• Title/Summary/Keyword: Fabrication methods

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Comparison of Surface Characteristics According to 3D Printing Methods and Materials for the Fabrication of Microfluidic Systems (미세유체시스템 제작을 위한 3D 프린팅 방식 및 소재 별 표면특성 비교)

  • Bae, Seo Jun;Im, Do Jin
    • Korean Chemical Engineering Research
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    • v.57 no.5
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    • pp.706-713
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    • 2019
  • In this study, basic research was conducted to provide guidelines for selecting printers and materials suitable for each application case by analyzing 3D printing method and surface characteristics of materials suitable for microfluidic system. We have studied the surface characteristics according to the materials for the two typical printing methods: The most commonly used method of Fused Deposition Modeling (FDM) printing and the relatively high resolution method of Stereolithography (SLA) printing. The FDM prints exhibited hydrophilic properties before post - treatment, regardless of the material, but showed hydrophobic properties after post - treatment with acetone vapor. It was confirmed by the observation of surface roughness using SEM that the change of the contact angle was due to the removal of the surface structure by post-treatment. SLA prints exhibited hydrophilic properties compared to FDM prints, but they were experimentally confirmed to be capable of surface modification using hydrophobic coatings. It was confirmed that it is impossible to make a transparent specimen in the FDM method. However, sufficient transparency is secured in the case of the SLA method. It is also confirmed that the electroporation chip of the digital electroporation system based on the droplet contact charging phenomenon was fabricated by the SLA method and the direct application to the microfluidic system by demonstrating the electroporation successfully.

Comparison on the Fracture Strength Depending on the Fiber Post and Core Build-up (섬유 강화 포스트와 코어 축성 방법에 따른 파절 강도에 관한 비교)

  • Lee, Ja-Hyoung;Shin, Sooyeon
    • Journal of Dental Rehabilitation and Applied Science
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    • v.25 no.3
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    • pp.225-235
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    • 2009
  • A common procedure of restoration of endodonticlly treated tooth with fiber-reinforced post is followed by core build-up after post cementation. However, this technique is complex and time-consuming. The aim of this study was to compare fracture strength of premolar, restored with various methods of core fabrications on fiber-reinforced posts and casting metal restoration. Forty five freshly extracted human mandibular premolars were obtained and devided into 5 groups acconding to the type of post and methods of core build-up. In Group A, D.T. $Light-post^{(R)}$ were cemented with $DUO-LINK^{TM}$ and then $LIGHT-CORE^{TM}$ was used for core restoration. In Group B, D.T. $Light-post^{(R)}$ and $DUO-LINK^{TM}$ were used for cementing in the postspace, and $DUO-LINK^{TM}$ was used again for core restoration. In Group C, $Light-post^{(R)}$ bonding and the core build-up were performed simultaneously by using $DUO-LINK^{TM}$. In Group D, $LuxaPost^{(R)}$ was bonded by using $LuxaCore^{(R)}-Dual$. Again, $LuxaCore^{(R)}-Dual$ was used for core restoration. In Group E, $LuxaPost^{(R)}$ bonding and the core build-up were performed simultaneously by using $LuxaCore^{(R)}-Dual$. Axial reduction was formed parallelly as possible and 45 degree bevel was made at buccal occlusal surface. Crowns were fabricated and cemented. Each tooth was embedded in self-curing acrylic resin to the level of 2mm below the CEJ. Specimens were fixed on universal testing machin such that the axis of the tooth was at 45 degree inclination to the horizontal plane, and compressive force was applied at a crosshead speed of 1mm/min until failure occurred. The mean fracture strength was the highest in group A followed by descending order in group B, D, E and C. However, there were no statistically significant differences between groups with regard to the fracture strength. The type of the post or build-up methods of the core does not seem to influence the fracture strength.

