• 한국자원식물학회:학술대회논문집
• /
• 한국자원식물학회 2021년도 춘계학술대회
• /
• pp.9-9
• /
• 2021

Mutation breeding is useful for improving agronomic characteristics of various crops. In this study, we constructed soybean Mutant Diversity Pool (MDP) from 1,695 gamma-irradiated mutants through two selection phases over M1 to M12 generations; we selected 523 mutant lines exhibiting at least 30% superior agricultural characteristics, and, second, we eliminated redundant morphological phenotypes in the M12 generation. Finally, we constructed 208 MDP lines and investigated 11 agronomic traits. We then assessed the genetic diversity and inter-relationships of these MDP lines using target region amplification polymorphism (TRAP) markers. Among the different TRAP primer combinations, polymorphism levels and PIC values averaged 59.71% and 0.15, respectively. Dendrogram and population structure analyses divided the MDP lines into four major groups. According to an analysis of AMOVA, the percentage of inter-population variation among mutants was 11.320 (20.6%), whereas mutant inter-population variation ranged from 0.231 (0.4%) to 14.324 (26.1%). Overall, the genetic similarity of each cultivar and its mutants were higher than within other mutant populations. In an analysis of the genome-wide association study (GWAS) using based on the genotyping-by-sequencing (GBS), we detected 66 SNPs located on 13 different chromosomes were found to be highly associated with four agronomic traits: days of flowering (33 SNPs), flower color (16 SNPs), node number (6 SNPs), and seed coat color (11 SNPs). These results are consistent with those previously reported for other genetic resource populations, including natural accessions and recombinant inbred line. Our observations suggest that genomic changes in mutant individuals induced by gamma rays occurred at the same loci as those of natural soybean population. This study has demonstrated that the integration of GBS and GWAS can serve as a powerful complementary approach to gamma-ray mutation for the dissection of complex traits in soybean.

• 천문학회보
• /
• 제42권2호
• /
• pp.65.4-65.4
• /
• 2017

The laboratory astrophysics is a new emerging field of basic sciences, and has tremendous discovery potentials. The laboratory astrophysics investigates the basic physical phenomena in the astrophysical objects in controlled and reproducible manners, which has become possible only recently due to the newly-established intense photon and ion beam facilities worldwide. In this presentation, we will introduce several promising ideas for laboratory astrophysics programs that might be readily incorporated in the Pohang Accelerator Laboratory X-ray Free Electron Laser (PAL-XFEL). For example, precise spectroscopic measurements using Electron Beam Ion Trap (EBIT) and intense X-ray photons from the PAL-XFEL can be performed to explore the fundamental processes in high energy X-ray phenomena in the visible universe. Besides, in many violent astrophysical events, the energy density of matter becomes so high that the traditional plasma physics description becomes inapplicable. Generation of such high-energy density states can be also be achieved by using the intense photon beams available from the PAL-XFEL.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
• /
• pp.288-288
• /
• 2011

최근 Charge Trap Flash (CTF) Non-Volatile Memory (NVM) 소자가 30 nm node 이하로 보고 되면서, 고집적화 플래시 메모리 소자로 각광 받고 있다. 기존의 CTF NVM 소자의 tunnel layer로 쓰이는 SiO2는 성장의 용이성과 Si 기판과의 계면특성, 낮은 누설전류와 같은 장점을 지니고 있다. 하지만 단일층의 SiO2를 tunnel layer로 사용하는 기존의 Non-Valatile Memory (NVM)는 두께가 5 nm 이하에서 direct tunneling과 Stress Induced Leakage Current (SILC) 등의 효과로 인해 게이트 누설 전류가 증가하여 메모리 보존특성의 감소와 같은 신뢰성 저하에 문제점을 지니고 있다. 이를 극복하기 위한 방안으로, 최근 CTF NVM 소자의 Tunnel Barrier Engineered (TBE) 기술이 많이 접목되고 있는 상황이다. TBE 기술은 SiO2 단일층 대신에 서로 다른 유전율을 가지는 절연막을 적층시킴으로서 전계에 대한 민감도를 높여 메모리 소자의 쓰기/지우기 동작 특성과 보존특성을 동시에 개선하는 방법이다. 또한 터널링 절연막으로 유전률이 큰 High-K 물질을 이용하면 물리적인 두께를 증가시킴으로서 누설 전류를 줄이고, 단위 면적당 gate capacitance값을 늘릴 수 있어 메모리 소자의 동작 특성을 개선할 수 있다. 본 연구에서는 CTF NVM 소자의 trap layer로 쓰이는 HfO2의 두께를 5 nm, blocking layer의 역할을 하는 Al2O3의 두께를 12 nm로 하고, tunnel layer로 Si3N4막 위에 유전율과 Energy BandGap이 유사한 HfAlO와 ZrO2를 적층하여 Program/Erase Speed, Retention, Endurance를 측정을 통해 메모리 소자로서의 특성을 비교 분석하였다.

