• 제목/요약/키워드: Ferroelectric Films

검색결과 658건 처리시간 0.029초

마이크로파대에서의 강유전 박막 유전 특성 평가 (Characterization of Ferroelectric Thin Film in Microwave Region)

  • 박정흠
    • 한국전기전자재료학회논문지
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    • 제17권10호
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    • pp.1061-1067
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    • 2004
  • In this study, ferroelectric (Ba,Sr)TiO$_3$ and high temperature superconductor YBCO thin films were fabricated by PLD (Pulsed Laser Deposition) method and tuneable bandstop filters were implemented with two different IDC(Interdigital Capacitance) gap patterns, 20${\mu}{\textrm}{m}$ and 30${\mu}{\textrm}{m}$ using these two thin film layers. The resonant frequency was changed by DC bias voltage. By comparing measured results with simulation, the dielectric properties of ferroelectric thin film have been extracted. The permittivity was 820 ~ 900 at 30 K and had an acceptable error range but the loss tangent had a great difference, 0.018 in 30${\mu}{\textrm}{m}$ IDC gap pattern and 0.037 in 20 ${\mu}{\textrm}{m}$.

분위기 소결공정에 의한 Bi3.75La0.25Ti3O12세라믹의 강유전특성 (Ferroelectric Properly of Bi3.75La0.25Ti3O12 Ceramic Sintered in the Ambient)

  • 김응권;박춘배;박기엽;송준태
    • 한국전기전자재료학회논문지
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    • 제15권9호
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    • pp.783-787
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    • 2002
  • In recent year, B $i_{4-}$x L $a_{x}$ $Ti_3$ $O_{12(BLT)}$ is one of promising substitute materials for the ferroelectric random access memory(FRAM) applications. But the systematic composition is still insufficient, so this experiment was carried out in ceramic ambient sintering process which has the very excellent ferroelectric property. Samples were prepared by a bulk and the purpose which was estimated with a suitability of thin films applications. The density of B $i_{3.75}$ L $a_{0.25}$ $Ti_3$ $O_{12}$ was high and the XRD pattern showed that the intensity of main peak (117) was increased at the argon ambient sintering. Controlling the quantity of oxygen, crystallization showed a thin, long plate like type, and we obtained the excellent dielectric and polarization properties at the argon atmosphere sintering. Also this sintering process was effective at the bulk sample. Argon ambient sintered sample produced higher permittivity of 154, the remanent polarization(2Pr) of 6.8 uC/$\textrm{cm}^2$ compared with that sintered in air and oxygen ambient. And this sintering process showed a possibility which could be applied to thin films process..

초고집적반도체의 커패시터용 강유전 박막의 전기적 특성 개선 (Improvement of Electrical Property in Ferroelectric Thin Films for ULSI's Capacitor)

  • 마재평;박삼규
    • 마이크로전자및패키징학회지
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    • 제11권3호
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    • pp.91-97
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    • 2004
  • PZT 박막을 rf-마그네트론 스퍼터링으로 $Pt/Ti/SiO_2/Si$ 기판 위에 형성시켰다. $5\%$ 과잉 PbO 를 포함한 bulk PZT 타겟을 사용하였다. 상온에서 PZT 박막을 얇게 입힌 후 나머지 두께를 $650^{\circ}C$에서 in-situ 방법으로 형성시켰다. 강유전 특성을 갖는 PZT 상은 $650^{\circ}C$에서 형성되었다. 2단계 스퍼터링에 의해 누설전류 특성을 크게 증진시킬 수 있었고, 적절한 두께의 상온층을 포함시킨 경우 $2{\times}10^{-7}A/cm^2$의 매우 작은 누설전류를 나타냈다. 누설전류 기구에 대한 조사 결과, 여러 조건에서 제조된 PZT 박막의 전기전도는 모두 bulk-limit 기구에 의한 것임을 알 수 있었다.

