• 약학회지
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• 제57권4호
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• pp.272-281
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• 2013

In this study, we developed and validated the HPLC method using the isolated components from Erycibae caulis. Their structures were elucidated by spectroscopic methods including UV, $^1H$-NMR, $^{13}C$-NMR, FAB-Mass and ESI-Mass as Compound 1 (crypto-chlorogenic acid), Compound 2 (scopolin), Compound 3 (neochlorogenic acid) and Compound 4 (3,4-di-O-caffeoylquinic acid). Major three compounds and scopoletin were decided as representative components of Erycibae caulis. We established HPLC analytical method by using the representative components and 20 commercial samples which were collected considering to various cultivated area. The HPLC fingerprinting was successfully achieved with an AKZO NOBEL Kromasil 100-5C18 column. The mobile phase consisted of 0.5% acetic acid in water (A) and methanol (B) using gradient method of 85(A) to 50(A) for 35min. The fingerprints of chromatograms were recorded at an optimized wavelength of 330 nm. This developed analytical method was validated with specificity, selectivity, accuracy and precision. And it is suggested that scopolin, scopoletin, neochlorogenic acid, 3,4-di-O-caffeoylquinic acid were more than 0.162%, 0.133%, 0.057%, 0.044%, respectively. In addition, principal component analysis (PCA) was performed on the analytical data of 20 different Erycibae caulis samples in order to classify samples collected from different regions. We hope that this assay can be readily utilized as quality control method for Erycibae caulis.

• Journal of Plant Biology
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• 제37권4호
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• pp.441-444
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• 1994

강낭콩(Phaseolus vulgaris L.) 미숙종자로부터 신규 phytosteryl glucoside를 순수분리하였다. 이 화합물은 positive FAB-MS에서 m/z 613에 $[M+Na]^{+}$를, 696에 $[M+Matrix]^{+}$의 강한 ion peak를 나타내었고, negative FABMS에서 m/z 589에 $[M-1]^{-}$의 강한 ion peak를 나타내어 그 분자량은 590으로 확인되었다. 400 MHz $^1H-NMR$ 분석 결과 이 화합물은 24-hydroxy-24-vinyl-cholesterol(saringosterol)과 ${\beta}-D-glucopyranose$가 연결되어 있는 saringosteryl glucoside임을 알 수 있었고, 이 화합물의 acetyl화 화합물의 400 MHz $^1H-NMR$의 분석을 통하여 이 화합물은 saringosterol의 C-3 수산기와 ${\beta}-D-glucopyranose$의 C-1'의 수산기가 탈수축합되어 있는 $3-O-{\beta}-D-glucopyranosyl-24-hydroxy-24-vinyl-cholesterol$(saringosteryul glucoside)로 구조결정되었다. 이 saringosteryl glucoside는 천연으로부터 처음 동정된 신규 화합물이며, 이 화합물의 aglycone인 saringosterol도 고등 식물에서는 처음으로 발견된 것이다.

• 한국진공학회지
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• 제17권4호
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• pp.278-291
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• 2008

반도체 소자 제조 공정을 진행하기 위해서는 수많은 진공 시스템이 사용되어야 하고 이로 인하여 많은 소비전력을 필요로 한다. 소비전력 문제는 환경 문제와도 연관되기 때문에 반도체 소자 제조업체들 입장에서는 깊은 관심을 가지고 해결해야 할 사항으로 여러 가지 방안들이 제안되고 있다. 진공 펌프 제조업체들 입장에서는 진공 펌프의 설계/제작에 있어 소비 전력절감을 감안하게 되지만, 반도체 팹(fab)내부에서 소비 전력을 줄이기 위해서는 진공 펌프를 사용하는 사용자의 사용 방법 및 환경도 매우 중요하다. 본 연구에서는 반도체 소자 제조 공정에 사용되는 진공 펌프의 소비 전력을 줄이는 여러 가지 방법들에 대해 간략하게 설명하고 반도체 산업의 기술 발전 방향이 진공 펌프 소비 전력에 미치는 영향을 살펴보고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.145-148
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• 2003

