• Title/Summary/Keyword: FETs

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Degradation Pattern of Black phosphorus Field Effect Transistor

  • Lee, Byeong-Cheol;Ju, Min-Gyu;Jin, Jun-Eon;Lee, Jae-U;Kim, Gyu-Tae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.167.1-167.1
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    • 2015
  • We investigate the degradation pattern of Black phosphorus (BP) field effect transistor (FETs) was investigated by using an mechanically exfoliated BP that react O2 and water vapor in ambient condition, degradation. The BP FETs was electrically measured every 20 minutes (1cycle) in the air, the total cycle is 100. We show electrical changes with Mobility, On/off ratio, Current and a significant positive shift in the threshold voltage. We extracted the current level at Vgs-Vth = 0, -10, -20 and fitting with Swiss-cheese model. This model suggested that Swiss-cheese model is well fitted with degradation pattern of BP FETs.

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Fabrication of p-type FinFETs with a 20 nm Gate Length using Boron Solid Phase Diffusion Process

  • Cho, Won-Ju
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.1
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    • pp.16-21
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    • 2006
  • A simple doping method to fabricate a very thin channel body of the p-type FinFETs with a 20 nm gate length by solid-phase-diffusion (SPD) process was developed. Using the poly-boron-films (PBF) as a novel diffusion source of boron and the rapid thermal annealing (RTA), the p-type sourcedrain extensions of the FinFET devices with a threedimensional structure were doped. The junction properties of boron doped regions were investigated by using the $p^+-n$ junction diodes which showed excellent electrical characteristics. Single channel and multi-channel p-type FinFET devices with a gate length of 20-100 nm was fabricated by boron diffusion process using PBF and revealed superior device scalability.

Design of Ku-Band Self-Oscillatring Mixer Using Cascode FETs Structure (Cascode형 FETs 구조를 이용한 Ku-Band 자기발진믹서의 설계)

  • 심재우;이영철
    • Proceedings of the Korea Electromagnetic Engineering Society Conference
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    • 2001.11a
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    • pp.227-230
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    • 2001
  • 본 논문은 마이크로파 슈퍼헤테로다인 수신기에서 발생되는 이미지성분을 효과적으로 제거하기위한 Cascode형 FETs구조를 이용한 Ku-Band 이미지 제거용 자기발진믹서을 분석하였다. 자기발진믹서는 두개의 FET에 의해서 동작되며 상위 FET는 유전체공진기에 의해서 발진기로 동작하며, 아래쪽 FET는 믹서로 동작시켰다. 모의실험 결과 초기 게이트바이어스 전압은 $V_{ gsl}$=-0.4V와 $V_{g2}$=-0.4V와 $V_{g2}$V선정 하였으며, 10.75GHz의 발진기 출력은 2.249dBm, 위상잡음은 -137.9dBc/1000KHz, 이미지 제거특성은 약 -26dBc 값을 얻었다.얻었다.

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Flexible and Transparent Reduced Graphene Oxide Nanocomposite Field-Effect Transistor for Temperature Sensing

  • Tran, QuangTrung;Ramasundaram, Subramanian;Hong, Seok Won;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.387.1-387.1
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    • 2014
  • A new class of temperature-sensing materials is demonstrated along with their integration into transparent and flexible field-effect transistor (FET) temperature sensors with high thermal responsivity, stability, and reproducibility. The novelty of this particular type of temperature sensor is the incorporation of an R-GO/P(VDF-TrFE) nanocomposite channel as a sensing layer that is highly responsive to temperature, and is optically transparent and mechanically flexible. Furthermore, the nanocomposite sensing layer is easily coated onto flexible substrates for the fabrication of transparent and flexible FETs using a simple spin-coating method. The transparent and flexible nanocomposite FETs are capable of detecting an extremely small temperature change as small as $0.1^{\circ}C$ and are highly responsive to human body temperature. Temperature responsivity and optical transmittance of transparent nanocomposite FETs were adjustable and tuneable by changing the thickness and R-GO concentration of the nanocomposite.

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Fabrication of a Graphene Nanoribbon with Electron Beam Lithography Using a XR-1541/PMMA Lift-Off Process

  • Jeon, Sang-Chul;Kim, Young-Su;Lee, Dong-Kyu
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.4
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    • pp.190-193
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    • 2010
  • This report covers an effective fabrication method of graphene nanoribbon for top-gated field effect transistors (FETs) utilizing electron beam lithography with a bi-layer resists (XR-1541/poly methtyl methacrylate) process. To improve the variation of the gating properties of FETs, the residues of an e beam resist on the graphene channel are successfully taken off through the combination of reactive ion etching and a lift-off process for the XR-1541 bi-layer. In order to identify the presence of graphene structures, atomic force microscopy measurement and Raman spectrum analysis are performed. We believe that the lift-off process with bi-layer resists could be a good solution to increase gate dielectric properties toward the high quality of graphene FETs.

