• 제목/요약/키워드: Fe ion

검색결과 1,131건 처리시간 0.028초

습식 산화법으로 성장된 산화구리입자를 이용한 방열 컴파운드 제조 및 특성 연구 (Characterizations of Thermal Compound Using CuO Particles Grown by Wet Oxidation Method)

  • 이동우;엄창현;주제욱
    • 한국재료학회지
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    • 제27권4호
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    • pp.221-228
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    • 2017
  • Various morphologies of copper oxide (CuO) have been considered to be of both fundamental and practical importance in the field of electronic materials. In this study, using Cu ($0.1{\mu}m$ and $7{\mu}m$) particles, flake-type CuO particles were grown via a wet oxidation method for 5min and 60min at $75^{\circ}C$. Using the prepared CuO, AlN, and silicone base as reagents, thermal interface material (TIM) compounds were synthesized using a high speed paste mixer. The properties of the thermal compounds prepared using the CuO particles were observed by thermal conductivity and breakdown voltage measurement. Most importantly, the volume of thermal compounds created using CuO particles grown from $0.1{\mu}m$ Cu particles increased by 192.5 % and 125 % depending on the growth time. The composition of CuO was confirmed by X-ray diffraction (XRD) analysis; cross sections of the grown CuO particles were observed using focused ion beam (FIB), field emission scanning electron microscopy (FE-SEM), and energy dispersive analysis by X-ray (EDAX). In addition, the thermal compound dispersion of the Cu and Al elements were observed by X-ray elemental mapping.

물리적 기상증착법을 이용한 내지문(Anti-Finger Print) 코팅 최적 공정 및 박막특성분석

  • 김왕렬;김현승;정우창;권민철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.489-489
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    • 2013
  • AF 코팅은 유리나 플라스틱과 같은 기재 표면을 특수 처리하여 지문과 같은 오염물질의 부착방지와 오염물질이 부착되더라도 쉽게 제거 가능하도록 하는 기술이다. 전자, 자동차, 건축, 섬유, 철강분야 등에 활용 가능한 중요기술로 박막의 발수 발유 기능을 부여하는 표면처리 기술이고, 코팅방법에는 진공증착, 스핀코팅, 딥코팅, 플로우 코팅, 스프레이 코팅 등이 있으며, 경화 방법이나 접촉각 등의 특성이 반영된다. 터치패널 등의 지문부착방지 기술은 불소계와 비불소계 재료로 구분할 수 있지만 지문을 쉽게 지울 수 있고, 오염 방지 기능과 내구성이 있으며, 우수한 광학특성을 유지하는 것이 과제라 할 수 있다. 그리고 항균성을 부여하는 기술도 개발되고 있다. 이런 터치패널의 강화유리에 AF 코팅한 제품은 핸드폰 글래스에 처음 적용하면서부터 실생활에 도입이 시작되고 있다. 이러한 AF 코팅을 스퍼터링 법을 이용하여 증착 시켰다. 기존에는 E-beam을 이용한 증착 방식이 주를 이루었지만, 스퍼터링 법을 이용함으로써 박막의 균일화 및 대량생산이 가능해졌다. 따라서 이 연구에서는 기존의 E-beam 방식과 sputtering 공정 중 ion source에 의한 전처리의 유무에 따른 박막의 특성을 비교하였다. 내부식성, 내마모성 시험을 거친 후, 접촉각을 측정하여 알아보았으며, 박막의 건전성 및 균일성은 FE-SEM을 이용하여 관찰하였다. 실험용 장비가 아닌 실제 생산장비인 직경 1,400 파이의 장비를 이용하여 증착하였으며 염수분무 및 내마모 시험 후, 기존 접촉각의 ${\pm}5^{\circ}$ 내외임을 확인 할 수 있었고, 박막의 건전성 또한 뛰어남을 알 수 있었다.

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Production of Saccharogenic and Dextrinogenic Amylases by Rhizomucor pusillus A 13.36

  • Silva Tony M.;Attili-Angelis Derlene;Carvalho Ana Flavia Azevedo;Silva Roberto Da;Boscolo Mauricio;Gomes Eleni
    • Journal of Microbiology
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    • 제43권6호
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    • pp.561-568
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    • 2005
  • A newly-isolated thermophilic strain of the zygomycete fungus Rhizomucor pusillus 13.36 produced highly active dextrinogenic and saccharogenic enzymes. Cassava pulp was a good alternative substrate for amylase production. Dextrinogenic and saccharogenic amylases exhibited optimum activities at a pH of 4.0-4.5 and 5.0 respectively and at a temperature of $75^{\circ}C$. The enzymes were highly thermostable, with no detectable loss of saccharogenic or dextrinogenic activity after 1 hand 6 h at $60^{\circ}C$, respectively. The saccharogenic activity was inhibited by $Ca^{2+}$ while the dextrinogenic was indifferent to this ion. Both activities were inhibited by $Fe^{2+}\;and\;Cu^{2+}$ Hydrolysis of soluble starch by the crude enzyme yielded $66\%$ glucose, $19.5\%$ maltose, $7.7\%$ maltotriose and $6.6\%$ oligosaccharides.

