• Title/Summary/Keyword: Exposure Device

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The assessment of the automatic exposure control system for mammography x-ray machine

  • Kim, Hak-Sung;Kim, Sung-Chul
    • International Journal of Contents
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    • v.9 no.2
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    • pp.66-69
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    • 2013
  • In the U.S., performance assessment on the Automatic Exposure Control system (AEC) is managed according to the Mammography Quality Standards Act (MQSA). However, The AEC is not available in the performance assessment conducted in Korea. Also, there is no study made on the performance of the automatic exposure control system for mammography in Korea. For this reason, this study examined the performance of the automatic exposure control system for mammography that was clinically used in the Incheon area. Result showed that the difference of the mean optical density was 0.79 ~ 2.81. This implies that some devices caused unnecessary x-ray exposure to patients. Furthermore, only 61.5% of the entire experimental device was shown to be satisfactory in terms of change in mean optical density. Moreover, in terms of the subject's thickness, change in radiographic density was shown to be severe among lower X-ray tube voltage while there was severe density change in X-ray image depending on X-ray tube voltage among the subjects with more thickness. Therefore, it is suggested to provide performance management on the AEC for mammography.

A Robust Mutual Authentication between User Devices and Relaying Server(FIDO Server) using Certificate Authority in FIDO Environments

  • Han, Seungjin
    • Journal of the Korea Society of Computer and Information
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    • v.21 no.10
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    • pp.63-68
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    • 2016
  • Recently, Biometrics is being magnified than ID or password about user authentication. However, unlike a PIN, password, and personal information there is no way to modify the exposure if it is exposed and used illegally. As FIDO(Fast IDentity Online) than existing server storing method, It stores a user's biometric information to the user device. And the user device authentication using the user's biometric information, the user equipment has been used a method to notify only the authentication result to the server FIDO. However, FIDO has no mutual authentication between the user device and the FIDO server. We use a Certificate Authority in order to mutually authenticate the user and the FIDO server. Thereby, we propose a more reliable method and compared this paper with existed methods about security analysis.

Sensitivity Improvement Method for Color Capture Device At Low Illumination Conditions (Color Capture Device의 저조도 감도 향상 방안)

  • Kim, Il-Do;Jun, Jae-Sung;Choi, Byung-Sun;Park, Sahng-Gyu
    • Proceedings of the IEEK Conference
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    • 2007.07a
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    • pp.235-236
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    • 2007
  • CCD(Charge-Coupled Device) 혹은 CMOS (Complementary Metal Oxide Semiconductor)와 같은 소자를 이용하여 빛을 전기적 신호인 Image로 재구성하는 촬상소자(Color Capture Device)는 촬영환경이 어두워지면 Dynamic Range가 작아지고, Noise가 상대적으로 심해진다[1][2]. 본 논문에서는 촬영 환경이 어두울 때, Resolution을 Preserving하는 Pixel Pitch가 큰 촬상 소자와 Motion Blur를 억제하는 Exposure Time이 긴 촬상 소자의 조합을 신호처리로 구현하여, 신호의 Power를 향상시켜 Dynamic Range를 키우고 Noise의 Boost-up을 억제하여 SNR(Signal to Noise Ratio)을 향상시키는 방식으로, 촬상 장치의 감도를 향상시켜 화질을 개선하는 방법을 제안한다.

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Study of Liquid Crystal Device using a High Thermal Photopolymer (고내열성 광폴리머 표면을 이용한 액정 표시 소자 연구)

  • 황정연;남기형;이상민;서대식;김재형;서동학
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.1
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    • pp.65-69
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    • 2004
  • We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1$^{\circ}$. The Voltage-transmittance (V-T) curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. Finally, The photoaligned TN cell has few hysteresis, and shows the residual DC voltage that is less.

