• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.114-115
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• 2007

In this paper, it was demonstrated that organic thin-film transistors (OTFTs) were fabricated with the organic passivation layer by vapor deposition polymerization (VDP) processing, In order to form polymeric film as an passivation layer, VDP process was also introduced instead of spin-coating process, where polymeric film was co-deposited by high-vacuum thermal evaporation from 6FDA and ODA followed by curing, Field effect mobility, threshold voltage, and on-off current ratio with 450-nm-thick organic passivation layer were about $0.21\;cm^2/Vs$, IV, and $1\;{\times}\;10^5$, respectively.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.11
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• pp.4711-4717
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• 2011

Formation of TiN films by PVD method and the DC and RF sputtering deposition method can be applied, the injected gas to generate plasma ionization rate of the film forming speed is slow away, anything to increase the adhesion between films limitations have. To improve this, to investigate the deposition and ion beam evaporation simultaneously IBAD(Ion beam assisted deposition) when used, Ion beam surface coating material prior to the survey because the surface cleaning effect of a large, high film adhesion can be obtained. In addition, the high vacuum and low temperature, high purity thin film of uniform thickness in the benefits is.

• Journal of the Korean Applied Science and Technology
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• v.16 no.4
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• pp.323-327
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• 1999

A water-soluble conducting polymer (CPP400 Paste) containing a derivative of polythiophene with several dopant was investigated as an anode material for organic electroluminescent devices. The device of ITO/CPP 400 Paste/TPD/$Alq_3$/Li:Al was fabricated, where CPP 400 Paste films were prepared by spin coating and TPD and $Alq_3$, films were prepared by vacuum evaporation. It was found that the turn-on voltage, current density, and luminance of the devices were dependent upon the thickness of CPP 400 Paste film in the Electroluminescent and current-voltage characteristics of the devices. This phenomena were explained by the energy level diagram of the device with the energy levels of the CPP400 Paste obtained by cyclic voltammetric method.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.21 no.4
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• pp.236-242
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• 2009

In finishing work, defects are often taken place by many factors. One of them is the thermo-humidity condition on the work surface as coating and anointing adhesives. Thus, the condition of thermo-humidity on work surface should be checked prior to the finishing work. However, many construction companies show a tendency to overlook it because not only are measurement tools so expensive but they don't have skilled hands about those tools. Therefore, we propose the measurement method that makes it easy to recognize surface thermo-humidity condition so as to reduce constructional flaws. And then we test this product. The test progresses to four stages with various conditions. We evaluate its usefulness and application possibility of this product in the field.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.29 no.6
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• pp.308-316
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• 2019

Electron beam physical vapor deposition (EBPVD) is a conventional method to fabricate thermal barrier coating (TBC) of high temperature airfoil engine parts, such as blade etc. for its high temperature structural stability from the nature of columnar growth behavior. For the high quality of TBC by EBPVD, the structural factors, such as growth behavior, thickness uniformity and so on, should be managed to obtain the coating which satisfied the required specifications of usable level of mechanical and thermal properties. In this study, the growth behavior and structure variations of 7YSZ (7 wt% yttria stabilized zirconia) coatings with different configurational deposition parameters for the specimens which have turbine blade shape mock-up were investigated. Growth behavior of coatings were studied by comparing computational modeling of evaporation behavior with actual deposition process using e-beam source.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.255-255
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• 2016

