• Title/Summary/Keyword: F.V.M

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Amorphous silicon thin-film solar cells with high open circuit voltage by using textured ZnO:Al front TCO (ZnO:Al 투명전도막을 이용한 높은 개방전압을 갖는 비정질 실리콘 박막 태양전지 제조)

  • Lee, Jeeong-Chul;Ahn, Se-Hin;Yun, Jae-Ho;Song, Jin-Soo;Yoon, Kyung-Hoon
    • New & Renewable Energy
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    • v.2 no.3
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    • pp.31-36
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    • 2006
  • Superstrate pin amorphous silicon thin-film(a-Si:H) solar cells are prepared on $SnO_2:F$ and ZnO:Al transparent conducting oxides(TCO) in order to see the effect of TCO/p-layers on a-Si:H solar cell operation. The solar cells prepared on textured ZnO:Al have higher open circuit voltage VOC than cells prepared on $SnO_2:F$. Presence of thin microcrystalline p-type silicon layer(${\mu}c-Si:H$) between ZnO:Al and p a-SiC:H plays a major role by causing improvement in fill factor as well as $V_{OC}$ of a-Si:H solar cells prepared on ZnO:Al TCO. Without any treatment of pi interface, we could obtain high $V_{OC}$ of 994mV while keeping fill factor(72.7%) and short circuit current density $J_{SC}$ at the same level as for the cells on $SnO_2:F$ TCO. This high $V_{OC}$ value can be attributed to modification in the current transport in this region due to creation of a potential barrier.

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Design and Fabrication of the 0.1${\mu}{\textrm}{m}$ Г-Shaped Gate PHEMT`s for Millimeter-Waves

  • Lee, Seong-Dae;Kim, Sung-Chan;Lee, Bok-Hyoung;Sul, Woo-Suk;Lim, Byeong-Ok;Dan-An;Yoon, yong-soon;kim, Sam-Dong;Shin, Dong-Hoon;Rhee, Jin-koo
    • Journal of electromagnetic engineering and science
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    • v.1 no.1
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    • pp.73-77
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    • 2001
  • We studied the fabrication of GaAs-based pseudomorphic high electron mobility transistors(PHEMT`s) for the purpose of millimeter- wave applications. To fabricate the high performance GaAs-based PHEMT`s, we performed the simulation to analyze the designed epitaxial-structures. Each unit processes, such as 0.1 m$\mu$$\Gamma$-gate lithography, silicon nitride passivation and air-bridge process were developed to achieve high performance device characteristics. The DC characteristics of the PHEMT`s were measured at a 70 $\mu$m unit gate width of 2 gate fingers, and showed a good pinch-off property ($V_p$= -1.75 V) and a drain-source saturation current density ($I_{dss}$) of 450 mA/mm. Maximum extrinsic transconductance $(g_m)$ was 363.6 mS/mm at $V_{gs}$ = -0.7 V, $V_{ds}$ = 1.5 V, and $I_{ds}$ =0.5 $I_{dss}$. The RF measurements were performed in the frequency range of 1.0~50 GHz. For this measurement, the drain and gate voltage were 1.5 V and -0.7 V, respectively. At 50 GHz, 9.2 dB of maximum stable gain (MSG) and 3.2 dB of $S_{21}$ gain were obtained, respectively. A current gain cut-off frequency $(f_T)$ of 106 GHz and a maximum frequency of oscillation $(f_{max})$ of 160 GHz were achieved from the fabricated PHEMT\\`s of 0.1 m$\mu$ gate length.h.