기주식물엽에 있어서 녹병균의 분화 (Rust Fungus Diferentiation on Host Leaves)

  • 김원겸
    • 미생물학회지
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    • 제13권1호
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    • pp.37-44
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    • 1975
  • As a basic study to elucidate nutritional physiology and composition of synthetic medium of red rotting bacteria, Erwinia carotovora, of ginseng, the effects of hydrogen ion concentration, various kinds of carbon sources, nitrogen source, micrometallic salts and it's concentration on the gorwth of the bacteria were investigated and the results were as follows. Optimal pH in the basal medium for the growth of the bacteria was 6.5. After incubation the pH in culture media was neutralized. Among the various kinds of carbon sources, sucrose, glucose mannitol, but organic acids were not utilized effectively as nutrients. After incubation the pH turned acidic. Alanine as organic nitrogen sources nad ammonium sulfate as inorganic nitrogen promoted the growth, but L-valine and sodium nitrite were the least effective. Ferric chloride 1.0mg/dl and ferrous sulfate 100mg/dl were the most effective as micrometallic sources. Control and boric acid were the least effective. New synthetic medium based on the above results was follows ; Alanine 1.0g, $KH_2PO_4$ 1.0g, sucrose 30.0g, $MgSo_4$ $7H_2$O 0.5g, $FeCl_36H_2$O 1.0mg thiamine 200.gamma.g, and distilled water 1000ml, pH6.5.

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Synthesis of Iron-loaded Zeolites for Removal of Ammonium and Phosphate from Aqueous Solutions

  • Kim, Kwang Soo;Park, Jung O;Nam, Sang Chul
    • Environmental Engineering Research
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    • 제18권4호
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    • pp.267-276
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    • 2013
  • This study presents a comparison of different protocols for the synthesis of iron-loaded zeolites, and the results of their application, as well as that of zeolite-A (Z-A), to the removal of ammonium and phosphate from aqueous media. Zeolites prepared by three methods were evaluated: iron-incorporated zeolites (IIZ), iron-exchanged zeolites (IEZ), and iron-calcined zeolites (ICZ). The optimal iron content for preparing of IIZ, as determined via scanning electron microscopy and X-ray photoelectron spectroscopy analyses, expressed as molar ratio of $SiO_2:Al_2O_3:Fe$, was below 0.05. Ammonia removal revealed that the iron-loaded zeolites have a higher removal capacity than that of Z-A due, not only to ion-exchange phenomena, but also via adsorption. Greater phosphate removal was achieved with IEZ than with ICZ; additionally, no sludge production was observed in this heterogeneous reaction, even though the coagulation process is generally accompanied by the production of a large amount of undesired chemical sludge. This study demonstrates that the developed synthetic iron-loaded zeolites can be applied as a heterogeneous nutrient-removal materials with no sludge production.

Effects of TiN Coating on the Fatigue Fracture of Dental Implant System with Various Cyclic Loads

  • Jung, Da-Un;Chung, Chae-Heon;Son, Mee-Kyoung;Choe, Han-Cheol
    • 한국표면공학회지
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    • 제48권6호
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    • pp.283-291
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    • 2015
  • The purpose of this study was to investigate effects of TiN coating on the fatigue fracture of dental implant system with various cyclic loads. TiN coated abutment screw, the fixture, and abutment of internal hex type were prepared for fatigue test. The fatigue test was carried out according to ISO 14801:2003(E) using tensile and compression tester with repeated load from 30% to 80% of static fracture force. Morphology and fractured surface was observed by field emission scanning electron microscope(FE-SEM) and energy dispersive X-ray spectroscope(EDS). The fracture cycle drastically decreased as repeated load increased. Especially, in the case of TiN-coated abutment screw, fracture cycle increased compared to non-coated abutment screw. The fatigue crack was propagated fast as repeated load increased. The plastic deformation region decreased, whereas, cleavage fracture region increased as repeated load increased.

Aspergillus속 균주가 생산하는 Phytase의 분리 정제 및 특성 (Isolation, Purification and Characterization of Phytase from Asperfillus sp.)

