• Title/Summary/Keyword: Fabrication Process

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Fabrication of Nanocomposite Powders by Sonochemical Method

  • Hayashi, Yamato;Sekino, Tohru;Niihara, Koichi
    • Journal of Powder Materials
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    • v.8 no.3
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    • pp.207-209
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    • 2001
  • Nano particles have recently been a major research interest, motivated by their unusual physical and chemical properties. Such particles can be synthesized using physical and chemical methods. The physical methods need expensive installation like vacuum induction furnace, whereas in chemical methods the process in generally very simple and low cost. In this study, simple and new fabrication process by using ultrasound was investigated to prepare the nano-sized metal particles on various powders at room temperature.

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Development of 2.3' Plastic Film STN LCDs with uniform Cell Gap

  • Park, S.K.;Han, J.I.;Kim, W.K.;Kwak, M.K.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.39-40
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    • 2000
  • STN LCDs on Plastic Film substrates for mobile communication devices have been researched and developed at KETI in KOREA. The Plastic Film substrate is so weak to heat and pressure that its fabrication process is limited to $110^{\circ}C(Tg)$. In order to maintain uniform pressure on Plastic Film substrate we used newly designed jig and fabrication process. Electro-optical characteristics are better than or equivalent to those of typical glass LCD though it is thinner, lighter-weight, and more robust than glass LCD.

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Fabrication of Gallium Phosphide Tapered Nanostructures on Selective Surfaces

  • Song, Young Min;Park, Hyun Gi
    • Applied Science and Convergence Technology
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    • v.23 no.5
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    • pp.284-288
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    • 2014
  • We present tapered nanostructures fabricated on a selective area of gallium phosphide substrates for advanced optoelectronic device applications. A lithography-free fabrication process was accomplished by dry etching of metal nanoparticles. Thermal dewetting of micro-patterned metal thin films provides etch masks for tapered nanostructures. This simple process also allows the formation of plasmonic surfaces with corrugated shapes. Rigorous coupled-wave analysis calculations provide design guidelines for tapered nanostructures on gallium phosphide substrates.

A Study on Organic/Inorganic Materials Deposition Using SAW-ED System (SAW-ED 시스템을 이용한 유/무기 소재 증착에 관한 연구)

  • Kim, Hyun Bum;Kim, Kyung Hwan;Ghayas, Siddiqi;Lim, Jong Hwan;Yang, Hyoung Chan;Choi, Kyung Hyun
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.5
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    • pp.100-108
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    • 2016
  • In various industries, many researches studies have been done in using nano thin film fabrication technology. In the field of printed electronics, various electronic devices can be fabricated using a direct printing process of on multiple functional materials. It has the advantages of low prices, environment-friendly environmentally friendly, flexibleility, large scale, mass production produced, simple process and so on. In this study, a viable thin film fabrication technology has beenwas introduced using the surface acoustic wave mechanism for thin film deposition. Fabrication of thin films using organic, inorganic and composite of organic/inorganic materials have been were analyzed through the experimental research. In this experiment, organic material MEH:PPV, inorganic material ZnO and composite material MEH:PPV/ZnO have been depo sited as thin films.

A new fabrication process of vanadium oxides($VO_{x}$) thin films showing high TCR and low resistance for uncooled IR detectors

  • Han, Yong-Hee;Kang, Ho-Kwan;Moon, Sung-Uk;Oh, Myung-Hwan;Choi, In-Hoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.558-561
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    • 2001
  • Vanadium oxide ($VO_x$) thin films are very good candidate material for uncooled infrared (IR) detectors due to their high temperature coefficient of resistance (TCR) at room temperature. But, the deposition of $VO_x$ thin films showing good electrical properties is very difficult in micro bolometer fabrication process using sacrificial layer removal because of its low process temperature and thickness of thin films less than $1000{\AA}$. This paper presents a new fabrication process of $VO_x$ thin films having high TCR and low resistance. Through sandwich structure of $VO_{x}(100{\AA})/V(80{\AA})/VO_{x}(500{\AA})$ by sputter method and post-annealing at oxygen ambient, we have achieved high TCR more than $-2%/^{\circ}C$ and low resistance less than $10K\Omega$ at room temperature.

