• Title/Summary/Keyword: F-가스

Search Result 556, Processing Time 0.025 seconds

Atomization Characteristic of F-O-F Triplet Injector for Gas Generator (가스발생기용 F-O-F 충돌형 인젝터 분사특성)

  • Kwon, Sun-Tak;Lee, Chang-Jin;Kim, Seung-Han;Han, Yeoung-Min
    • Journal of the Korean Society for Aeronautical & Space Sciences
    • /
    • v.33 no.1
    • /
    • pp.62-68
    • /
    • 2005
  • An injector for fuel rich gas generator was designed and experimentally investigated. Five variations of F-O-F triplet impinging type injector were tested to evaluate spray characteristics with kerosene/water simulant propellant. Test was focused to find the effect of design variables of impinging angle, and impinging distance, on the atomization performance. A mixing efficiency is used to compare droplet distribution and local O/F ratio of each injector in the range of momentum ratio of 0.2~1.3. Test results shows the max value of mixing efficiency locates about the 0.8 in momentum ratio. And the injector with an impinging angle of 45 degree and impinging distance of 6mm shows the very good performance result suitable for fuel rich gas generator. A combustion test will be also conducted with selected injector to verify the spray pattern and mixing efficiency.

Study of Electron Transport Coefficients in $C_{n}F_{2n+2}$(n=1,2,3) Molecular Gas ($C_{n}F_{2n+2}$(n=1,2,3) 분자가스의 전자수송계수 연구)

  • Jeon, Byung-Hoon
    • Proceedings of the KIEE Conference
    • /
    • 2006.07c
    • /
    • pp.1455-1456
    • /
    • 2006
  • 반도체 에칭분야에 많이 이용되고 있는 $CF_4$, $C_{2}F_6$, $C_{3}F_8$가스들의 전자수송계수들을 볼츠만 방정식을 이용하여 해석하고자 한다. 특히 혼합가스를 이용하여 확산방전스위치에서 요구되어지는 특성을 파악하고자 할 때 시뮬레이션에 의한 적절한 혼합비 구현을 위하여 이들 순수가스들이 가지고 있는 전자충돌단면적을 해석하고, 전자이동속도와 부착계수 값을 2항과 다항근사 볼츠만 해석을 통해 $0.1{\sim}300$ Td에 걸친 광범위 표에서 해석하고자 한다.

  • PDF

A Study on Etching of Si3N4 Thin Film and the Exhausted Gas Using C3F6 Gas for LCD Process (LCD 공정용 C3F6 가스를 이용한 Si3N4 박막 식각공정 및 배출가스에 관한 연구)

  • Jeon, S.C.;Kong, D.Y.;Pyo, D.S.;Choi, H.Y.;Cho, C.S.;Kim, B.H.;Lee, J.H.
    • Journal of the Korean Vacuum Society
    • /
    • v.21 no.4
    • /
    • pp.199-204
    • /
    • 2012
  • $SF_6$ gas is widely used for dry etching process of semiconductor and display fabrication process. But $SF_6$ gas is considered for typical greenhouse gas for global warming. So it is necessary to research relating to $SF_6$ alternatives reducing greenhouse effect in semiconductor and display. $C_3F_6$ gas is one of the promising candidates for it. We studied about etch characteristics by performing Reactive Ion Etching process of dry etching and reduced gas element exhausted on etching process using absorbent Zeolite 5A. $Si_3N_4$ thin film was deposited to 500 nm with Plasma Enhanced Chemical Vapor Deposition and we performed Reactive Ion Etching process after patterning through photolithography process. It was observed that the etch rate and the etched surface of $Si_3N_4$ thin film with Scanning Electron Microscope pictures. And we measured and compared the exhausted gas before and after the absorbent using Gas Chromatograph-Mass Spectrophotometry.

A Study on the Hazard of Converted Gas for Surface Heating Treatment (표면열처리용 변성가스의 위험성에 관한 연구)

  • Choi Jae-Wook;Min Wong-Chul;Lim Woo-Sub;Lee Byoung-Chul;Kim Dong-Kyu
    • Journal of the Korean Institute of Gas
    • /
    • v.9 no.3 s.28
    • /
    • pp.9-14
    • /
    • 2005
  • To estimate the explosion characteristics of converted gas, the study was examined into effects of altering oxygen concentration and adding hydrogen. From the result of the experiment, as the concentration of converted gas and hydrogen were increased at $21\%$ oxygen concentration, the lower explosion limit was low. Minimum explosion oxygen concentration was $6\%$. Maximum explosion pressure of converted gas was $4.61 kg_f/cm^2$, now Maximum explosion pressure rising velocity was $130.75 kg_f/cm^2/s$ at converted gas concentration $40\%$. Also, minimum ignition energy was 0.13 mJ at converted gas concentration $50\%$.

