• 제목/요약/키워드: Etching glass

검색결과 258건 처리시간 0.024초

$C_2F_6$$NF_3$ 유도결합플라즈마를 이용한 $SiO_2$:Ge 식각에관한 연구 (Inductively coupled Plasma Reactive ion etching of Ge doped silica glass using $C_2F_6$ and $NF_3$)

  • 이석룡;문종하;김원효;이병택
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.225-225
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    • 2003
  • 실리카글라스를 기초로 하는 PLC소자는 가격, 광 손실 성질과 광섬유와의 결합효율이 좋아 광통신에 응용되어지고 있으며 Ge 도핑된 실리카 글라스는 PLC소자의 코어물질로 널리 사용되고 있다. 소작제작을 위해서는 높은 식각률과 깨끗하고 적은 표면손상을 얻어야 하므로 유도결합플라즈마를 이용한 건식식각공정개발이 이루어 져야 한다. 본 연구에서는 Ge 도핑된 실리카글라스의 식각특성을 연구하기 위해 $C_2$F/6 와 NF$_3$가스를 사용하였고 ICP power, bias power, 압력, 플라즈마와 샘플간의 거리를 변화시키면서 식각속도, 표면거칠기, 메사수직도, 마스크선택도등 기본공정 조건을 연구하고 첨가가스(CH$_4$, $O_2$), 마스크 물질(Ni, Cr, PR) 도핑농도(0.3, 0.45, 0.7%)등을 변화시키면서 식각특성을 연구하였다. 그 결과 300nm/min, 정도의 식각속도를 가지고 수직한 메사각도(~89$^{\circ}$)와 미려한 표면(표면거 칠기 1.5nm 이하)를 갖는 결과를 얻었다.

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마이크로 연료전지용 MEMS 메탄올 개질기의 가공과 성능시험 (Fabrication and Performance Evaluation of MEMS Methanol Reformer for Micro Fuel Cells)

  • 김태규;권세진
    • 대한기계학회논문집B
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    • 제30권12호
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    • pp.1196-1202
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    • 2006
  • A MEMS methanol reformer was fabricated and its performance was evaluated in the present study. Catalytic steam reforming of methanol was selected because the process had been widely applied in macro scale reformers. Conventional Cu/ZnO catalyst that was prepared by co-precipitation method to give the highest coating quality was used. The reactor structure was made by bonding three layers of glass wafers. The internal structure of the wafer was fabricated by the wet-etching process that resulted in a high aspect ratio. The internal surface of the reactor was coated by catalyst and individual wafers were fusion-bonded to form the reactor structure. The internal volume of the microfabricated reactor was $0.3cm^3$ and the reactor produced exhaust gas with hydrogen concentration at 73%. The production rate of hydrogen was 4.16 ml/hr that could generate power of 350 mW in a typical PEM fuel cell.

레이저에 의한 포토레지스트의 마스크리스 페터닝 (Maskless patterning of Photoresist by laser)

  • 이경철;김재권;이천;최진호;이강욱;최익순
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.886-888
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    • 1998
  • By irradiating photoresist on Si or glass with $Ar^+$ (${\lambda}$=514 nm, CW) and Nd:YAG (${\lambda}$=266 and 532nm, pulse) laser beam, the photoresist was etched masklessly in air. Using a fourth harmonic Nd:YAG laser beam, the etching threshold of energy fluence was $25\;J/cm^2$ and the damage of substrate was appeared over $40\;J/cm^2$.

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자기변형 박막을 이용한 마이크로 펌프의 제작과 시험 (Fabrication and Test of a Micro Pump with a Magnetostrictive diaphragm)

  • 서지훈;정옥찬;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.1017-1019
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    • 1998
  • In this paper, the fabrication of a micropump with two giant magnetostrictive films of Sm-Fe and Tb-Fe is presented. The pump consist of one silicon wafer and one cover glass. The micropump consists of an actuator diaphragm, a paired nozzle and diffuser, and two through holes. The Structure of the micropump is fabricated by the chemical vapor deposition, the etching and the sputtering of the magnetostrictive films. The deflection of the actuator measured diaphragm is measured by using the laser vibrometer and the flow rate of the micro pump is observed by using a video microscope.