Resistive random access memory (ReRAM)는 낮은 동작 전압, 빠른 동작 속도, 고집적화 등의 장점으로 인해 차세대 비휘발성 메모리 소자로써 많은 관심을 받고 있다. 최근에 ReRAM 절연막으로 NiOx, TiOx, AlOx TaOx, HfOx와 같은 binary metal oxide 물질들을 적용하는 연구가 활발히 진행되고 있다. 특히, HfOx는 안정적인 동작 특성을 나타낸다는 점에서 ReRAM 절연막 물질로 적합하다고 보고되고 있다. ReRAM 절연막을 형성할 때, 물리 기상 증착 방법 (PVD)이나 화학 기상 증착법 (CVD)과 같은 방법이 많이 이용된다. 이러한 증착 방법들은 고품질의 박막을 형성시킬 수 있는 장점이 있다. 하지만, 높은 온도에서의 공정과 고가의 진공 장비가 이용되기 때문에 경제적인 문제가 있으며, 기판 또는 금속에 플라즈마 손상으로 인한 문제가 발생할 수 있다. 따라서 이러한 문제점들을 개선하기 위해 용액 공정이 많은 관심을 받고 있다. 용액 공정은 공정과정이 간단할 뿐만 아니라 소자의 대면적화가 가능하고 공정온도가 낮으며 고가의 진공장비가 필요하지 않은 장점을 가진다. 따라서 본 연구에서는, 용액공정을 이용하여 HfOx 기반의 ReRAM 제작하였고 $25^{\circ}C$와 $85^{\circ}C$에서 ReRAM의 동작특성에 미치는 compliance current의 영향을 평가하였다. 실험 방법으로는, hafnium chloride (0.1 M)를 2-methoxyethanol에 충분히 용해시켜서 precursor를 제작하였다. 이후, p-type Si 기판 위에 습식산화를 통하여 300 nm 두께의 SiO2 절연층을 성장시킨 후, 하부전극을 형성하기 위해 electron beam evaporation을 이용하여 10/100 nm 두께의 Ti/Pt 전극을 증착하였다. 순차적으로, 제작된 산화물 precursor를 이용하여 Pt 위에 spin coating 방법으로 1000 rpm 10 초, 6000 rpm 30초의 조건으로 두께 35 nm의 HfOx 막을 증착하였다. 최종적으로, solvent 및 불순물을 제거하기 위해 $180^{\circ}C$의 온도에서 10 분 동안 열처리를 진행하였으며, 상부 전극을 형성하기 위해 electron beam evaporation을 이용하여 Ti와 Al을 각각 50 nm, 100 nm의 두께로 증착하였다. ReRAM 동작에서 compliance current가 미치는 영향을 평가하기 위하여 compliance current를 10mA에서 1mA까지 변화시키면서 측정한 결과, $25^{\circ}C$에서는 compliance current의 크기와 상관없이 일정한 메모리 윈도우와 우수한 endurance 특성을 얻는 것을 확인하였다. 한편, $85^{\circ}C$의 고온에서 측정한 경우에는 1mA의 compliance current를 적용하였을 때, $25^{\circ}C$에서 측정된 메모리 윈도우 크기를 비슷하게 유지하면서 더 우수한 endurance 특성을 얻는 것을 확인하였다. 결과적으로, 용액공정 방법으로 제작된 ReRAM을 측정하는데 있어서 compliance current를 줄이면 보다 우수한 endurance 특성을 얻을 수 있으며, ReRAM 소자의 전력소비감소에 효과적이라고 기대된다.

• Korean Journal of Materials Research
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• v.17 no.1
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• pp.31-36
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• 2007

Nanoimprint lithography (NIL) is a new lithographic method that offers a sub-10nm feature size, high throughput, and low cost. One of the most serious problems of NIL is the stiction between mold and resist. The antistiction layer coating is very effective to prevent this stiction and ensure the successful NIL results. In this paper, an antistiction layer was deposited by VSAM (vapor self assembly monolayer) method on silicon samples with FOTS (perfluoroctyltrichlorosilane) as a precursor for making an antistiction layer. A specially designed LPCVD (low pressure chemical vapor deposition) was used for this experiment. All experiments were achieved after removing the humidity. First, the evaporation test of FOTS was performed for checking the evaporation temperature at low pressure. FOTS was evaporated at 5 Tow and $110^{\circ}C$. In order to evaluate the temperature effect on antistiction layer, chamber temperature was changed from 50 to $170^{\circ}C$ with 0.1ml of FOTS for 1 minute. Good hydrophobicity of all samples was shown at about $110^{\circ}$ of contact angle and under $20^{\circ}$ of hysteresis. The surface energies of all samples calculated by Lewis acid/base theory was shown to be about 15mN/m. The deposited thicknesses of all samples measured by ellipsometry were almost 1nm that was similar value of the calculated molecular length. The surface roughness of all samples was not changed after deposition but the friction force showed relatively high values and deviations deposited at under $110^{\circ}$. Also the white circles were founded in LFM images under $110^{\circ}$. High friction forces were guessed based on this irregular deposition. The optimized VSAM process for FOTS was achieved at $170^{\circ}C$, 5 Torr for 1 hour. The hot embossing process with 4 inch Si mold was successfully achieved after VSAM deposition.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.21 no.12
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• pp.10-15
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• 2020

Ultraviolet rays, which have wavelengths smaller than 400 nm, are very harmful to the eyes. Recently, high-energy visible light was also revealed to be harmful to retinal cells. Therefore, polymer eyeglass lenses that can block UV and high-energy visible light are needed for eye health. In this study, high-refractive-index polymer eyeglass lens, n=1.67, were manufactured using the injection-mold method with the m-xylene diisocyanate monomer, 2,3-bis((2-mercaptoethyl)thio)-1-propanethiol monomer, benzotriazole UV absorber, release of alkyl phosphoric ester, dye mixture of CI solvent violet 13, and catalyst of dibutyltin dichloride mixture. A multi-layer anti-reflection coating was applied to manufactured polymer eyeglass lenses for both sides using an E-beam evaporation system. The optical properties of the manufactured lenses with the UV and high-energy visible light-blocking function were analyzed by UV-visible spectrophotometry. As a result, the polymer eyeglass lens with a UV absorber of 0.5 wt. % blocked 99% of UV and high-energy visible light shorter than 411 nm. The average transmittance of the polymer eyeglass lens with a UV absorber of 0.5wt.% was 97.9% in the range of 460 ~ 660 nm for photopic eye sensitivity higher than 10%. Therefore, clear image acquisition in photopic vision is possible.