Polymerization of HEMA by Electron beam Irradiation and Fabrication of Soft contact lens (전자빔조사에 의한 HEMA의 중합과 소프트콘택트렌즈 제조)

  • Hwang, Kwang-Ha;Shin, Joong-Hyeok;Sung, Yu-Jin;Jeong, Keun-Seung;Jun, Jin
    • Journal of Korean Ophthalmic Optics Society
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    • v.17 no.2
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    • pp.135-141
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    • 2012
  • Purpose: Polymerization of HEMA(2-hydroxyethyl methacrylate) which can be used in the soft contact lens has been performed by using electron beam(EB) irradiation, and examined the best condition for the polymerization. Comparing the physical properties of the contact lenses to the one fabricated by thermal polymerization method, we check the use possibility of the EB irradiation to the fabrication of the soft contact lens. Methods: We investigated the degree of polymerization of the HEMA according to the composition of the monomer, the additive ratio and the dose of electron beam (0~120 kGy). The degree of polymerization was measured depending on the EB dose to research the best synthetic condition under the EB irradiation. The physical properties of the contact lens such as water content(%), oxygen transmissibility(Dk/t) and optical transmittance were analysed by using the FT-IR results with comparing the two different polymerization method (thermal and electron beam polymerization) with same additive ratio. Results: When the dose of electron beam was above 100 kGy, the degree of polymerization of HEMA was above 99% with regardless using cross-linker and initiator. The water content of the lens fabricated by EB method showed 10% higher than the one by the thermal method which was 40%. The lens fabricated by EB method also showed higher oxygen transmissibility(Dk/t) as same with the water content, and showed twice higher value in the lens fabricated by pure HEMA. According to the FT-IR results, hydrophilic property of the lens fabricated by EB method was increased due to increasing the intermolecular hydrogen bonding. It showed above 90% optical transmittance in the visible range of wavelength on the contact lenses fabricated by the both of two different polymerization method. Conclusions: The polymerization of HEMA without cross-linker and initiator was successful above 100 kGy of EB irradiation. Moreover the lens fabricated from the polymer synthesized by pure HEMA with 100 kGy of EB showed the highest water content and oxygen transmissibility. Therefore EB irradiation is another possible method to synthesize the polymer which can be used for the soft contact lens.

Design and Fabrication of Sputter Coating System for Ophthalmic Lens (안경렌즈코팅용 소형 Sputter Coating System 설계 및 제작에 관한 연구)

  • Park, Moonchan;Jung, Boo Young;Kim, Eung Sun;Lee, Jong Geun;Joo, Kyung Bok;Moon, Hee Sung
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.1
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    • pp.53-58
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    • 2008
  • Purpose: To design and fabricate the small sputter coating system for the Ophthalmic lens. Methods: The design of sputter target was done using macleod program for AR coating and mirror coating of Ophthalmic lens with Si target and then the sputter system was fabricated. Results: The optimum condition of AR coating with Si target was [air|$SiO_2$(81.3)|$Si_3N_4$ (102)|$SiO_2$(19.21)|$Si_3N_4$(15.95)|$SiO_2$(102)|glass], for blue color mirror coating [air|$SiO_2$(56.61)|$Si_3N_4$(135.86)|$SiO_2$(67.64)|$Si_3N_4$(55.4)|$SiO_2$(53.53)|$Si_3N_4$(51.28)|glass], for green color coating [air|$SiO_2$(66.2)|$Si_3N_4$(22.76)|$SiO_2$(56.58)|$Si_3N_4$(140.35)|$SiO_2$(152.35)|$Si_3N_4$(70.16)|$SiO_2$(121.87)|glass], for gold color [air|$SiO_2$(83.59)|$Si_3N_4$(144.86)|$SiO_2$(11.82)|$Si_3N_4$(129.93)|$SiO_2$(90.01)|$Si_3N_4$(88.37)|glass]. Conclusions: In the fabrication of sputtering coating apparatus, Dual cathode with same Ti target were coated at the same time on both sides of Ophthalmic lens to lessen the time of coating on Ophthalmic Lens and save the cost of the lens. The distance of target-substrate of cathode was variable from 12.5 cm to 20 cm. Turbo pump was used to take the whole coating process about 15 min. instead of diffusion pump. The lens holder was made to coat 2 pairs lens every coating and was rotated to get the uniformity of thin film.

