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Ferroelectric Properly of Bi3.75La0.25Ti3O12 Ceramic Sintered in the Ambient

분위기 소결공정에 의한 Bi3.75La0.25Ti3O12세라믹의 강유전특성

  • 김응권 (성균관 대학교 정보통신대학원) ;
  • 박춘배 (원광대학교 전기전자 및 정보공학부) ;
  • 박기엽 (부산정보대학 전기전자계열) ;
  • 송준태 (성균관 대학교 정보통신대학원)
  • Published : 2002.09.01

Abstract

In recent year, B $i_{4-}$x L $a_{x}$ $Ti_3$ $O_{12(BLT)}$ is one of promising substitute materials for the ferroelectric random access memory(FRAM) applications. But the systematic composition is still insufficient, so this experiment was carried out in ceramic ambient sintering process which has the very excellent ferroelectric property. Samples were prepared by a bulk and the purpose which was estimated with a suitability of thin films applications. The density of B $i_{3.75}$ L $a_{0.25}$ $Ti_3$ $O_{12}$ was high and the XRD pattern showed that the intensity of main peak (117) was increased at the argon ambient sintering. Controlling the quantity of oxygen, crystallization showed a thin, long plate like type, and we obtained the excellent dielectric and polarization properties at the argon atmosphere sintering. Also this sintering process was effective at the bulk sample. Argon ambient sintered sample produced higher permittivity of 154, the remanent polarization(2Pr) of 6.8 uC/$\textrm{cm}^2$ compared with that sintered in air and oxygen ambient. And this sintering process showed a possibility which could be applied to thin films process..

Keywords

References

  1. J. of the Ceramic Society of Japan v.109 Preparation and ferroelectric properties of PZT thin Films C.S.D.P Bo-Ping Zang https://doi.org/10.2109/jcersj.109.1268_299
  2. J. of KOEEME(in Korean) v.12 no.7 A study on PZT thin films capacitor and their bottom electrodes Young Park
  3. 전기전자재료학회논문지 v.11 no.7 PLD를 이용한 강유전체(PZT, PST, PT)/YBCO박막 구조의 제작과 전기적인 특성에 관한 연구 김정환;이재형;문형무
  4. Thin Solid Films v.305 Pulsed laser deposition preparation and properties of SBT thin films Ping-Xing Yang https://doi.org/10.1016/S0040-6090(96)09564-8
  5. Jpn. J. Appl. Phys. v.38 Evolution of ferroelectric structure in SBT thin films prepared using triple alkoxides on Pt-passivated Si Kazumi Kato https://doi.org/10.1143/JJAP.38.5417
  6. Nature v.401 La-substituted Bi, Ti for use in non-volatile memories T. W. Noh https://doi.org/10.1038/44352
  7. Appl. Phys. Lett. v.78 no.5 Fatigue-free behavior of highly oriented BLT thin films grown on Pt/Ti/SiO₂/Si by MSD Uong Chon https://doi.org/10.1063/1.1333686
  8. Jpn. J. Appl. Phys. v.40 Fa-brication and characterization of metal ferroelectric metal insulator semiconductor structure using ferroelectric BLT films Eisuke Tokumitsu;Takeaki Isobe https://doi.org/10.1143/JJAP.40.5576
  9. Appl. Phys. Lett. v.78 BLT thin films prepared on Si(100) by metalorganic decomposition method Yun Hou;Xiao Hong Xu https://doi.org/10.1063/1.1355012
  10. 한국전기전자재료학회 2001 추계학술대회논문집 v.14 no.1 FRAM 응용을 위한 BLT박막의 제작 및 특성 김경태;김창일
  11. Jpn. J. Appl. Phys. v.35 Electrical Property of (Bi, La)₄Ti₃O12 Based Thin Films Prepared by RF Sputtering N. Ichinose;M. Nomura https://doi.org/10.1143/JJAP.35.4960
  12. 전기전자재료학회논문지 v.13 no.5 분위기 소결공정에 의해 제조된 ZnO 세라믹 바리스터의 열화기구 연구 소순진;김영진;박춘배