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A Comparison of EMG Amplitude between the Biceps Brachii and the Quadriceps Femoris Muscles in Static Exertions (상완이두근과 대퇴사두근의 등장성 수축에 대한 EMG Amplitude의 비교${\cdot}$분석)

  • Lee, Koo-Hyung;Lee, Nyun-Woo
    • Journal of the military operations research society of Korea
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    • v.8 no.1
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    • pp.77-98
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    • 1982
  • Experiments have been performed for estimating the individual muscle capabilities of the biceps brachii and the quadriceps femoris muscle. The surface EMG has been recorded on the bellies of the biceps brachii and the quadriceps femoris muscle during isometric contractions at $50\%,\;75\%,\;and\;100\%$ MVC. The rectified EMG amplitudes of the maximum voluntary contraction (MVC) were in the range of $2.8\~3.0\;mV\;and\;6.9\~7.2\;mV$ the biceps brachii and the quadriceps femoris, respectively. In the biceps brachii, Type S motor units were recruited in the range of $41\~49\%$ MVC; and Type F motor units were recruited in the range of $51\~59\%$ MVC, In the quadriceps femoris, Type S, Type SF, and Type F motor units were recruited in the ranges of $31\~38\%,\;33\~48\%$, and $21\~29\%$ MVC respectively.

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Synthesis and Electroluminescent Properties of Cabazolyl Vinylene Derivatives

  • Seo, H.J.;Park, H.C.;Lee, S.E.;Park, J.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.952-954
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    • 2003
  • We report the photo-(PL) and electroluminescence (EL) properties of new conjugated compounds based on carbazolyl vinylene moiety, 3,3'-(1,4-phenylene di-2,1-ethenediyl) bis[9-ethyl-(E,E)-9H-carbazole](PEEC) and 3,3'-([1,1'-biphenyl]-4,4'-diyldi-2,1-ethenediyl)bis[9-ethyl-9H-carbazole](BPEEC), as emitting materials. The ITO/m-MTDATA/NPB/BPEEC/Alq3/LiF/Al device shows bluish-green EL spectrum at 490nm and turn-on voltage at 8V. PEEC shows bluish-green EL around ${\lambda}$ max=496nm and turn-on voltage at 6V and 2.4 Cd/A efficiency in ITO/m-MTDATA/NPB/PEEC/Alq3/LiF/Al device.

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Supercapacitor of Auxiliary Electric Power Source in Industrial Safety for High Output (고출력용 산업안전 보조전원의 Supercapacitor)

  • 허진우;강안수
    • Proceedings of the Safety Management and Science Conference
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    • 2003.11a
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    • pp.335-343
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    • 2003
  • In the electrode fabrication of unit cell, it was ascertained that electrochemical characteristics were greatly increased with 90 wt.% of BP-20, 5 wt.% of Super P and 5 wt.% of mixed binder [P(VdF-co-HFP) : PVP =7 : 3] The self-discharge of unit cell showed that diffusion process was controlled by the ion concentration difference of initial electrolyte due to the characteristics of Electric Double Layer Capacitor (EDLC) charged by ion adsorption in the beginning, but this by current leakage through the double-layer at the electrode/electrolyte interface had a minor effect and voltages of curves were remained constant regardless of electrode material. The electrochemical characteristics of 2.3 V/3,000 F grade EDLC were as follows: 0.35 m of DC-ESR (100 A discharge), 0.14 mof AC-ESR (AC amplitude 100 mV), 2.80 Wh/kg (3.73 Wh/L) of energy density and 4.64 kW /kg (6.19 kW/L) of power density. Power output was compatible with electric vehicle applications, uninterrupted power supply and engine starter, in due consideration of Ragone relations.

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Low Voltage CMOS LC VCO with Switched Self-Biasing

  • Min, Byung-Hun;Hyun, Seok-Bong;Yu, Hyun-Kyu
    • ETRI Journal
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    • v.31 no.6
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    • pp.755-764
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    • 2009
  • This paper presents a switched self-biasing and a tail current-shaping technique to suppress the 1/f noise from a tail current source in differential cross-coupled inductance-capacitance (LC) voltage-controlled oscillators (VCOs). The proposed LC VCO has an amplitude control characteristic due to the creation of negative feedback for the oscillation waveform amplitude. It is fabricated using a 0.13 ${\mu}m$ CMOS process. The measured phase noise is -117 dBc/Hz at a 1 MHz offset from a 4.85 GHz carrier frequency, while it draws 6.5 mA from a 0.6 V supply voltage. For frequency tuning, process variation, and temperature change, the amplitude change rate of the oscillation waveform in the proposed VCO is 2.1 to 3.2 times smaller than that of an existing VCO with a fixed bias. The measured amplitude change rate of the oscillation waveform for frequency tuning from 4.55 GHz to 5.04 GHz is 131 pV/Hz.

