• Title/Summary/Keyword: FeFET

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CoFe/Si/CoFe 구조에서의 스핀주입에 관한 연구

  • 이한주;황웅준;조성준;김윤명;박영준;한석희;이우영;김영근;신무환
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.56-57
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    • 2002
  • 반도체를 이용한 스핀트로닉스(spintronics) 기술은 Spin LED, Spin FET 그리고 Spin RTD 등과 같은 차세대 신개념 소자에 응용될 수 있다는 점에서 상당한 각광을 받고 있다[1]. 이 중에서 강자성체의 박막을 사용하여 스핀 분극된 전자를 주입(inject)하고 반도체 내에 스핀 분극된 전자를 이동(transport)시킨 다음, 강자성체의 박막으로 이러한 스핀을 검출(detect) 할 수 있는 기술이 개발된다면 앞으로 새로운 분야의 가능성이 열릴 수 있다고 기대할 수 있다[2,3]. (중략)

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Precise pressure sensor using piezoelectric nanocomposites integrated directly in organic field-effect transistors

  • Tien, Nguyen Thanh;Trung, Tran Quang;Seol, Young-Gug;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.500-500
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    • 2011
  • With recent advances in flexible and stretchable electronics, the development of physically responsive field-effect transistors (physi-FETs) that are easily integrated with transformable substrates may enable the omnipresence of physical sensing devices in electronic gadgets. However, physical stimuli typically induce whole sensing physi-FET devices under global influences that also cause changes in the parameters of FET transducers, such as channel mobility and dielectric capacitance that prevent proper interpretations of response in sensing materials. Extended-gate structures with isolated stimuli have been used recently in physi-FETs to demonstrate performances of sensing materials only. However, such approaches are limited to prototype researches since isolated stimuli rarely occur in real-life applications. In this report, we theoretically and experimentally demonstrated that integrating piezoelectric nanocomposites directly into flexible organic FETs (OFETs) as gate dielectrics provides a general research direction to physi-FETs with a simple device structure and the capability of precisely investigating functional materials. Measurements with static stimulations, which cannot be performed in conventional systems, exhibited giant-positive d33 values of nanocomposites of barium titanate (BT) NPs and poly (vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)).

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Spin Transport in a Ferromagnet/Semiconductor/Ferromagnet Structure: a Spin Transistor

  • Lee, W.Y;Bland, J.A.C
    • Journal of Magnetics
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    • v.7 no.1
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    • pp.4-8
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    • 2002
  • The magnetoresistance (MR) and the magnetization reversal of a lateral spin-injection device based on a spin-polarized field effect transistor (spin FET) have been investigated. The device consists of a two-dimensional electron gas (2DEG) system in an InAs single quantum well (SQW) and two ferromagnetic $(Ni_{80}Fe_{20})$ contacts: all injector (source) and a detector (drain). Spin-polarized electrons are injected from the first contact and, after propagating through the InAs SQW are collected by the second contact. By engineering the shape of the permalloy contacts, we were able to observe distinct switching fields $(H_c)$ from the injector and the collector by using scanning Kerr microscopy and MR measurements. Magneto-optic Kerr effect (MOKE) hysteresis loops demonstrate that there is a range of magnetic field (20~60 Oe), at room temperature, over which the magnetization in one contact is aligned antiparallel to that in the other. The MOKE results are consistent with the variation of the magnetoresistance in the spin-injection device.

Development of High Voltage Pulse Power Supply for Focus Electrode(FE) type TWTA test station (Focus Electrode(FE) type TWTA용 고전압 펄스전원장치 개발)

  • Kim S. C.;Kim D. H.
    • Proceedings of the KIPE Conference
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    • 2004.07a
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    • pp.61-63
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    • 2004
  • Focus Electrode(FE) 기능을 갖는 진행파관 증폭기(TWTA)를 구동하기 위하여 고전압 펄스전원 장치가 필요하다. 이 전원장치는 영부터 -5.0 kV TWT 캐소드 고전압 위에서 펄스 출력으로 동작 되어야 한다. 고전압펄스전원장치는 바이어스 전압이 영부터 -1.5 kV 사이를 연속적으로 가변 할 수 있어야 하고, 펄스의 반복 주파수는 CW로 부터 1 kHz 그리고 펄스폭은 $10\;{\mu}s$ 부터 $500\;{\mu}s$로 선택 가능하여야 한다. 그리고 출력펄스의 상승 및 하강 시간은 150 ns 보다 작아야 한다. 턴-온 및 오프의 스윗칭 시간을 만족시키기 위하여 고전압 스위치는 직렬로 연결된 FET 모듈을 사용하였다. 본 논문에서는 이러한 고전압 펄스전원장치의 설계 및 제작원리 그리고 시험결과에 대하여 다루었다.