  • PDF

Production of $[^{18}F]F_2$ Gas for Electrophilic Substitution Reaction (친전자성 치환반응을 위한 $[^{18}F]F_2$ Gas의 생산 연구)

  • Moon, Byung-Seok;Kim, Jae-Hong;Lee, Kyo-Chul;An, Gwang-Il;Cheon, Gi-Jeong;Chun, Kwon-Soo
    • Nuclear Medicine and Molecular Imaging
    • /
    • v.40 no.4
    • /
    • pp.228-232
    • /
    • 2006
  • Purpose: electrophilic $^{18}F(T_{1/2}=110\;min)$ radionuclide in the form of $[^{18}F]F_2$ gas is of great significance for labeling radiopharmaceuticals for positron omission tomography (PET). However, its production In high yield and with high specific radioactivity is still a challenge to overcome several problems on targetry. The aim of the present study was to develop a method suitable for the routine production of $[^{18}F]F_2$ for the electrophilic substitution reaction. Materials and Methods: The target was designed water-cooled aluminum target chamber system with a conical bore shape. Production of the elemental fluorine was carried out via the $^{18}O(p,n)^{18}F$ reaction using a two-step irradiation protocol. In the first irradiation, the target filled with highly enriched $^{18}O_2$ was irradiated with protons for $^{18}F$ production, which were adsorbed on the inner surface of target body. In the second irradiation, the mixed gas ($1%[^{19}F]F_2/Ar$) was leaded into the target chamber, fellowing a short irradiation of proton for isotopic exchange between the carrier-fluorine and the radiofluorine absorbed in the target chamber. Optimization of production was performed as the function of irradiation time, the beam current and $^{18}O_2$ loading pressure. Results: Production runs was performed under the following optimum conditions: The 1st irradiation for the nuclear reaction (15.0 bar of 97% enriched $^{18}O_2$, 13.2 MeV protons, 30 ${\mu}A$, 60-90 min irradiation), the recovery of enriched oxygen via cryogenic pumping; The 2nd irradiation for the recovery of absorbed radiofluorine (12.0 bar of 1% $[^{19}F]fluorine/argon$ gas, 13.2 MeV protons, 30 ${\mu}A$, 20-30 min irradiation) the recovery of $[^{18}F]fluorine$ for synthesis. The yield of $[^{18}F]fluorine$ at EOB (end of bombardment) was achieved around $34{\pm}6.0$ GBq (n>10). Conclusion: The production of $^{18}F$ electrophilic agent via $^{18}O(p,n)^{18}F$ reaction was much under investigation. Especially, an aluminum gas target was very advantageous for routine production of $[^{18}F]fluorine$. These results suggest the possibility to use $[^{18}F]F_2$ gas as a electrophilic substitution agent.

Water Absorption Properties of Low Dielectric SiOF Thin Film (저유전율 SiOF 박막의 흡습 특성 연구)

  • Lee, Seok-Hyeong;Yu, Jae-Yun;O, Gyeong-Hui;Park, Jong-Wan
    • Korean Journal of Materials Research
    • /
    • v.7 no.11
    • /
    • pp.969-973
    • /
    • 1997
  • 저유전율 층간절연물질인 불소첨가 SiO$_{2}$박막을 ECR(electron cyclotron resonance) Plasma chemical vapor deposition 법으로 성막하였다. SiOF박막의 증착은 SiF$_{4}$/O$_{2}$의 가스유량비를 변수로하여 0.2에서 1.6까지 변화시켜 증착하였고, 이때 마이크로파 전력은 700W, 기판온도는 30$0^{\circ}C$에서 행하였다. 증착된 SiOF박막의 흡습특성을 알아보기 위하여 Fourier transformed infrared spectroscopy(FTIR)을 이용하여 분석한 결과, 가스유량비 (SiF$_{4}$O$_{2}$)가 0.2 에서 1.6으로 증가하였을 때 Si-Ostretching피크의 위치는 1072$cm^{-1}$ /에서 1088$cm^{-1}$ /로 증가하였으며, Si-F$_{2}$피크는 가스유량비가 1.0이상에서 나타나기 시작하였다. 또한 가스유량비가 0.2에서 0.8까지 변화하여 증착한 시편은 Si-OH 피크가 관찰되지 않았지만 가스유량비가 1.0이상(11.8at.% F함유)의 시편의 경우 Si-OH 피크가 관찰되어 내흡습성이 저하되고 있음을 확인할 수 있었다.

