• Current Optics and Photonics
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• 제2권2호
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• pp.147-152
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• 2018

We propose a novel bi-focal metallic Fresnel zone plate (MFZP) with shallow depth-of-field (DOF) characteristics. We design the specific annular slit patterns, exploiting the phase-selection-rule method along with the particle swarm optimization algorithm, which we have recently proposed. We numerically investigate the novel characteristics of the bi-focal MFZP in comparison with those of another bi-focal MFZP having equivalent functionality but designed by the conventional multi-zone method. We verify that whilst both bi-focal MFZPs can produce dual focal spots at $15{\mu}m$ and $25{\mu}m$ away from the MFZP plane, the former exhibits characteristics superior to those of the latter from the viewpoint of axial resolution, including the axial side lobe suppression and axial DOF shallowness. We expect the proposed bi-focal MFZP can readily be fabricated with electron-beam evaporation and focused-ion-beam processes and further be exploited for various applications, such as laser micro-machining, optical trapping, biochemical sensing, confocal sensing, etc.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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• pp.118-120
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• 2009

태양전지는 무한한 차세대 청정에너지로 주목을 받으며 그 개발의 필요성이 높아지고 있다. 이중 염료 감응형 태양전지(Dye-Sensitized Solar Cells, DSSC)는 낮은 제조 단가와 높은 효율로 기존의 Si 태양전지를 대체할 새로운 방법으로 연구되고 있다. 염료감응태양전지에 사용되는 $TiO_2$는 광촉매 성질 및 전자 전도성이 좋으며, 무독성에 가격이 저렴하여 다양한 분야에서 현재 많이 연구되고 있는 재료이다. 많이 사용되어지는 TiO2의 표면적은 염료의 흡착에 관여하므로 표면적의 제어는 매우 중요한 요소이다. $TiO_2$를 기판에 증착하는 방법으로는 Electrophoretic deposition, Chemical bath deposition, RF Margnetron sputtering, Electron-beam evaporation 등이 있으며 본 실험에서는 RF Magnetron sputtering을 사용하여 기판에 증착시키는 방법으로 구조를 제어하고자 한다. 이렇게 제조된 $TiO_2$ 박막을 SEM(Scanning Electron Microscopy)과 Solar simulator를 이용하여 표면형상과 Photocurrent-voltage curve를 분석하였다. 이것을 토대로 제조된 $TiO_2$박막의 구조가 염료감응태양전지에 미치는 영향을 연구해보고자 한다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.662-662
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• 2013

Over the last several decades, innovative light-harvesting devices have evolved to achieve high efficiency in solar energy transfer. Research on the mechanisms for plasmon resonance is very desirable to overcome the conventional efficiency limits of photovoltaics. The influence of localized surface plasmon resonance on hot electron flow at a metal-semiconductor interface was observed with a Schottky diode composed of a thin silver layer on $TiO_2$. The photocurrent is generated by absorption of photons when electrons have enough energy to travel over the Schottky barrier and into the titanium oxide conduction band. The correlation between the hot electrons and the surface plasmon is confirmed by matching the range of peaks between the incident photons to current conversion efficiency (IPCE, flux of collected electrons per flux of incident photons) and UV-Vis spectra. The photocurrent measured on Ag/$TiO_2$ exhibited surface plasmon peaks; whereas, in contrast to the Au/$TiO_2$, a continuous Au thin film doesn't exhibit surface plasmon peaks. We modified the thickness and morphology of a continuous Ag layer by electron beam evaporation deposition and heating under gas conditions and found that the morphological change and thickness of the Ag film are key factors in controlling the peak position of light absorption.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.318.1-318.1
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• 2014

Metal nano-crystals have been received much attentions owing to their excellent catalytic property and surface plasmon effect. In the last decade, many studies on synthesizing well-dispersive nanoparticles and on understanding their distinct physical properties have been performed. There were tremendous reports revealing the electrochemical activities and enhancement of surface plasmonic effect were dependent mainly on the size, shape, and composition. So far, most fabrication methods have been based on vacuum based deposition techniques, such as chemical vapor deposition and electron-beam evaporation, and then annealed them to transform into the nanoparticles. Recently, there were several reports regarding to the photoinduced nano-crystal synthesis as an effective way to produce the metal nanoparticles. In this study, we report synchrotron x-ray mediated synthesis of Au nanoparticles on ZnO nanowires. ZnO nanowires were fabricated by hydrothermal method, and then they were dip into a solution having Au clusters. Detailed structural evolution of Au nanoparticles was investigated using scanning electron microscopy and photoluminescence measurements. The results on formation of well-dispersive Au nanoparticles on ZnO nanowires will be presented.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.628-631
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• 2002