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Memory Circuit of Nonvolatile Single Transistor Ferroelectric Field Effect Transistor (비휘발성 단일트랜지스터 강유전체 메모리 회로)

  • 양일석;유병곤;유인규;이원재
    • Proceedings of the IEEK Conference
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    • 2000.11b
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    • pp.55-58
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    • 2000
  • This paper describes a single transistor type ferroelectric field effect transistor (1T FeFET) memory celt scheme which can select one unit memory cell and program/read it. To solve the selection problem of 1T FeEET memory cell array, the row direction common well is electrically isolated from different adjacent row direction column. So, we can control voltage of common well line. By applying bias voltage to Gate and Well, respectively, we can implant IT FeEET memory cell scheme which no interface problem and can bit operation. The results of HSPICE simulations showed the successful operations of the proposed cell scheme.

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Recent Advance of Flexible Organic Memory Device

  • Kim, Jaeyong;Hung, Tran Quang;Kim, Choongik
    • Journal of Semiconductor Engineering
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    • v.1 no.1
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    • pp.38-45
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    • 2020
  • With the recent emergence of foldable electronic devices, interest in flexible organic memory is significantly growing. There are three types of flexible organic memory that have been researched so far: floating-gate (FG) memory, ferroelectric field-effect-transistor (FeFET) memory, and resistive memory. Herein, performance parameters and operation mechanisms of each type of memory device are introduced, along with a brief summarization of recent research progress in flexible organic memory.

Characteristics of a Titanium-oxide Layer Prepared by Plasma Electrolytic Oxidation for Hydrogen-ion Sensing

  • Lee, Do Kyung;Hwang, Deok Rok;Sohn, Young-Soo
    • Journal of Sensor Science and Technology
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    • v.28 no.2
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    • pp.76-80
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    • 2019
  • The characteristics of a titanium oxide layer prepared using a plasma electrolytic oxidation (PEO) process were investigated, using an extended gate ion sensitive field effect transistor (EG-ISFET) to confirm the layer's capability to react with hydrogen ions. The surface morphology and element distribution of the PEO-processed titanium oxide were observed and analyzed using field-emission scanning-electron microscopy (FE-SEM) and energy-distribution spectroscopy (EDS). The titanium oxide prepared by the PEO process was utilized as a hydrogen-ion sensing membrane and an extended gate insulator. A commercially available n-channel enhancement MOS-FET (metal-oxide-semiconductor FET) played a role as a transducer. The responses of the PEO-processed titanium oxide to different pH solutions were analyzed. The output drain current was linearly related to the pH solutions in the range of pH 4 to pH 12. It was confirmed that the titanium-oxide layer prepared by the PEO process could feasibly be used as a hydrogen-ion-sensing membrane for EGFET measurements.

Giant Piezoelectric Nanocomposites Integrated in Physically Responsive Field-effect Transistors for Pressure Sensing Applications

  • Tien, Nguyen Thanh;Trung, Tran Quang;Kim, Do-Il;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.550-551
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    • 2012
  • Physically responsive field-effect transistors (physi-FETs), which are sensitive to physical stimuli, have been studied for decades. However, the primary issue of separating responses by sensing materials from interferences by other subcomponents in a FET transducer under global physical stimuli has not been completely resolved. Recent challenges of structural design and employing smart materials with a large electro-physical coupling effect for flexible physi-FETs still remain. In this article, we propose directly integrating nanocomposites of barium titanate (BT) nanoparticles (NPs) and highly crystalline poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) as gate dielectrics into flexible organic FETs to precisely separate and quantify tiny variations of remnant polarization caused by mechanical stimuli. Investigations under static stimuli resulted in first-reported giant-positive piezoelectric coefficients of d33 up to 960 pC/N, presumably due to significant contribution of the intrinsic piezoelectricity of BT NPs and P(VDF-TrFE) crystallites. This approach provides a general research direction, and not limited to physic-FETs.

