• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.147.2-148
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• 2016

Light management technology is very important for thin film solar cells, which can reduce optical reflection from the surface of thin film solar cells or enhance optical path, increasing the absorption of the incident solar light. Using proper light trapping structures in hydrogenated amorphous silicon (a-Si:H) solar cells, the thickness of absorber layers can be reduced. Instead, the internal electric field in the absorber can be strengthened, which helps to collect photon generated carriers very effectively and to reduce light-induced loss under long-term light exposure. In this work, we introduced a chemical etching technology to make honey-comb textures on glass substrates and analyzed the optical properties for the textured surface such as transmission, reflection and scattering effects. Using ray optics and finite difference time domain method (FDTD) we represented the behaviors of light waves near the etched surfaces of the glass substrates and discussed to obtain haze parameters for the different honey-comb structures. The simulation results showed that high haze values were maintained up to the long wavelength range over 700 nm, and with the proper design of the honey-comb structure, reflection or transmission of the glass substrates can be enhanced, which will be very useful for the multi-junction (tandem or triple junction) thin film a-Si:H solar cells.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.319.1-319.1
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• 2016

Recently, the Al-doped ZnO (ZnO:Al) films are intensively used in thin film a-Si solar cell applications due to their high transmittance and good conductivity. The textured ZnO:Al films are used to enhance the light trapping in thin film solar cells. The wet etch process is used to texture ZnO:Al films by dipping in diluted acidic solutions like HCl or HF. During that process the glass substrate could be damaged by the acidic solution and it may be difficult to apply it for the inline mass production process since it has to be done outside the chamber. In this paper we report a new technique to control the surface morphology of RF-sputtered ZnO:Al films. The ZnO:Al films are textured with vaporized HF formed by the mixture of HF and H2SiO3 solution. Even though the surface of textured ZnO:Al films by vapor etching process showed smaller and sharper surface structures compared to that of the films textured by wet etching, the haze value was dramatically improved. We achieved the high haze value of 78% at the wavelength of 540 nm by increasing etching time and HF concentration. The haze value of about 58% was achieved at the wavelength of 800 nm when vapor texturing was used. The ZnO:Al film texture by HCl had haze ratio of about 9.5 % at 800 nm and less than 40 % at 540 nm. In addition to low haze ratio, the texturing by HCl was very difficult to control etching and to keep reproducibility due to its very fast etching speed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.459-459
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• 2012

Recently, the discharge of global warming gases in dry etching process of TFT-LCD display industry is a serious issue because perfluorocarbon compound (PFC) gas causes global warming effects. PFCs including CF4, C2F6, C3F8, CHF3, NF3 and SF6 are widely used as etching and cleaning gases. In particular, the SF6 gas is chemically stable compounds. However, these gases have large global warming potential (GWP100 = 24,900) and lifetime (3,200). In this work, we chose C3F6O gas which has a very low GWP (GWP100 = <100) and lifetime (< 1) as a replacement gas. This study investigated the effects of the gas flow ratio of C3F6O/O2 and process pressure in dual-frequency capacitively coupled plasma (CCP) etcher on global warming effects. Also, we compared global warming effects of C3F6O gas with those of SF6 gas during dry etching of a patterned positive type photo-resist/silicon nitride/glass substrate. The etch rate measurements and emission of by-products were analyzed by scanning electron Microscopy (SEM; HITACI, S-3500H) and Fourier transform infrared spectroscopy (FT-IR; MIDAC, I2000), respectively. Calculation of MMTCE (million metric ton carbon equivalents) based on the emitted by-products were performed during etching by controlling various process parameters. The evaluation procedure and results will be discussed in detail.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.341-341
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• 2011

초발수 표면은 자가세정, 부식방지, 방오특성의 특징을 가진다. 이러한 특성은 오염성이 높은 건물외장재 및 자동차유리, 태양전지 모듈유리, 디스플레이등 적용분야가 매우 다양하며, 코팅 방법으로 sol-gel, CVD, PVD등의 여러 가지 방법으로 많은 연구가 보고 되고 있다. 초발수 표면을 제작하는 대표적인 방법으로 PTFE와 같은 낮은 표면에너지를 가지는 물질을 증착하는 방법이 많이 사용되고 있으나, 초발수 표면에 가까운 접촉각을 구현하기에는 한계가 있다. 본 연구에서는 여러 가지 기판(Al, Cu, Sus, glass)에 추가적으로 표면 미세요철구조를 만들어 특성을 분석 하였다. 표면의 미세구조는 기판을 산에 Etching 하는 방법으로 Sample을 준비 하였다. 준비된 기판에 RF-Magnetron Sputtering 방법을 이용하여 PTFE를 증착하여 특성을 분석 하였다. 표면과 물방울이 이루는 각도를 알아보기 위해 Contact Angle을 측정한 결과 Glass와 Sus 기판을 제외한 Al과 Cu기판에서 약 150도에 이르는 초발수 특성을 보였으며, 이러한 표면형상을 관찰하기 위해서 SEM 측정을 해본 결과 표면의 미세요철구조가 확인 되었으며, AFM 측정결과 표면의 미세요철의 거칠기가 Etching공정을 통해 증가 된 것을 확인할 수 있었으며, Etching후 Al과 Cu는 수 nm ~ mm의 거칠기를 보였으며, 거칠기가 증가하여 접촉각의 향상에 기여 하였으리라 생각된다. XPS 측정결과 낮은 표면에너지를 가지는 CF2와 CF3 피크가 보이는 것으로 보아 표면에너지가 낮아져 접촉각이 높아졌으리라 사료 된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.340-343
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• 2000

