• Title/Summary/Keyword: Electron-Beam

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Structural Design on the Vacuum Chamber of Electron Beam Welding System (전자빔 용접기 진공 작업실의 구조설계)

  • Lee, Young-Sin;Ryu, Chung-Hyun;Seo, Jung;Han, Yu-Hee
    • Laser Solutions
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    • v.1 no.1
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    • pp.11-17
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    • 1998
  • The electron beam welding system has the advantages of the high power density, narrow welding section, and small thermal distortion of a workpiece. Recently, the electron beam welding system is widely used to the airplane engineering, nuclear power plant, and automobile industry. In the present paper, the structural analyses on the vacuum chamber of the electron beam welding system are performed by the F.E.M. analysis. The stiffening characteristics on the geometric shape, stiffener height and stiffener span are investigated. The deflection of the stiffened vacuum chamber under pressure is minimized by longitudinal and transverse stiffeners which are continuous in both direction.

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Effects of electron beam treatment on cotton linter for the preparation of nanofibrillated cellulose

  • Le, Van Hai;Seo, Yung Bum
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.48 no.2
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    • pp.68-74
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    • 2016
  • Nanofibrillated cellulose (NFC) was prepared from cotton linter after electron beam irradiation to investigate its effects on the manufacturing efficiency of the NFC preparation and the property changes by the treatment. Mechanical device (Super Masscolloider) was used to prepare the NFC and its passing frequency for each NFC preparation was recorded. More electron beam irradiation resulted in less passing frequency. Alpha cellulose content, molecular weight, crystallinity index, and thermal decomposition behavior of each treatment were lowered by electron beam treatment (10 and 100 kGy) and grinding process. NFC films were prepared to investigate their mechanical properties. There were little changes in tensile properties of the NFC films.

Effect of Electron Beam Irradiation on Microbial Growth and Qualities in Astragalus membranaceus

  • Jin, You-Young;Shin, Hee-Young;Ku, Kyoing-Ju;Song, Kyung-Bin
    • Journal of Applied Biological Chemistry
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    • v.49 no.4
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    • pp.176-179
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    • 2006
  • Electron beam irradiation was applied to examine the microbial growth and qualities of vacuum-packaged Astragalus membranaceus, a Korean medicinal herb. Samples were irradiated at dose of 2, 4, 8, 12, and 16 kGy, respectively. Microbiological data on A. membranaceus showed that populations of total bacteria, yeast and mold, total coliforms were significantly reduced with increase of irradiation dose. Populations of microorganisms in A. membranaceus were decreased by 2-3 log cycles at 8 kGy irradiation. Color measurements showed that electron beam treatment caused negligible changes in Hunter color L, a, and b values of A. membranaceus. Sensory evaluations showed that there were no significant changes among the samples. These results suggest that electron beam irradiated A. membranaceus have better microbial safety and qualities, compared with the non-irradiated control.

Novel Patterning of Gold Using Spin-Coatable Gold Electron-Beam Resist

  • Kim, Ki-Chul;Lee, Im-Bok;Kang, Dae-Joon;Maeng, Sung-Lyul
    • ETRI Journal
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    • v.29 no.6
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    • pp.814-816
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    • 2007
  • Conventional lithography methods of gold patterning are based on deposition and lift-off or deposition and etching. In this letter, we demonstrate a novel method of gold patterning using spin-coatable gold electron-beam resist which is functionalized gold nanocrystals with amine ligands. Amine-stabilized gold electron beam resist exhibits good sensitivity, 3.0 mC/$cm^2$, compared to that of thiol-stabilized gold electron beam resists. The proposed method reduces the number of processing steps and provides greater freedom in the patterning of complex nanostructures.

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Development parameter measurement and profile analysis of electron beam resist for lithography simulation (리소그라피 모의실험을 위한 전자빔용 감광막의 현상 변수 측정과 프로파일 분석)

  • 함영묵;이창범;서태원;전국진;조광섭
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.7
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    • pp.198-204
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    • 1996
  • Electron beam lithography is one of the importnat technologies which can delineate deep submicron patterns. REcently, electron beam lithography is being applied in delineating the critical layers of semiconductor device fabrication. In this paper, we present a development simulation program for electron beam lithography and study the development profiles of resist when resist is exposed by the electron beam. Experimentally, the development parameter of positive and negative resists are measured and the data is applied to input parameter of the simulation program. Also simulation results are compared of the process results in the view of resist profiles. As a result, for PMMA and SAL 601 resist, the trend of simulation to the values of process parameters agree with real process results very well, so that the process results can be predicted by the simulation.

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Fabrication of carbon nanostructures using electron beam lithography and pyrolysis for biosensing applications (전자빔 리소그래피와 열처리를 이용한 탄소 나노구조물의 제작 및 바이오센싱 응용연구)

  • Lee, Jung-A;Lee, Kwang-Cheol;Park, Se-Il;Lee, Seung-S.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1727-1732
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    • 2008
  • We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

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Microbial Decontamination of Angelica gigas Nakai Using Electron Beam Irradiation

  • Jin, You-Young;Shin, Hee-Young;Song, Kyung-Bin
    • Preventive Nutrition and Food Science
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    • v.11 no.4
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    • pp.344-347
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    • 2006
  • This study evaluated the use of electron beam irradiation for decontamination of the Korean medicinal herb, Angelica gigas Nakai. Herb samples were irradiated at doses of 2, 8, and 16 kGy, respectively. Populations of microorganisms in Angelica gigas Nakai decreased by 2$\sim$3 log cycles at 8 kGy irradiation. Electron beam irradiation caused negligible changes in Hunter color L, a, and b values. Sensory evaluations of Angelica gigas Nakai confirmed that irradiation caused no significant changes in the organoleptic properties of the samples. These results suggest that electron beam-irradiated herbs retain a better microbial safety and sensory qualities, compared with the non-irradiated.

Utilization of Electron Beam-Radiated Cotton Waste for Agaric Mushroom Cultivation Bed (전자빔으로 처리한 폐면의 버섯배지효과)

  • Shon, Hyo-Jung;Chung, Sun-Young;Lee, Jong-Shin;Seo, Yung-Bum
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.41 no.3
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    • pp.71-75
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    • 2009
  • Cotton waste is usually used for cultivating agaric mushroom after outdoor fermentation for a few months. Electron beam was used to break down the polymer chaims of cotton waste for increasing low molecular weight soluble sugars, which may enhance the agaric mushroom cultivation. By increasing electron beam radiation, alpha cellulose content of the cotton waste was decreased while beta cellulose content and hot water solubles were increased. Electron beam radiation over 240 kGy on cotton waste caused significant increase of mushroom yield without lowering mushroom quality.

Molecular Weight Control of Chitosan Using Gamma Ray and Electron Beam Irradiation

  • Kim, Hyun Bin;Lee, Young Joo;Oh, Seung Hwan;Kang, Phil Hyun;Jeun, Joon Pyo
    • Journal of Radiation Industry
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    • v.7 no.1
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    • pp.51-54
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    • 2013
  • Chitosan is a useful natural polymer material in many application fields such as biomaterials, water-treatment, agriculture, medication, and food science. However, the poor solubility limits its application. In this study, the effects of radiation on chitosan were investigated using gamma ray and electron beam irradiation. The chemical structure and molecular weight analysis show similar degradation effects of chitosan powder in both gamma ray and electron beam irradiation. However, the radiation irradiated chitosan in $H_2O$ has a lower molecular weight, since the hydroxyl radicals attack the glycosidic bonds. This effect is more clearly shown in the electron beam irradiation results.