Linearity Enhancement of Doped Channel GaAs-based Power FETs Using Double Heterostructure (이중이종접합을 이용한 채널도핑된 GaAs계 전력FET의 선형성 증가)

  • 김우석;김상섭;정윤하
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.9-11
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    • 2000
  • To increase the device linearities and the breakdown-voltages of FETs, Al$\sub$0.25/ Ga$\sub$0.75/AS / In$\sub$0.25/Ga$\sub$0.75/As / Partially doped channel FET(DCFET) structures are proposed. The metal- insulator -semiconductor (MIS) like structures show the high gate-drain breakdown voltage(-20 V) and high linearities. The devices showed the small ripple of the current cut-off frequency and the power cut-off frequency over the wide bias range.

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Triple-gate Tunnel FETs Encapsulated with an Epitaxial Layer for High Current Drivability

  • Lee, Jang Woo;Choi, Woo Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.2
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    • pp.271-276
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    • 2017
  • The triple-gate tunnel FETs encapsulated with an epitaxial layer (EL TFETs) is proposed to lower the subthreshold swing of the TFETs. Furthermore, the band-to-band tunneling based on the maximum electric-field can occur thanks to the epitaxial layer wrapping the Si fin. The performance and mechanism of the EL TFETs are compared with the previously proposed TFET based on simulation.

Analysis of Microwave Image signal Rejection using the Dual Gate FETs (Dual Gate FETs에 의한 마이크로파 이미지신호 제거특성 분석)

  • 심재우;이경보;이강훈;이영철
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2001.10a
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    • pp.234-237
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    • 2001
  • 본 논문은 마이크로파 수신기시스템에서 발생되는 이미지성분을 효과적으로 제거하기 위해서 Dual Gate FETs을 이용한 이미지 제거 특성을 분석하였다. Dual Gate를 이용한 이미지 제거능력을 모의 실험한 결과 RF신호에 대한 이미지 제거특성은 -32dBc을 보였으며, Dual Gate FETs믹서의 변환이득은 1.7 dBm, 5GHz 발진주파수는 -117.3 dBc/100KHz 임을 확인하였다.

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Light Emitting Devices Based on Organic Single Crystals

  • Nakanotani, Hajime;Saito, Masatoshi;Nakamura, Hiroaki;Adachi, Chihaya
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.342-345
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    • 2009
  • Bright light-emitting single crystal organic field-effect transistors (FETs) based on highly luminescent oligo(p-phenylenevinylene) (OPV) derivatives are demonstrated. Although OPV single crystal FETs show both p - and n - type FET operation, we found that an increase in the conjugation length of the OPV derivatives from three phenylene rings to five phenylene rings results in an improvement in the electron mobility by an order of magnitude, while retaining the high hole mobility with intense electroluminescence.

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Long-term Air Stability of Small Molecules passivated-Graphene Field Effect Transistors

  • Shin, Dong Heon;Kim, Yoon Jeong;Kim, Sang Jin;Moon, Byung Joon;Oh, Yelin;Ahn, Seokhoon;Bae, Sukang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.237.1-237.1
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    • 2016
  • Electrical properties of graphene-based field effect transistors (G-FETs) can be degraded in ambient conditions owing to physisorbed oxygen or water molecules on the graphene surface. Passivation technique is one of a fascinating strategy for fabrication of G-FETs, which allows to sustain electrical properties of graphene in the long term without disrupting its inherent properties: transparency, flexibility and thinness. Ironically, despite its importance in producing high performance graphene devices, this method has been much less studied compared to patterning or device fabrication processes. Here we report a novel surface passivation method by using atomically thin self-assembled alkane layers such as C18- NH2, C18-Br and C36 to prevent unintentional doping effects that can suppress the degradation of electrical properties. In each passivated device, we observe a shift in charge neutral point to near zero gate voltage and it maintains the device performance for 1 year. In addition, the fabricated PG-FETs on a plastic substrate with ion-gel gate dielectrics exhibit not only mechanical flexibility but also long-term stability in ambient conditions. Therefore, we believe that these highly transparent and ultra-thin passivation layers can become a promising candidate in a wide range of graphene based electronic applications.

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