ITO(Indium Tin Oxide) films for transparent electrodes of FPD(Flat Panel Display) were patterned in atmosphere using laser. A pulse type(repetition rate of 10 Hz) Q-switched Nd:YAG laser which can generate the fundamental wavelength at 1064 nm or its harmonics(532, 266 nm) was used for Patterning of the ITO film. In case of using the second harmonic(532 nm) of Nd:YAG laser, the ITO film(thickness of 20 nm) was removed clearly with a laser fluence of 5.2 J/$\textrm{cm}^2$ and a beam scan speed of 200${\mu}{\textrm}{m}$/s. But the glass substrate was damaged when the laser fluence was over 5.2 J/$\textrm{cm}^2$. We discussed the etching mechanism of the ITO film using Nd:YAG laser with observation of the etching characteristics including a depths and widths of ITO films as a function of laser fluence using SEM(Scanning Electron Microscopy) and surface profiler($\alpha$-step 500).

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 하계학술대회 논문집 C
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• pp.2102-2104
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• 2004

In this study, sheathless electrospray from PDMS/glass microchips with conducting metal emitter tip is described. A chip-based capillary electrophoresis/mass spectrometry (CE/MS) system has advantages of the CE separation and on-line electrospray detection of peptide solution. We have fabricated a new electrospray ionization(ESI) device composed of the metal emitter tip and CE separation channel monolithically in a glass microchip. The separation channel and metal emitter tip are fabricated using a glass wet etching and gold electro plating process, respectively. The fabricated micro electrospray chip was tested by spraying peptide sample for mass spectrometric analysis. Singlely-charged peak and doublely-charged peak of peptide were detected and further MS/MS fragmentation was performed in each peak. Direct comparisons with conventional glass or fused silica emitters showed very similar performance with respect to signal strength and stability.

• 한국추진공학회지
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• 제19권1호
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• pp.1-8
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• 2015

MEMS 추력기를 위한 유리 박막 마이크로 점화기를 개발하였다. 수십 마이크로 미터의 두께를 가지는 유리 박막을 사용하여 점화기의 구조적 안정성을 향상시켰다. 마이크로 점화기는 박막 형성을 위한 감광 유리의 이방성 식각과 점화 코일 형성을 위한 Pt/Ti 증착 공정으로 제작되었다. 개발된 점화기는 유리 박막의 구조적 안정성으로 인하여 특별한 장치없이 추진제 충전이 가능하였다. 점화 실험이 성공적으로 이뤄졌으며 최소 점화 지연은 27.5 ms, 최소 점화 에너지는 19.3 mJ 이였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2009년도 제33회 추계학술대회논문집
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• pp.289-292
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• 2009

본 연구에서는 감광유리를 이용한 PEM 마이크로 연료전지 바이폴라 플레이트의 제작 공정을 확립하고 성능 측정을 수행하였다. 감광유리는 무게가 가볍고 내화학성이 뛰어나며 제작이 용이하다. 비등방성 식각, 열 및 UV 접합, 그리고 금속 층 적층을 통한 MEMS 제작 공정이 확립되었다. 성능 측정 결과 활성화 영역에 은이 적층된 마이크로 연료전지의 성능이 그렇지 않은 것보다 우수하였으며 두 경우에서 측정된 마이크로 연료전지의 성능은 모두 국내외 마이크로 연료전지 연구 수준과 동등한 수준이었다.

• 대한기계학회논문집B
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• 제26권12호
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• pp.1639-1645
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• 2002

Micro engine that includes Micro scale combustor is fabricated. Design target was focused on the observation of combustion driven actuation in MEMS scale. Combustor design parameters are somewhat less than the size recommended by feasibility test. The engine structure is fabricated by isotropic etching of the photosensitive glass wafers. Electrode formed by electroplating of the Nickel. Photosensitive glass can be etched isotropically with almost vertical angle. Bonding and assembly of structured photosensitive glass wafer form the engine. Combustor size was determined to be 1 mm scale. Movable piston is engraved inside the wafer. Ignition was done by nickel spark plug which was electroplated with thickness of 40 ${\mu}{\textrm}{m}$. The wafers were bonded by epoxy that resists high temperature. In firing test due to the bonding method and design tolerance pressure buildup by reaction was not confirmed. But ignition, flame propagation and actuation of micro structure from the reaction was observed. From the result basement of design and fabrication technology was obtained.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2001년도 춘계학술대회논문집E
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• pp.169-174
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• 2001

This paper reports on the development of high aspect ratio structure and 3-D integrated process for MEMS-based micro gas turbines. To manufacture high aspect ratio structures, Deep Reactive Ion Etching (DRIE) process have been developed and optimized. Specially, in this study, structures with aspect ratios greater than 10 were fabricated. Also, wafer direct bonding and Infra-Red (IR) camera bonding inspection systems have been developed. Moreover, using glass/silicon wafer direct bonding, we optimized the 3-D integrated process.