  • PDF

Development of voice-enabled Gas timer using the S3F8S19 processor (S3F8S19 프로세서를 이용한 음성지원 가스타이머 개발)

  • Choi, Young-Gyu
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
    • /
    • v.8 no.6
    • /
    • pp.551-555
    • /
    • 2015
  • Dementia of the country due to the aging population of 59 thousand people has reached serious territory. To increase the number of future dementia doubled every 20 years until 2050, in 2020 about 84 thousand people, about 127 thousand people in 2030, 2050 are estimated at 271 thousand people. If you have a gas stove when using dementia patients at home, Voice Support breaker is required in a fire can automatically block the gas valve because of a risk. In this paper, we develop a gas-timer demented patients using S3F8S19 8bit processor to use the gas safely.

Effect of gas composition on the characteristics of a-C:F thin films for use as low dielectric constant ILD (가스 조성이 저유전상수 a-C:F 층간절연막의 특성에 미치는 영향)

  • 박정원;양성훈;이석형;손세일;오경희;박종완
    • Journal of the Korean Vacuum Society
    • /
    • v.7 no.4
    • /
    • pp.368-373
    • /
    • 1998
  • As device dimensions approach submicrometer size in ULSI, the demand for interlayer dielectric materials with very low dielectric constant is increased to solve problems of RC delay caused by increase in parasitic resistance and capacitance in multilevel interconnectins. Fluorinated amorphous carbon in one of the promising materials in ULSI for the interlayer dielectric films with low dielectric constant. However, poor thermal stability and adhesion with Si substrates have inhibited its use. Recently, amorphous hydrogenated carbon (a-C:H) film as a buffer layer between the Si substrate and a-C:F has been introduced because it improves the adhesion with Si substrate. In this study, therfore, a-C:F/a-C:H films were deposited on p-type Si(100) by ECRCVD from $C_2F_6, CH_4$and $H_2$gas source and investigated the effect of forward power and composition on the thickness, chemical bonding state, dielectric constant, surface morphology and roughness of a-C:F films as an interlayer dielectric for ULSI. SEM, FT-IR, XPS, C-V meter and AFM were used for determination of each properties. The dielectric constant in the a-C:F/a-C:H films were found to decrease with increasing fluorine content. However, the dielectric constant increased after furnace annealing in $N_2$atomosphere at $400^{\circ}C$ for 1hour due to decreasing of flurorine content. However, the dielectric constant increased after furnace annealing in $N_2$atmosphere at $400^{\circ}C$ for 1hour due to decreasing of fluorine concentration.

  • PDF

Rocket Engine Test Facility Improvement for Hot Firing Test of 75 ton-f Class Gas Generator and Cold Flow Test (75톤급 가스발생기 연소시험을 위한 시험장 개선 및 수류시험)

  • Kang, Dong-Hyuk;Lim, Byoung-Jik;Ahn, Kyu-Bok;Seo, Seong-Hyeon;Han, Yeoung-Min;Choi, Hwan-Seok
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2009.11a
    • /
    • pp.29-33
    • /
    • 2009
  • On the basis of the development experience of a gas generator for the 30 ton-f thrust liquid rocket engine combustor a Subscale Ground Firing Test Facility was designed and fabricated for a gas generator for the 75 ton-f thrust liquid rocket engine combustor. The Subscale Ground Firing Test Facility developed is going to be used to develop 75 ton-f class gas generator. Acquired data and test technique from this facility will be used to develope the high performance liquid rocket engine combustor and the Ground Firing Test Facility. This report describes the improved Subscale Ground Firing Test Facility for 75 ton-f class gas generator and results of the cold flow test.

  • PDF