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Growth and Structural Properties of Fe Thin Films Electrodeposited on n-Si(111) (n-Si(111) 기판 위에 전기증착에 의한 Fe 박막의 성장과 구조적 특성)

  • Kim Hyun-Deok;Park Kyeong-Won;Lee Jong-Duk
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.9
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    • pp.1663-1670
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    • 2006
  • Single crystal Fe thin films were grown directly onto n-Si(111) substrates by pulsed electrodeposition. Cyclic Voltammogram(CV) indicated that the $Fe^{2+}/n-Si(111)$ interface shows a good diode behavior by forming a Schottky barrier. From Mott-Schottky (MS) relation, it is found that the flat-band potential of n-Si(111) substrate and equilibrium redox potential of $Fet^{2+}$ ions are -0.526V and -0.316V, respectively. The nucleation and growth kinetics at the initial reaction stages of Fe/n-Si(111) substraste was studied by current transients. Current transients measurements have indicated that the deposition process starts via instantaneous nucleation and 3D diffusion limited growth. After the more deposition, the deposition flux of Fe ions was saturated with increase of deposition time. from the as-deposited sample obtained using the potential pulse of 1.4V and 300Hz, it is found that Fe nuclei grows to three dimensional(3D) islands with the average size of about 100nm in early deposition stages. As the deposition time increases, the sizes of Fe nuclei increases progressively and by a coalescence of the nuclei, a continuous Fe films grow on the Si surface. In this case, the Fe films show a highly oriented columnar structure and x-ray diffraction patterns reveal that the phase ${\alpha}-Fe$ grows on the n-Si(111) substrates.

전이금속이 도핑된 Si 박막의 열처리 효과에 따른 구조 및 자기적 성질

  • Seo, Ju-Yeong;Park, Sang-U;Lee, Gyeong-Su;Song, Hu-Yeong;Kim, Eun-Gyu;Son, Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.184-184
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    • 2011
  • 반도체 전자 소자의 초고집적회로(VLSI, Very Large Scale Integrated Circuit)가 수년간 지속됨에 따라 실리콘 기반으로 하는 MOSFET 성능의 한계에 도달하게 되었다. 재료 물성, 축소, 소자 공정 등에 대한 원인으로 이를 극복하고자 하는 재료와 성능향상에 관한 연구가 진행되고 있다. 이에 기존 시스템의 전자의 전하 정보만을 응용하는 것이 아니라 전자의 스핀 정보까지 고려하는 스핀트로닉스 연구분야가 주목을 받고 있다. Spin-FET는 스핀 주입, 스핀 조절, 스핀측정 등으로 나뉘어 연구되고 있으며 이 중 스핀 주입의 효율 향상이 우선시 해결되어야 한다. 일반적으로 스핀 주입 과정에서 소스가 되는 강자성체와 스핀 확산 거리가 긴 반도체 물질과의 Conductance mismatch가 문제되고 있다. 이에 자성 반도체는 근본적인 문제를 해결하고 반도체와 자성체의 특성을 동시에 나타내는 물질로써, Si과 Ge (4족) 등의 반도체뿐만 아니라, GaAs, InP (3-5족), ZnO, ZnTe (2-6족) 등의 반도체 또한 많은 연구가 이루어지고 있다. 자성 반도체에서 해결해야 할 가장 큰 문제는 물질이 자성을 잃는 Curie 온도를 상온 이상으로 높이는 것이다. 이에 본 연구는 전이금속이 도핑된 4족 Si 반도체 박막을 성장하고 후처리 공정을 통하여 나타나는 구조적, 자기적 특성을 연구하였다. 펄스 레이저 증착 방법을 통하여 p-type Si 기판위에 전이금속 Fe이 도핑된 박막을 500 nm 로 성장하였다. 성장 온도는 $250^{\circ}C$로 하였고, 성장 분압은 $3 {\times}10^{-3}$Torr 로 유지하며 $N_2$ 가스를 사용하였다. 구조적 결과를 보기 위해 X선 회절 분석과 원자력 현미경 결과를 확인하였고, 자기적 특성을 확인하기 위해 저온에서 초전도 양자 간섭계로 조사하였다. XRD를 통해 (002)면, (004)면의 Si 기판 결정을 보았으며, Fe 관련된 이차상이 형성됨을 예측해 보았다. ($Fe_3Si$, $Fe_2Si$ 등) 초전도 양자 간섭계에서 20 K에서 측정한 이력 현상을 관찰하고, 온도변화에 따른 전체 자기모멘트를 관찰하였으며 이는 상온에서도 강자성 특성이 나타남을 확인하였다.

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