• Applied Microscopy
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• v.10 no.1_2
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• pp.7-17
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• 1980

Electron microscope radioautography introduced by Liquier-Milward (1956) is now used routinely in many laboratories. Most of the technical difficulties in specimen preparation have been overcome. This method is modified from loop method for improvement of EM radioautographic techniques. The advantages of this method are: 1. the use of single specimens on small corks and of a large wire loop, allows the experimenter to avoid the blemishes in the membrane; 2. the surfactant dioctyl sodium sulphosuccinate is added to diluted ILford L4, thus greatly prolonging the period of time over which good emulsion layers can be made; 3. corks can be handled in perspex holder which allows about 20 specimens to be developed simultaneously. The steps of the method comprise: 1. Cut ribbons of ultrathin sections of silver interference colour 2. Pick them up on formvar-coated 200 mesh grids 3. Prestaining of tissues 4. Coat the specimens with a thin layer of carbon by evaporation (30-60A) 5. Mount the specimens on corks (about 1cm apical diameter) using double-sided scotch tape 6. Emulsion coating; a. Take a 250m1 beaker, place it on the pan of a sliding weight balance and weigh it. Add 10 grams extra to the beam. Add pieces of ILford L4 emulsion to the beaker until the balance is swinging freely. Add the 20ml of distilled water that was previously measured out. b. Surfactant dioctyl sodium sulphosuccinate is added to diluted ILford L4. 7. Prepare a series of membranes of gelled emulsion with the wire loop and apply one to each cork-borne specimen. 8. Put the specimens away to expose by pushing the corks into short length of PVC tubing, each tube having a small hole in the side 9. Place the tubes in small boxes together with silica gel. 10. Exposure 11. Developer - Kodak Microdol X for 3 minutes 12. Fixer - A perspex holder can be manufactured which allows 20 specimens to be developed simultaneously. 12. Fixer - 30% sodium thiosulfate for 10 minutes 13. Examination with Siemens Elmiskop 1A electron microscope

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.83.2-83.2
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• 2010

평판형 고체산화물 연료전지(planar SOFC : Solid oxide Fuelcell)는 높은 전류 효율 및 출력밀도를 가지는 중,대형 발전용 전기소자이다. SOFC 스택을 600~800도에서 작동할 경우, 금속 분리판에서 휘발된 크롬에 의한 열화현상과 금속의 산화에 의한 표면 저항의 증가가 큰 문제점으로 알려져 있으며, 이를 개선하기 위한 많은 연구가 진행되고 있다. 본 연구에서는 금속 분리판의 열화를 억제하기 위한 여러 보호코팅의 특성을 밝히고, 특성차이의 원인을 분석하고자 하였다. 모재는 상용 STS444합금 (Nisshin steel 생산) 2.0mmt 박판을 사용하였으며, 표면 상태를 균일하게 하기 위하여 표면은 동일한 #1200 번 사포로 연마후 코팅하였다. 적용한 코팅은 전기도금 Ni 코팅, (MnCo)3O4 wet powder spray 코팅, (MnCo)3O4 ADM코팅 3종이었으며, 코팅층의 두께는 최적 공정조건에 따라 달리 하였다. 산화후 형성되는 표면 산화물의 전기적 특성을 평가하기 위하여 시험편의 비면적 저항 (ASR : area specific resistance)을 장시간 측정하였다. 측정편의 크기는 가로 4cm ${\times}$ 세로 4cm였으며, 100시간 공기중 산화후 측정하였다. 표면 접촉을 높이기 위하여 Pt paste를 40~50um도포하였으며, 1~0.1A인가된 전류에 대한 저항을 4전극법 (4-probe)으로 측정하였다. 표면 코팅층이 크롬 휘발을 억제하는 정도를 평가하기 위하여 크롬 휘발량을 측정하였다. 시편은 가로 1.5cm ${\times}$ 세로 1cm 였으며, 공급된 공기와 수분의 혼합가스와 응축기 표면에 흡착된 크롬의 양을 ICP-MASS법으로 측정하였다.