Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Overlapping Rates of Laser Spots on the Laser Direct Patterning of ITO Electrode in the Double-layer Structure of Thin Film

이층 박막 구조에서 ITO 전극의 레이저 직접 패터닝 시레이저 식각 패턴 중첩 비율의 변화

  • Wang, Jian-Xun (Department of Electronics Engineering, Gachon University) ;
  • Park, Jung-Cheul (Department of Electronics Engineering, Gachon University) ;
  • Kwon, Sang-Jik (Department of Electronics Engineering, Gachon University) ;
  • Cho, Eou-Sik (Department of Electronics Engineering, Gachon University)
  • Received : 2012.02.06
  • Accepted : 2012.04.13
  • Published : 2012.05.01
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Abstract

Laser direct patterning of indium tin oxide(ITO) is one of new methods of direct etching process to replace the conventional photolithography. A diode pumped Q-switched Nd:$YVO_4$ (${\lambda}$= 1,064 nm) laser was used to produce ITO electrode on various transparent oxide semiconductor films such as zinc oxide(ZnO). The laser direct etched ITO patterns on ZnO were compared with those on glass substrate and were considered in terms of the overlapping rate of laser beam. In case of the laser etching on double-layer, it was possible to obtain the higher overlapping rate of laser beam.

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References

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