferroelectric capacitors were deposited and characterized. The $IrO_2$films deposited in the conditions of 25, 40 and 50% oxygen ambient by sputtering method were annealed at 600, 700 and $800^{\circ}C$, respectively. It was found that the crystallinity and the surface morphology of $IrO_2$films affected the surface properties and electrical properties of SBT thin films prepared by the MOD method. With increasing temperature, the crystallinity and the roughness of $IrO_2$films were also increasing. This increasing of roughness degraded the surface properties and electrical properties of SBT films. We found an optimum condition of $IrO_2$films as bottom electrode for ferroelectric capacitor at 50% oxygen ambient and $600^{\circ}C$ annealing temperature. Electrical characterizations were performed by using$ IrO_2$bottom electrodes grown at an optimum conditions. The remanent polarization ($P_{r}$) of the Pt/SBT/$IrO_2$/$SiO_2$/Si structure was 2.75 $\mu$C/$\textrm{cm}^2$ at an applied voltage of 3 V. The leakage current density was $1.06${\times}$10^{-3}$ A/$\textrm{cm}^2$ at an applied voltage of 3 V.

Magneto-Mechano-Triboelectric Generator Enabled by Ferromagnetic-Ferroelectric Composite (강자성-강유전성 복합체를 활용한 자기-기계-마찰전기 변환 발전소자)

  • Yeseul Lim;Geon-Tae Hwang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.1
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    • pp.112-117
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    • 2024
  • The Internet of Things (IoT) device is a key component for Industry 4.0, which is the network in homes, factories, buildings, and infrastructures to monitor and control the systems. To demonstrate the IoT network, batteries are widely utilized as power sources, and the batteries inevitably require repeated replacement due to their limited capacity. Magneto-mechano-electric (MME) generators are one of the candidate to develop self-powered IoT systems since MME generators can harvest electricity from stray alternating current (AC) magnetic fields arising from electric power cables. Herein, we report a magneto-mechano-triboelectric generator enabled by a ferromagnetic-ferroelectric composite. In the triboelectric nylon matrix, a ferromagnetic carbonyl iron powder (CIP) was introduced to induce magnetic force near the AC magnetic field for MME harvesting. Additionally, a ferroelectric ceramic powder was also added to the MME composite material to enhance the charge-trapping capability during triboelectric harvesting. The final ferromagnetic-ferroelectric composite-based MME triboelectric harvester can generate an open-circuit voltage and a short-circuit current of 110 V and 8 μA, respectively, which were enough to turn on a light emitting diode (LED) and charge a capacitor. These results verify the feasibility of the MME triboelectric generator for not only harvesting electricity from an AC magnetic field but also for various self-powered IoT applications.

Cell Signal Distribution Characteristics For High Density FeRAM

  • Kang, Hee-Bok;Park, Young-Jin;Lee, Jae-Jin;Ahn, Jin-Hong;Sung, Man-Young;Sung, Young-Kwon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.3
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    • pp.222-227
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    • 2004
  • The sub-bitline (SBL) sensing voltage of a cell and total cell array can be measured by the method of SBL voltage evaluation method. The MOSAID tester can collect all SBL signals. The hierarchical bitline of unit cell array block is composed of the cell array of 2k rows and 128 columns, which is divided into 32 cell array sections. The unit cell array section is composed of the cell array of 64 rows and 128 columns. The average sensing voltage with 2Pr value of $5{\mu}C/cm^2$ and SBL capacitance of 40fF is about 700mV at 3.0V operation voltage. That is high compensation method for capacitor size degradation effect. Thus allowed minimum 2Pr value for high density Ferroelectric RAM (FeRAM) can move down to about less than $5{\mu}C/cm^2$.