PEO Film Formation Behavior of AZ31 Mg Alloy under Pulse Current (펄스 전류 하에서 AZ31 마그네슘 합금의 플라즈마전해산화 피막의 형성 거동)

  • Moon, Sungmo
    • Journal of the Korean institute of surface engineering
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    • v.55 no.5
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    • pp.292-298
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    • 2022
  • In this study, PEO (plasma electrolytic oxidation) film formation behavior of AZ31 Mg alloy under application of 300 Hz pulse current was studied by the analyses of V-t curve, arc generation behavior, PEO film thickness and morphology of PEO films with treatment time in 0.05 M NaOH + 0.05 M Na2SiO3 + 0.1 M NaF solution. PEO films was observed to grow after 10 s of application of pulse current together with generation of micro-arcs. PEO film grew linearly with treatment time at a growth rate of about 5.58 ㎛/min at 200 mA/cm2 of pulse current but increasing rate of film formation voltage became lowered largely with increasing treatment time after passing about 250 V, suggesting that resistivity of PEO films during micro-arc generation decreases with increasing film formation voltage at more than 250 V.

Preparation of PVdF/Fe3O4-GO (MGO) Composite Membrane by Using Electrospinning Technology and its Arsenic Removal Characteristics (전기방사법을 이용한 PVdF/Fe3O4-GO(MGO) 복합 분리막 제조 및 비소 제거 특성평가)

  • Jang, Wongi;Hou, Jian;Byun, Hongsik;Lee, Jae Yong
    • Membrane Journal
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    • v.26 no.6
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    • pp.480-489
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    • 2016
  • In this study, the PVdF/MGO composite nanofiber membranes (PMGs) introducing Iron oxide-Graphene oxide ($Fe_3O_4/GO$, Metallic graphene oxide; MGO) was prepared via electrospinng method and its arsenic removal characteristics were investigated. The thermal treatment was carried out to improve the mechanical strength of nanofiber membranes and then the results showed that of outstanding improvement effect. However, in case of PMGs, the decreasing tendency of mechanical strength was indicated as increasing MGO contents. From the results of pore-size analysis, it was confirmed that the porous structured membranes with 0.3 to $0.45{\mu}m$ were prepared. For the water treatment application, the water flux measurement was carried out. In particular, PMG2.0 sample showed about 70% improved water flux results ($153kg/m^2h$) compared to that of pure PVdF nanofiber membrane ($91kg/m^2h$) under the 0.3 bar condition. In addition, the PMGs have indicated the high removal rates of both As(III) and As(V) (up to 81% and 68%, respectively). Based on the adsorption isotherm analysis, the adsorption of As(III) and As(V) ions were both more suitable for the Freundlich. From all of results, it was concluded that PVdF/MGO composite nanofiber membranes could be utilized as a water treatment membrane and for the Arsenic removal applications.

Fabrication and Characterization of $0.2\mu\textrm{m}$ InAlAs/InGaAs Metamorphic HEMT's with Inverse Step-Graded InAlAs Buffer on GaAs Substrate

  • Kim, Dae-Hyun;Kim, Sung-Won;Hong, Seong-Chul;Paek, Seung-Won;Lee, Jae-Hak;Chung, Ki-Woong;Seo, Kwang-Seok
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.2
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    • pp.111-115
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    • 2001
  • Metamorphic InAlAs/InGaAs HEMT are successfully demonstrated, exhibiting several advantages over conventional P-HEMT on GaAs and LM-HEMT on InP substrate. The strain-relaxed metamorphic structure is grown by MBE on the GaAs substrate with the inverse-step graded InAlAs metamorphic buffer. The device with 40% indium content shows the better characteristics than the device with 53% indium content. The fabricated metamorphic HEMT with $0.2\mu\textrm{m}$T-gate and 40% indium content shows the excellent DC and microwave characteristics of $V_{th}-0.65V,{\;}g_{m,max}=620{\;}mS/mm,{\;}f_T120GHZ{\;}and{\;}f_{max}=210GHZ$.

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