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Fabrication of Lenticular Lens by Continuous UV Roll Imprinting (UV Roll 임프린팅 공정을 이용한 렌티큘러 렌즈 제작)

  • Myung H.;Cha J.;Kim S.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.10a
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    • pp.91-94
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    • 2005
  • With increasing demands for large-scale micro-optical components in the field of digital display, the establishment of large-scale fabrication technology fur polymeric patterns has become a priority. The starting point of any polymer replication process is the mold, and the mold often has flat surface. However, It is very hard to replicate large-scale micro patterns using the flat mold, because the cost of large-scale flat mold was very high, and some uniformity and releasing problems were often occurred in large scale flat molding process. In this study, a UV roll imprinting system to overcome the financial and fabrication issues of large-scale pattern replication process was designed and constructed. As a practical example of the system, a lenticular lens with radius of curvature of $223{\mu}m$ and pitch of $280{\mu}m$, which was used to provide wide viewing angle in projection TV, was designed and fabricated. The roll stamper was fabricated using direct machining process of aluminum roll base. Finally, the shape accuracy and uniformity of roll imprinted lenticular lens sheet were measured and analyzed.

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Fabrication of Microstructures for Conductive Polymer Actuators Using MEMS Process (MEMS 공정을 이용한 전도성 고분자 액추에이터용 마이크로 구조물의 제작)

  • Lee, Seung-Ki;Jung, Seng-Hwan
    • Journal of Sensor Science and Technology
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    • v.12 no.4
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    • pp.156-163
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    • 2003
  • Polypyrrole microactuators have been fabricated by the standard surface micromachining method combined with the electropolymerization of polypyrrole. The fundamental structure to verify the feasibility of the fabrication process is polypyrrole cantilever. Based on these process, polypyrrole grippers and valves for the manipulation of the cell have been fabricated. Grippers have the structure of bone and muscle which are rigid polymers and polypyrrole, respectively. Valves have the assembled structure of channels with polypyrrole cantilevers. The proposed fabrication process and structures are expected to be used for bio-related applications, for example, the cell manipulation.

A HIGH-ASPECT-RADIO COME ACTUATOR USING UV-LIGA SURFACE MICROMACHINING AND (110) SILICON BULK MICORMACHINING (UV-LIGA 표면 미세 가공 기술과 (110) 실리콘 몸체 미세 가공 기술을 이용한 큰 종횡비의 빗모양 구동기 제작에 관한 연구)

  • Kim, Seong-Hyeok;Lee, Sang-Hun;Kim, Yong-Gwon
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.2
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    • pp.132-139
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    • 2000
  • This paper reports a novel micromachining process based on UV-LIGA process and (110) silicon anisotropic etching for fabrication of a high-aspect-ratio comb actuator. The comb electrodes are fabricated by (110) SILICON comb structure considering the etch-rate-ratio between (110) and (111) planes and lateral etch rate of a beam-type structure. The fabricated structure was$ 400\mum \; thick\; and\; 18\mum$ wide comb electrodes separated by $7\mim$ so that the height-gap ratio was about 57. Also considering resonant frequency of the comb actuator and the frequency-matching between sensing and driving mode for gyroscope application, we designed the number, width, height and length of the spring structures. Electroplated gold springs on both sides of the seismic mass were $15\mum\; wide,\; 14\mum\; thick\; and \; 500\mum$ long. The fabricated comb actuator had resonant frequency ay 1430Hz, which was calculated to be 1441Hz. The proposed fabrication process can be applicable to the fabrication of a high-aspect-ratio comb actuator for a large displacement actuator and precision sensors. Moreover, this combined process enables to fabricate a more complex structure which cannot be fabricate only by surface or bulk micromachining.

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Fabrication of 3D-Printed Circuit Device using Direct-Write Technology (Direct Write 기술을 이용한 3DCD의 제작)

  • Yun, Hae Young;Kim, Ho Chan;Lee, In Hwan
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.2
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    • pp.1-8
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    • 2016
  • Generally, electrical circuits are fabricated as Printed Circuit Boards (PCBs) and mounted on the casing of the product. Additionally, this requires many other parts and some labor for assembly. Recently, molding technology has increasingly been applied to embed simple circuits in plastic casing. The technology is called a Molded Interconnected Device (MID). By using this technology, PCB fabrication can be replaced by molding, and much of the corresponding assembly process for PCBs can be eliminated if the circuit is simple enough for molding. Furthermore, as the improvement of conductive materials and printing technologies of simple electric circuits can be printed directly on the casing part, this also reduces the complexity of the product design and production cost. Therefore, this paper introduces a new MID fabrication process using direct 3D printing technology. Additionally, it is applied to an automotive part of a cruise control switch. The methodology and design are shown.

Fabrication of Nano Master with Anti-reflective Surface Using Aluminum Anodizing Process (양극산화공정을 이용한 반사방지 성형용 나노 마스터 개발)

  • Shin, H.;Park, Y.;Seo, Y.;Kim, B.
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.18 no.6
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    • pp.697-701
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    • 2009
  • A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

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