Characterization of Photoresist Processing by Statistical Design of Experiment (DOE)

  • Kim, Gwang-Beom;Park, Jae-Hyun;Soh, Dae-Wha;Hong, Sang-Jeen
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.43-44
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    • 2005
  • SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image is desired. But SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination. Based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factional design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

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Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE)

  • Mun Sei-Young;Kim Gwang-Beom;Soh Dea-Wha;Hong Sang Jeen
    • Journal of information and communication convergence engineering
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    • v.3 no.4
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    • pp.191-194
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    • 2005
  • SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image are desired. However SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination, based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factorial design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

Pre-contoured reconstruction plate fabricated via three-dimensional printed bending support

  • Song, In-Seok;Ryu, Jae-Jun;Choi, Young-Jun;Lee, Ui-Lyong
    • Journal of the Korean Association of Oral and Maxillofacial Surgeons
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    • v.47 no.3
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    • pp.233-236
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    • 2021
  • A mandibular continuity defect can be repaired using either a prosthetic device or autogenous bone. A titanium reconstruction plate can be used with a localized or vascularized flap over the defect of the mandible. Unfortunately, the plate may fail due to plate exposure, screw loosening, fracture, or infection, and will need to be removed. Plate exposure though the skin or mucosa is one of the main reasons for failure. In the present work, the authors introduced a lingually positioned reconstruction plate fabricated via three-dimensional printed bending support. This custom reconstruction plate can avoid plate re-exposure as well as reduce surgical errors and operation time.

Exposure dose Reduction using Pb Banding of own manufacturing (자체제작 Pb 밴딩을 이용한 피폭선량 감소)

  • Kim, Chang-Gyu
    • Journal of Digital Convergence
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    • v.11 no.6
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    • pp.269-273
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    • 2013
  • Exposure dose to the examinee was measured using glass dosimeter in the test using panorama device at the time of dental treatment. As a result of measuring expose dose to lens according to the different sizes of Pb banding of own manufacturing to reduce exposure dose to lens especially sensitive to radiation, it was verified that exposure dose to lens varied depending on the size of the Pb banding. With the size of Pb banding of $3{\times}20{\times}0.2cm$, exposure dose tended to increase higher than normal value, and with the size of or more than $5{\times}20{\times}0.2cm$, it decreased. And also, the obtained image with the size of $7{\times}20{\times}0.2cm$ was not suitable for diagnosis. Therefore, it is expected that exposure dose would be reduced by using Pb banding of the size of not less than $5{\times}20{\times}0.2cm$ and not more than $6{\times}20{\times}0.2cm$ in the test, to minimize exposure dose and conduct panorama test efficiently.

Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

A Study on the X-ray Image Reading of Radiological Dispersal Device (방사능 폭발물의 X-ray 영상판독에 관한 연구)

  • Geun-Woo Jeong;Kyong-Jin Park
    • Journal of the Korean Society of Industry Convergence
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    • v.27 no.2_2
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    • pp.437-443
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    • 2024
  • The purpose of radiological Dispersal Device(RDD) is to kill people by explosives and to cause radiation exposure by dispersing radioactive materials. And It is a form of explosive that combines radioactive materials such as Co-60 and Ir-192 with improvised explosives. In this study, we tested and evaluated whether it was possible to read the internal structure of an explosive using X-rays in a radioactive explosive situation. The improvised explosive device was manufactured using 2 lb of model TNT explosives, one practice detonator, one 9V battery, and a timer switch in a leather briefcase measuring 41×35×10 cm3. The radioactive material used was the Co-60 source used in the low-level gamma ray irradiation device operated at the Advanced Radiation Research Institute of the Korea Atomic Energy Research Institute. The radiation dose used was gamma ray energy of 1.17 MeV and 1.33 MeV from a Co-60 source of 2208 Ci. The dose rates are divided into 0.5, 1, 2, and 4 Gy/h, and the exposure time was divided into 1, 3, 5, and 10 minutes. Co-60 source was mixed with the manufactured explosive and X-ray image reading was performed. As a result of the experiment, the X-ray image appeared black in all conditions divided by dose rate and time, and it was impossible to confirm the internal structure of the explosive. This is because γ-rays emitted from radioactive explosives have higher energy and stronger penetrating power than X-rays, so it is believed that imaging using X-rays is limited By blackening the film. The results of this study are expected to be used as basic data for research and development of X-ray imaging that can read the internal structure of explosives in radioactive explosive situations.