• 대한치과보철학회지
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• 제42권5호
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• pp.501-513
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• 2004

Purpose : The purpose of this study was to evaluate the effects of etching time on shear bond strength of four resin cements to IPS Empress 2 ceramic. Material and Methods: Forty rectangular shape ceramic specimens ($10{\times}15{\times}3.5mm$ size) were used for this study. The ceramic specimens divided into four groups and were etched with 10% hydrofluoric acid for 0, 10, 30, 60, 180, 300, 420, 600, and 900 seconds respectively. Etched surfaces of ceramic specimens were coated with ceramic adhesive system and bonded with four resin cement (Variolink II, Panavia F, Panavia 21, Super-Bond C&B) using acrylic glass tube. All cemented specimens were tested under shear loading untill fracture on universal testing machine at a crosshead speed 1mm/min: the maximum load at fracture (kg) was recored. Shear bond strengh data were analyzed with oneway analysis of variance and Tukey HSD tests (p<.05). Etched ceramic surfaces (0-, 60-, 300-, and 600-seconds etching period) and fracture surfaces after shear testing were examined mophologically using scanning electron microscopy. Results : Ceramic surface treatment with 10% hydrofluoric acid improved the bond strength of three resin cement except for Super-Bond C&B cement. Variolink II (41.0$\pm$2.4 MPa) resin cement at 300-seconds etching time showed statistically higher shear bond strength than the other resin cements (Panavia F: 28.3$\pm$2.3 MPa, Panavia 21: 21.5$\pm$2.2 MPa, Super-Bond C&B: 16.7$\pm$1.6 MPa). Ceramic surface etched with 10% hydrofluoric acid for 300 seconds showed more retentive surface texture. Conclusion: Within the limitation of this study, Variolink II resin cement are suitable for cementation of Empress 2 all-ceramic restorations and etching with 10% hydrofluoric acid for 180 to 300 seconds is required to enhance the bond strength.

• Tribology and Lubricants
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• 제23권6호
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• pp.298-300
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• 2007

Frictional characteristics of mesoporous $SiO_2$ thin films were evaluated with different pore sizes. The films were manufactured by sol-gel and self-assembly methods to have a porous structure. The pores on the surface may play as the outlet of wear particle and the storage of lubricant so that the surface interactions could be improved. The pores were exposed on the surface by chemical mechanical polishing (CMP) or plasma-etching after forming the porous films. The ball-on-disk tests with mesoporous $SiO_2$ thin films on glass specimen were conducted at sliding speed of 15 rpm and a load of 0.26 N. The results show considerable dependency of friction on pore size of mesoporous $SiO_2$ thin films. The friction coefficient decreased as increasing the pore size. CMP process was very useful to expose the pores on the surface.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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• pp.62-65
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• 2002

Transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Coming 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures $({\leq}300^{\circ}C)$, the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

• 한국정밀공학회지
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• 제21권2호
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• pp.195-202
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• 2004

This paper presents the fabrication and evaluation of mechanical behavior for a peristaltic micropump by flow simulation. The valve-less micropump using the diffuser/nozzle is consists of the lower plate, the middle plate, the upper plate and the tube that connects inlet and outlet of the pump. The lower plate includes the channel and the chamber, and the plain middle plate are made of glass and actuated by the piezoelectric translator. Channels and a chamber on the lower plate are fabricated on high processability silicon wafer by the DRIE(Deep Reactive Ion Etching) process. The upper plate does the roll of a pump cover and has inlet/outlet/electric holes. Three plates are laminated by the aligner and bonded by the anodic bonding process. Flow simulation is performed using error-reduced finite volume method (FVM). As results of the flow simulation and experiments, the single chamber pump has severe flow problems, such as a backflow and large fluctuation of a flow rate. It is proved that the double-chamber micropump proposed in this paper can reduce the drawback of the single-chamber one.

• KSTLE International Journal
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• 제3권2호
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• pp.101-109
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• 2002

This paper presents the fabrication and performance inspection of a peristaltic micropump by flow simulation. The valve-less micropump using the diffuser/nozzle is consists of base plate, mid plate, top plate and connection tubes fur inlet and outlet. In detail, the base plate is composed of two diffuser nozzles and three chambers, the mid plate consists of a glass diaphragm for the volumetric change of the pumping chamber. The inlet and outlet tubes are connected at the top plate and the actuator fur pressing the diaphragm is located beneath the top plate. The micropump is fabricated on the silicon wafer by DRIE (Deep Reactive ion Etching) process. The pumping performances are tested by the pneumatic test rig and compared with the simulated results fur various dimensions of diffuser nozzles. The pumping characteristics of the micropump by the volumetric change at the pumping chamber is modeled and simulated by the commercial software of FLOW-3D. The simulated results shows that reverse flow is the inherent phenomena in the diffuser nozzle type micropump, but it can be reduced at the dual pumping chamber model.