• 전기전자학회논문지
• /
• 제26권2호
• /
• pp.306-312
• /
• 2022

서로 다른 PN 비율과 금속화 어닐링 온도에 의해 장벽 높이가 다른 4H-SiC 병합 PiN Schottky(MPS) 다이오드의 전기적 특성과 심층 트랩을 조사했다. MPS 다이오드의 장벽 높이는 IV 및 CV 특성에서 얻었다. 전위장벽 높이가 낮아짐에 따라 누설 전류가 증가하여 10배의 전류가 발생하였다. 또한, 심층 트랩(Z_1/2 및 RD_1/2)은 4개의 MPS 다이오드에서 DLTS 측정을 통해 밝혀졌다. DLTS 결과를 기반으로, 트랩 에너지 준위는 낮은 장벽 높이와 함께 22~28%의 얕은 수준으로 확인되었다. 이는 쇼트키 장벽 높이에 대해 DLTS에 의해 결정된 결함 수준 및 농도의 의존성을 확인할 수 있다.

• 한국재료학회지
• /
• 제34권2호
• /
• pp.111-115
• /
• 2024

Silicon carbide (SiC) has emerged as a promising material for next-generation power semiconductor materials, due to its high thermal conductivity and high critical electric field (~3 MV/cm) with a wide bandgap of 3.3 eV. This permits SiC devices to operate at lower on-resistance and higher breakdown voltage. However, to improve device performance, advanced research is still needed to reduce point defects in the SiC epitaxial layer. This work investigated the electrical characteristics and defect properties using DLTS analysis. Four deep level defects generated by the implantation process and during epitaxial layer growth were detected. Trap parameters such as energy level, capture-cross section, trap density were obtained from an Arrhenius plot. To investigate the impact of defects on the device, a 2D TCAD simulation was conducted using the same device structure, and the extracted defect parameters were added to confirm electrical characteristics. The degradation of device performance such as an increase in on-resistance by adding trap parameters was confirmed.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.464.1-464.1
• /
• 2014

Among numerous material candidates, Cu(InxGa1-x)(SySe2-y) (CIGS) thin films have emerged as promising material candidates for thin film solar cell applications due to the high energy conversion efficiency and relatively low fabrication cost. The CIGS thin film solar cells consist of several materials, including Mo back contacts, ZnO-based window layers, and CdS buffer layers. All these materials have different crystal structures and contain quite distinct chemical elements, and hence the device characterization requires careful analyses. Most of all, identification of the major trap states resulting in the carrier recombination processes is a key step toward realization of high efficiency CIGS solar cells. We have carried out electrical investigations of CIGS thin film solar cells to specify the major trap states and their roles in photovoltaic performance. In particular, we have used the temperature-dependent transport characterizations and admittance spectroscopy. In this presentation, we will introduce some exemplary studies of DC and AC electrical characteristics of the CIGS solar cells.