Recently, the recycle of CMP (chemical mechanical polishing) slurries have been positively considered in order to reduce the high COO (cost of ownership) and COC (cost of consumables) in CMP process. Among the composition of slurries (buffer solution, bulk solution, abrasive particle, oxidizer, inhibitor, suspension, antifoaming agent, dispersion agent), the abrasive particles are one of the most important components. Especially, the abrasive particles of slurry are needed in order to achieve a good removal rate. However, the cost of abrasives, is still very high. In this paper, we have collected the silica abrasive powders by filtering after subsequent CMP process for the purpose of abrasive particle recycling. And then, we have studied the possibility of recycle of reused silica abrasive through the analysis of particle size and hardness. Also, we annealed the collected abrasive powders to promote the mechanical strength of reduced abrasion force. Finally, we compared the CMP characteristics between self-developed KOH-based silica abrasive slurry and original slury, As our experimental results, we obtained the comparable removal rate and good planarity with commercial products. Consequently, we can expect the saving of high cost slurry.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.33-36
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• 2003

Tungsten is widely used as a plug for the multi-level interconnection structures. However, due to the poor adhesive properties of tungsten (W) on $SiO_2$ layer, the Ti/TiN barrier layer is usually deposited onto $SiO_2$ for increasing adhesion ability with W film. Generally, for the W-CMP (chemical mechanical polishing) process, the passivation layer on the tungsten surface during CMP plays an important role. In this paper, the effect of oxidants controlling the polishing selectivity of W/Ti/TiN layer were investigated. The alumina $(Al_2O_3)$ abrasive containing slurry with 5 % $H_2O_2$ as the oxidizer, was studied. As our preliminary experimental results, very low removal rates were observed for the case of no-oxidant slurry. This low removal rate is only due to the mechanical abrasive force. However, for Ti and TiN with 5 % $H_2O_2$ oxidizer, different removal rate was observed. The removal mechanism of Ti during CMP is mainly due to mechanical abrasive, whereas for TiN, it is due to the formation of metastable soluble peroxide complex.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.45-48
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• 2003

The polishing mechanism of W-CMP process has been reported as the repeated process of passive layer formation by oxidizer and abrasion action by slurry abrasives. Thus, it is important to understand the effect of oxidizer on tungsten passivation layer in order to obtain higher removal rate (RR) and very low non-uniformity (NU%) during W-CMP process. In this paper, we investigated the effects of oxidizer on W-CMP process with three different kinds of oxidizers, such as $H_2O_2$, $Fe(NO_3)_3$, and $KIO_3$. In order to compare the removal rate and non-uniformity of three oxidizers, we used alumina-based slurry of pH 4. According to the CMP tests, three oxidizers showed different removal mechanism on tungsten surface. Also, the microstructures of surface layer by AFM image were greatly influenced by the slurry chemical, composition of oxidizers. The difference in removal rate and roughness of tungsten surface are believed to caused by modification in the mechanical behavior of $Al_2O_3$ abrasive particles in CMP slurry. Our stabilized slurries can be used a guideline and promising method for improved W-CMP process.

• 한국진공학회지
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• 제20권3호
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• pp.182-188
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• 2011

탄소가 없는 폴리실라잔 계와 탄소가 함유된 폴리메틸 실라잔 계 전구체를 실리콘 기판에 스핀코팅하고 $150^{\circ}C$, $400^{\circ}C$, $850^{\circ}C$에서 열처리하여 형성된 박막의 물리적 화학적 특성을 평가하였다. 프리에 변환 적외선 분광, 수축 율, 갭-충진, 식각속도 등을 평가하여 박막형성과 형성된 박막의 물리화학적 특성에 미치는 탄소의 영향을 고찰하였다. 탄소함유 전구체는 (탄소가 없는 전구체보다) $400^{\circ}C$에서 질소, 수소, 탄소의 휘발량이 더 적고 산소 흡수량이 더 적어서 (15.6%)보다 낮은 14.5% 두께 수축을 나타내었으나, $800^{\circ}C$에서는 휘발 량이 더 많고 산소 흡수량도 더 많아져 (19.4%)보다 높은 37.4% 두께 수축을 나타냈다. 프리에 변환 적외선 분광분석결과, 전구체내의 탄소는 Spin-on dielectric (SOD) 박막으로 하여금 Si-O 결합형성을 적게, 박막특성을 불균일하게, 그리고 화학 용액에 더 빨리 식각되도록 만들었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.464-464
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• 2010