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Study of the Sludge Formation Mechanism in Advanced Packaging Process and Prevention Method for the Sludge (어드밴스드 패키징 공정에서 발생할 수 있는 슬러지의 인자 확인 및 형성 방지법의 제안)

  • Jiwon Kim;Suk Jekal;Ha-Yeong Kim;Min Sang Kim;Dong Hyun Kim;Chan-Gyo Kim;Yeon-Ryong Chu;Neunghi Lee;Chang-Min Yoon
    • Journal of the Korea Organic Resources Recycling Association
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    • v.31 no.1
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    • pp.35-45
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    • 2023
  • In this study, the sludge formation in the wastewater drain from the advanced packaging process mechanisms are revealed as well as the key factors, materials, and sludge prevention methods using surfactant. Compared with that of conventional packaging process, advanced packaging process employ similar process to the semiconductor fabrication process, and thus many processes may generate wastewater. In specific, a large amount of wastewater may generate during the carrier wafer bonding, photo, development, and carrier wafer debonding processes. In order to identify the key factors for the formation of sludge during the advanced packaging process, six types of chemicals including bonding glue, HMDS, photoresist (PR), PR developer, debonding cleaner, and water are utilized and mixing evaluation is assessed. As a result, it is confirmed that the black solid sludge is formed, which is originated by the sludge seed formation by hydrolysis/dehydration reaction of HMDS and sludge growth via hydrophobic-hydrophobic binding with sludge seed and PR. For the sludge prevention investigation, three surfactants of CTAB, PEG, and shampoo are mixed with the key materials of sludge, and it is confirmed that the sludge formations are successfully suppressed. The underlying mechanism behind the sludge formation is that the carbon tails of the surfactant bind to PR with hydrophobic-hydrophobic interaction and inhibit the reaction with HMDS-based slurry seeds to prevent the sludge formation. In this regard, it is expected that various problems like clogging in drains and pipes during the advanced packaging process may effectively solve by the injection of surfactants into the drains.

Solar Module with a Glass Surface of AG (Anti-Glare) Structure (연요철(Anti-Glare) 구조의 표면 유리 기판을 가지는 고효율 태양전지 모듈)

  • Kong, Dae-Young;Kim, Dong-Hyun;Yun, Sung-Ho;Bae, Young-Ho;Yu, In-Sik;Cho, Chan-Seob;Lee, Jong-Hyun
    • Journal of the Korean Vacuum Society
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    • v.20 no.3
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    • pp.233-241
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    • 2011
  • Currently, solar module is using the two methods such as a glass-filled method or a super-straight method. The common point of these methods is to use glass structure on the front of solar module. However, the reflectance of the solar module is high depending on the height of the incident sunlight due to the flat surface of the module front glass. Purposed to solve these problems, AG (anti-glare) structures were formed on the glass surface. Next is fabrication methods of AG structure. First, uneven structure made by micro blaster equipment was dipped in Hydro-fluidic acid (HF) acid. HF acid process was carried out to remove particles and to make high transmittance. The reflectance and transmittance of the anti-glare glass was compared to those of the bare glass. The reflectance of anti-glare glass decreased approximately 1% compared with bare glass. The transmittance of anti-glare glass was similar to bare glass. According to the sample angle, the difference of the reflectance between bare glass and the anti-glare glass was about 19%. Isc and efficiency value of anti-glare glass on bare solar cell appeared about 3.01 mA and 0.228% difference compared with bare glass. Anti-glare glass on textured solar cell appeared about 9.46 mA and 0.741% difference compared with bare glass. As a result, the role of anti-glare in the substrate is to reduces the loss of sunlight reflected from the surface. In this study, therefore, AG structure on the solar cell was used to improve the efficiency of solar cell.