Effect of annealing pressure on the growth and electrical properties of $YMnO_3$ thin films deposited by MOCVD

  • Shin, Woong-Chul;Park, Kyu-Jeong;Yoon, Soon-Gil
    • Journal of Korean Vacuum Science & Technology
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    • v.4 no.1
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    • pp.6-10
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    • 2000
  • Ferroelectric YMnO$_3$ thin films were deposited on $Y_2$O$_3$/si(100) substrates by metalorganic chemical vapor deposition. The YMnO$_3$ thin films annealed in vacuum ambient (100 mTorr) above 75$0^{\circ}C$ show hexagonal structured YMnO$_3$. However, the film annealed in oxygen ambient shows poor crystallinity, and the second phase as $Y_2$O$_3$ and orthorhombic-YMnO$_3$ were shown. The annealing ambient and pressure on the crystallinity of YMnO$_3$ thin films is very important. The C-V characteristics have a hysteresis curve with a clockwise rotation, which indicates ferroelectric polarization switching behavior. When the gate voltage sweeps from +5 to 5 V, the memory window of the Pt/YMnO$_3$/Y$_2$O$_3$/Si gate capacitor annealed at 85$0^{\circ}C$ is 1.8 V. The typical leakage current densities of the films annealed in oxygen and vacuum ambient are about 10$^{-3}$ and 10$^{-7}$ A/cm$^2$ at applied voltage of 5 V.

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Electrical Properties of Pt/$LiNbO_3$/AIN/Si(100) structures (Pt/$LiNbO_3$/AIN/Si(100) 구조의 전기적 특성)

  • 정순원;정상현;인용일;김광호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.58-61
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    • 2001
  • Metal-insulator-semiconductor (MIS) C-V properties with high dielectric AIN thin films showed no hysteresis and good interface properties. The dielectric constant of the AIN film calculated from the capacitance at the accumulation region in the capacitance-voltage(C-V) characteristics was about 8. The C-V characteristics of MFIS capacitor showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin films. Typical dielectric constant value of LiNbO$_3$ film of MFIS device was about 23. The memory window width was about 1.2V at the gate voltage of $\pm$5 V ranges. Typical gate leakage current density of the MFIS structure was the order of 10$^{-9}$ A/cm$^2$ at the range of within $\pm$500 kV/cm. The ferroelectric capacitors showed no polarization degradation up to about 10$^{11}$ switching cycles when subjected to symmetric bipolar voltage pulse(peak-to-peak 8V, 50% duty cycle) in the 500kHz.

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Ferroelectric and Structural Properties of Nd-substituted $Bi_4Ti_3O_{12}$ Thin Films Fabricated by MOCVD

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2006.10a
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    • pp.166-169
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    • 2006
  • A promising capacitor, which has conformable step coverage and good uniformity of thickness and composition, is needed to manufacture high-density non-volatile FeRAM capacitors with a stacked cell structure. In this study, ferroelectric $Bi_{3.61}Nd_{0.39}Ti_3O_{12}$ (BNT) thin films were prepared on $Pt(111)/Ti/SiO_2/Si$ substrates by the liquid delivery system MOCVD method. In these experiments, $Bi(ph)_3$, $Nd(TMHD)_3$ and $Ti(O^iPr)_2(TMHD)_2$ were used as the precursors and were dissolved in n-butyl acetate. The BNT thin films were deposited at a substrate temperature and reactor pressure of approximately $600^{\circ}C$ and 4.8 Torr, respectively. The microstructure of the layered perovskite phase was observed by XRD and SEM. The remanent polarization value (2Pr) of the BNT thin film was $31.67\;{\mu}C/cm^2$ at an applied voltage of 5 V.