A few years ago, for maintaining high stability and production yield of production equipment in a semiconductor fab, on-line monitoring of wafers is required, so that semiconductor manufacturers are investigating a software based process controlling scheme known as virtual metrology (VM). As semiconductor technology develops, the cost of fabrication tool/facility has reached its budget limit, and reducing metrology cost can obviously help to keep semiconductor manufacturing cost. By virtue of prediction, VM enables wafer-level control (or even down to site level), reduces within-lot variability, and increases process capability, $C_{pk}$. In this research, we have practiced VM on $SiO_2$ etch rate with optical emission spectroscopy(OES) data acquired in-situ while the process parameters are simultaneously correlated. To build process model of $SiO_2$ via, we first performed a series of etch runs according to the statistically designed experiment, called design of experiments (DOE). OES data are automatically logged with etch rate, and some OES spectra that correlated with $SiO_2$ etch rate is selected. Once the feature of OES data is selected, the preprocessed OES spectra is then used for in-situ sensor based VM modeling. ICP-RIE using 葰.56MHz, manufactured by Plasmart, Ltd. is employed in this experiment, and single fiber-optic attached for in-situ OES data acquisition. Before applying statistical feature selection, empirical feature selection of OES data is initially performed in order not to fall in a statistical misleading, which causes from random noise or large variation of insignificantly correlated responses with process itself. The accuracy of the proposed VM is still need to be developed in order to successfully replace the existing metrology, but it is no doubt that VM can support engineering decision of "go or not go" in the consecutive processing step.

• 한국문헌정보학회지
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• 제51권1호
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• pp.289-306
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• 2017

본 연구는 공공도서관 '메이커스페이스' 구성 및 프로그램 운영을 분석함으로써 현재 14개 국내 공공도서관 메이커스페이스 사례인 '무한상상실' 프로그램의 현황 및 한계점을 도출하고, 향후 해외의 메이커스페이스와 같이 확대되고 지속가능한 모형으로 발전하기 위한 운영 방안을 제시하고자 하였다. 이를 위해 국내외 메이커스페이스에 관한 문헌 및 사례조사를 실시하였고 국내 공공도서관 메이커스페이스 현황조사를 통해 메이커스페이스의 발전과정, 프로그램 유형, 지원 유형 및 서비스 성과를 분석하였다. 아울러 국내외 공공도서관 메이커스페이스 전담사서와의 심층인터뷰를 진행함으로써 메이커스페이스의 개념 변화, 필요성, 효과성, 한계점 및 향후 발전방안 등을 조사 분석하였다. 그 결과 메이커스페이스의 지속가능한 운영을 위해 시급히 마련되어야 할 정책방안으로 다양하고 안정적인 재원 확보, 전문 인력 배치 및 훈련, 적극적인 자원봉사자 활용 방안, 홍보전략 수립, 지역주민이 소통하는 공간을 넘어 신기술을 통한 교육과 창조의 공간, 지역 아카이브 생성의 '메이킹' 공간이 되어야 한다는 것을 제안하였다.

• Journal of the Korean Wood Science and Technology
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• 제49권3호
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• pp.267-273
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• 2021

Camellia nut shell was collected, dried at room temperature and ground to get fine powder. The powder was extracted three times with 95% EtOH, combined, evaporated, and then freeze dried. The crude powder was dissolved in H₂O and then sequentially fractionated with n-hexane, CH₂Cl₂, EtOAc and n-BuOH. A part of EtOAc fraction was chromatographed on a silica gel and on a Sephadex LH-20 columns using MeOH, aqueous MeOH, EtOAc-n-hexane and EtOH-n-hexane to isolate gallotannins. Three gallotannins, 1,2-di-O-galloyl-β-D-glucopyranoside (2), 1,2,6-tri-O-galloyl-β-D-glucopyranoside (3) and 1,2,3,6-tetra-O-galloyl-β-D-glucopyranoside (4), including gallic acid (1), were isolated and elucidated by NMR and Mass spectroscopies. Although nothing new, these gallotannins were first reported from the nut shell extractives of camellia tree (Camellia oleifera C. Abel). This study was to investigate the chemical constituents, especially hydrolysable tannins, of nut shell extractives of Camellia oleifera and to provide basic information for the future chemical utilization of this species.