Study on Pressure-dependent Growth Rate of Catalyst-free and Mask-free Heteroepitaxial GaN Nano- and Micro-rods on Si (111) Substrates with the Various V/III Molar Ratios Grown by MOVPE

  • Ko, Suk-Min;Kim, Je-Hyung;Ko, Young-Ho;Chang, Yun-Hee;Kim, Yong-Hyun;Yoon, Jong-Moon;Lee, Jeong-Yong;Cho, Yong-Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.180-180
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    • 2012
  • Heteroepitaxial GaN nano- and micro-rods (NMRs) are one of the most promising structures for high performance optoelectronic devices such as light emitting diodes, lasers, solar cells integrated with Si-based electric circuits due to their low dislocation density and high surface to volume ratio. However, heteroepitaxial GaN NMRs growth using a metal-organic vapor phase epitaxy (MOVPE) machine is not easy due to their long surface diffusion length at high growth temperature of MOVPE above $1000^{\circ}C$. Recently some research groups reported the fabrication of the heteroepitaxial GaN NMRs by using MOVPE with vapor-liquid-solid (VLS) technique assisted by metal catalyst. However, in the case of the VLS technique, metal catalysts may act as impurities, and the GaN NMRs produced in this mathod have poor directionallity. We have successfully grown the vertically well aligned GaN NMRs on Si (111) substrate by means of self-catalystic growth methods with pulsed-flow injection of precursors. To grow the GaN NMRs with high aspect ratio, we veried the growth conditions such as the growth temperature, reactor pressure, and V/III molar ratio. We confirmed that the surface morphology of GaN was strongly influenced by the surface diffusion of Ga and N adatoms related to the surrounding environment during growth, and we carried out theoretical studies about the relation between the reactor pressure and the growth rate of GaN NMRs. From these results, we successfully explained the growth mechanism of catalyst-free and mask-free heteroepitaxial GaN NMRs on Si (111) substrates. Detailed experimental results will be discussed.

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Liquid Silicon Infiltrated SiCf/SiC Composites with Various Types of SiC Fiber (다양한 SiC 섬유를 적용한 실리콘 용융 침투 공정 SiCf/SiC 복합재료의 제조 및 특성 변화 연구)

  • Song, Jong Seob;Kim, Seyoung;Baik, Kyeong Ho;Woo, Sangkuk;Kim, Soo-hyun
    • Composites Research
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    • v.30 no.2
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    • pp.77-83
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    • 2017
  • Liquid silicon infiltration, which is one of the methods of producing fiber reinforced ceramic composites, has several advantages such as low fabrication cost and good shape formability. In order to confirm LSI process feasibility of SiC fiber, $SiC_f/SiC$ composites were fabricated using three types of SiC fibers (Tyranno SA, LoxM, Tyranno S) which have different crystallinity and oxygen content. Composites that were fabricated with LSI process were well densified by less than 2% of porosity, but showed an obvious difference in 3-point bending strength according to crystallinity and oxygen content. When composites in LSI process was exposed to a high temperature, crystallization and micro structural changes were occurred in amorphous SiOC phase in SiC fiber. Fiber shrinkage also observed during LSI process that caused from reaction in fiber and between fiber and matrix. These were confirmed with changes of process temperature by SEM, XRD and TEM analysis.

Characteristics of graphene sheets synthesized by the Thermo-electrical Pulse Induced Evaporation (전계 펄스 인가 증발 방법을 이용한 그라핀의 특성 연구)

  • Park, H.Y.;Kim, H.W.;Song, C.E.;Ji, H.J.;Choi, S.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.412-412
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    • 2009
  • Carbon-based nano materials have a significant effect on various fields such as physics, chemistry and material science. Therefore carbon nano materials have been investigated by many scientists and engineers. Especially, since graphene, 2-dimemsonal carbon nanostructure, was experimentally discovered graphene has been tremendously attracted by both theoretical and experimental groups due to their extraordinary electrical, chemical and mechanical properties. Electrical conductivity of graphene is about ten times to that of silicon-based material and independent of temperature. At the same time silicon-based semiconductors encountered to limitation in size reduction, graphene is a strong candidate substituting for silicon-based semiconductor. But there are many limitations on fabricating large-scale graphene sheets (GS) without any defect and controlling chirality of edges. Many scientists applied micromechanical cleavage method from graphite and a SiC decomposition method to the fabrication of GS. However these methods are on the basic stage and have many drawbacks. Thereupon, our group fabricated GS through Thermo-electrical Pulse Induced Evaporation (TPIE) motivated by arc-discharge and field ion microscopy. This method is based on interaction of electrical pulse evaporation and thermal evaporation and is useful to produce not only graphene but also various carbon-based nanostructures with feeble pulse and at low temperature. On fabricating GS procedure, we could recognize distinguishable conditions (electrical pulse, temperature, etc.) to form a variety of carbon nanostructures. In this presentation, we will show the structural properties of OS by synthesized TPIE. Transmission Electron Microscopy (TEM) and Optical Microscopy (OM) observations were performed to view structural characteristics such as crystallinity. Moreover, we confirmed number of layers of GS by Atomic Force Microscopy (AFM) and Raman spectroscopy. Also, we used a probe station, in order to measure the electrical properties such as sheet resistance, resistivity, mobility of OS. We believe our method (TPIE) is a powerful bottom-up approach to synthesize and modify carbon-based nanostructures.