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Improved Temperature Stability in Dielectric Properties of 0.8BaTiO3-(0.2-x)NaNbO3-xBi(Mg1/2Ti1/2)O3 Relaxors

  • Goh, Yumin;Kim, Baek-Hyun;Bae, Hyunjeong;Kwon, Do-Kyun
    • Journal of the Korean Ceramic Society
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    • v.53 no.2
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    • pp.178-183
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    • 2016
  • Ferroelectric relaxor ceramics with $BaTiO_3-NaNbO_3-Bi(Mg_{1/2}Ti_{1/2})O_3$ ternary compositions (BT-NN-BMT) have been prepared by sol-gel powder synthesis and consequent bulk ceramic processing. Through the modified chemical approach, fine and single-phase complex perovskite compositions were successfully obtained. Temperature and frequency dependent dielectric properties indicated typical relaxor characteristics of the BT-NN-BMT compositions. The ferroelectric-paraelectric phase transition became diffusive when NN and BMT were added to form BT based solid solutions. BMT additions to the BT-NN solid solutions affected the high temperature dielectric properties, which might be attributable to the compositional inhomogeneity of the complex perovskite and resulting weak dielectric coupling of the Bi-containing polar nanoregions (PNRs). The temperature stability of the dielectric properties was good enough to satisfy the X9R specification. The quasi-linear P-E response and the temperature- stable dielectric properties imply the high potential of this ceramic compound for use in high temperature capacitors.

The Effects of Deposition Temperature on the Growth Behavior of the $BNdT(Bi_{3.25}Nd_{0.75}Ti_{3}O_{12})$ Ferroelectric Thin Films ($BNdT(Bi_{3.25}Nd_{0.75}Ti_{3}O_{12})$ 강유전 박막 성장거동에 미치는 증착온도의 영향)

  • Kwon, Hyun-Yul;Nam, Sung-Pill;Kim, Jung-Hun;Lee, Sung-Gap;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2005.11a
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    • pp.176-178
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    • 2005
  • Ferroelectric $Bi_{3.25}Nd_{0.75}Ti_{3}O_{12}(BNdT)$ thin films were proposed for capacitor of FeRAM. The BNdT thin films were grown on Pt/Ti $SiO_2/P-Si(100)$ substrates by the RF magnetron sputtering deposition. The dielectric properties of the BNdT were investigated by varying deposition temperatures. Increasing deposition temperature, the (117) peak was increased. An increase of columnar and recrystalline structure of BNdT films with increasing deposition temperature was observed by the Field Emission Scanning Electron Microscopy(FE-SEM). The dielectric constant and dielectric loss of the BNdT thin films with deposition temperature of $600^{\circ}C$ were 319 and 0.05, respectively.

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The study of the properties of PZT thin films deposited on $Ru/RuO_{2}$ electrode ($Ru/RuO_{2}$ 이중 전극위에 성장한 PZT 박막의 특성에 관한 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Park, Young;Somg, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.394-397
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    • 2001
  • In this paper, in-situ deposited $Ru/RuO_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and $RuO_2$ bottom electrodes are also investigated. The use of $Ru/RuO_2$ hybrid electrodes showed better electrical properties in compression with $RuO_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/$RuO_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of $7.2C/cm^2$ and 46.35 kV/cm, respectively.

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Electrodic properties of PZT thin films growed on Ru/$RuO_2$ bottom eletrode (Ru/$RuO_2$ 하부전극에 성장한 PZT 박막의 전기적 특성 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Kim, Eung-Kwon;Park, Young;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.58-62
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    • 2002
  • Pb($Zr_{0.52}Ti_{0.48}$)$O_3$ (PZT) thin films deposited on the Pt/Ti and Ru/$RuO_2$ bottom electrode by rf magnetron sputtering methode. Ru/$RuO_2$ bottom electrode deposited on the p-type wafer as Ru thickness by in-situ process. Our results show that all PZT films indicated perovskite polycrystalline structure with perferred orientation (110) and no pyrochlore phase is observed. A well-fabricated $RuO_2$/PZT/Ru(100nm)/$RUO_2$ capacitor showed a leakage current density in the order of $2.13{\times}10^{-7}A/cm^2$ as 100 kV/cm, a remanent polarization of 7.20 ${\mu}C/cm^2$, and a coercive field of 58.37 kV/cm. The results show that the new Ru/$RuO_2$ bottom electrodes are expected to reduce the degradation ferroelectric fatigue and excellent ferroelectric properties.

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