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Effect of Aluminum Fence-type electrode Design on Characteristics of AC-PDP

  • Lee, Seog-Young;Lee, Dong-Heon;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.408-411
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    • 2008
  • In an attempt to enhance luminance efficiency and to reduce discharge delays of test panels with aluminum fence-electrodes, various designs of the electrodes were prepared by chemically etching the aluminum foils bonded to soda-lime glass substrate via anodic bonding process. The effects of fence design on luminance and discharge characteristics were investigated and compared with conventional ac-PDPs. These results showed a possibility of using fence-type aluminum electrode at front plates of ac-PDDs without sacrificing its performance.

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Effect of deposition method of source/drain electrode on a top gate ZnO TFT Performance

  • Kopark, Sang-Hee;Hwang, Chi-Sun;Yang, Shin-Hyuk;Yun, Young-Sun;Park, Byung-Chang
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.254-257
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    • 2008
  • We have investigated the effect of source/drain electrode deposition method on a performance of top gate structured ZnO TFT performance. TFT using S/D of ITO film, consisted of bi-layer which deposited by ion beam assisted sputtering at the initial stage then deposited by DC magnetron sputtering, showed better performance compared to that using S/D of ITO deposited by just DC magnetron sputtering. Two ITO films exhibited different grain shapes and these resulted in different etching properties. We also suspect that charge trapping on the glass substrate (back channel) during the ITO film deposition may influence the characteristics of top gate structured ZnO TFT.

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표면 텍스쳐된 ZnO:Al 투명전도막 증착 및 특성 (The Deposition and Properties of Surface Textured ZnO:Al Films)

  • 유진수;이정철;김석기;윤경훈;박이준;이준신
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권9호
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    • pp.378-382
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    • 2003
  • Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure md the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures ($\leq$$300^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

Surface Textured ZnO:Al 투명전도막 제작 및 특성 (The fabrication and properties of surface textured ZnO:Al films)

  • 유진수;이정철;강기환;김석기;윤경훈;송진수;박이준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.391-394
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    • 2002
  • Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology Properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9 mTorr) and high substrate temperatures ($\leq$30$0^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

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Microcolumn 을 위한 새로운 개념의 초소형 전자빔 deflector (A New Miniaturized Electron-Beam deflector for Microcolumn)

  • 한창호;김학;전국진
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2003년도 하계종합학술대회 논문집 II
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    • pp.1037-1040
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    • 2003
  • 본 논문에서는 microcolumn 을 위한 초소형 전자빔 deflector 의 제작방법과 microcolumn array 에서 deflector 의 외부 패드를 최소화 할 수 있는 새로운 배선방법을 기술하였다. 배선의 통로 및 절연체 역할을 하는 Pyrex glass 의 양쪽에 각각 실리콘 웨이퍼의 양극접합 및 deep reactive ion etching(DRIE)과 금속 전기 도금을 이용하여 다층배선을 하였다. 이 배선방법을 이용하면 microcolumn array 가 수백개가 되더라도 deflector 의 외부 패드는 항상 8개를 유지할 수 있다.

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The Optimization of the Organic Passivation Process in the TFT-LCD Panel for LCD Televisions

  • Lee, Yeong-Beom;Jun, Sahng-Ik
    • Journal of Information Display
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    • 제10권2호
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    • pp.54-61
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    • 2009
  • The results of the optimization of the organic passivation process for fabricating thin-film transistors (TFTs) with a high aperture ratio on a seventh-generation glass (2200${\times}$1870 mm) substrate for LCD-TV panels are reported herein. The optimization of the organic passivation process has been verified by checking various factors, including the material properties (e.g., thickness, stain, etching, thermal reflow) and the effects on the TFT operation (e.g., gate/data line delay and display-driving properties). The two main factors influencing the organic passivation process are the optimization of the final thickness of the organic passivation layer, and the gate electrode. In conclusion, the minimum possible final thickness was found to be $2.42{\um}m$ via simulation and pilot testing, using the full-factorial design. The optimization of the organic passivation layer was accomplished by improving its brightness by over 10 cd/$m^2$ (ca. 2% luminance) compared to that of the conventional organic passivation process. The results of this research also help reduce the reddish stain on display panels.