• 한국전기전자재료학회논문지
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• 제25권5호
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• pp.377-380
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• 2012

Laser direct patterning of indium tin oxide(ITO) is one of new methods of direct etching process to replace the conventional photolithography. A diode pumped Q-switched Nd:$YVO_4$ (${\lambda}$= 1,064 nm) laser was used to produce ITO electrode on various transparent oxide semiconductor films such as zinc oxide(ZnO). The laser direct etched ITO patterns on ZnO were compared with those on glass substrate and were considered in terms of the overlapping rate of laser beam. In case of the laser etching on double-layer, it was possible to obtain the higher overlapping rate of laser beam.

• 한국결정성장학회지
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• 제7권2호
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• pp.341-348
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• 1997

2원동시 RF magnetron 방법을 이용하여 조건별(sputtering gas압력, buffer충 유무 및 etching여부 등)로 제작된 Pt/co 인공격자 다층막 ([$Pt10.7\AA/Co2.8{\AA}{\times}{12}$])의 구조정보에 대하여 알아보았다. 다층막 구조평가는 X선 회절측정을 이용하여 행하였으며 구조에 대한 정보를 보다 면밀하게 평가하기 위해서 다층막 모델을 제작하여 얻어진 결과를 실험결과와 비교분석 하였다. 제작된 다층막 구조모델의 계산결과를 실측치와 비교하면 peak의 위치나 회절강도가 상당히 일치하였으며 이것은 구조모델이 실제의 Pt/Co 인공격자 다층막구조를 잘 반영하고 있음을 알 수 있었다.

• 마이크로전자및패키징학회지
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• 제8권1호
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• pp.13-18
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• 2001

본 연구에서 RF 플라즈마를 이용한 촉매 화학기상증착법에 의하여 탄소나노튜브를 성장시켰다. 탄소나노튜브는 Ni이 증착된 강화 유리 기판위에 $600^{\circ}C$ 이하의 공정 온도에서 성장되었으며, 성장시 성장 온도와 에칭 시간 그리고 Ni 층의 두메에 따라 탄소나노튜브 성장 특성이 다양하게 나타났다. Ni이 증착된 강화 유리기판위에 탄소나노튜브를 성장시키기 위하여 에칭 가스로는 $H_2$와 $NH_3$가스를 사용하였고, 탄소 원료로 $C_2H_2$가스를 사용하였다. 수직 배향된 탄소나노튜브의 직경과 길이는 약 150 nm와 3 $\mu\textrm{m}$ 정도의 크기로 성장되었다. 촉매 화학기상증착법을 이용하여 성장된 탄소나노튜브는 FED의 에미터로 사용이 기대된다.

• 센서학회지
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• 제14권6호
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• pp.423-429
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• 2005

In this paper, we proposed the fabrication process of the stable e-beam evaporation and the patterning of metals layer on the polydimethylsiloxane (PDMS) substrate. The metal layer was deposited under the various deposition rate, and its effect to the electrical and mechanical properties (e.g.: adhesion-strength of metal layer) was investigated. The influence of surface roughness to the adhesion-strength was also examined via the tape test. Here, we varied the roughness by changing the reactive ion etching (RIE) duration. The electrode patterning was performed through the conventional photolithography and chemical etching process after e-beam deposition of $200{\AA}$ Ti and $1000{\AA}$ Au. As a result, the adhesion strength of metal layer on the PDMS surface was greatly improved by the oxygen plasma treatment. The e-beam evaporation on the PDMS surface is known to create the wavy topography. Here, we found that such wavy patterns do not effect to the electrical and mechanical properties. In conclusion, the metal patterns with minimum $20{\mu}m$ line width was produced well via the our fabrication process, and its electrical conductance was almost similar to the that of metal patterns on the silicon or glass substrates.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 하계학술대회 논문집 C
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• pp.1482-1484
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• 2002

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures $({\leq}300^{\circ}C)$, the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.