• Applied Science and Convergence Technology
• /
• 제26권5호
• /
• pp.133-138
• /
• 2017

We investigated the interface defect engineering and reaction mechanism of reduced transition layer and nitride layer in the active plasma process on 4H-SiC by the plasma reaction with the rapid processing time at the room temperature. Through the combination of experiment and theoretical studies, we clearly observed that advanced active plasma process on 4H-SiC of oxidation and nitridation have improved electrical properties by the stable bond structure and decrease of the interfacial defects. In the plasma oxidation system, we showed that plasma oxide on SiC has enhanced electrical characteristics than the thermally oxidation and suppressed generation of the interface trap density. The decrease of the defect states in transition layer and stress induced leakage current (SILC) clearly showed that plasma process enhances quality of $SiO_2$ by the reduction of transition layer due to the controlled interstitial C atoms. And in another processes, the Plasma Nitridation (PN) system, we investigated the modification in bond structure in the nitride SiC surface by the rapid PN process. We observed that converted N reacted through spontaneous incorporation the SiC sub-surface, resulting in N atoms converted to C-site by the low bond energy. In particular, electrical properties exhibited that the generated trap states was suppressed with the nitrided layer. The results of active plasma oxidation and nitridation system suggest plasma processes on SiC of rapid and low temperature process, compare with the traditional gas annealing process with high temperature and long process time.

• 한국자동차공학회논문집
• /
• 제2권5호
• /
• pp.58-65
• /
• 1994

In order to reduce particulate emissions from diesel vehicles, mathematical model is established and analyzed on ceramic wall-flow monolith filter. A wall-flow monolith filter placed in the exhaust stream of a diesel engine can effectively limit the emission of diesel particulates through the monolith. The accumulated particulates can then be periodically combusted inside the monolith by directing hot gas to the monolith while normal engine exhaust is routed around the monolith system. The resulting low flow rates through the monolith require consideration of gas dynamics through the channels as well as particulate combustion to analyze this regeneration process. A mathematical model of the regeneration is formulated as a system of nonlinear partial differential equations describing the conservation of mass, momentum and energy. Numerical solutions are obtained by using a finite difference techniques for the spatial discretization. So we can use filter simulation program for the purpose of filter design and actual filter regeneration

• 센서학회지
• /
• 제4권3호
• /
• pp.43-50
• /
• 1995

Eu와 Fe를 불순물로 첨가한 BGO 섬광체 단결정을 Czochralski 방법으로 육성하였다. 그리고 육성된 BGO 단결정의 trap 특성을 알기 위하여 활성화 에너지, 주파수인자 및 열발광차수 등 포획매개변수를 구하고, 이것을 순수 BGO 섬광체 단결정의 열형광 특성과 비교하였다. 그리고 육성된 BGO 단결정의 광투과율을 측정하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
• /
• pp.340-341
• /
• 2012

In this work, we investigated the effects of temperature stress on flatband voltage (VFB) shifts of HfO2-SiO2 double gate dielectrics devices. Fig. 1 shows a high frequency C-V of the device when a positive bias for 10 min and a subsequent negative bias for 10 min were applied at room temperature (300 K). Fig. 2 shows the corresponding plot when the same positive and negative biases were applied at a higher temperature (473.15 K). These measurements are based on the BTS (bias temperature stress) about mobile charge in the gate oxides. These results indicate that the positive bias stress makes no difference, whereas the negative bias stress produces a significant difference; that is, the VFB value increased from ${\Delta}0.51$ V (300 K, Fig. 1) to ${\Delta}14.45$ V (473.15 K, Fig. 2). To explain these differences, we propose a mechanism on the basis of oxygen vacancy in HfO2. It is well-known that the oxygen vacancy in the p-type MOS-Cap is located within 1 eV below the bottom of the HfO2 conduction band (Fig. 3). In addition, this oxygen vacancy can easily trap the electron. When heated at 473.15 K, the electron is excited to a higher energy level from the original level (Fig. 4). As a result, the electron has sufficient energy to readily cross over the oxide barrier. The probability of trap about oxygen vacancy becomes very higher at 473.15 K, and therefore the VFB shift value becomes considerably larger.