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LSMCD 공정으로 제조한 SBT 박막의 Sr/Ta 몰비에 따른 강유전 특성 (Effect of Sr/Ta mole ratio on the ferroelectric properties of SBT thin films fabricated by LSMCD process)

  • 박주동;김지웅;오태성
    • 한국진공학회지
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    • 제9권4호
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    • pp.360-366
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    • 2000
  • LSMCD (Liquid Source Misted Chemical Deposition)공정으로 Sr/Ta몰비 0.35~0.65 조성범위에서 150 nm 두께의 $Sr_xBi_{2.4}Ta_2O_9$ (SBT)박막을 제조하여, Sr/Ta몰비에 따른 결정상과 미세구조, 강유전 특성 및 누설전류 특성을 분석하였다. LSMCD 공정으로 제조한 SBT박막은 Sr/Ta 몰비 0.425의 조성에서 최적의 강유전 특성을 나타내어 $\pm$5 V의 구동전압 인가시 15.01 $\mu$C/$\textrm{cm}^2$의 잔류분극 $2P_{r}$과 41kV/cm의 항전계 $E_{c}$를 나타내었다. LSMCD공정으로 제조한 Sr/Ta 몰비 0.35~0.5 범위의 SBT 박막은 100 kV/cm의 전기장 하에서 $10^{-5}$A/$\textrm{cm}^2$ 미만의 낮은 누설전류 밀도를 나타내었으며, $\pm$5V의 구동전압 인가시 $10^{10}$회의 스위칭 후에도 잔류분극 감소가 1% 미만인 우수한 분극피로 특성을 나타내었다.

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Ferroelectric $SrBi_2Ta_2O_9$ Thin Films by Liquid-Delivery Metalorganic Chemical Vapor Deposition using $Sr[Ta(OEt)_5(dmae)]_2$ and $Bi(C_6H_5)_3$

  • Shin, Wonng-Chul;Choi, Kyu-Jeong;Park, Chong-Man;Yoon, Soon-Gil
    • The Korean Journal of Ceramics
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    • 제6권3호
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    • pp.219-223
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    • 2000
  • The ferroelectric SBT films were deposited on Pt/Ti/SiO$_2$/Si substrates by liquid injection metalorganic chemical vapor deposition (MOCVD) with single-mixture solution of Sr[Ta(OEt)$_5$(dmae)]$_2$and Bi(C$_6$ 6/H$_5$)$_3$. The Sr/Ta and Bi/Ta ratio in SBT films depended on deposition temperature and mol ratio of precursor in the single-mixture solution. At the substrate temperature of 40$0^{\circ}C$, Sr/Ta and Bi/Ta ratio were close to 0.4 and 1 at precursor mol ratio of 0.5~1.0, respectively. As-deposited film was amorphous. However, after annealing at 75$0^{\circ}C$ for 30 min in oxygen atmosphere, the diffraction patterns indicated polycrystalline SBT phase. The remanent polarization (Pr) and coercive field (Ec) of SBT film annealed at 75$0^{\circ}C$ were 4.7$\mu$C/$\textrm{cm}^2$ and 115.7kV/cm at an applied voltage of 5V, respectively. The SBT films annealed at 75$0^{\circ}C$ showed practically no polarization fatigue up to 10$^10$ switching cycles.

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$CeO_2$박막의 결정성 및 전기적 특성에 미치는 sputtering시 산소분압비의 영향 (Effects of oxygen partial pressure during sputtering on texture and electrical properties of $CeO_2$ thin films)

    • 한국진공학회지
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    • 제10권1호
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    • pp.51-56
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    • 2001
  • MFISFET(Metal-ferroelectric-insulator-semiconductor-field effect transistor)에의 적용을 위한 절연체로서 CeO$_2$ 박막을 r.f. magnetron sputtering법에 의해 제조하였다. 스퍼터링시 증착개스는 Ar과 $O_2$를 사용하였으며 산소분압비에 따른 $CeO_2$박막의 결정성 및 전기적 특성에 미치는 영향을 평가하였다. p형-Si(100)기판 위에 $600^{\circ}C$에서 증착된 $CeO_2$ 박막들은(200)방향으로 우선방향성을 가지고 성장하였으며 Ar만으로 증착된 박막의 우선방향성은 증가하였으나 상대적으로 많은 하전입자와 표면 거칠기로 인해 C-V특성에서 큰 이력특성을 보였고 산소분압비가 증가함에 따라 양호한 특성을 보였다. 이것은 이동가능한 이온전하의 감소에 기인한다고 할 수 있다. Ce:O의 비는 모든 박막에서 1:2.22~2.42를 보여 산소과잉의 조성을 나타냈으며 산소분압비에 따라 제조된 박막들의 누설전류값은 100 kV/cm의 전계에서 $10^{-7}$~$10^{-8}$A의 차수를 보였다.