  • 천성숙;조영제;차원섭;이희덕;이선호
    • 한국식품영양과학회지
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    • 제27권1호
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    • pp.38-45
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    • 1998
  • To extract insoluble proteins and to improve funtional properties of abolished proteins, an phytase producing Aspergillus sp. SM-15 was isolated from soil. The enzyme was purified and its enzymological characteristics were investigated. Phytase production reached to maximum when the wheat bran medium containing 1% mannose, 1% yeast extract, 1% (NH4)2HPO4 and 0.2% calcium chloride was cultured for 4 days. Phytase was purified 17.1 fold and specific activity was 244.32unit/mg by a sequencial process of ammonium sulfate fraction, ion exchange chromatography and gel filtrations Pruified enzyme was confirmed as a single band by the polyacrylamide gel electro-phoresis. The molecular weight of phytase was estimated to be 46,000. The optimum pH and temperature for the phytase activity were 5.5 and 5$0^{\circ}C$. The enzyme is stable in pH 4.5~5.5, 6$0^{\circ}C$. The activity of purified enzyme was inhibited by Hg2+ whereas activited by Pb2+ and Fe2+. The activity of phytase was inhibited by the treatment with iodine. The result indicate the possible involvement of histidine at active site. Km and Vmax of the puridied phytase were 37.037mM/L and 159.87umol/min, respectively.

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Phosphorescent Azacrown Ether-appended Iridium (III) Complex for the Selective Detection of Hg2+ in Aqueous Acetonitrile

  • Li, Yinan;Yoon, Ung-Chan;Hyun, Myung-Ho
    • Bulletin of the Korean Chemical Society
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    • 제32권1호
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    • pp.122-126
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    • 2011
  • A new phosphorescent cyclometalated heteroleptic iridium (III) complex with an ancillary ligand of 4-azacrownpicolinate was prepared and its metal ion selective phosphorescent chemosensing behavior was investigated. The new iridium (III) complex exhibits notable phosphorescence quenching for Hg2+ in aqueous 50% acetonitrile solution with respect to the selective phosphorescent detection of various metal ions including $Li^+,Na^+,K^+,Cs^+,Mg^{2+},Ca^{2+},Ba^{2+},Fe^{2+},Ni^{2+},Cu^{2+},Zn^{2+},Ag^+,Pb^{2+},Cd^{2+},Cr^{2+},Cr^{3+}$ and $Hg^{2+}$. The phosphorescence quenching for $Hg^{2+}$ increased linearly with increasing concentration of $Hg^{2+}$ in the range of $10{\mu}M-700{\mu}M$ even in the presence of other metal ions, except for $Cu^{2+}$. Consequently, the new iridium (III) complex has the potential to be utilized for the determination of parts per million levels of $Hg^{2+}$ in aqueous acetonitrile media.

제주도 해안가에서 측정된 에어로졸의 성분별 입경분포 특성 (Size Distribution of Ambient Aerosol Measured at a Coastal Site in Jeju Island)

  • 이기호;양희준;허철구
    • 한국환경과학회지
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    • 제12권10호
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    • pp.1043-1054
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    • 2003
  • During the period from April to September 2002, the size distributions of ambient aerosol were measured at the coastal site at Hamduk in Jeju Island. Na$\^$+/, K$\^$+/, Mg$\^$2+/, Ca$\^$2+/and Cl$\^$-/ exhibited mostly a bimodal coarse mode size distribution, while ammonium and sulfate were mainly in the fine size range, with maximum at around 0.54$\mu\textrm{m}$. The average molar concentration ratio of ammonium to sulfate for fine particles was equal to 2.0${\pm}$0.9. Nitrate was evenly found in both the coarse and fine modes. Elements like Al, Fe, Cu, Mg, Na, Ti, Sr and Mn were dominant in coarse particles, with the maximum at around 5.25$\mu\textrm{m}$. S and Pb were mainly in the submicrometer size range. Other elements with a fine and coarse modes were V, Ni, Cu, Ba and Mo. The patterns of the size distributions of trace elements measured at the downtown in Jeju City were very similar to those at the coastal site in Hamduk. However, the amplitude of size fractional concentrations at Jeju City was narrower than that at Hamduk. While the mass median diameters for the chemical species originated from the natural origin such as marine and crust were relatively large, those for ammonium, sulfate, S and Pb were very small.

초순수의 오염과 반도체 제조에 미치는 영향에 대한 연구 (A Study on the Contamination of D.I. Water and its Effect on Semiconductor Device Manufacturing)

  • 김흥식;유형원;윤철;김태각;최민성
    • 전자공학회논문지A
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    • 제30A권11호
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    • pp.99-104
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    • 1993
  • We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

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