• 제목/요약/키워드: Electron-Phonon Interaction Model

검색결과 5건 처리시간 0.017초

줄 가열 변화에 따른 박막 트랜지스터 내 포논 열 흐름에 대한 수치적 연구 (Effect of Joule Heating Variation on Phonon Heat Flow in Thin Film Transistor)

  • 진재식;이준식
    • 대한기계학회논문집B
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    • 제33권10호
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    • pp.820-826
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    • 2009
  • The anisotropic phonon conductions with varying Joule heating rate of the silicon film in Silicon-on-Insulator devices are examined using the electron-phonon interaction model. It is found that the phonon heat transfer rate at each boundary of Si-layer has a strong dependence on the heating power rate. And the phonon flow decreases when the temperature gradient has a sharp change within extremely short length scales such as phonon mean free path. Thus the heat generated in the hot spot region is removed primarily by heat conduction through Si-layer at the higher Joule heating level and the phonon nonlocality is mainly attributed to lower group velocity phonons as remarkably dissimilar to the case of electrons in laser heated plasmas. To validate these observations the modified phonon nonlocal model considering complete phonon dispersion relations is introduced as a correct form of the conventional theory. We also reveal that the relation between the phonon heat deposition time from the hot spot region and the relaxation time in Si-layer can be used to estimate the intrinsic thermal resistance in the parallel heat flow direction as Joule heating level varies.

전자-포논 상호작용 모델을 이용한 실리콘 박막 소자의 포논 평균자유행로 스펙트럼 열전도 기여도 수치적 연구 (A Numerical Study on Phonon Spectral Contributions to Thermal Conduction in Silicon-on-Insulator Transistor Using Electron-Phonon Interaction Model)

  • 강형선;고영하;진재식
    • 대한기계학회논문집B
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    • 제41권6호
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    • pp.409-414
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    • 2017
  • 본 연구의 목적은 실제 실리콘 박막 트랜지스터 내 포논 전달 특성을 이해하는 것이다. 이를 위해 박막 소자 내 열해석 예측 정확성이 검증된 전자-포논 상호작용 모델을 이용하여 반도체 산업에서 중요한 Silicon-on-Insulator(SOI) 시스템에 대한 다양한 조건에서 전자-포논 산란에 의한 Joule 가열 메커니즘의 고려하여 포논 전달 해석을 수행했다. 소자 장치 전원(device power)과 실리콘 층 두께 변화에 따른 포논의 평균자유행로(mean free path) 스펙트럼에 대한 열적 특성을 조사하여, 실제 SOI 소자 내 포논 전달을 이해했다. 이 결과는 SOI 소자의 신뢰성 설계 및 고효율 열소산(heat dissipation) 설계전략에 필요한 포논 전달 특성 이해에 활용될 수 있다.

Optical phonon and scattering in uniaxial crystals

  • Lee, B.C
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.118-118
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    • 2000
  • We investigate Frohlich-like electron--optical-phonon interactionsin uniaxial crytals based on the macroscopic dielectric continuum model. In general, the optical-phonon branches support mixed longitudinal and transverse modes due to the anisotropy. For heterostructures with double interfaces and superlattices, it is known that confined, interface, and half-space optical phonon modes exist in zincblende cystals. In uniaxial structures, additional propagating modes may exist in wurtzite heterosystems due to anisotropic phonon dispersion. This is especially the case when the dielectric properties of the adjacent heterostructure materials do not differ substantially. The dispersion relations and the interaction Hamiltonians for each of these modes are derived.

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박막 실리콘 내 도핑 농도 변화에 따른 포논과 전자의 열전도율 기여도에 대한 수치해석 (Predictions of Phonon and Electron Contributions to Thermal Conductivity in Silicon Films with Varying Doping Density)

  • 진재식;이준식
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2007년도 춘계학술대회B
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    • pp.2182-2187
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    • 2007
  • The relative contributions of phonon and electron to the thermal conductivity of silicon film with varying doping density are evaluated from the modified electron-phonon interaction model, which is applicable to the micro/nanoscale simulation of energy transport between energy carriers. The thermal conductivities of intrinsic silicon layer thicknesses from 20 nm to 500 nm are calculated and extended to the variation in n-type doping densities from 1.0 ${\times}$ $10^{18}$ to 5.0 ${\times}$ $10^{20}$ $cm^{-3}$, which agree well with the experimental data and theoretical model. From simulation results, the phonon and electron contributions to thermal conductivity are extracted. The electron contribution in the silicon is found to be not negligible above $10^{19}$ $cm^{-3}$, which can be classified as semimetal or metal by the value of its electrical resistivity at room temperature. The thermal conductivity due to electron is about 57.2% of the total thermal conductivity at doping concentration 5.0 ${\times}$ $10^{20}$ $cm^{-3}$ and silicon film thickness 100 nm.

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$Ga_{1-x}In_xSe $ 단결정의 Energy Gap의 온도 의존정에 관한 연구 (Temperatature Dependence of the Energy Gap of $Ga_{1-x}In_xSe $ Single Crystals)

  • 김화택;윤창선
    • 대한전자공학회논문지
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    • 제21권2호
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    • pp.36-46
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    • 1984
  • Ga1-xlnxSe 단결정을 X=0.0∼0.1영역과 X=0.8-1.0영역에서 Bridgman방법으로 성장시켰다. 성장된 Ga1-xlnxSe 단결정은 X=0.0∼0.1영역에서는 hexagonal구조, X=0.8∼1.0영역에서는 rhombohedral 구조를 가지고 있었다. CaInSe 단결정은 간접천이형 energy gap을 가지고 있었으며, 15°K에서 250°K로 시편의 온도가 상승할 때 energy gap 은 감소되었고, 온도계수는 (-2.4∼-4.3)×10-4eV/K으로 주어졌다. Ga1-xlnxSe 단결정의, energy gap에 온도 의존성은 Schmid의 electron-phonon 상호작용의 이론으로 설명할 수 있었다.

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