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Boron Doping Method Using Fiber Laser Annealing of Uniformly Deposited Amorphous Silicon Layer for IBC Solar Cells (IBC형 태양전지를 위한 균일하게 증착된 비정질 실리콘 층의 광섬유 레이저를 이용한 붕소 도핑 방법)

  • Kim, Sung-Chul;Yoon, Ki-Chan;Kyung, Do-Hyun;Lee, Young-Seok;Kwon, Tae-Young;Jung, Woo-Won;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.456-456
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    • 2009
  • Boron doping on an n-type Si wafer is requisite process for IBC (Interdigitated Back Contact) solar cells. Fiber laser annealing is one of boron doping methods. For the boron doping, uniformly coated or deposited film is highly required. Plasma enhanced chemical vapor deposition (PECVD) method provides a uniform dopant film or layer which can facilitate doping. Because amorphous silicon layer absorption range for the wavelength of fiber laser does not match well for the direct annealing. In this study, to enhance thermal affection on the existing p-a-Si:H layer, a ${\mu}c$-Si:H intrinsic layer was deposited on the p-a-Si:H layer additionally by PECVD. To improve heat transfer rate to the amorphous silicon layer, and as heating both sides and protecting boron eliminating from the amorphous silicon layer. For p-a-Si:H layer with the ratio of $SiH_4$ : $B_2H_6$ : $H_2$ = 30 : 30 : 120, at $200^{\circ}C$, 50 W, 0.2 Torr for 30 minutes, and for ${\mu}c$-Si:H intrinsic layer, $SiH_4$ : $H_2$ = 10 : 300, at $200^{\circ}C$, 30 W, 0.5 Torr for 60 minutes, 2 cm $\times$ 2 cm size wafers were used. In consequence of comparing the results of lifetime measurement and sheet resistance relation, the laser condition set of 20 ~ 27 % of power, 150 ~ 160 kHz, 20 ~ 50 mm/s of marking speed, and $10\;{\sim}\;50 {\mu}m$ spacing with continuous wave mode of scanner lens showed the correlation between lifetime and sheet resistance as $100\;{\Omega}/sq$ and $11.8\;{\mu}s$ vs. $17\;{\Omega}/sq$ and $8.2\;{\mu}s$. Comparing to the singly deposited p-a-Si:H layer case, the additional ${\mu}c$-Si:H layer for doping resulted in no trade-offs, but showed slight improvement of both lifetime and sheet resistance, however sheet resistance might be confined by the additional intrinsic layer. This might come from the ineffective crystallization of amorphous silicon layer. For the additional layer case, lifetime and sheet resistance were measured as $84.8\;{\Omega}/sq$ and $11.09\;{\mu}s$ vs. $79.8\;{\Omega}/sq$ and $11.93\;{\mu}s$. The co-existence of $n^+$layeronthesamesurfaceandeliminating the laser damage should be taken into account for an IBC solar cell structure. Heavily doped uniform boron layer by fiber laser brings not only basic and essential conditions for the beginning step of IBC solar cell fabrication processes, but also the controllable doping concentration and depth that can be established according to the deposition conditions of layers.

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