Chemical vapor deposition of $TaC_xN_y$ films using tert-butylimido tris-diethylamido tantalum(TBTDET) : Reaction mechanism and film characteristics
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- 한국재료학회:학술대회논문집
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- 한국재료학회 2009년도 추계학술발표대회
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- pp.24.1-24.1
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- 2009