$Al_2O_3$ capping layer and MgO protective layer were deposited by electron beam evaporation method using single crystal source. Thickness of the capping layer, $Al_2O_3$, was varied from 5 nm to 10 nm. Surface morphology was observed by SEM and AFM before and after hydration. And microstructure of deposited $Al_2O_3$ layer and chemical shift of electron binding energy were also observed by high resolution TEM and XPS, respectively, after hydration. From these results, it was found that Mg atoms diffused into $Al_2O_3$ layer, reacted with moisture and formed $Mg(OH)_2$ during hydration. As thickness of $Al_2O_3$ increased, extent of hydration increased. $Al_2O_3$ capped MgO thin films and uncapped MgO thin films were deposited on AC-PDP test panel to characterize discharge properties. Although $Al_2O_3$ has poor discharge properties rather than MgO, because of many hydrated species on the surface of MgO, similar discharge properties were observed.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.78.1-78.1
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• 2012

비 휘발성 저항 메모리소자인 resistance random access memory (ReRAM)는 빠른 동작특성과 저 전압 특성을 나타내고 비교적 간단한 소자구조로 고집적화에 유리하여 기존의 DRAM과 flash 메모리, SRAM 등이 갖고 있는 한계를 극복할 수 있는 차세대 메모리소자로써 각광받고 있다. 현재, 이성분계 산화물, 페로브스카이트 산화물, 고체 전해질 물질, 유기재료 등을 응용한 저항 메모리소자에 대한 연구가 활발히 진행되고 있다. 그 중 ZnO 를 기반으로 하는 amorphous InGaZnO (a-IGZO) 박막은 저온에서 대면적 증착이 가능하며 다른 비정질 재료에 비해 높은 전하 이동도를 갖기 때문에 박막트랜지스터 적용 시 우수한 전기적 특성을 나타낸다. 또한 빠른 동작특성과 높은 저항 변화율을 보이기 때문에 ReRAM에 응용 가능한 재료로써 기대되고 있다. 본 연구에서는 MOM(metal/oxide/metal) 구조를 기반한 TiN/a-IGZO/ITO 구조의 소자를 제작하여 저항 메모리 특성을 평가하였다. IGZO 박막은 radio frequency (RF) sputter 를 이용하여 ITO/glass 기판 위에 증착하였다. MOM 구조를 위한 상부 TiN 전극은 e-beam evaporation 을 이용하여 증착하였다. 제작된 저항 메모리소자는 안정적인 unipolar resistive switching 특성을 나타내었으며, TiN 상부전극과 IGZO 계면 간의 Transmission Electron Microscopy (TEM) 분석을 통해 전압 인가 후 전극 금속 물질의 박막 내 삽입으로 인한 금속 필라멘트의 형성을 관찰 할 수 있었다. 합성된 박막의 형태와 결정성은 Scanning electron microscope (SEM)와 X-ray Diffraction (XRD)을 통해 평가 하였으며, 제작된 소자의 전기적 특성은 HP-4145 를 이용하여 측정하고 비교 분석하였다.

• 태양에너지
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• 제15권3호
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• pp.141-149
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• 1995

텅스텐 산화물 박막이 전자 비임에 의해 실리콘 기판 위에 제작되었다. 여러가지 전해질에 의해 퇴화된 막의 두께와 구조는 후방산란분광, 라만분광, 광전자분광 및 전자현미경에 의해 연구되었다. 텅스텐 산화물 박막은 1몰의 황산 전해질속에서 두께가 가장 많이 용해 되었으며,수분에 의해 촉진된 것을 확인하였다. 그러나 글리세린이 포함된 전해질에 의해서 퇴화된 막의 전자구조는 제작된 막과 비교할 때 변화가 없었다. 막의 퇴화는 두께와 표면 구조변화에도 그 원인이 있음을 보였다.

• 대한금속재료학회지
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• 제48권7호
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• pp.660-666
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• 2010

30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1174-1177
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• 1995

In this paper, electrical properties CdS/CdTe heterojunction solar cell prepared by electron beam evaporation method were investigated. Crystal structure of CdS films deposited at substrate temperature of $50{\sim}250^{\circ}C$ was hexagonal type with preferential orientation of the (002)plane parallel to the substrate. Optical transmittance of the CdS film is increasing and resistivity is decreasing with increasing subsrate temperature. CdS/CdTe Solar cell characteristics were improved by increasing of substrate and annealing temperature. However, low efficiency due to small Jsc, Voc below 0.3 $mA/cm^2$ and 430 mV are observed. Low efficiency is contributed to be high resistance of CdTe films and contact.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1178-1180
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• 1995

In this paper, structual, optical and electrical properties of CdTe thin films prepared by electron beam evaporation method were studied. The crystal structure of CdTe films deposited at substrate temperature of $100{\sim}400^{\circ}C$ was zincblend type with preferential orientation of the (111)plane parallel to the substrate. The result of optical absoption and transmittance show that solar radiation with energy larger than band gap is almost completely absorbed within an about $2{\mu}m$ thickness of the evaporated CdTe layer and optical band gap of the CdTe film was larger with increasing substrate temperature. The resistivity of CdTe films deposited on the glass substrate was about $10^5{\sim}10^7{\Omega}cm$.