• Title/Summary/Keyword: Eom Heun

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A study about Eom Heun's poetry (십성당(十省堂) 엄흔(嚴昕)의 시세계(詩世界))

  • Kwon, Hyok-myong
    • (The)Study of the Eastern Classic
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    • no.49
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    • pp.137-160
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    • 2012
  • This paper focuses on analyzing Eom Heun's grip on reality and attitudes through his literary works. He realized his time as a corrupted world that lack of morality. This actually was a criticism for the existing political force at that time, and he embodied it by using the image of wind, frost, mole cricket, ant, and so on. During that time, he tried to stick to his opinion on integrity. For that, he criticized men of the day who had an apathetic attitude. On the other hand, he praised pine and grass as an image of faith and fidelity. We may verify his world view by reading his literary works.

한국인 청소년의 체격 기준에 관한 연구

  • Nam, Gi-Yong;Kim, Eung-Jin;Kim, In-Dal;Sin, Dong-Hun;Jang, Sin-Yo;Seong, Rak-Eung;Lee, Sang-Don;Kim, U-Gyeom;Choe, Deok-Gyeong;Kim, Chun-Hui;Lee, Jong-Heun;Eom, Yung-Ui
    • The Korean Journal of Physiology
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    • v.3 no.2
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    • pp.33-69
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    • 1969
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Study on Cu CMP by using Semi-Abrasive Free Slurry (준 무연마제 슬러리를 아용한 Cu CMP 연구)

  • Kim, Nam-Hoon;Lim, Jong-Heun;Eom, Jun-Chul;Kim, Sang-Yong;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.158-161
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    • 2003
  • The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5% acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

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Occurrence of Grapholita dimorpha in Korean Pear Orchards and Cross-trapping of Its Sibling Species, Grapholita molesta, to a Pheromone Lure (국내 배과원에 복숭아순나방붙이의 발생과 유사종 복숭아순나방의 페로몬 트랩 교차 유인)

  • Jung, Chung Ryul;Ahn, Jeong Joon;Eom, Hoon Sik;Seo, Jung Heun;Kim, Yonggyun
    • Korean journal of applied entomology
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    • v.51 no.4
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    • pp.479-484
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    • 2012
  • The occurrence of plum fruit moth, Grapholita dimorpha, has been recently reported in apple orchards in Korea. It has been suspected that G. dimorpha and its related species, G. molesta, may occur simultaneously in other host plants. This study reports the occurrence of G. dimorpha in pear orchards of different localities in Korea. The identification of G. dimorpha was determined by morphological characters and the DNA marker. The cross-trapping of both species may be possible because the major sex pheromone (SP) compositions for the two species are similar. From the monitoring data, G. dimorpha and G. molesta were caught in SP lure traps of G. dimorpha and both species were also caught in SP lure traps of G. molesta. This cross-trapping of G. molesta to a SP lure of G. dimorpha varied significantly among pear orchards in different geographical localities. Furthermore, the occurrence peaks of the two species were not coincidental in all monitored orchards. These suggest that monitoring data obtained from each SP trap of both species in pear orchards may be mixed with two species, which would result in the over-estimation of population density and peak frequency on both species in pear orchards.