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Electrical/Optical Characterization of PZT Thin Films Deposited through Sol-Gel Processing

  • Hwang, Hee-Soo;Kwon, Kyoeng-Woo;Choi, Jeong-Wan;Do, Woo-Ri;Hwang, Jin-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.361-361
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    • 2012
  • PZT (Pb(Zr,Ti)O3) thin films have been used widely in the MEMS application, due to their inherent ferroelectric and piezoelectric properties. Such ferroelectricity induces much higher dielectric constants compared to those of the nonperovskite materials. In this work, the PZT thin films were deposited onto Indium-Tin-oxide (ITO) substrates through the spin-coating of PZT sols. The deposited PZT thin films were characterized in terms of the electrical and optical properties with special emphases on conductivity and optical constants. The detailed analysis techniques incorporate the dc-based current-voltage characteristics for the electrical properties, spectroscopic ellipsometry for optical characterization, atomic force microscopy for surface morphology, X-ray Photoelectron Spectroscopy for chemical bonding, Energy-dispersive X-ray Spectrometry for chemical analyses and X-ray diffraction for crystallinity. The ferroelectric phenomena were confirmed using capacitance-voltage measurements. The integrated physical/chemical features are attempted towards energy-oriented applications applicable to next-generation high-efficiency power generation systems.

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CSD 방법을 이용한 $La_2T_2O_7$ 박막제조 (Fabrication of $La_2T_2O_7$ Thin Film by Chemical Solution Deposition)

  • 장승우;우동찬;이희영;정우식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
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    • pp.339-342
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    • 1998
  • Ferroelectric L $a_2$ $Ti_2$ $O_{7}$(LTO) thin films were prepared by chemical solution deposition processes. Acetylacetone was used as chelating agent and nitric acid was added in the stock solution to control hydrolysis and condensation reaction rate. The LTO thin films were spin-coated on Pt/Ti/ $SiO_2$/(100)Si and Pt/Zr $O_2$/ $SiO_2$/(100)Si substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. The role of acetylacetone in Ti iso-propoxide stabilization by possibly substituting $O^{i}$Pr ligand was studied by H-NMR. B site-rich impurity phase, i.e. L $a_4$ $Ti_{9}$ $O_{24}$, was found after annealing, where its appearance was dependent on process temperature indicating the possible reaction with substrate. Dielectric and other relevant electrical properties were measured and the results were compared between modified sol-gel and MOD processes.s.s.

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Sol-Gel 법에 의한 Pb(Zr, Ti)${O}_{3}$ 박막의 제조 및 구조적 특성 (Preparation and structural properties of the Pb(Zr, Ti)${O}_{3}$ thin film by Sol-Gel method)

  • 이영준;정장호;이성갑;이영희
    • 대한전기학회논문지
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    • 제44권7호
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    • pp.914-918
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    • 1995
  • In this study, Pb(Zr$_{x}$ Ti$_{1-x}$ )O$_{3}$ (x=0.65, 0.52, 0.35) thin films were fabricated by Sol-Gel method. A stock solution with excess Pb 10[mol%] of Pb(Zr$_{x}$ Ti$_{1-x}$ )O$_{3}$ was made and spin-coated on the Pt/SiO$_{2}$/Si substrate at 4000[rpm] for 30[sec.]. Coated specimens were dried on the hot-plate at 400[.deg. C] for 10[min.]. Sintering temperature and time were 500~800[.deg. C] and 1~60[min.]. The coating process was repeated 6 times and the final thickness of the thin films were about 4800[A]. To investigate crystallization condition, PZT thin films were analyzed with sintering temperature, time and composition by the XRD. The microstructure of thin fulms were investigated by SEM. The ferroelectric perovskite phases precipitated under the sintering of 700[.deg. C] for 1 hours. In the PZT(52/48) composition, dielectric constant and dielectric loss were 2133, 2.2[%] at room temperature, respectively.ively.

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Sol-Gel법으로 제조한 $PbTiO_3$ 강유전 박막의 구조적, 유전적 특성에 관한 연구 (A Study on the Structural and the Dielectric Properties of $PbTiO_3$ Ferroelectric Thin Films Prepared by Sol-Gel Processing)

  • 김재헌;김준한;백동수;이두희;박창엽
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1993년도 춘계학술대회 논문집
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    • pp.100-103
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    • 1993
  • Ferroelectric lean-titanate thin films were fabricated by sol-gel processing. Sol-gel derived $PbTiO_3$ thin films crystallized into the expected tetragonal perovskite structure when heated to $600^{\circ}C$ and above. The effects of annealing temperature on grain size made with SEM observation are reported. The films heated at $650^{\circ}C$ for 30min showed a square-type hysteresis loop with $P_r$ and $E_c$ of $11.5{\mu}C/cm^2$, 115kV/cm, respectively.

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